JP2002072222A - Liquid crystal display device and method of manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display device and a method capable of of manufacturing the same generating no display defect, reducing the cost and improving the production yield. SOLUTION: In the method of manufacturing liquid crystal display device holding a liquid crystal layer between a pair of substrates stuck together with a sealant, a base layer 502 is formed on one of the substrates 200 M. A sealant width regulating area 503 is formed by forming a recessed part with removal of a part of the base layer of a region corresponding to a starting part and a stopping part of application of the sealant 106. The sealant 106 is applied to the one of the substrates 200 M. The other substrate 100 M is stuck to the one substrate 200 M together with the sealant 106 so as to form a specified gap.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing the liquid crystal display device, and more particularly, to a structure of an application region of a sealant for bonding a pair of substrates.

[0002]

2. Description of the Related Art At present, there is an increasing tendency for liquid crystal display devices to have large screens. Along with this, when performing so-called multi-panning in which a plurality of liquid crystal cells are cut out from one set of mother glass substrates, it is necessary to cut out unnecessary areas between adjacent liquid crystal cells as much as possible and cut out a plurality of larger liquid crystal cells. Is required. In addition, even in a small liquid crystal display device, in order to reduce costs, it is required that an unnecessary area be similarly reduced as much as possible when performing multi-paneling from one set of mother glass substrates.

[0003] As a method of applying a sealing material on one mother glass substrate, a seal printing method has been mainly used. However, in this method, a printing plate comes into contact with a display area portion and dust and the like are generated. It is necessary to carry out the display failure due to the adhesion and to exchange the plate every time the type is changed, which causes a reduction in workability.

Therefore, recently, a dispenser system has become mainstream in place of the seal printing system. This dispenser method has the advantage that the type can be easily changed, but on the other hand, the application amount control and the dripping control of the seal material in the application start portion where the application of the seal material is started and the application end portion where the application of the seal material is completed. It is difficult,
In these portions, the application amount may increase more than necessary.

[0005]

As described above, in the conventional coating method, the amount of application of the sealing material at the start and end of application is greater than at the other parts. Therefore, when bonding one set of mother glass substrates,
The sealing material is hardened by pressing both substrates, but in portions where the amount of application is large, the sealing material may spread more than necessary in the width direction.

When the unnecessary area between adjacent liquid crystal cells is narrowed, the sealing material in a portion having a large amount of application may spread to a scribe line for cutting out the liquid crystal cells from a set of bonded mother glass substrates. is there.
The sealing material that has spread over the scribe line may cause scribe failure, and may lower the production yield.

[0007] In addition, in a portion where the amount of application is large, there is a possibility that a gap defect in which a gap (gap) between the substrates becomes wider when one set of mother glass substrates is bonded together than in other portions. This gap defect also affects the display area, causing display defects, and may lower the production yield.

In order to prevent the occurrence of such a defect,
When an unnecessary area between adjacent liquid crystal cells on the mother glass substrate is enlarged, the number of liquid crystal cells that can be cut out decreases, which causes a problem that cost is increased and manufacturing yield is reduced.

The present invention has been made in view of the above-described problems, and has as its object to provide a liquid crystal display capable of reducing costs and improving manufacturing yield without causing display defects. An object of the present invention is to provide a device and a method of manufacturing the liquid crystal display device.

[0010]

According to a first aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, comprising the steps of: sandwiching a liquid crystal layer between a pair of substrates bonded by a sealing material. In the method for manufacturing a liquid crystal display device, a base layer is formed on one substrate, and a concave portion is formed by removing a part of the base layer in a region corresponding to a coating start portion and a coating end portion of a sealing material, A sealing material is applied to one of the substrates, and the other substrate is attached to the one substrate by the sealing material so as to form a predetermined gap.

According to a sixth aspect of the present invention, in the method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between a pair of substrates bonded by a sealing material, the sealing material is applied on one of the substrates. A wall is formed along the application direction of the sealing material so as to surround a region corresponding to the start portion and the application end portion, the sealing material is applied to one of the substrates, and the other substrate is applied to the one substrate by the sealing material. It is characterized in that it is bonded to a substrate so as to form a predetermined gap.

