JP5489390B2 - プロセスチャンバ内のシャワーヘッド用サスペンション - Google Patents

プロセスチャンバ内のシャワーヘッド用サスペンション Download PDF

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Publication number
JP5489390B2
JP5489390B2 JP2006239266A JP2006239266A JP5489390B2 JP 5489390 B2 JP5489390 B2 JP 5489390B2 JP 2006239266 A JP2006239266 A JP 2006239266A JP 2006239266 A JP2006239266 A JP 2006239266A JP 5489390 B2 JP5489390 B2 JP 5489390B2
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Japan
Prior art keywords
gas
showerhead
suspension
wall
chamber
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JP2006239266A
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English (en)
Japanese (ja)
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JP2007123840A5 (enrdf_load_stackoverflow
JP2007123840A (ja
Inventor
ケラー アーンスト
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Applied Materials Inc
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Applied Materials Inc
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Publication of JP2007123840A5 publication Critical patent/JP2007123840A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Fire-Extinguishing By Fire Departments, And Fire-Extinguishing Equipment And Control Thereof (AREA)
JP2006239266A 2005-09-02 2006-09-04 プロセスチャンバ内のシャワーヘッド用サスペンション Active JP5489390B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71387505P 2005-09-02 2005-09-02
US60/713875 2005-09-02

Publications (3)

Publication Number Publication Date
JP2007123840A JP2007123840A (ja) 2007-05-17
JP2007123840A5 JP2007123840A5 (enrdf_load_stackoverflow) 2012-08-02
JP5489390B2 true JP5489390B2 (ja) 2014-05-14

Family

ID=37816905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006239266A Active JP5489390B2 (ja) 2005-09-02 2006-09-04 プロセスチャンバ内のシャワーヘッド用サスペンション

Country Status (4)

Country Link
JP (1) JP5489390B2 (enrdf_load_stackoverflow)
KR (1) KR101354575B1 (enrdf_load_stackoverflow)
CN (1) CN1924085B (enrdf_load_stackoverflow)
TW (1) TWI306782B (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101139215B1 (ko) * 2009-10-27 2012-05-14 주식회사 테스 기판 처리 장치
WO2011146571A2 (en) * 2010-05-21 2011-11-24 Applied Materials, Inc. Tightly-fitted ceramic insulator on large-area electrode
US8721791B2 (en) 2010-07-28 2014-05-13 Applied Materials, Inc. Showerhead support structure for improved gas flow
CN103403843B (zh) 2011-03-04 2016-12-14 诺发系统公司 混合型陶瓷喷淋头
DE102015118765A1 (de) * 2014-11-20 2016-06-09 Aixtron Se Vorrichtung zum Beschichten eines großflächigen Substrats
DE102015110440A1 (de) * 2014-11-20 2016-05-25 Aixtron Se CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate
KR101590346B1 (ko) * 2015-01-30 2016-02-01 주식회사 테스 박막증착장치
JP6242933B2 (ja) 2016-03-31 2017-12-06 株式会社日立国際電気 基板処理装置、半導体装置の製造方法およびプログラム
CN113261078B (zh) 2019-01-07 2024-06-21 株式会社爱发科 真空处理装置、真空处理装置的清洁方法
US20220064799A1 (en) * 2019-01-07 2022-03-03 Ulvac, Inc. Vacuum processing apparatus
KR102700366B1 (ko) * 2019-01-29 2024-08-30 주성엔지니어링(주) 샤워헤드 및 이를 포함하는 기판처리장치
KR102618455B1 (ko) * 2019-12-02 2023-12-27 주식회사 원익아이피에스 샤워헤드조립체 및 이를 포함하는 기판처리장치
US12011731B2 (en) * 2020-07-10 2024-06-18 Applied Materials, Inc. Faceplate tensioning method and apparatus to prevent droop
KR102828735B1 (ko) 2023-04-27 2025-07-03 (주)티티에스 샤워헤드 코너 영역의 공정가스 흐름 개선 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5670218A (en) * 1995-10-04 1997-09-23 Hyundai Electronics Industries Co., Ltd. Method for forming ferroelectric thin film and apparatus therefor
JP3480271B2 (ja) * 1997-10-07 2003-12-15 東京エレクトロン株式会社 熱処理装置のシャワーヘッド構造
US6300255B1 (en) * 1999-02-24 2001-10-09 Applied Materials, Inc. Method and apparatus for processing semiconductive wafers
US6461435B1 (en) * 2000-06-22 2002-10-08 Applied Materials, Inc. Showerhead with reduced contact area
US7131218B2 (en) * 2004-02-23 2006-11-07 Nike, Inc. Fluid-filled bladder incorporating a foam tensile member
JP4698251B2 (ja) * 2004-02-24 2011-06-08 アプライド マテリアルズ インコーポレイテッド 可動又は柔軟なシャワーヘッド取り付け

Also Published As

Publication number Publication date
KR101354575B1 (ko) 2014-01-22
CN1924085A (zh) 2007-03-07
TW200709854A (en) 2007-03-16
KR20070026210A (ko) 2007-03-08
JP2007123840A (ja) 2007-05-17
TWI306782B (en) 2009-03-01
CN1924085B (zh) 2013-10-23

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