JP5315302B2 - 走査透過電子顕微鏡及びその軸調整方法 - Google Patents

走査透過電子顕微鏡及びその軸調整方法 Download PDF

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Publication number
JP5315302B2
JP5315302B2 JP2010167687A JP2010167687A JP5315302B2 JP 5315302 B2 JP5315302 B2 JP 5315302B2 JP 2010167687 A JP2010167687 A JP 2010167687A JP 2010167687 A JP2010167687 A JP 2010167687A JP 5315302 B2 JP5315302 B2 JP 5315302B2
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JP
Japan
Prior art keywords
electron beam
scanning transmission
ronchigram
histogram
electron microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010167687A
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English (en)
Japanese (ja)
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JP2012028234A (ja
Inventor
邦康 中村
博実 稲田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2010167687A priority Critical patent/JP5315302B2/ja
Priority to EP11812257.1A priority patent/EP2600379B1/de
Priority to US13/808,134 priority patent/US8710438B2/en
Priority to PCT/JP2011/065790 priority patent/WO2012014665A1/ja
Publication of JP2012028234A publication Critical patent/JP2012028234A/ja
Application granted granted Critical
Publication of JP5315302B2 publication Critical patent/JP5315302B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes
JP2010167687A 2010-07-27 2010-07-27 走査透過電子顕微鏡及びその軸調整方法 Expired - Fee Related JP5315302B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010167687A JP5315302B2 (ja) 2010-07-27 2010-07-27 走査透過電子顕微鏡及びその軸調整方法
EP11812257.1A EP2600379B1 (de) 2010-07-27 2011-07-11 Transmissions-rasterelektronenmikroskop und achseneinstellungsverfahren dafür
US13/808,134 US8710438B2 (en) 2010-07-27 2011-07-11 Scanning transmission electron microscope and axial adjustment method thereof
PCT/JP2011/065790 WO2012014665A1 (ja) 2010-07-27 2011-07-11 走査透過電子顕微鏡及びその軸調整方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010167687A JP5315302B2 (ja) 2010-07-27 2010-07-27 走査透過電子顕微鏡及びその軸調整方法

Publications (2)

Publication Number Publication Date
JP2012028234A JP2012028234A (ja) 2012-02-09
JP5315302B2 true JP5315302B2 (ja) 2013-10-16

Family

ID=45529882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010167687A Expired - Fee Related JP5315302B2 (ja) 2010-07-27 2010-07-27 走査透過電子顕微鏡及びその軸調整方法

Country Status (4)

Country Link
US (1) US8710438B2 (de)
EP (1) EP2600379B1 (de)
JP (1) JP5315302B2 (de)
WO (1) WO2012014665A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5743950B2 (ja) * 2012-04-27 2015-07-01 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP6106547B2 (ja) * 2013-07-12 2017-04-05 株式会社日立ハイテクノロジーズ 透過電子顕微鏡
JP6957998B2 (ja) * 2017-06-07 2021-11-02 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム調整方法
JP6857575B2 (ja) * 2017-08-24 2021-04-14 日本電子株式会社 収差測定方法および電子顕微鏡

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6658164B1 (en) * 1999-08-09 2003-12-02 Cross Match Technologies, Inc. Calibration and correction in a fingerprint scanner
JP2003331773A (ja) 2002-05-13 2003-11-21 Jeol Ltd 電子顕微鏡
JP2006173027A (ja) * 2004-12-20 2006-06-29 Hitachi High-Technologies Corp 走査透過電子顕微鏡、及び収差測定方法、ならびに収差補正方法
JP4895525B2 (ja) * 2005-04-11 2012-03-14 株式会社日立ハイテクノロジーズ 走査透過電子顕微鏡装置
US7619220B2 (en) * 2005-11-30 2009-11-17 Jeol Ltd. Method of measuring aberrations and correcting aberrations using Ronchigram and electron microscope
JP2007173132A (ja) * 2005-12-26 2007-07-05 Hitachi High-Technologies Corp 走査透過電子顕微鏡、および走査透過電子顕微鏡の調整方法
JP2007179753A (ja) * 2005-12-27 2007-07-12 Hitachi High-Technologies Corp 走査透過電子顕微鏡、及び収差測定方法
US7300106B2 (en) 2006-03-30 2007-11-27 Schukra Of North America, Ltd. Trim foam lumbar
JP4942000B2 (ja) * 2006-04-28 2012-05-30 独立行政法人物質・材料研究機構 電子顕微鏡とその対物レンズ系収差特性の計測方法

Also Published As

Publication number Publication date
WO2012014665A1 (ja) 2012-02-02
US8710438B2 (en) 2014-04-29
EP2600379B1 (de) 2015-04-08
US20130112875A1 (en) 2013-05-09
EP2600379A4 (de) 2014-07-30
EP2600379A1 (de) 2013-06-05
JP2012028234A (ja) 2012-02-09

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