JP5486146B2 - Aromatic vinyl compound resin composition and method for producing the same - Google Patents

Aromatic vinyl compound resin composition and method for producing the same Download PDF

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JP5486146B2
JP5486146B2 JP2006159372A JP2006159372A JP5486146B2 JP 5486146 B2 JP5486146 B2 JP 5486146B2 JP 2006159372 A JP2006159372 A JP 2006159372A JP 2006159372 A JP2006159372 A JP 2006159372A JP 5486146 B2 JP5486146 B2 JP 5486146B2
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健史 大塚
浩二 平島
丈裕 巨勢
広平 西野
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Toyo Styrene Co Ltd
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本発明は、揮発分やダイマー・トリマー成分が少なく、臭気の少ない芳香族ビニル化合物系樹脂組成物及びその製造方法に関する。   The present invention relates to an aromatic vinyl compound-based resin composition having a small amount of volatile components, dimer / trimer components, and less odor, and a method for producing the same.

芳香族ビニル化合物系樹脂は優れた射出成形性や良外観を有し、各種雑貨や電気製品等に広く用いられている。また安価であり発泡成形が容易な事から梱包材や食品包材にも用いられ、特に食品包材にはスチレン系樹脂の発泡シートより2次加工された生鮮食料品用トレーやカップめん容器等が供されている。こうした食品用途では樹脂容器と食品とが直接接触する為、臭気の移行や耐熱性低下等の観点から樹脂成分中に含まれる揮発分やダイマー・トリマー成分の低減が求められている。   Aromatic vinyl compound-based resins have excellent injection moldability and good appearance, and are widely used in various miscellaneous goods and electrical products. In addition, it is inexpensive and easy to foam, so it is also used for packing materials and food packaging materials. In particular, food packaging materials include trays for fresh food products and cup noodle containers that are secondarily processed from foamed sheets of styrene resin. It is provided. In such food applications, since the resin container and the food are in direct contact with each other, reduction of volatile components and dimer / trimer components contained in the resin component is required from the viewpoint of odor transfer and heat resistance reduction.

一方、芳香族ビニル化合物系樹脂の工業生産においては、バッチ式懸濁重合から連続式塊状重合へとプロセス転換を行い、生産効率の向上を図る趨勢にある。バッチ式懸濁重合では必須である分散剤が連続式塊状重合では不要である為、プロセス転換により樹脂の品質向上が可能となる反面、脱揮工程での熱履歴が強くなった結果、熱劣化に由来する揮発分やダイマー・トリマー成分が増加する傾向となっている(特許文献1)。   On the other hand, in the industrial production of aromatic vinyl compound resins, there is a trend to improve the production efficiency by changing the process from batch suspension polymerization to continuous bulk polymerization. Dispersants, which are essential in batch suspension polymerization, are not necessary in continuous bulk polymerization, so the quality of the resin can be improved by process conversion. On the other hand, the thermal history in the devolatilization process has increased, resulting in thermal degradation. There is a tendency for volatile matter and dimer / trimer components derived from to increase.

連続式塊状重合プロセスにて芳香族ビニル化合物を重合し、脱揮にて未反応モノマーや溶剤を除去する場合、十分な脱揮を行う為には脱揮工程の温度を重合工程に比べ大幅に高くする必要があり、その際の熱分解に由来する揮発分やダイマー・トリマー成分の生成が避けられない。脱揮工程での熱分解は無酸素下での高分子鎖切断によるアルキルラジカル生成に起因すると考えられる為、アルキルラジカルを直接捕捉する化合物が開発され、分子量低下抑制やゲル化抑制に有効な劣化防止剤として上市されている(非特許文献1、非特許文献2)。また、これらの劣化防止剤を用いることにより、モノマー等の揮発分やダイマー・トリマーの生成を抑制する技術も開示されている(特許文献2、3)。しかし、これらの劣化防止剤は揮発性が比較的高く、連続式塊状重合プロセスの脱揮工程前に酸化防止剤を添加すると、脱揮工程でかなりの割合が除去されてしまうため、必要以上に添加量を増やさなければならず、コストアップとなる問題があった。   When polymerizing aromatic vinyl compounds in a continuous bulk polymerization process and removing unreacted monomers and solvents by devolatilization, the temperature of the devolatilization process is significantly higher than the polymerization process in order to perform sufficient devolatilization. It is necessary to make it high, and generation of volatile components and dimer / trimer components derived from thermal decomposition at that time cannot be avoided. Since the thermal decomposition in the devolatilization process is thought to be caused by the generation of alkyl radicals by polymer chain scission in the absence of oxygen, a compound that directly captures alkyl radicals has been developed and is effective for suppressing molecular weight reduction and gelation. It is marketed as an inhibitor (Non-patent document 1, Non-patent document 2). Moreover, the technique which suppresses the production | generation of volatile matters, such as a monomer, and a dimer / trimer by using these degradation inhibitors is also disclosed (patent documents 2 and 3). However, these deterioration inhibitors are relatively high in volatility, and if an antioxidant is added before the devolatilization step of the continuous bulk polymerization process, a considerable proportion will be removed in the devolatilization step, which is more than necessary. There was a problem that the addition amount had to be increased, resulting in an increase in cost.

特開2000−95888号公報JP 2000-95888 A 合成樹脂工業、37(12)、74(1990)Synthetic resin industry, 37 (12), 74 (1990) Polymers&PolymerComposites,vol.8,No.1,37−50(2000)Polymers & Polymer Compositions, vol. 8, no. 1,37-50 (2000) 特開平5−170825号公報Japanese Patent Laid-Open No. 5-170825 特開2002−121215号公報JP 2002-121215 A

本発明は、芳香族ビニル化合物系樹脂組成物において、熱分解に由来する揮発分やダイマー・トリマー成分が低減され、臭気の少ない芳香族ビニル化合物系樹脂組成物を提供する事を課題とするものである。   It is an object of the present invention to provide an aromatic vinyl compound-based resin composition having a reduced odor and a reduced volatile content and dimer / trimer components derived from thermal decomposition in an aromatic vinyl compound-based resin composition. It is.

