JP5430764B2 - 薄膜太陽電池の製造方法 - Google Patents
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Description
図1は、実施の形態1による薄膜太陽電池の構成を模式的に示す斜視図であり、図2は、図1の一部を拡大した斜視図であり、図3は、図2のA−A断面図である。なお、図2は、図1のCの部分を切り出して拡大した図である。
図6は、この発明の実施の形態2による薄膜太陽電池の構造の一例を模式的に示す断面図である。この例では、裏面電極層14は、光電変換層13上の全面に形成される厚さ10〜500nmの透明導電膜15Aと、透明導電膜15A上に形成される細線状の金属膜16と積層構造によって構成される。金属膜16は、実施の形態1と同様にスクライブライン20に直交する方向に延在して設けられる。また、金属膜16の幅は10〜1,000μmであり、細線状の金属膜16間のピッチは100μm〜10mmである。ここで、透明導電膜15Aの厚さが10nmより薄いと、金属膜16を構成する金属元素の光電変換層13中への拡散を効果的に抑制することができず、透明導電膜15Aの厚さが500nmよりも厚いと、太陽光の透明導電膜15Aでの減衰量が従来の構造の薄膜太陽電池と同程度となってしまうので、透明導電膜15Aの厚さは上記範囲であることが望ましい。減衰量をさらに減少するために透明導電膜15Aの厚さを10〜300nmとしてもよい。
実施例1にかかる薄膜太陽電池として、実施の形態1の図2と図3に示される構造のものを用い、実施例2にかかる薄膜太陽電池として、実施の形態2の図6に示される構造のものを用いる。透明絶縁基板11としてガラス基板を使用し、表面電極層12として厚さ1μmのAlドープZnO(以下、AZOという)を用い、光電変換層13として膜厚1μmの微結晶シリコン膜を用いる。実施例1では裏面電極層14を構成する透明導電膜15として厚さ90nmのAZOを用い、実施例2では裏面電極層14を構成する透明導電膜15Aとして厚さ300nmのAZOを用いる。また、裏面電極層14を構成する金属膜16として、厚さ300nmのAgを用い、白色絶縁層17として、酸化チタンをアクリル系のバインダ樹脂に混合させたものを用いる。
作製された薄膜太陽電池について、透明絶縁基板11側から擬似太陽光をソーラシュミレータで照射し電流−電圧特性を測定し、短絡電流密度、開放電圧、曲線因子および変換効率を求める。
図7は、実施例と比較例による薄膜太陽電池の特性を示す図である。比較例による薄膜太陽電池の短絡電流は17.8mAであるのに対し、実施例1,2の薄膜太陽電池の短絡電流はそれぞれ19.1mA,18.3mAとなり、それぞれ比較例に比べて増加している。また、実施例1,2の開放電圧は、比較例の開放電圧の値(0.53V)とほとんど差がない。曲線因子(FF)は、実施例1では、比較例の値(0.725)と比較して若干低い0.698となっているが、実施例2では、比較例と同程度となっている。そして、実施例1,2の光電変換効率は、それぞれ6.93%、6.98%となり、比較例の6.84%に比して増加している。
11 透明絶縁基板
12 表面電極層
13 光電変換層
14 裏面電極層
15,15A 透明導電膜
16 金属膜
16a 接続部
17 白色絶縁層
20 スクライブライン
21 第1スクライブライン
22 第2スクライブライン
23 第3スクライブライン
Claims (4)
- 透光性の基板上に、透明導電性材料からなる膜を形成し、各セル間を分離する第1の電極層分離溝を形成して前記各セルの第1の電極層を形成する第1工程と、
前記第1の電極層を形成した前記基板上に、薄膜半導体層を含む光電変換層を形成する第2工程と、
前記光電変換層上に透明導電膜を形成する第3工程と、
前記透明導電膜と前記光電変換層とを前記セルごとに分離する前記第1の電極層分離溝と平行なセル接続溝を形成する第4工程と、
前記セル接続溝の形成位置では、前記セル接続溝の底部で前記第1の電極層と接続されるように、前記透明導電膜上および前記セル接続溝内に線状の金属膜を形成する第5工程と、
前記金属膜、前記透明導電膜および前記光電変換層を前記セルごとに分離する前記第1の電極層分離溝と平行な第2の電極層分離溝を形成する第6工程と、
前記セル接続溝内の前記金属膜が製膜されていない領域および前記第2の電極層分離溝内と、前記金属膜が形成された前記基板上とに、白色絶縁層からなる反射膜を形成する第7工程と、
