JP5264216B2 - Carbon monoxide remover - Google Patents
Carbon monoxide remover Download PDFInfo
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- JP5264216B2 JP5264216B2 JP2008052081A JP2008052081A JP5264216B2 JP 5264216 B2 JP5264216 B2 JP 5264216B2 JP 2008052081 A JP2008052081 A JP 2008052081A JP 2008052081 A JP2008052081 A JP 2008052081A JP 5264216 B2 JP5264216 B2 JP 5264216B2
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- carbon monoxide
- manganese
- agent
- oxide
- detoxifying
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- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 title claims description 25
- 229910002091 carbon monoxide Inorganic materials 0.000 title claims description 25
- 239000003795 chemical substances by application Substances 0.000 claims description 27
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims description 26
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 10
- GEYXPJBPASPPLI-UHFFFAOYSA-N manganese(iii) oxide Chemical group O=[Mn]O[Mn]=O GEYXPJBPASPPLI-UHFFFAOYSA-N 0.000 claims description 8
- 150000002736 metal compounds Chemical class 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- 229910052703 rhodium Inorganic materials 0.000 claims description 5
- 239000010948 rhodium Substances 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 description 15
- 239000007789 gas Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000000654 additive Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000001784 detoxification Methods 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- 239000005751 Copper oxide Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910000431 copper oxide Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000012856 packing Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000011572 manganese Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- -1 rhodium metal compounds Chemical class 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000005469 granulation Methods 0.000 description 2
- 230000003179 granulation Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 2
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 241000282887 Suidae Species 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- PPNAOCWZXJOHFK-UHFFFAOYSA-N manganese(2+);oxygen(2-) Chemical class [O-2].[Mn+2] PPNAOCWZXJOHFK-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- FXADMRZICBQPQY-UHFFFAOYSA-N orthotelluric acid Chemical compound O[Te](O)(O)(O)(O)O FXADMRZICBQPQY-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 1
- 229910000058 selane Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Catalysts (AREA)
- Treating Waste Gases (AREA)
Description
本発明は、一酸化炭素の除害剤に関し、詳しくは、半導体製造工程等から排出される排ガス中の有害な一酸化炭素を除害する除害剤に関する。 The present invention relates to a carbon monoxide detoxifying agent, and more particularly to a detoxifying agent for detoxifying harmful carbon monoxide in exhaust gas discharged from a semiconductor manufacturing process or the like.
乾式法による除害剤には、除外対象となるガスに応じて、あるいは、酸素の必要性の有無等の処理条件に応じて多種多様なものが用いられている。例えば、アルシンやセレン化水素等においては、空気中等の酸素の存在下で活性炭に接触させて酸化させる方法や、窒素等の不活性雰囲気下での酸化銅や酸化マンガンをはじめとする金属酸化物との化学反応によって除去する方法等が知られている。これらの方法は、それぞれ一長一短があり、処理条件によって適宜使用されている。 A wide variety of pesticides by the dry method are used depending on the gas to be excluded or depending on the processing conditions such as the necessity of oxygen. For example, in arsine, hydrogen selenide, etc., a method of oxidizing by contacting activated carbon in the presence of oxygen such as in the air, or metal oxides such as copper oxide and manganese oxide in an inert atmosphere such as nitrogen There are known methods for removing them by a chemical reaction. Each of these methods has advantages and disadvantages, and is appropriately used depending on processing conditions.
高温下で一酸化炭素を除去するための方法としては、酸化銅、二酸化マンガン等の金属酸化物触媒や、活性炭に銅、マンガン等を添着した添着活性炭を使用し、空気中等の酸素の存在下で酸化して除害する方法が知られている。特に、添着活性炭を用いる方法は、常温付近でも使用されている。また、常温での不活性雰囲気下における一酸化炭素の除害処理については、二酸化マンガン及び酸化銅を主成分とする組成物の成形体を用いて除去する方法が開示されている(例えば、特許文献1参照。)。
しかし、半導体製造工程においては、窒素、アルゴン、ヘリウム等の不活性ガスがベースガスとして使用され、これらに含有される一酸化炭素を酸化させて除害するためには、空気等の酸素含有ガスを混合する必要があり、空気を送るブロア等の設備等が必要となる。また、二酸化マンガン及び酸化銅を主成分とする成形体を用いて不活性雰囲気下で除害処理を行う方法では、微量の水分でも急激な性能劣化を起こすため、除湿設備も必要となり、使用条件に注意が必要であった。さらに、これらの設備を別途設置する必要があることから、除害設備のコストアップの要因となっていた。 However, in the semiconductor manufacturing process, an inert gas such as nitrogen, argon or helium is used as a base gas, and in order to oxidize and remove the carbon monoxide contained therein, an oxygen-containing gas such as air is used. Need to be mixed, and equipment such as a blower for sending air is required. In addition, in the method of performing detoxification treatment in an inert atmosphere using a molded body mainly composed of manganese dioxide and copper oxide, even if a small amount of water causes a rapid performance deterioration, a dehumidifying equipment is also required, It was necessary to pay attention to. Furthermore, since it is necessary to install these facilities separately, it has been a factor in increasing the cost of the abatement equipment.