本発明者らは、かかる現状に鑑み、鋭意検討を重ねた結果、特定の構造を有する化合物を特定量含有し、総揮発分、芳香族ビニル化合物のダイマー量およびトリマー量を特定量以下とすることにより、臭気が少なく、耐熱性に優れる芳香族ビニル化合物系樹脂組成物が得られることを見出し、本発明に至った。   As a result of intensive studies in view of the present situation, the present inventors contain a specific amount of a compound having a specific structure, and make the total volatile content, the dimer amount of the aromatic vinyl compound, and the trimer amount not more than the specific amount. As a result, it was found that an aromatic vinyl compound-based resin composition having less odor and excellent heat resistance was obtained, and the present invention was achieved.

すなわち、本発明に係る芳香族ビニル化合物系樹脂組成物は、スチレン系単量体の単独重合体、又はアクリロニトリル、メタクリル酸エステル及びアクリル酸エステルのうち少なくとも1種とスチレン系単量体との共重合体からなる芳香族ビニル化合物系樹脂に対して、少なくとも1個以上のチオエーテル結合を分子内に有する化合物を200〜2000ppm含有し、前記チオエーテル結合を有する化合物が、下記一般式(I)に示す構造の化合物又は下記一般式(II)に示す構造の化合物であり、かつガスクロマトグラフィーにより測定される総揮発分が500ppm以下であり、ガスクロマトグラフィーにより測定される前記スチレン系単量体のダイマー量およびトリマー量の合計が1500ppm以下であり、脱揮工程の前に、重合工程により得た前記芳香族ビニル化合物系樹脂に対して、前記チオエーテル結合を有する化合物を添加することにより得たものである。
また、本発明に係る芳香族ビニル化合物系樹脂組成物の製造方法は、塊状重合にてスチレン系単量体を単独で重合するか、又はアクリロニトリル、メタクリル酸エステル及びアクリル酸エステルのうち少なくとも1種とスチレン系単量体とを共重合する重合工程と、未反応モノマーや溶剤を除去する脱揮工程と、を有し、前記脱揮工程の前に、前記重合工程により得た芳香族ビニル化合物系樹脂に対して、下記一般式(I)に示す構造の化合物又は下記一般式(II)に示す構造の化合物を200〜2000ppm添加し、ガスクロマトグラフィーにより測定される総揮発分が500ppm以下であり、ガスクロマトグラフィーにより測定される前記スチレン系単量体のダイマー量およびトリマー量の合計が1500ppm以下である芳香族ビニル化合物系樹脂組成物を得る。

Figure 0005486146
(式中、nは12〜18の整数を示す。)
Figure 0005486146
That is, the aromatic vinyl compound resin composition according to the present invention is a styrene monomer homopolymer or a copolymer of at least one of acrylonitrile, methacrylic acid ester and acrylic acid ester and a styrene monomer. A compound having 200 to 2000 ppm of a compound having at least one thioether bond in the molecule with respect to the aromatic vinyl compound resin made of a polymer and having the thioether bond is represented by the following general formula (I). A dimer of the styrenic monomer that is a compound having a structure or a compound having a structure represented by the following general formula (II), has a total volatile content of 500 ppm or less measured by gas chromatography, and is measured by gas chromatography the total amounts and trimer content of not more than 1500 ppm, immediately before as degassing step, heavy To the aromatic vinyl compound type resin obtained by the process are those obtained by adding a compound having a thioether bond.
The method for producing an aromatic vinyl compound-based resin composition according to the present invention is a method of polymerizing a styrenic monomer alone by bulk polymerization, or at least one of acrylonitrile, methacrylic acid ester and acrylic acid ester. a polymerization step of copolymerizing a styrene monomer and a devolatilization step of removing the unreacted monomers and solvent, has, the immediately before as degassing step, an aromatic vinyl obtained by the polymerization step A compound having a structure represented by the following general formula (I) or a compound having a structure represented by the following general formula (II) is added to the compound-based resin in an amount of 200 to 2000 ppm, and the total volatile content measured by gas chromatography is 500 ppm or less. And the total of the dimer amount and trimer amount of the styrenic monomer measured by gas chromatography is 1500 ppm or less Obtaining a sulfonyl compound resin composition.
Figure 0005486146
(In the formula, n represents an integer of 12 to 18.)
Figure 0005486146

本発明の芳香族ビニル系樹脂組成物は、揮発分やダイマー・トリマー成分が少なくなり、臭気・耐熱性の観点から特に食品包材用途に最適である。また樹脂成形加工中の揮発分の大気放出が低減され、環境面にも寄与が大きい。   The aromatic vinyl resin composition of the present invention has less volatile components and dimer / trimer components, and is particularly suitable for food packaging applications from the viewpoint of odor and heat resistance. In addition, the atmospheric emission during resin molding is reduced, contributing greatly to the environment.

以下、本発明について詳細に説明を行う。
本発明を構成する少なくとも1個以上のチオエーテル結合を分子内に有する化合物としては、ジステアリルチオジプロピオネート、ジミリスチルチオジプロピオネート、テトラキス[メチレン−3−(ドデシルチオ)プロピオネート]メタン、チオジエチレンビス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート]、ビス[2−メチル−4−(3−アルキルチオプロピオニルオキシ)−5−tert−ブチルフェニル]スルフィド類、4,6−ビス(n−アルキルチオメチル)−o−クレゾール類、4,4’−チオビスフェノール類等の化合物が例示される。
Hereinafter, the present invention will be described in detail.
Examples of the compound having at least one thioether bond in the molecule constituting the present invention include distearyl thiodipropionate, dimyristyl thiodipropionate, tetrakis [methylene-3- (dodecylthio) propionate] methane, thiodiethylene Bis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], bis [2-methyl-4- (3-alkylthiopropionyloxy) -5-tert-butylphenyl] sulfides, 4 , 6-bis (n-alkylthiomethyl) -o-cresols, 4,4′-thiobisphenols and the like.

前記のチオエーテル結合を有する化合物のうち、下記一般式(I)の硫黄原子がフェノール類と結合した4,6−ビス(n−アルキルチオメチル)−o−クレゾール類、および下記一般式(II)の4,4’−チオビスフェノール類は本発明において更に好適である。

Figure 0005486146
(式中、nは6〜18の整数を示す。) Among the compounds having the thioether bond, 4,6-bis (n-alkylthiomethyl) -o-cresols in which the sulfur atom of the following general formula (I) is bonded to phenols, and the following general formula (II) 4,4′-thiobisphenols are more preferred in the present invention.
Figure 0005486146
(In the formula, n represents an integer of 6 to 18.)