According to a tenth aspect of the present invention, there is provided a liquid crystal display device in which a liquid crystal layer is sandwiched between a pair of substrates bonded by a sealing material, wherein the liquid crystal display device further includes a base layer formed on an insulating substrate. A first substrate having a concave portion in a part of the base layer in a region corresponding to the application start portion and the application end portion of the sealing material, a second substrate arranged to face the first substrate, and A sealant that is applied to reach the application end portion and that bonds the first substrate and the second substrate so as to form a predetermined gap; and a sealant between the first substrate and the second substrate. And a liquid crystal layer sealed in the gap.

A liquid crystal display device according to claim 11, wherein a liquid crystal layer is sandwiched between a pair of substrates bonded by a seal material, and a coating start portion and a coating end portion of the seal material on the insulating substrate. A first substrate having a wall portion formed along the application direction of the sealing material so as to surround a region corresponding to the first substrate, a second substrate disposed to face the first substrate, and an application start portion to an application end portion And a sealing material for bonding the first substrate and the second substrate so as to form a predetermined gap, and enclosing in a gap between the first substrate and the second substrate. And a liquid crystal layer provided.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a liquid crystal display device of the present invention and a method of manufacturing the liquid crystal display device will be described with reference to the drawings.

As shown in FIG. 1, a liquid crystal display device according to an embodiment of the present invention is an active matrix type liquid crystal display device, and has a liquid crystal display panel 1 as shown in FIG.
0 is provided.

As shown in FIGS. 1 to 3, the liquid crystal display panel 10 includes an array substrate 100 as a first substrate, an opposing substrate 200 as a second substrate disposed opposite to the array substrate 100, and an array substrate. 100 and a liquid crystal composition 300 disposed between the opposing substrate 200. In such a liquid crystal display panel 10, a display area 102 for displaying an image includes an array substrate 100 and a counter substrate 20.
0 is formed in a region surrounded by a seal material 106 to be bonded. The peripheral areas 104X and 104Y formed in the area outside the sealing material are
02 has various wiring patterns drawn out from the inside.

As shown in FIGS. 2 and 3, the array substrate 100 is a matrix of m × n arranged on a transparent insulating substrate, for example, a glass substrate 101 having a thickness of 0.7 mm.
Pixel electrodes 151, m scanning lines Y1 to Ym formed along the row direction of these pixel electrodes 151, and n signal lines X formed along the column direction of these pixel electrodes 151.
Mxn thin film transistors, ie, TFT 121, and scanning lines Y1 to Ym arranged as non-linear switching elements near intersections of scanning lines Y1 to Ym and signal lines X1 to Xn corresponding to 1 to Xn and mxn pixel electrodes 151, respectively.
, A scanning line driving circuit 18 for driving the signal lines X1 to X
and a signal line driving circuit 19 for driving n.

The wiring portions of the scanning lines Y and the signal lines X are formed of a light-shielding low-resistance material such as aluminum or a molybdenum-tungsten alloy.

The pixel electrode 151 includes a scanning line Y and a signal line X.
And a transparent conductive member such as ITO (indium-tin-oxide) connected to the signal line X via the TFT 121.

The TFT 121 includes a channel region 112 C and a source region 112 disposed on the glass substrate 101.
And a polysilicon thin film 112 having a drain region 112D and a gate electrode 11 extending from the scanning line Y onto the channel region 112C via the gate insulating film 113.
4, a drain electrode 116D that penetrates through the gate insulating film 113 and the interlayer insulating film 115 to contact the drain region 112D of the polysilicon thin film 112 and is formed integrally with the signal line X; and the gate insulating film 113 and the interlayer insulating film. A source electrode 116S that penetrates through the contact 115 and contacts the source region 112S of the polysilicon thin film 112;
It has.

The array substrate 100 includes an interlayer insulating film 1
An organic insulating layer 130 formed of an acrylic resin or the like is provided on the TFT 15 and the TFT 110.

The pixel electrode 151 is electrically connected to a source electrode 116S of the TFT 121 via a through hole 118 penetrating the organic insulating film 130.

The surface of the pixel electrode 151 is
Are covered with an alignment film 141 for aligning the liquid crystal composition 300 interposed between the liquid crystal composition 300 and the liquid crystal composition 300.

Each TFT 121 is driven by a corresponding scanning line, and is used as a switching element for applying the potential of the signal lines X1 to Xn to each pixel electrode 151.

