JP5443808B2 - 気流発生装置 - Google Patents
気流発生装置 Download PDFInfo
- Publication number
- JP5443808B2 JP5443808B2 JP2009080275A JP2009080275A JP5443808B2 JP 5443808 B2 JP5443808 B2 JP 5443808B2 JP 2009080275 A JP2009080275 A JP 2009080275A JP 2009080275 A JP2009080275 A JP 2009080275A JP 5443808 B2 JP5443808 B2 JP 5443808B2
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- Prior art keywords
- dielectric layer
- electrode
- dielectric
- layer
- generation device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009080275A JP5443808B2 (ja) | 2009-03-27 | 2009-03-27 | 気流発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009080275A JP5443808B2 (ja) | 2009-03-27 | 2009-03-27 | 気流発生装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012075459A Division JP5444398B2 (ja) | 2012-03-29 | 2012-03-29 | 気流発生装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010227877A JP2010227877A (ja) | 2010-10-14 |
| JP2010227877A5 JP2010227877A5 (https=) | 2011-05-12 |
| JP5443808B2 true JP5443808B2 (ja) | 2014-03-19 |
Family
ID=43044263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009080275A Active JP5443808B2 (ja) | 2009-03-27 | 2009-03-27 | 気流発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5443808B2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11078794B2 (en) | 2016-02-16 | 2021-08-03 | Ihi Corporation | Airfoil structure manufacturing method |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012057271A1 (ja) * | 2010-10-27 | 2012-05-03 | 京セラ株式会社 | イオン風発生体及びイオン風発生装置 |
| JP5668134B2 (ja) * | 2011-02-23 | 2015-02-12 | 京セラ株式会社 | イオン風発生体及びイオン風発生装置 |
| JP6243626B2 (ja) * | 2012-05-14 | 2017-12-06 | マイクロプラズマ株式会社 | 低電圧プラズマ発生用電極 |
| KR101396209B1 (ko) | 2012-10-19 | 2014-05-19 | 한국철도기술연구원 | 철도차량용 공기저항 감소장치 |
| JP6316047B2 (ja) * | 2014-03-24 | 2018-04-25 | 株式会社東芝 | ガス処理装置 |
| JP7734526B2 (ja) * | 2021-07-28 | 2025-09-05 | 日産自動車株式会社 | 冷却装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002237368A (ja) * | 2001-02-09 | 2002-08-23 | Matsushita Electric Ind Co Ltd | イオン発生装置とその製造方法 |
| JP2003100498A (ja) * | 2001-09-20 | 2003-04-04 | Japan Vilene Co Ltd | 放電用電極 |
| KR20050043740A (ko) * | 2001-11-02 | 2005-05-11 | 플라스마솔 코포레이션 | 저온 플라즈마 슬릿 방전 장치 |
| JP5060163B2 (ja) * | 2006-04-28 | 2012-10-31 | 株式会社東芝 | 翼 |
| JP4638452B2 (ja) * | 2007-01-31 | 2011-02-23 | 三菱電機株式会社 | 電気集塵デバイス |
| JP2008289801A (ja) * | 2007-05-28 | 2008-12-04 | Toshiba Corp | ガス浄化装置 |
| JP5223424B2 (ja) * | 2008-04-08 | 2013-06-26 | パナソニック株式会社 | 集塵装置 |
-
2009
- 2009-03-27 JP JP2009080275A patent/JP5443808B2/ja active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11078794B2 (en) | 2016-02-16 | 2021-08-03 | Ihi Corporation | Airfoil structure manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010227877A (ja) | 2010-10-14 |
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