硫黄原子に隣接する側鎖の炭素数nは6〜18であり、脱揮時の揮発を考慮すると炭素数の多い方が好ましいが、溶剤に対する溶解性、或いは加熱融解での使用を考慮するとnは12〜16が特に好ましい。炭素側鎖の炭素数が少ないと脱揮後の臭気が強い傾向にあり、nは6より少ないと特に樹脂加工時の臭気が強くなり好ましくない。

Figure 0005486146
(式中、R1〜R4は水素、または炭素数1〜4のアルキル基を示す。) The carbon number n of the side chain adjacent to the sulfur atom is 6 to 18, and considering the volatilization at the time of devolatilization, it is preferable that the carbon number is large. However, considering the solubility in a solvent or use in heat melting, n Is particularly preferably 12-16. When the number of carbon atoms in the carbon side chain is small, the odor after devolatilization tends to be strong, and when n is less than 6, the odor during resin processing is particularly strong, which is not preferable.
Figure 0005486146
(In the formula, R1 to R4 represent hydrogen or an alkyl group having 1 to 4 carbon atoms.)

本発明の芳香族ビニル化合物系樹脂組成物に含まれる、芳香族ビニル化合物のダイマー量およびトリマー量の合計は1500ppm以下である。芳香族ビニル化合物がスチレンである場合について例示すると、ダイマーとは直鎖構造の2,4−ジフェニル−1−ブテン、環状構造の1,2−ジフェニルシクロブタン、1,3−ジフェニルシクロブタンをいう。またトリマーとは直鎖構造の2,4,6−トリフェニル−1−ヘキセン、環状構造の2,4,6−トリフェニルシクロヘキサン、1,2,3,4−テトラヒドロ−1−(1’−フェニルエチル)−4−フェニルナフタレンをいう。   The total of the dimer amount and trimer amount of the aromatic vinyl compound contained in the aromatic vinyl compound-based resin composition of the present invention is 1500 ppm or less. Exemplifying the case where the aromatic vinyl compound is styrene, the dimer refers to 2,4-diphenyl-1-butene having a linear structure, 1,2-diphenylcyclobutane having a cyclic structure, and 1,3-diphenylcyclobutane. Trimers are 2,4,6-triphenyl-1-hexene having a linear structure, 2,4,6-triphenylcyclohexane having a cyclic structure, 1,2,3,4-tetrahydro-1- (1′- Phenylethyl) -4-phenylnaphthalene.

本発明で使用するチオエーテル構造を有する化合物の添加量は200〜2000ppmであり、より好ましくは600〜1300ppmである。添加量が少ないとオリゴマー低減効果が減少し、多いと臭気が強くなるばかりか、添加量に見合う程のオリゴマー低減効果が見られない。   The addition amount of the compound having a thioether structure used in the present invention is 200 to 2000 ppm, more preferably 600 to 1300 ppm. When the addition amount is small, the oligomer reduction effect is decreased, and when it is large, the odor is not only strong, but the oligomer reduction effect corresponding to the addition amount is not seen.

本発明で得られる芳香族ビニル化合物系樹脂組成物の総揮発分は500ppm以下である。モノマーは沸点が低く原理的には脱揮条件を厳しくする事で減少するが、現実には脱揮条件下での熱履歴や剪断の影響で熱分解を起こし、新たなモノマー成分が生ずるため困難であり、本発明で使用する化合物の添加が極めて有効である。なお本発明での揮発性物質は、食品衛生法に係る器具及び容器包装の規格基準(昭和34年厚生省告示第370号)に定められた5物質を指す(スチレン、トルエン、エチルベンゼン、n−プロピルベンゼンおよびイソプロピルベンゼン)。   The total volatile content of the aromatic vinyl compound-based resin composition obtained in the present invention is 500 ppm or less. Monomers have a low boiling point and can be reduced in principle by tightening devolatilization conditions, but in reality it is difficult to cause thermal decomposition under the influence of thermal history and shearing under devolatilization conditions, resulting in new monomer components. Therefore, the addition of the compound used in the present invention is extremely effective. The volatile substances in the present invention refer to five substances (styrene, toluene, ethylbenzene, n-propyl) specified in the standards for equipment and containers and packaging related to the Food Sanitation Law (Ministry of Health and Welfare Notification No. 370 in 1959). Benzene and isopropylbenzene).

本発明の芳香族ビニル化合物系樹脂組成物の製造方法としては、連続重合プロセスが挙げられる。即ち塊状重合にて芳香族ビニル化合物を重合工程にて重合し、脱揮工程にて未反応モノマーや溶剤を除去して芳香族ビニル化合物系樹脂を製造するにあたり、重合工程または重合工程後、脱揮工程直前に前記チオエーテル結合を有する化合物を最終反応器により得られた樹脂に対し200〜2000ppm添加する事により、本発明の芳香族ビニル化合物系樹脂組成物を製造する事が出来る。   A continuous polymerization process is mentioned as a manufacturing method of the aromatic vinyl compound-type resin composition of this invention. That is, in producing an aromatic vinyl compound-based resin by polymerizing an aromatic vinyl compound in a polymerization process by bulk polymerization and removing unreacted monomers and solvents in a devolatilization process, depolymerization is performed after the polymerization process or polymerization process. The aromatic vinyl compound-based resin composition of the present invention can be produced by adding 200 to 2000 ppm of the compound having a thioether bond immediately before the volatilization process to the resin obtained by the final reactor.

本発明の芳香族ビニル化合物系樹脂組成物の構成単位は、スチレン、α−メチルスチレン、o−メチルスチレン、p−メチルスチレン等の単独または混合物を任意に用いる事が出来るが、特にスチレンが好ましい。また、これらの芳香族ビニル化合物系単量体に共重合可能な単量体、例えばアクリロニトリル、メタクリル酸エステル、アクリル酸エステル等の単量体を本発明の効果を損なわない程度で共重合させても良い。   As the structural unit of the aromatic vinyl compound-based resin composition of the present invention, styrene, α-methyl styrene, o-methyl styrene, p-methyl styrene or the like can be arbitrarily used or a mixture thereof, but styrene is particularly preferable. . In addition, monomers that can be copolymerized with these aromatic vinyl compound monomers, for example, monomers such as acrylonitrile, methacrylic acid ester, and acrylic acid ester are copolymerized to such an extent that the effects of the present invention are not impaired. Also good.