The scanning line driving circuit 18 sequentially supplies a scanning voltage to the scanning lines Y1 to Ym in a predetermined horizontal scanning period, and the signal line driving circuit 19 applies a pixel signal voltage to the signal lines X1 to X1 in each horizontal scanning period. Xn.

As shown in FIG. 3, the opposing substrate 200 includes a light-shielding film 202 and a color filter layer 203 (R, G) disposed on a transparent insulating substrate, for example, a glass substrate 201 having a thickness of 0.7 mm. , B). Light shielding film 202
Are disposed in a non-pixel portion, that is, in a region facing the wiring 170 and the TFT 121 when facing the array substrate 100. The light-shielding film 202 is formed of a black resin or a metal film or the like. In the case of a black resin, the film thickness is about 2 to 3 μm.

Color filter layer 203 (R, G, B)
Is a region facing the pixel electrode 151 of the counter substrate 200, and is arranged in a region corresponding to each of a red pixel (R) region, a green pixel (G) region, and a blue pixel (B) region. The color filter layer 203 is formed of, for example, a resin in which pigments of each color component are dispersed. The thickness of the color filter layer 203 (R, G, B) is about 2
To 3 μm.

The surface of the color filter 203 is covered with a transparent conductive member that forms a capacitance with the pixel electrode 151, for example, a counter electrode 204 formed of ITO. The surface of the counter electrode 204 is covered with an alignment film 207 for aligning the liquid crystal composition 300 interposed between the counter electrode 204 and the array substrate 100.

The non-pixel portions in the display area 102 and the peripheral area 104 (X, Y) of the counter substrate 200, that is, the wiring patterns 170 and TF such as the signal lines X and the scanning lines Y
The array substrate 100 and the opposing substrate 2
A spacer 400 is formed to form a gap having a predetermined width between 00 and 00. FIG. 3 shows the wiring pattern 17.
FIG. 5 illustrates a spacer 400 disposed on the upper side of the spacer 400. The spacer 400 is formed in a column shape of 10 μm square,
m. The spacer 400 has a plurality of resin layers, for example, a color filter layer 203 (R, G, B).
It is formed by laminating a light-shielding film 202 of black or black resin.

Thus, the gap between the array substrate 100 and the counter substrate 200 is set to about 5 μm.

The array substrate 100 and the counter substrate 2
No. 00 is bonded by the sealing material 106 in a state where a predetermined gap is formed by the spacer 400. The liquid crystal composition 300 for forming the liquid crystal layer is provided on the array substrate 1
It is sealed in a predetermined gap formed between the counter substrate 200 and the counter substrate 200.

The counter electrode 204 includes a plurality of pixel electrodes 151.
Are set to the reference potential. An electrode transfer material, that is, a silver paste as a transfer, disposed around the substrate is provided to supply a voltage from the array substrate 100 to the counter substrate 200, and the counter electrode 204 is connected to the counter electrode drive connected via the transfer. Driven by the circuit 20.

A liquid crystal capacitor CL is formed by the liquid crystal layer 300 sandwiched between the pixel electrode 151 and the counter electrode 204.

The array substrate 100 has a pair of electrodes for forming an auxiliary capacitance CS electrically in parallel with the liquid crystal capacitance CL. That is, the storage capacitor CS is connected to the pixel electrode 15
1 is formed by a potential difference formed between the storage capacitor electrode 61 having the same potential as 1 and the storage capacitor line 52 set to a predetermined potential.

On the front and back surfaces of the liquid crystal display panel 10, that is, on the outer surfaces of the glass substrates 101 and 201, a polarizing plate 190 whose polarizing surface is selected according to the display mode of the liquid crystal display device and the twist angle of the liquid crystal composition. And 210 are provided.

Next, a method of manufacturing the liquid crystal display device will be described.

That is, first, a mother glass for an array substrate and a mother glass for a counter substrate are prepared. here,
A case where four liquid crystal cells are taken out from a set of prepared mother glass substrates will be described.

On the mother glass for an array substrate, first, film formation and patterning are repeated on a transparent glass substrate having a thickness of 0.7 mm to form a wiring portion such as a plurality of scanning lines and signal lines, an insulating film, and a poly-silicon substrate. TF having semiconductor layer of silicon thin film
T or the like is formed.

Subsequently, using a spinner, a photosensitive resin, for example, a positive resist including an ultraviolet curable acrylic resin resist is applied to the entire surface of the substrate. Then, by drying the positive resist, an organic insulating layer is formed.

