JP5517826B2 - 真空処理装置およびプラズマ処理方法 - Google Patents
真空処理装置およびプラズマ処理方法 Download PDFInfo
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- JP5517826B2 JP5517826B2 JP2010182563A JP2010182563A JP5517826B2 JP 5517826 B2 JP5517826 B2 JP 5517826B2 JP 2010182563 A JP2010182563 A JP 2010182563A JP 2010182563 A JP2010182563 A JP 2010182563A JP 5517826 B2 JP5517826 B2 JP 5517826B2
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- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010182563A JP5517826B2 (ja) | 2010-08-17 | 2010-08-17 | 真空処理装置およびプラズマ処理方法 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010182563A JP5517826B2 (ja) | 2010-08-17 | 2010-08-17 | 真空処理装置およびプラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012043908A JP2012043908A (ja) | 2012-03-01 |
| JP2012043908A5 JP2012043908A5 (https=) | 2013-08-29 |
| JP5517826B2 true JP5517826B2 (ja) | 2014-06-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010182563A Active JP5517826B2 (ja) | 2010-08-17 | 2010-08-17 | 真空処理装置およびプラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5517826B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120225204A1 (en) * | 2011-03-01 | 2012-09-06 | Applied Materials, Inc. | Apparatus and Process for Atomic Layer Deposition |
| KR101959242B1 (ko) * | 2018-10-02 | 2019-03-19 | 한국진공주식회사 | 항공, 자동차용 탄소섬유 복합재 절삭가공용 공구 나노다이아몬드 코팅 장치 |
| CN113170567B (zh) * | 2019-11-12 | 2023-11-28 | 东芝三菱电机产业系统株式会社 | 活性气体生成装置 |
| KR102468140B1 (ko) * | 2022-05-24 | 2022-11-18 | (주)거성 | 교체가 용이한 증착장치용 일체화 실드 |
| CN116083885B (zh) * | 2023-01-12 | 2025-03-25 | 苏州晟成光伏设备有限公司 | 一种稳定气流的等离子辅助氧化装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02149339A (ja) * | 1988-11-30 | 1990-06-07 | Toshiba Corp | マイクロ波プラズマ処理装置 |
| DE3912569A1 (de) * | 1989-04-17 | 1990-10-18 | Siemens Ag | Verfahren und vorrichtung zur erzeugung eines elektrischen hochfrequenzfeldes in einem nutzraum |
| JP4302010B2 (ja) * | 2004-07-14 | 2009-07-22 | 三菱重工業株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| JP5517509B2 (ja) * | 2009-07-08 | 2014-06-11 | 三菱重工業株式会社 | 真空処理装置 |
| JP5199962B2 (ja) * | 2009-08-05 | 2013-05-15 | 三菱重工業株式会社 | 真空処理装置 |
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- 2010-08-17 JP JP2010182563A patent/JP5517826B2/ja active Active
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| JP2012043908A (ja) | 2012-03-01 |
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