また本発明中の芳香族ビニル化合物系樹脂組成物はゴム変性樹脂としても良く、即ち重合工程で予め、芳香族ビニル化合物に共役ジエン系ゴム状重合体を溶解し、グラフト重合を行っても良い。この場合の共役ジエン系ゴム状重合体としては、ポリブタジエン、スチレン−ブタジエンランダム共重合体、スチレン−ブタジエンブロック共重合体等を例示することができる。   In addition, the aromatic vinyl compound-based resin composition in the present invention may be a rubber-modified resin, that is, a conjugated diene rubber-like polymer may be previously dissolved in the aromatic vinyl compound in the polymerization step and graft polymerization may be performed. . Examples of the conjugated diene rubber-like polymer in this case include polybutadiene, styrene-butadiene random copolymer, styrene-butadiene block copolymer, and the like.

本発明中の重合工程はラジカル重合が一般的であるが、必要に応じてアニオン重合を用いても良い。ラジカル重合の場合は熱重合でも良いが、熱重合に由来するダイマー・トリマーを考慮しラジカル重合開始剤を使用する事も出来る。ラジカル重合開始剤としては過酸化ベンゾイル、アゾビスイソブチロニトリル、t−ブチルパーオキシベンゾエート、1,1−ジ(t−ブチルパーオキシ)シクロヘキサン、1,1−ビス(t−ブチルパーオキシ)−3,3,5−トリメチルシクロヘキサン、t−ブチルパーオキシイソプロピルカーボネート、ジクミルパーオキサイド、t−ブチルクミルパーオキサイド、t−ブチルパーオキシアセテート、t−ブチルパーオキシ−2−エチルヘキサノエート、2,2−ビス(4,4−ジ−t−ブチルパーオキシシクロヘキシル)プロパン、エチル−3,3−ジ(t−ブチルパーオキシ)ブチレート、t−ブチルパーオキシイソブチレート、ポリエーテルテトラキス(t−ブチルパーオキシカーボネート)等の有機過酸化物が例示できる。アニオン重合の場合はn−ブチルリチウム、s−ブチルリチウム等のアルキルリチウムが使用でき、重合調整剤としてテトラヒドロフランやテトラメチルエチレンジアミン、アルキルマグネシウム類が併用できる。   The polymerization step in the present invention is generally radical polymerization, but anionic polymerization may be used as necessary. In the case of radical polymerization, thermal polymerization may be used, but a radical polymerization initiator may be used in consideration of dimers and trimers derived from thermal polymerization. As radical polymerization initiators, benzoyl peroxide, azobisisobutyronitrile, t-butylperoxybenzoate, 1,1-di (t-butylperoxy) cyclohexane, 1,1-bis (t-butylperoxy) -3,3,5-trimethylcyclohexane, t-butylperoxyisopropyl carbonate, dicumyl peroxide, t-butylcumyl peroxide, t-butylperoxyacetate, t-butylperoxy-2-ethylhexanoate, 2,2-bis (4,4-di-t-butylperoxycyclohexyl) propane, ethyl-3,3-di (t-butylperoxy) butyrate, t-butylperoxyisobutyrate, polyether tetrakis ( Examples thereof include organic peroxides such as t-butyl peroxycarbonate. In the case of anionic polymerization, alkyllithium such as n-butyllithium and s-butyllithium can be used, and tetrahydrofuran, tetramethylethylenediamine, and alkylmagnesium can be used in combination as a polymerization regulator.

本発明の重合工程では、溶媒としてベンゼン、トルエン、エチルベンゼン等の芳香族炭化水素類や、ヘキサン、シクロヘキサン等の脂肪族炭化水素類が使用できる。またラジカル重合の場合は必要に応じて、脂肪族メルカプタンやα−メチルスチレンダイマー、ターピノーレン等の連鎖移動剤を用いても良い。   In the polymerization step of the present invention, aromatic hydrocarbons such as benzene, toluene and ethylbenzene, and aliphatic hydrocarbons such as hexane and cyclohexane can be used as a solvent. In the case of radical polymerization, a chain transfer agent such as aliphatic mercaptan, α-methylstyrene dimer or terpinolene may be used as necessary.

本発明の樹脂組成物に使用する化合物は既に説明したが、例えばオクタデシル−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、エチレンビス(オキシエチレン)ビス[3−(5−t−ブチル−4−ヒドロキシ−m−トリル)プロピオネート、ペンタエリスリトールテトラキス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]の様な他のフェノール系酸化防止剤、2,2−メチレンビス(4,6−ジ−t−ブチルフェニル)オクチルホスファイト、ビス(2,6−ジ−t−ブチル−4−メチルフェニル)ペンタエリスリトールジホスファイト等のリン系酸化防止剤と併用してもよい。これらの併用する酸化防止剤の添加量としては、200〜3000ppmであり、より好ましくは300〜2000ppmである。またこれらの併用する酸化防止剤は本発明の化合物に対して0.5〜2倍量添加することが特に好ましい。   The compounds used in the resin composition of the present invention have already been described. For example, octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate, ethylenebis (oxyethylene) bis [3- ( Other phenolic antioxidants such as 5-t-butyl-4-hydroxy-m-tolyl) propionate, pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] , 2,2-methylenebis (4,6-di-t-butylphenyl) octyl phosphite, bis (2,6-di-t-butyl-4-methylphenyl) pentaerythritol diphosphite, etc. You may use together with an agent. As addition amount of these antioxidant used together, it is 200-3000 ppm, More preferably, it is 300-2000 ppm. Further, it is particularly preferable to add 0.5 to 2 times the amount of the antioxidant used in combination with the compound of the present invention.

以下、実施例にて本発明を詳細に説明するが、本発明はこれに限定されるものではない。最初に本発明における分析方法を以下に説明する。   EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited to this. First, the analysis method in the present invention will be described below.