Subsequently, a through hole penetrating to the source electrode of the TFT is formed in the organic insulating layer.

Subsequently, a transparent conductive member, for example, ITO is formed into a film by a sputtering method, and is patterned into a predetermined pixel pattern. As a result, a pixel electrode in contact with the TFT via the through hole of each pixel is formed.

Subsequently, an alignment film material is applied to the entire surface of the substrate, baked, and rubbed to form an alignment film.

In the mother glass for the counter substrate, first, a light-shielding film and a color filter layer are formed on a transparent glass substrate having a thickness of 0.7 mm.

That is, a photosensitive black resin is applied to a thickness of, for example, 3 μm on a glass substrate using a spinner, and then dried at 90 ° C. for 10 minutes. Then, through a photomask having a predetermined pattern shape, that is, a shape corresponding to the pattern of the non-pixel portion on the array substrate, 365 nm
After exposure at a wavelength of 300 mJ / cm ² ,
Develop with an aqueous alkaline solution of pH 11.5. And
A light-shielding film is formed by baking at 200 ° C. for 60 minutes.

Subsequently, an ultraviolet curable acrylic resin resist in which a red pigment is dispersed is applied to the entire surface of a glass substrate by a spinner, and then dried. Then, after exposing at a wavelength of 365 nm and an exposure amount of 100 mJ / cm ² through a portion corresponding to the red pixel, that is, a red pixel region on the array substrate, and a photomask having a shape corresponding to the non-pixel portion, 1% aqueous solution of potassium hydroxide KOH
Develop for 0 seconds. Then, by firing at 230 ° C. for 1 hour, a red color filter layer having a thickness of, for example, 3.0 μm is formed.

Similarly, a green color filter layer having a thickness of 3.0 μm is formed in a portion corresponding to the green pixel region and the non-pixel portion. Similarly, a blue color filter layer having a thickness of 3.0 μm is formed in a blue pixel region and a portion corresponding to a non-pixel portion.

As described above, the light-shielding film is formed in the region facing the non-pixel portion of the array substrate, and the color filter layers of the colors corresponding to the red, green, and blue pixel regions are formed. At the same time, in the non-pixel portion, a columnar spacer is formed by laminating at least two layers of a light-shielding film, a red color filter, a green color filter, and a blue color filter each having a predetermined thickness.

Subsequently, a transparent conductive member, for example, ITO is formed into a film by sputtering, and is patterned into a predetermined shape. Thereby, a counter electrode is formed on the color filter layer.

Subsequently, an alignment film material is applied to the entire surface of the substrate, baked, and then rubbed to form an alignment film.

Subsequently, after the mother glass for the array substrate and the mother glass for the opposite substrate are washed, a sealant is applied to the mother glass for the array substrate or the mother glass for the opposite substrate by a dispenser. In this embodiment, for example, as shown in FIG.
The sealing material 106 is applied to M. This sealing material 106
Is made of, for example, an ultraviolet-curable epoxy resin. The sealing material 106 may be a thermosetting resin, an acrylic resin, or the like.

Subsequently, two mother glasses are attached to form a cell. At this time, the sealing material is cured by irradiating ultraviolet rays while pressing the set of bonded mother glass substrates. When the sealing material 106 is applied, an injection port 108 for injecting a liquid crystal material in a later step is opened.

Subsequently, the mother glass for the array substrate and the mother glass for the opposite substrate are cut to a desired size along the scribe line.

Subsequently, a liquid crystal material is injected from an injection port between two substrates of the liquid crystal cell cut out of the mother glass, and the liquid crystal material is sealed with a sealing material.

Subsequently, a polarizing plate is attached to the surface of the array substrate and the surface of the counter substrate.

Subsequently, as shown in FIG. 1, drive circuits 401-1 to 401-4 and 411-1 are provided on wiring pads formed in the peripheral area 104 (X, Y) of the array substrate 100.
To 411-2 are attached.

Then, a backlight is mounted on the back surface of the liquid crystal display panel, that is, on the array substrate side, to manufacture a liquid crystal display device.

As described above, in this method of manufacturing a liquid crystal display device, the sealing material 106 is applied to the counter substrate mother glass 200M. That is, as shown in FIG. 4, the sealing material 106 corresponding to one liquid crystal cell is applied from the application start portion SP to the application end portion EP on the base layer in the counter substrate mother glass 200M.

