JP5549065B2 - Liquid crystal panel and manufacturing method thereof - Google Patents

Liquid crystal panel and manufacturing method thereof Download PDF

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JP5549065B2
JP5549065B2 JP2008253874A JP2008253874A JP5549065B2 JP 5549065 B2 JP5549065 B2 JP 5549065B2 JP 2008253874 A JP2008253874 A JP 2008253874A JP 2008253874 A JP2008253874 A JP 2008253874A JP 5549065 B2 JP5549065 B2 JP 5549065B2
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liquid crystal
crystal panel
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信二 檀上
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Casio Computer Co Ltd
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Description

この発明は、大型基板から多数個同時に製造される液晶パネル及びその製造方法に関する。   The present invention relates to a liquid crystal panel manufactured simultaneously from a large substrate and a manufacturing method thereof.

液晶パネル集合体は、大型の基板に、多数個の液晶パネル領域を形成し、これを個々に分断して数個の液晶パネルを同時に形成している。この場合、大型基板から多くの液晶パネルを製造するために、液晶パネルの表示領域の外側に配置されるシール材の幅を狭くすることが要求されている。また、各液晶パネル領域を密接して配置することが要求されている。(特許文献1参照) Liquid crystal panel assembly, a large substrate to form a plurality LCD panel area of, which are formed simultaneously cutting to multi several liquid crystal panels individually. In this case, in order to manufacture many liquid crystal panels from the large-type substrate, reducing the width of the seal member disposed outside the display area of the liquid crystal panel is required. In addition, it is required that the respective liquid crystal panel regions are arranged closely. (See Patent Document 1)

特開2007−271749号公報JP 2007-271749 A

前記シール材は、生産性を高くするために、シルクスクリーン印刷、ディスペンサー等によって基板上に塗布するので、シール材の塗布幅精度良く狭くすることが困難であった。
また、液晶の注入を確実にするために、シール材の注入口から突出した突出部を隣接する液晶パネル領域との切断線を越えて形成し、個々の液晶パネルに分断することによって、前記突出部を基板の端面に揃えるようにしている。そのため、切断線に沿って個々の液晶パネルに分断する際に、対向する基板を接合する前記突出部が隣接する液晶パネル領域の基板間に残るため、基板に欠け等の欠陥が発生するという問題があった。
Since the sealing material is applied on the substrate by silk screen printing, a dispenser or the like in order to increase productivity, it is difficult to narrow the application width of the sealing material with high accuracy.
In addition, in order to ensure the injection of liquid crystal, the protrusion protruding from the sealing material injection port is formed beyond the cutting line with the adjacent liquid crystal panel region, and divided into individual liquid crystal panels, thereby the protrusion. The part is aligned with the end face of the substrate. Therefore, when dividing into individual liquid crystal panels along the cutting line, the protrusions that join the opposing substrates remain between the substrates in the adjacent liquid crystal panel regions, so that defects such as chipping occur in the substrates. was there.

この発明は、基板に発生する欠陥を低減した液晶パネルとその製造方法を提供することを目的とする。   An object of this invention is to provide the liquid crystal panel which reduced the defect which generate | occur | produces in a board | substrate, and its manufacturing method.

前記課題を解決するため、本発明の液晶パネルの一態様は、第1の絶縁膜が形成されるとともに当該第1の絶縁膜上に複数の画素電極が形成された第1の基板と、前記複数の画素電極と対向する対向電極が形成された第2の基板と、前記第1の基板と前記第2の基板との間に介在するように設けられたシール材と、前記第1および前記第2の基板と前記シール材とに囲まれた領域内に封止された液晶層とを備え、前記シール材は、前記液晶パネルの表示領域を取り囲む枠状部と、当該枠状部の一辺に形成された注入口部と、当該注入口部の両側から当該枠状部の外へ向かって突出した突出部とを有し、前記第1の絶縁膜から前記シール材の前記突出部に対応する部分を除去して形成され、前記シール材で埋められている第1の溝をさらに有し、前記突出部のうち、前記注入口部の両側と前記第1の基板および前記第2の基板の端面との間の部分に、前記第1の溝が形成されていることを特徴とする In order to solve the above problems, an embodiment of a liquid crystal panel according to the present invention includes a first substrate in which a first insulating film is formed and a plurality of pixel electrodes are formed on the first insulating film. a second substrate having a plurality of pixel electrodes and counter to that pair counter electrodes are formed, a sealing member disposed so as to be interposed between the first substrate and the second substrate, the first and e Bei and a liquid crystal layer sealed in said second substrate and the sealing member and in a region surrounded by the sealing material, a frame-shaped portion surrounding the display area of the liquid crystal panel, the frame has an inlet portion formed on one side of the Jo portion, a protrusion protruding toward the outside of the frame-shaped portion from both sides of the inlet portion, from the first insulating layer of the sealing material is formed by removing a portion corresponding to the projecting portion, further the first grooves are filled with the sealing material And, of said protruding portion, at a portion between said inlet portion sides and the end face of the first substrate and the second substrate, the first groove is formed, characterized in that to.