(1)樹脂組成物中のスチレンダイマーおよびトリマー含有量の測定
樹脂組成物200mgをジクロロメタン2mlにて完全に溶解し、次いでメタノール2mlを加えてポリマーを析出・静値後、上澄みをガスクロマトグラフィーを用いて以下の条件で測定した。
ガスクロマトグラフ:HP−5890(ヒューレットパッカード社製)
キャピラリーカラム:DB−1、0.2mm×30m、膜厚0.1μm
インジェクション温度:250℃
カラム温度:100〜300℃、10℃/min
ディテクター温度:300℃
スプリット比:50/1
内部標準物質:n−エイコサン
(1) Measurement of content of styrene dimer and trimer in resin composition Dissolve 200 mg of resin composition completely in 2 ml of dichloromethane, then add 2 ml of methanol to precipitate the polymer, and after static value, gas chromatograph the supernatant. And measured under the following conditions.
Gas chromatograph: HP-5890 (manufactured by Hewlett-Packard Company)
Capillary column: DB-1, 0.2 mm × 30 m, film thickness 0.1 μm
Injection temperature: 250 ° C
Column temperature: 100-300 ° C., 10 ° C./min
Detector temperature: 300 ° C
Split ratio: 50/1
Internal reference material: n-eicosane

(2)樹脂組成物中の総揮発分の測定
樹脂組成物500mgを、内部標準物質としてシクロペンタノールを含むDMF10mlに溶解し、ガスクロマトグラフィーを用いて以下の条件で測定した。
ガスクロマトグラフ:HP−5890(ヒューレットパッカード社製)
カラム:HP−WAX、0.25mm×30m、膜厚0.5μm
インジェクション温度:220℃
カラム温度:60℃〜150℃、10℃/min
ディテクター温度:220℃
スプリット比:30/1
(2) Measurement of total volatile content in resin composition 500 mg of the resin composition was dissolved in 10 ml of DMF containing cyclopentanol as an internal standard substance, and measured under the following conditions using gas chromatography.
Gas chromatograph: HP-5890 (manufactured by Hewlett-Packard Company)
Column: HP-WAX, 0.25 mm × 30 m, film thickness 0.5 μm
Injection temperature: 220 ° C
Column temperature: 60 ° C to 150 ° C, 10 ° C / min
Detector temperature: 220 ° C
Split ratio: 30/1

本発明の芳香族ビニル系樹脂組成物における臭気評価方法は次の要領で実施した。   The odor evaluation method in the aromatic vinyl resin composition of the present invention was carried out as follows.

(3−1)射出成形品の作成
以下の条件にて開口部幅100mm、奥行75mm、深さ45mm、厚さ1mmの直方形容器を射出成形で作成した。
射出成形機:日本製鋼社製 JSW100EP
シリンダー温度:230℃
金型温度:40℃
(3-1) Creation of Injection Molded Product A rectangular container having an opening width of 100 mm, a depth of 75 mm, a depth of 45 mm, and a thickness of 1 mm was created by injection molding under the following conditions.
Injection molding machine: JSW100EP manufactured by Nippon Steel
Cylinder temperature: 230 ° C
Mold temperature: 40 ℃

(3−2)臭気評価
以下の基準にて、臭気を判定した。
◎:射出成形直後の成形品にて臭気が全く感じられない。
○:射出成形直後の成形品では僅かに臭気を感じるが、冷却後の成形品では臭気が全く感じられない。
×:射出成形直後にも、冷却後の成形品においても臭気を感じる。
(3-2) Odor evaluation Odor was determined according to the following criteria.
A: No odor is felt at all in the molded product immediately after injection molding.
○: Slight odor is felt in the molded product immediately after injection molding, but no odor is felt in the molded product after cooling.
X: Odor is felt immediately after injection molding or in the molded product after cooling.

実施例1
完全混合槽型反応器を3基(第1〜第3、各30L)直列に接続し、更に複数本のチューブ型予熱器を備えた脱揮槽(第1、第2)を2基直列に接続し、連続重合装置とした。第1〜第3反応器はそれぞれ105℃、110℃、115℃に設定し、第1、第2脱揮槽はそれぞれ予熱器温度を180℃/600mmHg、220℃/6mmHgに設定した。原料としてスチレンモノマーとエチルベンゼンを8:2の質量比で混合し、更に1,1−ジ(t−ブチルパーオキシ)シクロヘキサンをスチレンモノマー質量に対し800ppmとなる様に加えた後、毎時9Lの流量で供給した。なお第3反応器と第1脱揮槽の間に静的混合機を設置し、該ミキサー上流側より4,6−ビス(ドデシルチオメチル)−o−クレゾール(商品名IRGANOX1726、チバ・スペシャルティケミカルズ社製)をエチルベンゼン溶液またはエチルベンゼンスラリー(4,6−ビス(ドデシルチオメチル)−o−クレゾール:5質量%)として第3反応器により得られた樹脂に対し1000ppmとなる様に連続的に添加した。樹脂組成物は第2脱揮槽出口末端より直接ストランドとし、水冷後ペレタイザーへ導入しペレット化し、芳香族ビニル化合物系樹脂組成物を得た。得られた樹脂組成物の総揮発分、ダイマー、トリマー量、樹脂組成物中の4,6−ビス(ドデシルチオメチル)−o−クレゾールの含有量、並びに臭気評価結果を表1に示す。
Example 1
Three complete mixing tank reactors (first to third, 30 L each) are connected in series, and two devolatilization tanks (first and second) equipped with a plurality of tube type preheaters are connected in series. The continuous polymerization apparatus was connected. The first to third reactors were set to 105 ° C., 110 ° C., and 115 ° C., respectively, and the first and second devolatilization tanks were set to preheater temperatures of 180 ° C./600 mmHg and 220 ° C./6 mmHg, respectively. After mixing styrene monomer and ethylbenzene at a mass ratio of 8: 2 as a raw material, and further adding 1,1-di (t-butylperoxy) cyclohexane to 800 ppm with respect to the styrene monomer mass, a flow rate of 9 L per hour Supplied with. A static mixer was installed between the third reactor and the first devolatilization tank, and 4,6-bis (dodecylthiomethyl) -o-cresol (trade name IRGANOX 1726, Ciba Specialty Chemicals) from the upstream side of the mixer. Was continuously added as an ethylbenzene solution or an ethylbenzene slurry (4,6-bis (dodecylthiomethyl) -o-cresol: 5% by mass) to 1000 ppm with respect to the resin obtained by the third reactor. did. The resin composition was directly made into a strand from the outlet end of the second devolatilization tank, cooled with water, introduced into a pelletizer, and pelletized to obtain an aromatic vinyl compound-based resin composition. Table 1 shows the total volatile content, dimer and trimer amounts of the obtained resin composition, the content of 4,6-bis (dodecylthiomethyl) -o-cresol in the resin composition, and odor evaluation results.