Coating start part SP and coating end part EP
Are formed in unnecessary areas such as between adjacent liquid crystal cell regions in the mother glass for counter substrate 200M.
In these application start part SP and application end part EP,
The sealant 106 may be applied more than necessary. For this reason, the counter substrate mother glass 200M includes a seal width regulating area 503 in the base layer corresponding to the application start portion SP and the application end portion EP.

First, a first manufacturing method of the seal width restricted area and a structural example manufactured by the method will be described. Here, as shown in FIGS. 5A to 5E,
This will be described with reference to a cross-sectional view of the mother glass shown in FIG. 4 in a direction orthogonal to the seal width regulating area 503.

As shown in FIG. 5A, in the mother glass 200M for the opposing substrate, first, the mother glass substrate 50
An underlayer 502 is formed in an unnecessary area on the substrate 1.
The underlayer 502 includes a light shielding film, a red color filter layer,
It is formed using a green color filter layer and a blue color filter layer. For example, a case where a base layer is formed using a red color filter layer will be described.

In the same manner as in the above-described manufacturing method, a UV curable acrylic resin resist in which a red pigment is dispersed is applied to a thickness of about 3 μm on a mother glass substrate 501 by a spinner, and then dried.

Subsequently, as shown in FIG. 5B, this UV-curable acrylic resin resist was exposed to light of 100 mJ / cm ² at a wavelength of 365 nm through a photomask PM corresponding to a predetermined pattern. Exposure.

Subsequently, as shown in FIG. 5C, the ultraviolet-curable acrylic resin resist is developed with a 1% aqueous solution of potassium hydroxide KOH for 10 seconds to remove the unexposed resist. Then, baking is performed at 230 ° C. for one hour to form a seal width control area 503 in the base layer 502.

The seal width regulating area 503 is formed by a stripe-shaped base layer 502 along the application direction of the seal material at the application start portion SP. That is,
The seal width control area 503 has about 100
It is formed by forming grooves having a width of μm at a pitch of about 100 μm. The depth of this groove is 3 μm, which is almost equal to the thickness of the underlayer 503. The width, pitch, and depth of the groove can be variously changed depending on the application amount of the sealing material, the target sealing width at the time of completion, and the design of the entire substrate. Further, in this embodiment, the groove is formed by completely removing the base layer 503 and exposing the glass substrate 501. However, at least a part of the base layer 502 is removed and the thickness is smaller than the surrounding thickness. The groove may be formed by the underlayer.

Subsequently, as shown in FIG. 5D, the sealing material 106 is applied on the base layer 502 of the opposite substrate mother glass 200M. That is, the seal width control area 5
The coating start portion SP and the coating end portion EP on the underlayer 502 at 03 are used as the coating start portion SP and the coating end portion EP. FIG. 6A is a plan view showing the application start portion SP and the sealing material 106 applied around the application start portion SP. The sealing material 106 is applied to the coating start portion SP
Through the liquid crystal cell region from the end of application EP.

Subsequently, as shown in FIG. 5 (e), the counter substrate mother glass 200 coated with the sealing material 106 is formed.
Then, the mother glass 100M for an array substrate is attached to M, and the sealing material 106 is cured while applying pressure. At this time, the sealing material 106 in the application start portion SP and the application end portion EP is formed by the grooves formed in the base layer 503.
The spread in the width direction is restricted. FIG. 6B is a plan view showing a state where the sealing material 106 applied to the application start portion SP and the periphery thereof is cured by pressure. As shown in FIG. 6B, the seal width after pressure curing is almost the same at any location.

Therefore, it is possible to prevent the adjacent seal members from coming into contact with each other and to prevent the seal members from spreading to the scribe line SL. For this reason, when a liquid crystal cell is cut out along the scribe line SL, occurrence of scribe failure can be suppressed.

Further, since the spread of the sealing material can be suppressed more than necessary, the width of the unnecessary area between the adjacent liquid crystal cells can be made smaller than ever, and the effective area is widened in design. It is possible to cut out more liquid crystal cells from one set of mother glass.