前記課題を解決するため、本発明の液晶パネルの製造方法の一態様は、第1の基板と第2の基板とがシール材を介して貼り合わされ、当該第1の基板および当該第2の基板と当該シール材とによって囲まれた領域に液晶が封止された液晶パネルの製造方法であって、前記第1の大型基板に第1の絶縁膜を形成する絶縁膜形成工程と、前記第1の大型基板の前記第1の絶縁膜から、前記液晶パネルの複数の画素が配列される表示領域を取り囲む枠状部と、当該枠状部の一辺に形成される注入口部と、当該注入口部の両側から当該枠状部の外へ向かって突出する突出部とを有する前記シール材のうちの、当該突出部に対応する部分を除去して前記シール材で埋められる第1の溝を形成する第1の溝形成工程と、前記第1の大型基板に形成された前記第1の絶縁膜上に、第1の電極を形成する第1の電極形成工程と、前記第2の大型基板上に、第2の電極を形成する第2の電極形成工程と、前記第1の大型基板の前記第1の電極が形成された面と前記第2の大型基板の前記第2の電極が形成された面とのいずれか一方に、前記シール材の前記枠状部と前記注入口部と前記突出部とを形成するための材料を塗布する塗布工程と、前記第1の大型基板の前記第1の電極が形成された面と前記第2の大型基板の前記第2の電極が形成された面とを対向させて配置し、前記第1の大型基板と前記第2の大型基板とを前記材料を介して貼り合わせる工程と、前記貼り合わされた前記第1の大型基板と前記第2の大型基板を前記液晶パネルの領域ごとに切断する工程と、を備え、前記塗布工程は、前記材料を隣接する2つの前記液晶パネルの領域に跨るように塗布する工程を含み、前記切断する工程は、前記第1の溝が、前記隣接する2つの前記液晶パネルのうち一方の液晶パネルの前記突出部のうち、当該一方の液晶パネルの前記注入口部の両側と前記第1の基板および前記第2の基板の端面との間の部分に形成されるように、前記第1の大型基板と前記第2の大型基板を切断する工程を含むことを特徴とする To solve the above problems, one aspect of the manufacturing method of the liquid crystal panel of the present invention includes a first substrate and a second substrate are bonded to each other with a sealing member, said first substrate and said second substrate liquid crystal in a region surrounded by the said sealing material is a manufacturing method of a liquid crystal panel sealed with the insulating film forming step of forming a first insulating film on the first large-sized substrate, the first from the first insulating film of a large substrate, and the frame-like portion which surrounds the display area in which a plurality of pixels of the liquid crystal panel are arranged, an inlet portion formed on one side of the frame-shaped portion, the inlet a protrusion from both sides of the section projecting toward the outside of the frame-like portion, of said sealing member having a first groove by removing the portions corresponding to the projecting portion is filled with the sealing material a first groove forming step of forming, which is formed on the first large substrate Serial on the first insulating film, a first electrode forming step of forming a first electrode, the second large substrate, a second electrode forming step of forming a second electrode, the first The frame-shaped portion of the sealing material and the surface of the first large substrate on one of the surface on which the first electrode is formed and the surface on which the second electrode of the second large substrate is formed An application step of applying a material for forming the inlet and the protruding portion; a surface of the first large substrate on which the first electrode is formed; and the second large substrate. and electrodes are formed face to face arranged, the first large substrate between said second large-sized substrate and a step of bonding through a pre SL materials, the bonded together the first large substrate and and a step of cutting a second large-sized substrate for each area of the liquid crystal panel, wherein the coating step, Comprising the step of applying to straddle the two regions of the liquid crystal panel in contact next to the serial material, wherein the step of cutting, the first groove, one liquid crystal panel of said adjacent two of said liquid crystal panel wherein one of the protruding portions so as to be formed in a portion between the end face of each side and the first substrate and the second substrate of the inlet portion of the one liquid crystal panel, the first of comprising the step of cutting the large-sized substrate and the second large-sized substrate, and wherein the.