なお、樹脂組成物中の4,6−ビス(ドデシルチオメチル)−o−クレゾールの含有量については、樹脂組成物200mgをジクロロメタン2mlにて完全に溶解し、次いでメタノール2mlを加えてポリマーを析出・静値後、上澄みを液体クロマトグラフィーにて以下の様に測定した。
液体クロマトグラフ:アライアンス2695(日本ウォーターズ社製)
カラム:TSKgel ODS−120T、6.0mm×15cm(東ソー社製)
カラム温度:40℃
移動相:メタノール
Regarding the content of 4,6-bis (dodecylthiomethyl) -o-cresol in the resin composition, 200 mg of the resin composition was completely dissolved in 2 ml of dichloromethane, and then 2 ml of methanol was added to precipitate the polymer. -After the static value, the supernatant was measured by liquid chromatography as follows.
Liquid chromatograph: Alliance 2695 (Nippon Waters)
Column: TSKgel ODS-120T, 6.0 mm × 15 cm (manufactured by Tosoh Corporation)
Column temperature: 40 ° C
Mobile phase: methanol

実施例2
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールを1500ppmとなる様に連続的に添加したこと以外は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。
Example 2
The same procedure as in Example 1 was performed except that 4,6-bis (dodecylthiomethyl) -o-cresol was continuously added to 1500 ppm in Example 1. The evaluation results of the obtained resin composition are shown in Table 1.

実施例3
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールを800ppmとなる様に連続的に添加したこと以外は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。
Example 3
The same operation as in Example 1 was conducted except that 4,6-bis (dodecylthiomethyl) -o-cresol was continuously added to 800 ppm in Example 1. The evaluation results of the obtained resin composition are shown in Table 1.

実施例4
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールを600ppmとなる様に連続的に添加したこと以外は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。
Example 4
The same operation as in Example 1 was conducted except that 4,6-bis (dodecylthiomethyl) -o-cresol was continuously added to 600 ppm in Example 1. The evaluation results of the obtained resin composition are shown in Table 1.

参考例5
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールの代わりに4,6−ビス(オクチルチオメチル)−o−クレゾール(商品名IRGANOX1520L、チバ・スペシャルティケミカルズ社製)を第3反応器により得られた樹脂に対し1000ppmとなる様に連続的に添加した他は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。なお、樹脂組成物中の4,6−ビス(オクチルチオメチル)−o−クレゾールの含有量については、4,6−ビス(ドデシルチオメチル)−o−クレゾールの含有量と同様の方法にて測定した。
Reference Example 5
In Example 1, instead of 4,6-bis (dodecylthiomethyl) -o-cresol, 4,6-bis (octylthiomethyl) -o-cresol (trade name: IRGANOX1520L, manufactured by Ciba Specialty Chemicals) was used as the third product. The same procedure as in Example 1 was carried out except that the resin obtained by the reactor was continuously added at 1000 ppm. The evaluation results of the obtained resin composition are shown in Table 1. The content of 4,6-bis (octylthiomethyl) -o-cresol in the resin composition is the same as the content of 4,6-bis (dodecylthiomethyl) -o-cresol. It was measured.

参考例6
参考例5において4,6−ビス(オクチルチオメチル)−o−クレゾールを600ppmとなる様に連続的に添加したこと以外は、参考例5と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。
Reference Example 6
The same operation as in Reference Example 5 was performed except that 4,6-bis (octylthiomethyl) -o-cresol was continuously added to 600 ppm in Reference Example 5. The evaluation results of the obtained resin composition are shown in Table 1.

実施例7
4,6−ビス(ドデシルチオメチル)−o−クレゾールの代わりに4,4’−チオビス(6−t−ブチル−3−メチルフェノール)(商品名ヨシノックスSR、エーピーアイコーポレーション社製)を第3反応器により得られた樹脂に対し1000ppmとなる様に連続的に添加したこと以外は、実施例1と同様に実施した。
Example 7
In place of 4,6-bis (dodecylthiomethyl) -o-cresol, 4,4′-thiobis (6-tert-butyl-3-methylphenol) (trade name Yoshinox SR, manufactured by API Corporation) It implemented like Example 1 except having added continuously so that it might become 1000 ppm with respect to resin obtained with the reactor.

なお、樹脂組成物中の4,4’−チオビス(6−t−ブチル−3−メチルフェノールの含有量については、樹脂組成物200mgをジクロロメタン2mlにて完全に溶解し、次いでメタノール2mlを加えてポリマーを析出・静値後、上澄みをガスクロマトグラフィーを用いて以下の条件で測定した。
ガスクロマトグラフ:HP−5890(ヒューレットパッカード社製)
キャピラリーカラム:DB−1、0.2mm×30m、膜厚0.1μm
インジェクション温度:250℃
カラム温度:100〜300℃、10℃/min
ディテクター温度:300℃
スプリット比:50/1
内部標準物質:n−エイコサン
For the content of 4,4′-thiobis (6-tert-butyl-3-methylphenol in the resin composition, 200 mg of the resin composition was completely dissolved in 2 ml of dichloromethane, and then 2 ml of methanol was added. After polymer precipitation and static value, the supernatant was measured under the following conditions using gas chromatography.
Gas chromatograph: HP-5890 (manufactured by Hewlett-Packard Company)
Capillary column: DB-1, 0.2 mm × 30 m, film thickness 0.1 μm
Injection temperature: 250 ° C
Column temperature: 100-300 ° C., 10 ° C./min
Detector temperature: 300 ° C
Split ratio: 50/1
Internal reference material: n-eicosane

実施例8
実施例7において4,4’−チオビス(6−t−ブチル−3−メチルフェノール)を2000ppmとなる様に連続的に添加したこと以外は、実施例7と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。
Example 8
The same operation as in Example 7 was carried out except that 4,4′-thiobis (6-tert-butyl-3-methylphenol) was continuously added to 2000 ppm in Example 7. The evaluation results of the obtained resin composition are shown in Table 1.