Further, the seal width regulation area 503
Are formed using a film forming process and a patterning process for forming a light shielding film, a red color filter layer, a green color filter layer, and a blue color filter layer in a liquid crystal cell region. For this reason, a separate manufacturing process for forming the seal width regulation area 503 is not required. Therefore, there is no increase in manufacturing cost.

The production yield of the liquid crystal cell can be improved, and the production cost can be reduced.

According to the first manufacturing method described above, the seal width regulating area 503 is formed by the stripe-shaped grooves extending in parallel along the extending direction, as shown in FIG. 7A. Alternatively, it may be formed by an island-shaped pattern that is arranged in a staggered manner at a predetermined density. Alternatively, as shown in FIG. 7B, it may be formed by a stripe-shaped groove extending in a direction perpendicular to the direction in which the seal width regulating area 503 extends.

Next, a description will be given of a second method of manufacturing the seal width restricted area and a structural example manufactured by the method. Here, as shown in FIGS. 8A to 8D,
This will be described with reference to a cross-sectional view of the mother glass shown in FIG. 4 in a direction orthogonal to the seal width regulating area 503.

As shown in FIG. 8A, in the counter substrate mother glass 200M, first, the mother glass substrate 50
An underlayer 502 is formed in an unnecessary area on the substrate 1.
This base layer 502 is formed using a light-shielding film, a red color filter layer, a green color filter layer, and a blue color filter layer, as in the first manufacturing method. For example, a case in which a base layer is formed using a light-blocking film will be described.

That is, on the mother glass substrate 501,
The photosensitive black resin is applied to a thickness of about 3 μm by a spinner, and then dried. Then, at a wavelength of 365 nm through a photomask corresponding to a predetermined pattern shape,
After exposure at an exposure of 300 mJ / cm ² , pH
5. Develop with an aqueous alkali solution. Then, the base layer 502 is formed by baking at 200 ° C. for 60 minutes.

Subsequently, as shown in FIG. 8B, a wall portion 505 is formed on the base layer 502 for restricting the spread of the sealing material in the width direction. The wall 505 is formed by laminating at least two or more red color filter layers, green color filter layers, and blue color filter layers formed after the light-shielding film forming process. In this embodiment, for example, the wall portion 505 is formed by stacking a red color filter layer and a green color filter layer.
Will be described.

That is, an ultraviolet-curable acrylic resin resist in which a red pigment is dispersed is formed on the underlayer 502 by a spinner and patterned, and then the first layer 505-1 of the wall 505 is patterned. To form Then, on the underlying layer 502 including on the first layer 505-1,
An ultraviolet-curable acrylic resin resist in which a green pigment is dispersed is formed by a spinner and patterned to form a second layer 505-2 of the wall 505.

The wall portion formed by laminating a plurality of color filter layers in this manner can be formed in the same step as the columnar spacer 400 in the liquid crystal cell region.

Thus, a width of about 10 μm and a height of about 5 μm
The seal width regulating area 503 having the wall portion 505 is formed. The width of the wall 505, the interval between the wall 505,
The height can be variously changed depending on the application amount of the sealing material, the target sealing width at the time of completion, and the design of the entire substrate.

Subsequently, as shown in FIG. 8C, the sealing material 106 is applied on the base layer 502 of the opposite substrate mother glass 200M. That is, the seal width control area 5
03 underlayer 50 between which the wall portion 505 was formed
The upper portion 2 is a coating start portion SP and a coating end portion EP.
FIG. 9A is a plan view showing the application start portion SP and the sealing material 106 applied around the application start portion SP. Seal material 1
06 is applied from the application start portion SP to the application end portion EP via the liquid crystal cell region.

Subsequently, as shown in FIG. 8D, the opposite substrate mother glass 200 coated with the sealing material 106 is formed.
Then, the mother glass 100M for an array substrate is attached to M, and the sealing material 106 is cured while applying pressure. The wall portion 505 formed in the seal width regulating area 503 becomes a column in contact with the array substrate mother glass 100M and forms a gap corresponding to the height of the wall portion 505 between one set of mother glass. At this time, the width of the sealant 106 in the application start portion SP and the application end portion EP in the width direction is regulated by the wall portion 505. FIG. 9B shows the seal material 10 applied to the application start part SP and its periphery.
FIG. 6 is a plan view showing a state in which No. 6 is cured by pressing. FIG. 9B
As described above, during the pressure curing of the seal material, the spread in the direction of increasing the width in the conventional manner is restricted, and the seal material 106 spreads along the wall 505. For this reason, the seal width after the pressure curing is not locally widened and becomes almost uniform at any place.