そこで本発明は、不活性雰囲気下で一酸化炭素を効率よく除害処理することができる一酸化炭素の除害剤を提供することを目的としている。 Accordingly, an object of the present invention is to provide a carbon monoxide detoxifying agent capable of efficiently detoxifying carbon monoxide under an inert atmosphere.
上記目的を達成するため、本発明の一酸化炭素の除害剤は、半導体製造工程で排出される不活性雰囲気ガス中の一酸化炭素の除害剤であって、主成分となるマンガン酸化物に、金、白金、銀、ロジウムのうち少なくとも一種の金属単体又はこれらの金属化合物を添加したことを特徴としている。
In order to achieve the above object, the carbon monoxide detoxifying agent of the present invention is a carbon monoxide detoxifying agent in an inert atmosphere gas discharged in a semiconductor manufacturing process, and a manganese oxide as a main component Further, it is characterized in that at least one metal simple substance or a metal compound of gold, platinum, silver and rhodium is added.
特に、本発明の一酸化炭素の除害剤は、前記マンガン酸化物が、酸化マンガン(III)又は酸化マンガン(IV)であることが好ましく、前記金属単体又は金属化合物の添加量は、除害剤全重量に占める割合が0.1〜10%であることが好ましい。 In particular, in the carbon monoxide abatement agent of the present invention, the manganese oxide is preferably manganese (III) oxide or manganese (IV) oxide, and the amount of the metal simple substance or metal compound added is the abatement. The proportion of the total weight of the agent is preferably 0.1 to 10%.
本発明の一酸化炭素の除害剤は、不活性雰囲気下において一酸化炭素の除害能力を有するとともに、水分による急激な除害能力の低下を抑制できる。また、この除害剤は、使用後に空気に触れても発熱することがなく、安全性が高い。 The carbon monoxide detoxifying agent of the present invention has a carbon monoxide detoxifying ability under an inert atmosphere, and can suppress a rapid decrease in detoxifying ability due to moisture. In addition, this abatement agent does not generate heat even when it is exposed to air after use, and is highly safe.
本発明の一酸化炭素の除害剤は、主成分となるマンガン酸化物に、金、白金、銀、ロジウムのうち少なくとも一種の金属単体又はこれらの金属化合物を添加して形成される。マンガン酸化物としては、各種のマンガン酸化物が使用できるが、通常は、酸化マンガン(III)又は酸化マンガン(IV)を単独であるいは混合して使用することが望ましい。また、マンガン酸化物の比表面積は、100m2/g以上であれば、水分による劣化を十分に抑えることができる。 The carbon monoxide abatement agent of the present invention is formed by adding at least one elemental metal or a metal compound of at least one of gold, platinum, silver and rhodium to manganese oxide as a main component. As the manganese oxide, various manganese oxides can be used. Usually, it is desirable to use manganese oxide (III) or manganese oxide (IV) alone or in combination. In addition, when the specific surface area of the manganese oxide is 100 m 2 / g or more, deterioration due to moisture can be sufficiently suppressed.
