JP5542851B2 - 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 - Google Patents

感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 Download PDF

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JP5542851B2
JP5542851B2 JP2012031351A JP2012031351A JP5542851B2 JP 5542851 B2 JP5542851 B2 JP 5542851B2 JP 2012031351 A JP2012031351 A JP 2012031351A JP 2012031351 A JP2012031351 A JP 2012031351A JP 5542851 B2 JP5542851 B2 JP 5542851B2
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JP2013167781A (ja
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裕之 米澤
豪 安藤
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Fujifilm Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2012031351A 2012-02-16 2012-02-16 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 Expired - Fee Related JP5542851B2 (ja)

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Application Number Priority Date Filing Date Title
JP2012031351A JP5542851B2 (ja) 2012-02-16 2012-02-16 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
TW102101807A TW201335714A (zh) 2012-02-16 2013-01-17 感光性樹脂組成物、硬化膜的製造方法、硬化膜、有機ｅｌ顯示裝置以及液晶顯示裝置
KR1020130012737A KR20130094736A (ko) 2012-02-16 2013-02-05 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 ｅｌ 표시 장치 및 액정 표시 장치

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JP2012031351A JP5542851B2 (ja) 2012-02-16 2012-02-16 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置

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JP2013167781A JP2013167781A (ja) 2013-08-29
JP5542851B2 true JP5542851B2 (ja) 2014-07-09

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TW (1) TW201335714A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5949094B2 (ja) * 2012-04-25 2016-07-06 Jsr株式会社 ポジ型感放射線性組成物、表示素子用層間絶縁膜及びその形成方法
CN103454857B (zh) * 2012-05-31 2020-01-03 住友化学株式会社 光致抗蚀剂组合物
JP6267951B2 (ja) * 2013-12-18 2018-01-24 富士フイルム株式会社 感光性転写材料、パターン形成方法およびエッチング方法
WO2019065351A1 (ja) * 2017-09-26 2019-04-04 東レ株式会社 感光性樹脂組成物、硬化膜、硬化膜を具備する素子、硬化膜を具備する有機ｅｌ表示装置、硬化膜の製造方法、および有機ｅｌ表示装置の製造方法
KR102669089B1 (ko) * 2017-09-29 2024-05-23 니폰 제온 가부시키가이샤 포지티브형 감방사선성 수지 조성물
CN108287451A (zh) * 2018-01-24 2018-07-17 浙江福斯特新材料研究院有限公司 一种低介电感光覆盖膜树脂组合物
KR102288387B1 (ko) * 2018-09-03 2021-08-10 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자
WO2021215163A1 (ja) * 2020-04-23 2021-10-28 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
CN114276239B (zh) * 2021-12-29 2023-10-27 徐州博康信息化学品有限公司 一种含缩酮结构酸敏感光刻胶树脂单体的制备方法

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Publication number Priority date Publication date Assignee Title
JP4207604B2 (ja) * 2003-03-03 2009-01-14 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの形成方法
JP2005084239A (ja) * 2003-09-05 2005-03-31 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP5492812B2 (ja) * 2010-03-11 2014-05-14 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の形成方法、有機ｅｌ表示装置、及び、液晶表示装置
JP5630068B2 (ja) * 2010-04-28 2014-11-26 Jsr株式会社 ポジ型感放射線性組成物、層間絶縁膜及びその形成方法
JP5742661B2 (ja) * 2011-10-25 2015-07-01 信越化学工業株式会社 ポジ型レジスト組成物及びパターン形成方法

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KR20130094736A (ko) 2013-08-26
JP2013167781A (ja) 2013-08-29

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