JP5566378B2 - オキシムエステル光開始剤 - Google Patents

オキシムエステル光開始剤 Download PDF

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Publication number
JP5566378B2
JP5566378B2 JP2011512067A JP2011512067A JP5566378B2 JP 5566378 B2 JP5566378 B2 JP 5566378B2 JP 2011512067 A JP2011512067 A JP 2011512067A JP 2011512067 A JP2011512067 A JP 2011512067A JP 5566378 B2 JP5566378 B2 JP 5566378B2
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JP
Japan
Prior art keywords
meth
alkyl
phenyl
acrylate
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011512067A
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English (en)
Japanese (ja)
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JP2011525480A (ja
JP2011525480A5 (enExample
Inventor
啓 松本
久稔 倉
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BASF SE
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BASF SE
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Publication of JP2011525480A5 publication Critical patent/JP2011525480A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/34—Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • C07C251/48—Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with the carbon atom of at least one of the oxyimino groups bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62—Benzothiazoles
    • C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70—Sulfur atoms
    • C07D277/74—Sulfur atoms substituted by carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Indole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
JP2011512067A 2008-06-06 2009-05-27 オキシムエステル光開始剤 Expired - Fee Related JP5566378B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08157706 2008-06-06
EP08157706.6 2008-06-06
PCT/EP2009/056397 WO2009147031A2 (en) 2008-06-06 2009-05-27 Oxime ester photoinitiators

Publications (3)

Publication Number Publication Date
JP2011525480A JP2011525480A (ja) 2011-09-22
JP2011525480A5 JP2011525480A5 (enExample) 2012-07-19
JP5566378B2 true JP5566378B2 (ja) 2014-08-06

Family

ID=40042788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011512067A Expired - Fee Related JP5566378B2 (ja) 2008-06-06 2009-05-27 オキシムエステル光開始剤

Country Status (7)

Country Link
US (1) US8507725B2 (enExample)
EP (1) EP2303833B1 (enExample)
JP (1) JP5566378B2 (enExample)
KR (1) KR101626172B1 (enExample)
CN (1) CN102112438B (enExample)
TW (1) TWI466853B (enExample)
WO (1) WO2009147031A2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2285836B1 (en) * 2008-06-06 2012-01-18 Basf Se Photoinitiator mixtures
US8507726B2 (en) 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
JP5799799B2 (ja) * 2011-10-20 2015-10-28 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
CN107652383A (zh) * 2011-10-20 2018-02-02 日立化成株式会社 感光性树脂组合物、感光性元件、抗蚀图形的形成方法以及印刷电路板的制造方法
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
CN103698976A (zh) * 2012-09-27 2014-04-02 李妤 新型激光数字全息高密度存储显示材料的制备
KR102215890B1 (ko) * 2012-12-21 2021-02-15 에이치디 마이크로시스템즈 가부시키가이샤 감광성 수지 조성물, 그것을 사용한 패턴 경화막의 제조 방법 및 반도체 장치
CN105531260B (zh) * 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用
CN104672354A (zh) * 2015-02-04 2015-06-03 天津墨森科技有限公司 一种双肟酯类光引发剂及其制备方法和应用
CN107614485A (zh) * 2015-08-24 2018-01-19 株式会社艾迪科 肟酯化合物及含有该化合物的聚合引发剂
JP6713112B2 (ja) * 2016-04-27 2020-06-24 東京応化工業株式会社 化合物及びその製造方法
TWI664500B (zh) * 2016-06-30 2019-07-01 奇美實業股份有限公司 黑色感光性樹脂組成物及其應用
KR102545326B1 (ko) * 2017-03-16 2023-06-21 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
CN109134711B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种硫鎓盐光引发剂及其制备与应用
CN109134710B (zh) * 2017-06-15 2021-08-03 常州强力电子新材料股份有限公司 一种芳基硫鎓盐肟酯类光引发剂及其合成与应用
KR102355406B1 (ko) * 2017-06-29 2022-01-25 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치
JP2020200272A (ja) * 2019-06-11 2020-12-17 株式会社Adeka カルバモイルオキシム化合物並びに該化合物を含有する重合開始剤及び重合性組成物
WO2025225376A1 (ja) * 2024-04-23 2025-10-30 富士フイルム株式会社 光硬化性組成物、画素の製造方法、膜、光学フィルタ、固体撮像素子、画像表示装置および光重合開始剤

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
DE1908346A1 (de) * 1968-02-20 1969-11-13 Eastman Kodak Co Substituierte Triarylamine
FR2393345A1 (fr) 1977-06-01 1978-12-29 Agfa Gevaert Nv Fabrication d'elements modifies sous forme d'images
GB2029423A (en) 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
JPS6443562A (en) * 1987-08-12 1989-02-15 Asahi Chemical Ind Photosensitive composition
JPH07271020A (ja) 1994-03-18 1995-10-20 Internatl Business Mach Corp <Ibm> ブラックマトリックス形成用感光性組成物、カラーフィルター基板及びそれを用いた液晶表示装置
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
KR101032582B1 (ko) 2002-12-03 2011-05-06 시바 홀딩 인크 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제
JP3754065B2 (ja) 2003-06-10 2006-03-08 三菱化学株式会社 光重合性組成物及びこれを用いたカラーフィルター
US7759043B2 (en) 2004-08-18 2010-07-20 Ciba Specialty Chemicals Corp. Oxime ester photoinitiators
CN102093282B (zh) 2005-12-01 2014-02-12 西巴控股有限公司 肟酯光敏引发剂
US8586268B2 (en) 2005-12-20 2013-11-19 Basf Se Oxime ester photoinitiators
TWI392966B (zh) * 2006-01-13 2013-04-11 Toyo Ink Mfg Co 二酮肟酯化合物及其用途
JP4874659B2 (ja) * 2006-01-24 2012-02-15 富士フイルム株式会社 アニリン化合物及びその製造方法、並びに、感光性組成物
WO2008018405A1 (fr) * 2006-08-11 2008-02-14 Nippon Valqua Industries, Ltd. Vanne
WO2008138733A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2402315A1 (en) 2007-05-11 2012-01-04 Basf Se Oxime ester photoinitiators
KR101526619B1 (ko) 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
JP2009040762A (ja) 2007-08-09 2009-02-26 Ciba Holding Inc オキシムエステル光開始剤
EP2285836B1 (en) * 2008-06-06 2012-01-18 Basf Se Photoinitiator mixtures
US8507726B2 (en) * 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures

Also Published As

Publication number Publication date
EP2303833B1 (en) 2013-10-16
TWI466853B (zh) 2015-01-01
CN102112438B (zh) 2014-07-23
US8507725B2 (en) 2013-08-13
CN102112438A (zh) 2011-06-29
WO2009147031A2 (en) 2009-12-10
EP2303833A2 (en) 2011-04-06
WO2009147031A3 (en) 2010-07-08
JP2011525480A (ja) 2011-09-22
US20110170209A1 (en) 2011-07-14
TW201000434A (en) 2010-01-01
KR101626172B1 (ko) 2016-05-31
KR20110015683A (ko) 2011-02-16

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