この発明の液晶パネルによれば、液晶パネルの基板に発生する欠陥を低減することができる。
また、この発明の液晶パネルの製造方法によれば、基板に発生する欠陥を低減した液晶パネルを製造することができる。
According to the liquid crystal panel of the present invention, defects generated on the substrate of the liquid crystal panel can be reduced.
Moreover, according to the manufacturing method of the liquid crystal panel of this invention, the liquid crystal panel which reduced the defect generate | occur | produced in a board | substrate can be manufactured.

(第1の実施形態)
図1はこの発明の第1の実施例を示す液晶パネルの平面図、図2は図1のII-II線で切断して示す断面図である。
これらの図において、液晶パネルは、第1の基板と第2の基板とが対向配置され、これらの基板間に液晶が封入されている。前記第1の基板は、一つの導電膜、或いは複数の導電膜により形成される対向電極1が設けられた対向基板2からなっている。前記第2の基板は、前記対向電極1と対向する領域によりそれぞれ画素を形成する複数の画素電極3が形成された画素基板4からなっている。前記画素基板4には、図示しないが、画素電極3が行及び列方向に複数配列され、これらの画素電極3に対応する複数の画素は、マトリックス状に配列され、これらの複数の画素がマトリックス状に配列された領域が、表示領域を形成している。
(First embodiment)
FIG. 1 is a plan view of a liquid crystal panel according to a first embodiment of the present invention, and FIG. 2 is a sectional view taken along line II-II in FIG.
In these drawings, in the liquid crystal panel, a first substrate and a second substrate are arranged to face each other, and liquid crystal is sealed between these substrates. The first substrate comprises a counter substrate 2 provided with a counter electrode 1 formed of one conductive film or a plurality of conductive films. The second substrate comprises a pixel substrate 4 on which a plurality of pixel electrodes 3 each forming a pixel by a region facing the counter electrode 1 are formed. Although not shown, the pixel substrate 4 has a plurality of pixel electrodes 3 arranged in the row and column directions, a plurality of pixels corresponding to the pixel electrodes 3 are arranged in a matrix, and the plurality of pixels are arranged in a matrix. The regions arranged in a shape form a display region.

対向電極1が設けられた対向基板2と画素電極3が設けられた画素基板4は、それぞれの電極が形成された内面を互いに対向させて配置され、シール材5を介して貼り合わされている。シール材5は、前記複数の画素が配列された表示領域を取り囲む4つの辺を有する枠状部5aと、前記枠状部5aの一辺に形成された注入口部5bと、前記注入口部5bの両側から前記枠状部5a外へ向かって突出した突出部5cとからなり、前記対向基板2と前記画素基板4の間に液晶6を封止している。 The pixel substrate 4 facing the substrate 2 and the picture element electrode 3 counter electrode 1 is provided is provided is disposed an inner surface, each of the electrodes are formed to face each other, they are bonded to each other with a sealing member 5 Yes. The sealing material 5 includes a frame-like portion 5a having four sides surrounding the display area in which the plurality of pixels are arranged, an inlet portion 5b formed on one side of the frame-like portion 5a, and the inlet portion 5b. from both sides consist, a protrusion 5c protruding toward outside of the frame-shaped portion 5a of the seals the liquid crystal 6 between the pixel substrate 4 and the counter substrate 2.

前記対向電極1と画素基板4とのうちの少なくとも一方、この実施例では画素基板4の前記対向電極1対向する面には、絶縁膜7と、その絶縁膜7の上に画素電極3と、が設けられ、画素電極3には、それぞれ薄膜トランジスタ8(以下、TFTという)が接続されている。図2ではTFT8を簡略化して表しているが、図3に示すように、前記TFT8は、前記画素基板4上に形成されたゲート電極9と、前記ゲート電極9を覆って形成され、前記絶縁膜7を構成する透明なゲート絶縁膜7gと、前記ゲート絶縁膜7gの上に前記ゲート電極9と対向させて形成されたi型半導体膜10と、前記i型半導体膜10の一方端と他方端の上に図示しないn型半導体膜を介して形成されたドレイン電極11及びソース電極12と、これら膜を覆う保護絶縁膜13とからなっている。 At least one of said opposing electrode 1 and the pixel substrate 4, the surface facing the counter electrode 1 of the pixel substrate 4 in this embodiment, the insulating film 7, the pixel electrode 3 over the insulating film 7 , And a thin film transistor 8 (hereinafter referred to as TFT) is connected to each pixel electrode 3. Although the TFT 8 is simplified in FIG. 2, as shown in FIG. 3, the TFT 8 is formed to cover the gate electrode 9 formed on the pixel substrate 4 and the gate electrode 9, and the insulation A transparent gate insulating film 7g constituting the film 7, an i-type semiconductor film 10 formed on the gate insulating film 7g so as to face the gate electrode 9, and one end and the other of the i-type semiconductor film 10 a drain electrode 11 and the source electrode 12 formed over the n-type semiconductor film (not shown) on the end, a protective insulating film 13 covering these membranes consists of.