を含むことを特徴とする薄膜太陽電池の製造方法。 - 前記第3工程では、前記第1の電極層分離溝が延在する第1の方向に所定のピッチで、前記第1の方向に垂直な第2の方向に延在する線状構造の前記透明導電膜を形成し、
前記第5工程では、前記線状の前記透明導電膜上に線状の前記金属膜を形成するとともに、前記線状の金属膜と前記セル接続溝との交差位置で前記セル接続溝を前記金属膜で埋め込むように、前記金属膜を形成することを特徴とする請求項1に記載の薄膜太陽電池の製造方法。 - 前記第3工程では、前記透明導電膜を前記光電変換層上の全面に形成し、
前記第5工程では、前記第1の電極層分離溝が延在する第1の方向に所定のピッチで、前記第1の方向に垂直な第2の方向に延在する線状構造の前記金属膜を形成することを特徴とする請求項1に記載の薄膜太陽電池の製造方法。 - 前記第5工程では、前記線状構造の金属膜を形成した後、前記線状構造の金属膜をマスクとして前記透明導電膜をエッチングする処理をさらに行うことを特徴とする請求項3に記載の薄膜太陽電池の製造方法。
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JP2012059886A (ja) * | 2010-09-08 | 2012-03-22 | Mitsubishi Heavy Ind Ltd | 光電変換装置 |
TWI451580B (zh) * | 2011-09-26 | 2014-09-01 | Ind Tech Res Inst | 薄膜太陽能電池之製法 |
US9147875B1 (en) * | 2014-09-10 | 2015-09-29 | Cellink Corporation | Interconnect for battery packs |
US10211443B2 (en) | 2014-09-10 | 2019-02-19 | Cellink Corporation | Battery interconnects |
JP2016111153A (ja) * | 2014-12-04 | 2016-06-20 | 住友化学株式会社 | 太陽電池モジュール及びその製造方法 |
WO2016126890A1 (en) | 2015-02-03 | 2016-08-11 | Cellink Corporation | Systems and methods for combined thermal and electrical energy transfer |
JP2020167243A (ja) * | 2019-03-29 | 2020-10-08 | パナソニック株式会社 | 太陽電池セル集合体、及び、太陽電池セルの製造方法 |
TWI690099B (zh) * | 2019-08-23 | 2020-04-01 | 台灣中油股份有限公司 | 鈣鈦礦太陽能電池模組的製造方法及鈣鈦礦太陽能電池模組 |
JPWO2021106526A1 (ja) * | 2019-11-27 | 2021-06-03 | ||
WO2022204709A1 (en) | 2021-03-24 | 2022-09-29 | Cellink Corporation | Multilayered flexible battery interconnects and methods of fabricating thereof |
CN116897436A (zh) * | 2022-01-24 | 2023-10-17 | 宁德时代新能源科技股份有限公司 | 太阳能电池以及其制备方法、光伏组件和用电装置 |
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JPWO2012017742A1 (ja) | 2013-10-03 |
CN103053033B (zh) | 2015-12-02 |
CN103053033A (zh) | 2013-04-17 |
WO2012017742A1 (ja) | 2012-02-09 |
US9293618B2 (en) | 2016-03-22 |
US20130098424A1 (en) | 2013-04-25 |
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