実施例9
4,4’−チオビス(6−t−ブチル−3−メチルフェノール)に加え、2,2−メチレンビス(4,6−ジ−t−ブチルフェニル)オクチルホスファイト(商品名アデカスタブHP−10、旭電化工業社製)を第3反応器により得られた樹脂に対しそれぞれ1000ppmとなる様に連続的に添加したこと以外は、実施例7と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。なお樹脂組成物中の2,2−メチレンビス(4,6−ジ−t−ブチルフェニル)オクチルホスファイトの含有量は、4,4’−チオビス(6−t−ブチル−3−メチルフェノール)の含有量と同様の方法にて測定した。
Example 9
In addition to 4,4′-thiobis (6-tert-butyl-3-methylphenol), 2,2-methylenebis (4,6-di-tert-butylphenyl) octyl phosphite (trade name ADK STAB HP-10, Asahi This was carried out in the same manner as in Example 7, except that Denka Kogyo Kogyo Co., Ltd.) was continuously added to the resin obtained by the third reactor so as to be 1000 ppm each. The evaluation results of the obtained resin composition are shown in Table 1. The content of 2,2-methylenebis (4,6-di-t-butylphenyl) octyl phosphite in the resin composition is 4,4′-thiobis (6-t-butyl-3-methylphenol). It measured by the method similar to content.

実施例10
4,4’−チオビス(6−t−ブチル−3−メチルフェノール)に加え、ジミリスチルチオジプロピオネート(商品名DMTP「ヨシトミ」、エーピーアイコーポレーション社製)を第3反応器により得られた樹脂に対しそれぞれ1000ppmとなる様に連続的に添加したこと以外は、実施例7と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。なお樹脂組成物中のジミリスチルチオジプロピオネートの含有量は、4,6−ビス(ドデシルチオメチル)−o−クレゾールと同様の方法にて測定した。
Example 10
In addition to 4,4′-thiobis (6-tert-butyl-3-methylphenol), dimyristyl thiodipropionate (trade name DMTP “Yoshitomi”, manufactured by API Corporation) was obtained by the third reactor. It implemented like Example 7 except having added continuously so that it might become 1000 ppm, respectively with respect to resin. The evaluation results of the obtained resin composition are shown in Table 1. The content of dimyristylthiodipropionate in the resin composition was measured by the same method as that for 4,6-bis (dodecylthiomethyl) -o-cresol.

比較例1
4,6−ビス(ドデシルチオメチル)−o−クレゾールを添加しなかった以外は、実施例1と同様の方法にて実施した。得られた樹脂組成物の評価結果を表1に示す。
Comparative Example 1
The same procedure as in Example 1 was performed except that 4,6-bis (dodecylthiomethyl) -o-cresol was not added. The evaluation results of the obtained resin composition are shown in Table 1.

比較例2
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールを180ppmとなる様に連続的に添加したこと以外は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。
Comparative Example 2
The same operation as in Example 1 was conducted except that 4,6-bis (dodecylthiomethyl) -o-cresol was continuously added so as to be 180 ppm in Example 1. The evaluation results of the obtained resin composition are shown in Table 1.

比較例3
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールの代わりに2−[1−(2−ヒドロキシ−3,5−ジ−t−ペンチルフェニル)エチル]−4,6−ジ−t−ペンチルフェニルアクリレート(商品名スミライザーGS、住友化学社製)を第3反応器により得られた樹脂に対し1000ppmとなる様に連続的に添加した以外は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。なお、樹脂組成物中の2−[1−(2−ヒドロキシ−3,5−ジ−t−ペンチルフェニル)エチル]−4,6−ジ−t−ペンチルフェニルアクリレートの含有量については、4,4’−チオビス(6−t−ブチル−3−メチルフェノール)の含有量と同様の方法にて測定した。
Comparative Example 3
In Example 1, instead of 4,6-bis (dodecylthiomethyl) -o-cresol, 2- [1- (2-hydroxy-3,5-di-t-pentylphenyl) ethyl] -4,6-di The same procedure as in Example 1 was conducted except that -t-pentylphenyl acrylate (trade name: Sumilizer GS, manufactured by Sumitomo Chemical Co., Ltd.) was continuously added so as to be 1000 ppm with respect to the resin obtained by the third reactor. . The evaluation results of the obtained resin composition are shown in Table 1. The content of 2- [1- (2-hydroxy-3,5-di-t-pentylphenyl) ethyl] -4,6-di-t-pentylphenyl acrylate in the resin composition is 4, It measured by the method similar to content of 4'-thiobis (6-t-butyl-3-methylphenol).

比較例4
実施例1において4,6−ビス(ドデシルチオメチル)−o−クレゾールの代わりに5,7−ジ−tert−ブチル−3−(3,4−ジメチルフェニル)−3H−ベンゾフラン−2−オン(商品名HP−136、チバ・スペシャルティケミカルズ社製)を第3反応器により得られた樹脂に対し1000ppmとなる様に連続的に添加した以外は、実施例1と同様に実施した。得られた樹脂組成物の評価結果を表1に示す。なお、樹脂組成物中の5,7−ジ−tert−ブチル−3−(3,4−ジメチルフェニル)−3H−ベンゾフラン−2−オンの含有量については、4,4’−チオビス(6−t−ブチル−3−メチルフェノール)の含有量と同様の方法にて測定した。
Comparative Example 4
In Example 1, instead of 4,6-bis (dodecylthiomethyl) -o-cresol, 5,7-di-tert-butyl-3- (3,4-dimethylphenyl) -3H-benzofuran-2-one ( Product name HP-136 (manufactured by Ciba Specialty Chemicals) was added in the same manner as in Example 1 except that it was continuously added to 1000 ppm with respect to the resin obtained by the third reactor. The evaluation results of the obtained resin composition are shown in Table 1. The content of 5,7-di-tert-butyl-3- (3,4-dimethylphenyl) -3H-benzofuran-2-one in the resin composition is 4,4′-thiobis (6- (t-butyl-3-methylphenol) content was measured by the same method.