そして、前記TFT8は、図示しない複数の走査線に前記ゲート電極9がそれぞれ接続され、図示しない複数の信号線にドレイン電極11がそれぞれ接続され、複数の画素電極3にそれぞれソース電極12が接続されている。   In the TFT 8, the gate electrode 9 is connected to a plurality of scanning lines (not shown), the drain electrode 11 is connected to a plurality of signal lines (not shown), and the source electrode 12 is connected to the plurality of pixel electrodes 3, respectively. ing.

前記絶縁膜7は、前記TFT8を構成する前記ゲート絶縁膜7gと前記保護絶縁膜13のうち、少なくとも前記ゲート絶縁膜7gを画素基板4の周辺部に延長して形成されたものであり、シール材5の枠状部5aと突出部5cのうち少なくとも突出部5cに対応し、且つ前記シール材5の幅に相当する部分が除去されている。この実施例では、前記画素基板4上のほぼ全面にゲート絶縁膜7gを形成し、このゲート絶縁膜7gの、シール材5の枠状部5aと突出部5cに対応し、且つ前記シール材5の幅に相当する部分が除去され、その除去されたゲート絶縁膜7gの側壁と基板の内面とにより、前記シール材5を流入させてそのシール材5の幅を規定するためのシール幅規定溝7aを形成している。 The insulating film 7, of the gate insulating film 7g constituting the TFT8 and the protective insulating film 13, which is formed by extending at least the gate insulating film 7g on the peripheral portion of the pixel substrate 4 , at least corresponds to the projecting portion 5c, and corresponds to the width of the sealing material 5 portion of the frame-shaped portion 5a of the seal member 5 and the projecting portion 5c are removed. In this embodiment, the forming a gate insulating film 7g substantially the entire surface of the pixel substrate 4, the gate insulating film 7g, corresponding to a frame-shaped portion 5a of the seal member 5 and the protruding portion 5c, and the sealing material A portion corresponding to the width 5 is removed, and the seal width is defined by allowing the seal material 5 to flow in and defining the width of the seal material 5 by the removed side wall of the gate insulating film 7g and the inner surface of the substrate. A groove 7a is formed.

尚、画素基板4には、前記複数の走査線と前記複数の信号線にそれぞれTFT8を動作させる信号と、前記対向電極1に信号を供給して、前記各画素を駆動するための駆動回路14が搭載されている。また、シール材の注入口部5bは、対向基板2と画素基板4との間に液晶6を注入した後、封止材15により封止されている。 The pixel substrate 4 is supplied with a signal for operating the TFT 8 to the plurality of scanning lines and the plurality of signal lines, and a signal to the counter electrode 1 to drive each pixel. 14 is mounted. The sealing material injection port 5 b is sealed with a sealing material 15 after the liquid crystal 6 is injected between the counter substrate 2 and the pixel substrate 4.

図4は、複数の液晶パネルが配列された液晶パネル集合体を模式的に示している。この図4において、上述した液晶パネルは、複数の液晶パネルを形成するための一方の大型基板20に、複数の液晶パネル領域30が配列される。大型基板20には、前記液晶パネル領域30ごとに図示しないゲート電極9と走査線が形成され、これらを覆って前記大型基板20の全面にゲート絶縁膜7gが形成されている。ゲート絶縁膜7gの表示領域の外側は、シール幅規定溝7aを形成するための絶縁膜として機能する。 FIG. 4 schematically shows a liquid crystal panel aggregate in which a plurality of liquid crystal panels are arranged. In FIG. 4, the liquid crystal panel described above has a plurality of liquid crystal panel regions 30 arranged on one large substrate 20 for forming a plurality of liquid crystal panels. The large-sized substrate 20, the liquid crystal panel region a gate electrode 9 (not shown) every 30 scanning lines are formed, a gate insulating film 7g on the entire surface of the large substrate 20 to cover them is formed. The outside of the display region of the gate insulating film 7g functions as an insulating film for forming the seal width defining groove 7a.

