JP5525519B2 - 分離されたヒータを有するプリントヘッド - Google Patents
分離されたヒータを有するプリントヘッド Download PDFInfo
- Publication number
- JP5525519B2 JP5525519B2 JP2011514607A JP2011514607A JP5525519B2 JP 5525519 B2 JP5525519 B2 JP 5525519B2 JP 2011514607 A JP2011514607 A JP 2011514607A JP 2011514607 A JP2011514607 A JP 2011514607A JP 5525519 B2 JP5525519 B2 JP 5525519B2
- Authority
- JP
- Japan
- Prior art keywords
- heater
- layer
- dielectric layer
- cavity
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 32
- 238000010438 heat treatment Methods 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 21
- 238000000151 deposition Methods 0.000 claims description 10
- 238000000059 patterning Methods 0.000 claims description 10
- 238000007789 sealing Methods 0.000 claims description 7
- 239000003566 sealing material Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 131
- 239000000976 ink Substances 0.000 description 56
- 239000011241 protective layer Substances 0.000 description 17
- 238000000926 separation method Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 13
- 230000006911 nucleation Effects 0.000 description 12
- 238000010899 nucleation Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000002161 passivation Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 238000013461 design Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000007480 spreading Effects 0.000 description 8
- 238000003892 spreading Methods 0.000 description 8
- 229910052581 Si3N4 Inorganic materials 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 230000004907 flux Effects 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- BLIQUJLAJXRXSG-UHFFFAOYSA-N 1-benzyl-3-(trifluoromethyl)pyrrolidin-1-ium-3-carboxylate Chemical compound C1C(C(=O)O)(C(F)(F)F)CCN1CC1=CC=CC=C1 BLIQUJLAJXRXSG-UHFFFAOYSA-N 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 5
- 238000007667 floating Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910002058 ternary alloy Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 230000003090 exacerbative effect Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910002059 quaternary alloy Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/1412—Shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/143,880 | 2008-06-23 | ||
| US12/143,880 US8540349B2 (en) | 2008-06-23 | 2008-06-23 | Printhead having isolated heater |
| PCT/US2009/003625 WO2010011250A2 (en) | 2008-06-23 | 2009-06-17 | Printhead having isolated heater |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011525437A JP2011525437A (ja) | 2011-09-22 |
| JP2011525437A5 JP2011525437A5 (enExample) | 2012-05-24 |
| JP5525519B2 true JP5525519B2 (ja) | 2014-06-18 |
Family
ID=41430793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011514607A Expired - Fee Related JP5525519B2 (ja) | 2008-06-23 | 2009-06-17 | 分離されたヒータを有するプリントヘッド |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8540349B2 (enExample) |
| EP (1) | EP2313276B1 (enExample) |
| JP (1) | JP5525519B2 (enExample) |
| WO (1) | WO2010011250A2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8414786B2 (en) * | 2008-11-05 | 2013-04-09 | Lexmark International, Inc. | Planar heater stack and method for making planar heater stack with cavity within planar heater substrata above substrate |
| US8079672B2 (en) * | 2008-11-05 | 2011-12-20 | Lexmark International, Inc. | Heater stack and method for making heater stack with cavity between heater element and substrate |
| US8172370B2 (en) * | 2008-12-30 | 2012-05-08 | Lexmark International, Inc. | Planar heater stack and method for making planar heater stack |
| US20120091121A1 (en) * | 2010-10-19 | 2012-04-19 | Zachary Justin Reitmeier | Heater stack for inkjet printheads |
| JP6465567B2 (ja) * | 2014-05-29 | 2019-02-06 | キヤノン株式会社 | 液体吐出ヘッド |
| US10493757B2 (en) | 2014-10-30 | 2019-12-03 | Hewlett-Packard Development Company, L.P. | Ink jet printhead |
| US10457048B2 (en) | 2014-10-30 | 2019-10-29 | Hewlett-Packard Development Company, L.P. | Ink jet printhead |
| WO2017011011A1 (en) * | 2015-07-15 | 2017-01-19 | Hewlett-Packard Development Company, L.P. | Adhesion and insulating layer |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6164759A (en) * | 1990-09-21 | 2000-12-26 | Seiko Epson Corporation | Method for producing an electrostatic actuator and an inkjet head using it |
| JPH07227968A (ja) | 1994-02-21 | 1995-08-29 | Canon Inc | インクジェット記録ヘッド及びその製造方法 |
| JPH0848038A (ja) * | 1994-08-08 | 1996-02-20 | Canon Inc | 液体噴射記録ヘッド用基体及びその製造方法及び液体噴射記録装置 |
| US5706041A (en) | 1996-03-04 | 1998-01-06 | Xerox Corporation | Thermal ink-jet printhead with a suspended heating element in each ejector |
| US5751315A (en) | 1996-04-16 | 1998-05-12 | Xerox Corporation | Thermal ink-jet printhead with a thermally isolated heating element in each ejector |
| US5861902A (en) * | 1996-04-24 | 1999-01-19 | Hewlett-Packard Company | Thermal tailoring for ink jet printheads |
| JP2001096749A (ja) * | 1999-09-29 | 2001-04-10 | Sharp Corp | インクジェットヘッド及びその製造方法 |
| US6340223B1 (en) * | 1999-06-28 | 2002-01-22 | Sharp Kabushiki Kaisha | Ink-jet head and fabrication method of the same |
| US6273555B1 (en) | 1999-08-16 | 2001-08-14 | Hewlett-Packard Company | High efficiency ink delivery printhead having improved thermal characteristics |
| US6692108B1 (en) | 2002-11-23 | 2004-02-17 | Silverbrook Research Pty Ltd. | High efficiency thermal ink jet printhead |
| US6755509B2 (en) | 2002-11-23 | 2004-06-29 | Silverbrook Research Pty Ltd | Thermal ink jet printhead with suspended beam heater |
-
2008
- 2008-06-23 US US12/143,880 patent/US8540349B2/en not_active Expired - Fee Related
-
2009
- 2009-06-17 WO PCT/US2009/003625 patent/WO2010011250A2/en not_active Ceased
- 2009-06-17 JP JP2011514607A patent/JP5525519B2/ja not_active Expired - Fee Related
- 2009-06-17 EP EP09745142A patent/EP2313276B1/en not_active Not-in-force
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011525437A (ja) | 2011-09-22 |
| WO2010011250A3 (en) | 2010-04-15 |
| US20090315951A1 (en) | 2009-12-24 |
| WO2010011250A2 (en) | 2010-01-28 |
| EP2313276A2 (en) | 2011-04-27 |
| EP2313276B1 (en) | 2012-10-03 |
| US8540349B2 (en) | 2013-09-24 |
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