Therefore, it is possible to prevent the adjacent seal members from coming into contact with each other and to prevent the seal members from spreading to the scribe line SL. For this reason, when a liquid crystal cell is cut out along the scribe line SL, occurrence of scribe failure can be suppressed.

Further, since the spread of the sealing material can be suppressed more than necessary, the width of the unnecessary area between the adjacent liquid crystal cells can be narrowed more than ever, and the effective area is widened in design. It is possible to cut out more liquid crystal cells from one set of mother glass.

Further, the wall 505 constituting the seal width regulating area 503 is provided with a light shielding film in the liquid crystal cell region,
It is formed using a film forming process and a patterning process for forming a red color filter layer, a green color filter layer, and a blue color filter layer. For this reason, a separate manufacturing process for forming the seal width regulation area 503 is not required. Therefore, there is no increase in manufacturing cost.

The production yield of the liquid crystal cell can be improved, and the production cost can be reduced.

According to the above-described second manufacturing method,
By giving directionality to the extension direction of the wall portion that regulates the spread of the seal material, the spread direction of the seal material during pressure curing can be controlled. For example, as shown in FIGS. 10A and 10B, when there is a portion A such as a mark or a wiring that is desired to be prevented from being covered with the sealing material around the application start portion and the application end portion, By forming the wall portion 505 so as to avoid from the portion A, it is possible to prevent the seal material from spreading to the portion A.

In the above-described embodiment, a case where a plurality of liquid crystal cells are cut out from one set of mother glass substrates has been described. However, in the present invention, one liquid crystal cell is formed by one set of glass substrates. Even if applicable. In this case, a liquid crystal cell can be configured by providing a light-shielding film disposed around the substrate as a base layer and providing a seal width regulating area in the base layer corresponding to the application start portion and the application end portion.

In the above-described embodiment, the base layer having the seal width control area is formed on the counter substrate side, and the sealing material is applied on the counter substrate side. However, the formation of the base layer and the application of the sealing material are not necessarily performed on the counter substrate. It does not have to be performed. That is, a base layer having a seal width regulation area may be provided on the array substrate side, or a sealing material may be applied on the array substrate side. Alternatively, a base layer having a seal width control area may be formed on one substrate, and a sealant may be applied to the other substrate.

As described above, according to the liquid crystal display device of the present invention and the method of manufacturing the liquid crystal display device, the underlayers corresponding to the application start portion and the application end portion of the sealing material have a thickness smaller than usual. A thin groove is formed. Thereby, when the seal material is applied to the application start portion and the application end portion, even if the application amount of the seal material is larger than usual,
It is possible to regulate the finished width after the substrates are bonded, and it is possible to form the same width as the normal portion.

Further, according to the present invention, a set of walls having a thickness larger than usual is formed in the coating start portion and the coating end portion. Thereby, when the seal material is applied to the application start portion and the application end portion, even when the application amount of the seal material is larger than usual, it is possible to regulate the completed width after bonding the substrates, It is possible to guide the spreading direction of the sealing material, and it is possible to form the sealing material in a predetermined width similar to that of the normal part.

[0090]

As described above, according to the present invention, the liquid crystal display device which can reduce the cost and improve the production yield without causing a display defect and the liquid crystal display device of the present invention can be provided. A manufacturing method can be provided.

[Brief description of the drawings]

FIG. 1 is a perspective view schematically showing an example of a liquid crystal display device manufactured by a method of manufacturing a liquid crystal display device according to the present invention.

FIG. 2 is an equivalent circuit diagram schematically showing a configuration of the liquid crystal display device shown in FIG.

FIG. 3 is a sectional view schematically showing a structure of the liquid crystal display device shown in FIG. 1;

FIG. 4 is a plan view schematically showing a structure of a counter substrate mother glass manufactured by the method for manufacturing a liquid crystal display device of the present invention.

FIGS. 5A to 5E are views for explaining a first manufacturing method of the liquid crystal display device according to the present invention.

FIG. 6A is a plan view showing a state in which a seal material is applied to an application start portion in the first manufacturing method, and FIG. 6B is a pressure-cured seal material. It is a top view showing a state after.