ゲート絶縁膜7gからなる絶縁膜7は、シール材5の枠状部5aと突出部5cに対応し、且つそのシール幅に相当する部分を除去してシール幅規定溝7aが形成されている。前記表示領域の内側には、図示しないが、複数の画素電極3が前記液晶パネル領域30ごとに形成されている。画素基板4の内面の、前記シール材5の前記枠状部5aと突出部5cの部分、すなわちシール幅規定溝7aに、未硬化のシール材を塗布し、未硬化のシール材5を前記シール幅規定溝7aに流れ込ませ、シール材5の幅を狭く規定させてシール材5を形成する。その後、液晶パネル領域30ごとに対向基板2に配置される対向電極1が形成された他方の大型基板を貼り合わせる。 Insulating film 7 consisting of the gate insulating film 7g corresponds to the frame-shaped portion 5a of the seal member 5 and the protruding portion 5c, and part was removed seal width defining grooves 7a corresponding to the seal width is formed . Although not shown, a plurality of pixel electrodes 3 are formed for each liquid crystal panel region 30 inside the display region. An uncured seal material is applied to the inner surface of the pixel substrate 4 between the frame-like portion 5a and the protruding portion 5c of the seal material 5, that is, the seal width defining groove 7a. The seal material 5 is formed by flowing into the seal width defining groove 7a and defining the width of the seal material 5 narrowly. Thereafter, the other large substrate on which the counter electrode 1 disposed on the counter substrate 2 is formed for each liquid crystal panel region 30 is bonded together.

2枚の大型基板を貼り合わされた液晶パネル集合体を前記液晶パネル領域30ごとに、切断線40,50に沿って切断し、また他方の大型基板を切断線41に沿って切断することによって個々の液晶パネルを形成する。前記シール材5の前記突出部5cの先端は、隣接する液晶パネル領域30の切断線40にまたがって形成され、大型基板を切断したときに対向基板1及び画素基板4と共に分断される。   The liquid crystal panel assembly in which two large substrates are bonded together is cut along the cutting lines 40 and 50 for each liquid crystal panel region 30 and the other large substrate is cut along the cutting lines 41 to individually A liquid crystal panel is formed. The tip of the protruding portion 5c of the sealing material 5 is formed across the cutting line 40 of the adjacent liquid crystal panel region 30, and is divided together with the counter substrate 1 and the pixel substrate 4 when the large substrate is cut.

この分断によって、液晶パネルは、シール材5の突出部5cが、対向基板1及び画素基板4の端面まで達した注入口部5bが形成され、前記シール材5の前記突出部5cの先端が残った他の液晶パネルでは、突出部5cのシール幅が狭いので、そのシール材5が容易に破断し、大型基板の不要部分を取り除くことができる。   By this division, the liquid crystal panel is formed with an injection port 5b in which the protruding portion 5c of the sealing material 5 reaches the end surfaces of the counter substrate 1 and the pixel substrate 4, and the tip of the protruding portion 5c of the sealing material 5 remains. In another liquid crystal panel, since the seal width of the protruding portion 5c is narrow, the seal material 5 can be easily broken, and unnecessary portions of the large substrate can be removed.

この実施例は、注入口部5bの突出部5cの断面を示す図5のように、画素基板4上に形成されたゲート絶縁膜7に、シール材5の枠状部5aと突出部5cのうち少なくとも突出部5cに対応し、且つ前記シール材5の幅に相当する部分を除去することにより、前記シール材5を流入させてそのシール材5の幅を規定するためのシール幅規定溝7aを形成したので、絶縁膜7のシール幅規定溝aに沿って塗布された、未硬化のシール材5は、シール幅規定溝7aに流れ込み、このシール幅規定溝7aによって、シール幅が規定され、広がることがなくなる。よって、シール幅の狭いシール材5を形成することができる。 This embodiment, as shown in Figure 5 showing a cross section of the protruding portion 5c of the inlet portion 5b, the gate insulating film 7 formed on the pixel substrate 4, a frame-shaped portion 5a of the seal member 5 and the protruding portion 5c at least corresponds to the projecting portion 5c, and by removing a portion corresponding to the width of the sealing material 5, the seal width defining for flowed to define the width of the sealing material 5 by the sealing member 5 of the since grooves were formed 7a, it is applied along the seal width defining grooves 7 a of the insulating film 7, the sealing material 5 of uncured, flows into the seal width defining grooves 7a, by the seal width defining grooves 7a, seal width Is no longer spread. Therefore, the sealing material 5 with a narrow seal width can be formed.

そして、この実施例のように、シール材5の枠状部5aと突出部5cに対応するシール材5のすべての領域にシール幅規定溝7aを設けることにより、シール材5全体の幅を狭くすることができるので、液晶パネル領域を小さくすることができ、大型基板からの液晶パネル領域の取り数を多くすることができる。 Then, as in this embodiment, by the all regions of the seal member 5 corresponding to the frame-shaped portion 5a of the seal member 5 and the protruding portion 5c provided a seal width defining grooves 7a, the width of the entire sealing material 5 Since it can be narrowed, the liquid crystal panel area can be reduced, and the number of liquid crystal panel areas taken from a large substrate can be increased.

