JP5315275B2 - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- JP5315275B2 JP5315275B2 JP2010066601A JP2010066601A JP5315275B2 JP 5315275 B2 JP5315275 B2 JP 5315275B2 JP 2010066601 A JP2010066601 A JP 2010066601A JP 2010066601 A JP2010066601 A JP 2010066601A JP 5315275 B2 JP5315275 B2 JP 5315275B2
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Claims (1)
- 基台と、
前記基台上に配置されて基板を保持する描画ステージと、
前記基台から上方に離間して配置されて前記描画ステージに保持される前記基板に光ビームを上方から照射して描画する描画ヘッドと、
水平方向において前記基台と隣接して配置されて前記描画ステージとの間で基板の搬送を行う搬送部と、
前記水平方向において前記基台に対して前記搬送部の反対側に配置されて前記描画ステージと前記描画ヘッドとに挟まれた空間に向けて気体を吹き出す気体吹出部と、
前記搬送部を取り囲む雰囲気を下方に排気する排気部と
を備え、
前記気体吹出部、前記描画ステージおよび前記搬送部は前記水平方向に列状に配置されて前記気体吹出部から吹き出された気体は前記水平方向に平行な方向で前記空間内を流れた後、前記搬送部を取り囲む雰囲気を介して下方に流れて排気される
ことを特徴とする露光装置。
Priority Applications (1)
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JP2010066601A JP5315275B2 (ja) | 2010-03-23 | 2010-03-23 | 露光装置 |
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JP2010066601A JP5315275B2 (ja) | 2010-03-23 | 2010-03-23 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
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JP2011199168A JP2011199168A (ja) | 2011-10-06 |
JP5315275B2 true JP5315275B2 (ja) | 2013-10-16 |
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JP2010066601A Active JP5315275B2 (ja) | 2010-03-23 | 2010-03-23 | 露光装置 |
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JP (1) | JP5315275B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105015255A (zh) * | 2015-08-07 | 2015-11-04 | 昆山塔米机器人有限公司 | 一种基于机械臂画沙画的表演平台 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003115451A (ja) * | 2001-07-30 | 2003-04-18 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
WO2004108252A1 (ja) * | 2003-06-03 | 2004-12-16 | Nikon Corporation | フィルタ装置及び露光装置並びにデバイスの製造方法 |
-
2010
- 2010-03-23 JP JP2010066601A patent/JP5315275B2/ja active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105015255A (zh) * | 2015-08-07 | 2015-11-04 | 昆山塔米机器人有限公司 | 一种基于机械臂画沙画的表演平台 |
CN105015255B (zh) * | 2015-08-07 | 2017-12-12 | 昆山塔米机器人有限公司 | 一种基于机械臂画沙画的表演平台 |
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JP2011199168A (ja) | 2011-10-06 |
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