FIGS. 7A and 7B are plan views showing other structural examples formed by the first manufacturing method of the present invention.

FIGS. 8A to 8D are views for explaining a second method of manufacturing the liquid crystal display device according to the present invention.

FIG. 9A is a plan view showing a state in which a sealing material is applied to an application start portion in the second manufacturing method, and FIG. 9B is a pressure-cured sealing material. It is a top view showing a state after.

FIGS. 10A and 10B are plan views showing other structural examples formed by the second manufacturing method of the present invention.

[Explanation of symbols]

 100: Array substrate 100M: Mother glass for array substrate 106: Sealing material 200: Counter substrate 200M: Mother glass for counter substrate 300: Liquid crystal composition 400: Spacer 501: Mother glass substrate 502: Base layer 503: Seal width regulation area 505 … Wall part SP… Application start part EP… Application end part SL… Scribe line

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G09F 9/30 349 G09F 9/30 349B 349C F-term (Reference) 2H089 HA40 LA47 MA04Y NA24 NA42 NA44 NA48 NA55 NA56 QA11 QA12 QA13 TA01 TA09 TA12 2H090 HA04 HB07X HC05 HC11 HC12 HC17 HC18 HD08 JA03 JA07 JA13 JB02 JC13 JC14 JC17 JD14 LA03 LA04 LA15 2H091 FA02Y FA34Y FB02 FC10 FC26 FD04 FD22 GA13 LA07 LA11 LA12 5C094A42 AE04

Claims (11)

[Claims] 1. A method of manufacturing a liquid crystal display device comprising a liquid crystal layer sandwiched between a pair of substrates bonded by a sealant, wherein a base layer is formed on one of the substrates, and a coating start portion and a coating end portion of the sealant are formed. A part of the base layer in a region corresponding to the above is removed to form a concave portion, a sealing material is applied to one of the substrates, and a predetermined gap is formed between the other substrate and the one substrate by the sealing material. A method for manufacturing a liquid crystal display device. 2. The method according to claim 1, wherein the recess is a groove extending in a predetermined direction. 3. The method of manufacturing a liquid crystal display device according to claim 1, wherein the concave portions are formed so that convex portions remaining in an island shape are dispersed and arranged at a predetermined density. 4. The method according to claim 1, wherein the sealing material is applied on the underlayer of the one substrate. 5. The method according to claim 1, wherein the underlayer is a light shielding layer or a color filter layer. 6. A method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between a pair of substrates bonded by a sealant, wherein a region corresponding to a coating start portion and a coating end portion of the sealant is surrounded on one of the substrates. A wall portion is formed along the application direction of the sealing material so that the sealing material is applied to one of the substrates, and the other substrate is bonded to the one substrate with the sealing material so as to form a predetermined gap. A method for manufacturing a liquid crystal display device, comprising: 7. The method according to claim 6, wherein the wall is formed on a base layer formed on the one substrate. 8. The method according to claim 1, wherein the underlayer is a light shielding layer or a color filter layer, and the wall is formed by laminating the light shielding layer and the color filter layer or a plurality of color filter layers. The method for manufacturing a liquid crystal display device according to claim 6. 9. The method according to claim 7, wherein the sealing material is applied on the underlayer on the one substrate. 10. A liquid crystal display device in which a liquid crystal layer is sandwiched between a pair of substrates bonded by a seal material, comprising a base layer formed on an insulative substrate, an application start portion of the seal material and application of the seal material. A first substrate having a concave portion in a part of the base layer in a region corresponding to an end portion, a second substrate disposed to face the first substrate, and being applied from the application start portion to the application end portion A sealing material for bonding the first substrate and the second substrate so as to form a predetermined gap; a liquid crystal layer sealed in a gap between the first substrate and the second substrate; A liquid crystal display device comprising: 11. A liquid crystal display device in which a liquid crystal layer is sandwiched between a pair of substrates bonded by a sealing material, wherein the sealing material surrounds a region corresponding to a coating start portion and a coating end portion of the sealing material on the insulating substrate. A first substrate having a wall portion formed along the application direction of the material, a second substrate arranged to face the first substrate, and being applied from the application start portion to the application end portion; A sealing material for bonding the first substrate and the second substrate so as to form a predetermined gap, and a liquid crystal layer sealed in the gap between the first substrate and the second substrate. A liquid crystal display device characterized by the above-mentioned.