また、シール材5の突出部5cに対応する部分にシール幅規定溝7aを設けることにより、隣接する液晶パネル領域にまたがって形成される突出部5cの幅を狭くすることができるので、各液晶パネルに分断するとき、突出部5cを容易に破断するので、対向基板2と画素基板4に欠けを生じさせることが無くなる。 Further, by providing the seal width defining groove 7a in the portion corresponding to the protruding portion 5c of the sealing material 5, the width of the protruding portion 5c formed across the adjacent liquid crystal panel regions can be reduced, so that each liquid crystal when cutting the panel, because easily broken projecting portion 5c, it is unnecessary to cause chipping to the counter substrate 2 and the pixel substrate 4.

上述した実施例では、対向する画素基板4と対向基板1とのうちの一方の画素基板4に、この画素基板4上の絶縁膜7を除去してシール幅規定溝7aを形成した例を示したが、これに限ること無く、対向する画素基板4と対向基板1の両方にシール幅規定溝7aを形成するようにしても良い。 In the embodiment described above, an example in which the seal width defining groove 7a is formed by removing the insulating film 7 on the pixel substrate 4 of one of the opposing pixel substrate 4 and the counter substrate 1 is shown. However, the present invention is not limited to this, and the seal width defining groove 7a may be formed in both the pixel substrate 4 and the counter substrate 1 facing each other.

すなわち、図6及び図7に示すように、対向基板1の内面に絶縁膜70を形成し、前記画素基板4のシール幅規定溝7aと同様に、シール材5の枠状部5aと突出部5cに対応し、且つそのシール幅に相当する部分を除去してシール幅規定溝70aが形成されている。 That is, as shown in FIGS. 6 and 7, an insulating film 70 is formed on the inner surface of the counter substrate 1, and the frame-like portion 5 a and the protruding portion of the sealing material 5 are formed in the same manner as the seal width defining groove 7 a of the pixel substrate 4. The seal width defining groove 70a is formed by removing a portion corresponding to 5c and corresponding to the seal width.

図6及び図7に示した実施例によれば、画素基板4と対向基板1の両方に設けたシール幅規定溝7a、70aによって、対向する基板の両側からシール幅が規定されるため、シール材5のシール幅を、より狭く形成することができ、大型基板からの液晶パネル領域の取り数をより多くすることができる。
また、シール材5の突出部5cのシール幅を、より狭く形成することができ、各液晶パネルに分断するとき、画素基板4等の欠けの発生を、さらに低減させることができる。
According to the embodiment shown in FIGS. 6 and 7, the seal width defining grooves 7a provided on both the pixel substrate 4 and the counter substrate 1 by 70a, the seal width is defined from both sides of the opposing substrate, The seal width of the sealing material 5 can be made narrower, and the number of liquid crystal panel regions taken from the large substrate can be increased.
Further, the seal width of the protruding portion 5c of the sealing material 5 can be made narrower, and the occurrence of chipping of the pixel substrate 4 and the like can be further reduced when divided into each liquid crystal panel.

尚、上述した実施例では、シール幅規定溝7aを形成する絶縁膜としてゲート絶縁膜7gを用いた例を示したが、これに限ることなく、絶縁膜として、TFT8の保護絶縁膜13を用いても良く、その場合は、TFT8の保護絶縁膜13を画素基板4の周辺にも形成し、この保護絶縁膜13にシール幅規定溝7a形成しても良く、また、TFT8の保護絶縁膜13とゲート絶縁膜7gとを積層させて形成し、これらの積層膜に、シール幅規定溝を形成するようにしても良い。 In the above-described embodiments, the gate insulating film 7g is used as the insulating film for forming the seal width defining groove 7a. However, the present invention is not limited thereto, and the protective insulating film 13 of the TFT 8 is used as the insulating film. In this case, the protective insulating film 13 of the TFT 8 may also be formed around the pixel substrate 4, and the seal width defining groove 7 a may be formed in the protective insulating film 13, or the protective insulating film 13 of the TFT 8 may be formed. and then laminating the gate insulating film 7g formed, these multilayer films, may be formed a seal width defining grooves.