Figure 0005486146
Figure 0005486146

表1より、本発明を構成する少なくとも1個以上のチオエーテル結合を分子内に有する化合物の添加量が少ないものは、総揮発分やダイマー・トリマーの量が多く、得られる樹脂組成物の臭気が強い。また本発明を構成する少なくとも1個以上のチオエーテル結合を分子内に有する化合物以外の酸化防止剤を用いたものは、得られた樹脂組成物に含有される割合が低く、臭気が強いことが分かる。   From Table 1, those having a small amount of the compound having at least one thioether bond in the molecule constituting the present invention have a large amount of total volatile components and dimers / trimers, and the resulting resin composition has an odor. strong. Further, it is understood that those using an antioxidant other than the compound having at least one thioether bond in the molecule constituting the present invention have a low ratio and a strong odor contained in the obtained resin composition. .

本発明の芳香族ビニル化合物系樹脂組成物は、揮発分やダイマー・トリマー成分が少なく、臭気が少ないため、食品包材用途に最適である。更に、本発明の芳香族ビニル化合物系樹脂組成物は、各種雑貨、日用品、電器製品等の用途にも幅広く使用可能であり、産業上の利用可能性は極めて大きい。   The aromatic vinyl compound-based resin composition of the present invention is suitable for food packaging applications because it has a small amount of volatile components and dimer / trimer components and a low odor. Furthermore, the aromatic vinyl compound-based resin composition of the present invention can be widely used for various miscellaneous goods, daily necessities, electrical appliances, and the like, and has a great industrial applicability.

Claims (4)

スチレン系単量体の単独重合体、又はアクリロニトリル、メタクリル酸エステル及びアクリル酸エステルのうち少なくとも1種とスチレン系単量体との共重合体からなる芳香族ビニル化合物系樹脂に対して、少なくとも1個以上のチオエーテル結合を分子内に有する化合物を200〜2000ppm含有し、
前記チオエーテル結合を有する化合物が、下記一般式(I)に示す構造の化合物又は下記一般式(II)に示す構造の化合物であり、
かつガスクロマトグラフィーにより測定される総揮発分が500ppm以下であり、ガスクロマトグラフィーにより測定される前記スチレン系単量体のダイマー量およびトリマー量の合計が1500ppm以下であり、
脱揮工程の前に、重合工程により得た前記芳香族ビニル化合物系樹脂に対して、前記チオエーテル結合を有する化合物を添加することにより得たものであることを特徴とする芳香族ビニル化合物系樹脂組成物。
Figure 0005486146
(式中、nは12〜18の整数を示す。)
Figure 0005486146
At least 1 with respect to an aromatic vinyl compound resin comprising a homopolymer of a styrene monomer or a copolymer of at least one of acrylonitrile, methacrylic acid ester and acrylic acid ester and a styrene monomer. Containing 200 to 2000 ppm of a compound having one or more thioether bonds in the molecule;
The compound having a thioether bond is a compound having a structure represented by the following general formula (I) or a compound having a structure represented by the following general formula (II):
And the total volatile matter measured by gas chromatography is 500 ppm or less, and the total of the dimer amount and trimer amount of the styrene monomer measured by gas chromatography is 1500 ppm or less,
Immediately before as degassing step, with respect to the aromatic vinyl compound type resin obtained by the polymerization process, the aromatic vinyl compound type which is characterized in that which was obtained by adding a compound having a thioether bond Resin composition.
Figure 0005486146
(In the formula, n represents an integer of 12 to 18.)
Figure 0005486146
前記スチレン系単量体が、スチレン、α−メチルスチレン、o−メチルスチレン及びp−メチルスチレンからなる群から選択された少なくとも1種の化合物であることを特徴とする請求項1に記載の芳香族ビニル化合物系樹脂組成物。   2. The fragrance according to claim 1, wherein the styrenic monomer is at least one compound selected from the group consisting of styrene, α-methylstyrene, o-methylstyrene, and p-methylstyrene. Group vinyl compound-based resin composition. 塊状重合にてスチレン系単量体を単独で重合するか、又はアクリロニトリル、メタクリル酸エステル及びアクリル酸エステルのうち少なくとも1種とスチレン系単量体とを共重合する重合工程と、
未反応モノマーや溶剤を除去する脱揮工程と、を有し、
前記脱揮工程の前に、前記重合工程により得た芳香族ビニル化合物系樹脂に対して、下記一般式(I)に示す構造の化合物又は下記一般式(II)に示す構造の化合物を200〜2000ppm添加し、ガスクロマトグラフィーにより測定される総揮発分が500ppm以下であり、ガスクロマトグラフィーにより測定される前記スチレン系単量体のダイマー量およびトリマー量の合計が1500ppm以下である芳香族ビニル化合物系樹脂組成物を得る芳香族ビニル化合物系樹脂組成物の製造方法。
Figure 0005486146
(式中、nは12〜18の整数を示す。)
Figure 0005486146
A polymerization step of polymerizing a styrenic monomer alone in bulk polymerization or copolymerizing at least one of acrylonitrile, methacrylic acid ester and acrylic acid ester with a styrenic monomer;
A devolatilization step for removing unreacted monomers and solvents,
Wherein immediately before as degassing step, wherein the aromatic vinyl compound type resin obtained by the polymerization step, 200 a compound of the structure shown in the compound or the following formula structure represented by the following general formula (I) (II) Aromatic vinyl added with ˜2000 ppm, total volatile content measured by gas chromatography is 500 ppm or less, and total of dimer amount and trimer amount of the styrene monomer measured by gas chromatography is 1500 ppm or less A method for producing an aromatic vinyl compound-based resin composition to obtain a compound-based resin composition.
Figure 0005486146
(In the formula, n represents an integer of 12 to 18.)
Figure 0005486146
前記スチレン系単量体が、スチレン、α−メチルスチレン、o−メチルスチレン及びp−メチルスチレンからなる群から選択された少なくとも1種の化合物であることを特徴とする請求項3に記載の芳香族ビニル化合物系樹脂組成物の製造方法。   4. The fragrance according to claim 3, wherein the styrenic monomer is at least one compound selected from the group consisting of styrene, α-methylstyrene, o-methylstyrene, and p-methylstyrene. For producing an aromatic vinyl compound-based resin composition.
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