この発明の第1の実施例を示す液晶パネルの平面図。1 is a plan view of a liquid crystal panel showing a first embodiment of the present invention. 第1の実施例の液晶パネルにおいて、図1のII−II線に沿う断面図。Sectional drawing which follows the II-II line | wire of FIG. 1 in the liquid crystal panel of a 1st Example. 第1の実施例の液晶パネルの断面を拡大して示す拡大断面図。The expanded sectional view which expands and shows the cross section of the liquid crystal panel of a 1st Example. 第1の実施例の液晶パネルの製造過程を示す平面図。The top view which shows the manufacturing process of the liquid crystal panel of a 1st Example. 第1の実施例の液晶パネルにおいて、図1のV−V線に沿う拡大断面図。The liquid crystal panel of a 1st Example WHEREIN: The expanded sectional view which follows the VV line | wire of FIG. この発明の他の実施例に係る液晶パネルの断面を示す断面図。Sectional drawing which shows the cross section of the liquid crystal panel which concerns on the other Example of this invention. 他の実施例に係る液晶パネルの断面を拡大して示す拡大断面図。The expanded sectional view which expands and shows the cross section of the liquid crystal panel which concerns on another Example.

符号の説明Explanation of symbols

1…対向電極、2…対向基板、3…画素電極、4…画素基板、5…シール材、5a…枠状部、5b…注入口部、5c…突出部、6…液晶、7…絶縁膜、7g…ゲート絶縁膜、7a…シール幅規定溝、8…薄膜トランジスタ、9…ゲート電極、10…i型半導体膜、111…ドレイン電極、12…ソース電極、13…保護絶縁膜、20…大型基板、30…液晶パネル領域、40,41,50…切断線。

DESCRIPTION OF SYMBOLS 1 ... Counter electrode, 2 ... Counter substrate, 3 ... Pixel electrode, 4 ... Pixel substrate, 5 ... Sealing material, 5a ... Frame-shaped part, 5b ... Injection part , 5c ... Projection part, 6 ... Liquid crystal, 7 ... Insulating film , 7g ... gate insulating film, 7a ... seal width defining groove, 8 ... thin film transistor, 9 ... gate electrode, 10 ... i-type semiconductor film, 111 ... drain electrode, 12 ... source electrode, 13 ... protective insulating film, 20 ... large substrate 30 ... Liquid crystal panel region, 40, 41, 50 ... Cutting line.

Claims (5)

第1の絶縁膜が形成されるとともに当該第1の絶縁膜上に複数の画素電極が形成された第1の基板と、
前記複数の画素電極と対向する対向電極が形成された第2の基板と、
前記第1の基板と前記第2の基板との間に介在するように設けられたシール材と、
前記第1および前記第2の基板と前記シール材とに囲まれた領域内に封止された液晶層と
を備え、
前記シール材は、前記液晶パネルの表示領域を取り囲む枠状部と、当該枠状部の一辺に形成された注入口部と、当該注入口部の両側から当該枠状部の外へ向かって突出した突出部とを有し、
前記第1の絶縁膜から前記シール材の前記突出部に対応する部分を除去して形成され、前記シール材で埋められている第1の溝をさらに有し
前記突出部のうち、前記注入口部の両側と前記第1の基板および前記第2の基板の端面との間の部分に、前記第1の溝が形成されている
ことを特徴とする液晶パネル。
A first substrate having a first insulating film formed thereon and a plurality of pixel electrodes formed on the first insulating film;
A second substrate on which the plurality of pixel electrodes and counter to that pair counter electrode is formed,
A sealing material provided to be interposed between the first substrate and the second substrate;
A liquid crystal layer sealed the first and the second substrate surrounded by said sealing member region,
Bei to give a,
Projecting the sealing material, said a frame portion surrounding the display area of the liquid crystal panel, toward the corresponding frame-shaped portion inlet portion formed on one side of, from both sides of the inlet portion to the outside of the frame-shaped portion a and a protrusion has a,
Is formed by removing a portion corresponding to the projecting portion of the sealing member from said first insulating film, further comprising a first groove which is filled with the sealing material,
Wherein one of the protruding portions, the portion between the inlet portion on both sides and the end face of the first substrate and the second substrate, the first groove is formed,
A liquid crystal panel characterized by that.
前記第2の基板上には第2の絶縁膜が形成されるとともに当該第2の絶縁膜上に前記対向電極が形成され、
前記第2の絶縁膜から前記シール材の前記突出部に対応する部分を除去して形成され、前記シール材で埋められている第2の溝をさらに有することを特徴とする請求項1に記載の液晶パネル。
A second insulating film is formed on the second substrate and the counter electrode is formed on the second insulating film;
2. The device according to claim 1, further comprising a second groove formed by removing a portion corresponding to the protruding portion of the sealing material from the second insulating film and filled with the sealing material. LCD panel.
前記第1の基板には、前記枠状部の前記突出部が設けられた側とは反対側に、前記シール材と同じ材料からなる部材が残存していることを特徴とする請求項1又は2に記載の液晶パネル。   The member made of the same material as the sealing material remains on the first substrate on the side opposite to the side where the protruding portion of the frame-like portion is provided. 2. A liquid crystal panel according to 2. 第1の基板と第2の基板とがシール材を介して貼り合わされ、当該第1の基板および当該第2の基板と当該シール材とによって囲まれた領域に液晶が封止された液晶パネルの製造方法であって、
前記第1の大型基板に第1の絶縁膜を形成する絶縁膜形成工程と、
前記第1の大型基板の前記第1の絶縁膜から、前記液晶パネルの複数の画素が配列される表示領域を取り囲む枠状部と、当該枠状部の一辺に形成される注入口部と、当該注入口部の両側から当該枠状部の外へ向かって突出する突出部とを有する前記シール材のうちの、当該突出部に対応する部分を除去して前記シール材で埋められる第1の溝を形成する第1の溝形成工程と、
前記第1の大型基板に形成された前記第1の絶縁膜上に、第1の電極を形成する第1の電極形成工程と、
前記第2の大型基板上に、第2の電極を形成する第2の電極形成工程と、
前記第1の大型基板の前記第1の電極が形成された面と前記第2の大型基板の前記第2の電極が形成された面とのいずれか一方に、前記シール材の前記枠状部と前記注入口部と前記突出部とを形成するための材料を塗布する塗布工程と、
前記第1の大型基板の前記第1の電極が形成された面と前記第2の大型基板の前記第2の電極が形成された面とを対向させて配置し、前記第1の大型基板と前記第2の大型基板とを前記材料を介して貼り合わせる工程と、
前記貼り合わされた前記第1の大型基板と前記第2の大型基板を前記液晶パネルの領域ごとに切断する工程と、
を備え、
前記塗布工程は、前記材料を隣接する2つの前記液晶パネルの領域に跨るように塗布する工程を含み、
前記切断する工程は、前記第1の溝が、前記隣接する2つの前記液晶パネルのうち一方の液晶パネルの前記突出部のうち、当該一方の液晶パネルの前記注入口部の両側と前記第1の基板および前記第2の基板の端面との間の部分に形成されるように、前記第1の大型基板と前記第2の大型基板を切断する工程を含む
ことを特徴とする液晶パネルの製造方法。
A first substrate and a second substrate are bonded to each other with a sealing member, the liquid crystal panel in which liquid crystal in a region surrounded by the first substrate and the second substrate and the sealing member is sealed A manufacturing method comprising:
An insulating film forming step of forming a first insulating film on the first large substrate;
From the first insulating film of said first large-sized substrate, a frame-shaped portion surrounding the display region in which a plurality of pixels of the liquid crystal panel is arranged, and the inlet portion formed in one side of the frame-like portion, the both sides of the inlet portion of said sealing member having a protrusion protruding toward the outside of the frame-shaped portion, the first to be filled with the sealing material to remove the portion corresponding to the projecting portion A first groove forming step of forming a groove of
A first electrode forming step of forming a first electrode on the first insulating film formed on the first large substrate;
A second electrode forming step of forming a second electrode on the second large substrate;
The frame-shaped portion of the sealing material on one of the surface of the first large substrate on which the first electrode is formed and the surface of the second large substrate on which the second electrode is formed And an application step of applying a material for forming the inlet and the protrusion,
A surface of the first large substrate on which the first electrode is formed and a surface of the second large substrate on which the second electrode is formed are arranged opposite to each other; a step of bonding the second large substrate through a pre SL material,
A step of cutting said laminated together the said first large-sized substrate and the second large-sized substrate for each area of the liquid crystal panel,
With
The coating step includes the step of applying to extend across the area of two of said liquid crystal panel in contact next to the material,
Wherein the step of cutting, said first groove, of said protruding portion of one liquid crystal panel of said adjacent two of said liquid crystal panel, and both sides of the inlet portion of the one liquid crystal panel as formed in the portion between the end face of the first substrate and the second substrate, comprising the step of cutting said first large-sized substrate and the second large-sized substrate,
A method for manufacturing a liquid crystal panel.
前記第2の大型基板に第2の絶縁膜を形成する絶縁膜形成工程と、
前記第2の大型基板の前記第2の絶縁膜から、前記シール材の前記突出部に対応する部分を除去して前記シール材で埋められる第2の溝を形成する第2の溝形成工程と、
をさらに備えることを特徴とする請求項4に記載の液晶パネルの製造方法。
An insulating film forming step of forming a second insulating film on the second large substrate;
From the second of said second insulating film of a large substrate, the second groove forming step of forming a second groove before Symbol by removing a portion corresponding to the projecting portion is filled with the sealing material of the sealing material When,
The method of manufacturing a liquid crystal panel according to claim 4, further comprising:
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