金、白金、銀、ロジウムの金属化合物としては、これらの金属のフッ化物、塩化物、臭化物、ヨウ化物等のハロゲン化物をはじめとして、水酸化物、酸化物、硫化物、さらに炭酸塩、硝酸塩、酢酸塩、亜硫酸塩、塩素酸塩、過塩素酸塩、臭素酸塩、ヨウ素酸塩、過ヨウ素酸塩、ホウ酸塩、酢酸塩、リン酸塩、クロム酸塩、シアン化物、チオ硫酸塩等の塩類や、チオ錯塩、チオスルファト錯塩、スルフィト錯塩、アンモニア錯塩、有機物塩、アンミン錯塩、ピリジン錯塩、フェナントロリン錯塩、ジピリジル錯塩、ピコリン酸錯塩、フルオロ錯塩、過ヨウ素酸錯塩、テルル酸錯塩、エチレンピグアニド錯塩等の各種錯塩を使用できる。 Gold, platinum, silver, rhodium metal compounds include halides such as fluorides, chlorides, bromides, iodides, hydroxides, oxides, sulfides, and carbonates and nitrates of these metals. , Acetate, sulfite, chlorate, perchlorate, bromate, iodate, periodate, borate, acetate, phosphate, chromate, cyanide, thiosulfate Salts such as thio complex salts, thiosulfato complex salts, sulfito complex salts, ammonia complex salts, organic salts, ammine complex salts, pyridine complex salts, phenanthroline complex salts, dipyridyl complex salts, picolinic acid complex salts, fluoro complex salts, periodic acid complex salts, telluric acid complex salts, ethylene pigs Various complex salts such as anide complex salts can be used.
これらの金属単体又はこれらの金属化合物(以下、金属添加物という。)の添加量は、金属添加物の種類によって異なるが、除害剤の全重量に対して金属成分の占める割合が0.1〜10%である範囲が最適である。この金属添加物の添加量が0.1%未満であると金属添加物を添加した効果を十分に発揮することができず、また、10%を超えると除害剤中に占めるマンガン酸化物の割合が相対的に低下するため、剤単位体積当たりの一酸化炭素の除害量が減少してしまう。 The amount of these simple metals or these metal compounds (hereinafter referred to as metal additives) varies depending on the type of metal additive, but the ratio of the metal component to the total weight of the detoxifying agent is 0.1. A range of -10% is optimal. If the addition amount of the metal additive is less than 0.1%, the effect of adding the metal additive cannot be sufficiently exerted, and if it exceeds 10%, the manganese oxide occupying the detoxifying agent Since the ratio decreases relatively, the amount of carbon monoxide detoxification per unit volume of the agent decreases.
前記マンガン酸化物に金属添加物を添加した除害剤は、粉末状態で使用することも可能であるが、適当な大きさ、形状に成形して用いることにより、取り扱い性を向上させるとともに、飛散防止を図ることができ、さらに、破過帯の長さを調節して反応による発熱の局部集中を防ぎ、差圧を減少させることができる。 The abatement agent in which a metal additive is added to the manganese oxide can be used in a powder state, but by using it molded into an appropriate size and shape, it improves handling and In addition, the length of the breakthrough zone can be adjusted to prevent local concentration of heat generation due to the reaction, and the differential pressure can be reduced.
除害剤の成形は、押出造粒、転動造粒、打錠、破砕等の一般的な方法で行うことができる。また、必要に応じて少量の水や溶剤等を使用して成形することも可能である。成形した除害剤の形状には特に制限はなく、球状、円柱状、筒状、破砕状等を選択することができ、その大きさは、最大長が1〜20mmの範囲、最短長が1〜20mmの範囲が好適であり、使用条件等に応じて任意に設定することができる。 The removal agent can be formed by a general method such as extrusion granulation, rolling granulation, tableting, and crushing. Moreover, it is also possible to shape | mold using a small amount of water, a solvent etc. as needed. There is no restriction | limiting in particular in the shape of the shape | molded disinfectant, A spherical shape, a column shape, a cylinder shape, a crushing shape, etc. can be selected, The size is the range whose maximum length is 1-20 mm, and the shortest length is 1 The range of ˜20 mm is suitable, and can be arbitrarily set according to the use conditions and the like.
前記除害剤を使用して一酸化炭素の除害処理を行うには、前記除害剤をカラム等の適当な筒体内に充填し、この筒体内に一酸化炭素を含む除害対象ガスを流通させればよい。このときの筒体内の除害剤の充填密度は、0.5〜1.5g/cm3程度が望ましい。充填密度が0.5g/cm3より小さい場合には成形物の強度が弱くなり、単位体積当たりの処理量が低下してしまう。また、充填密度が1.5g/cm3よりも大きい場合には差圧が上昇して処理に悪影響を及ぼすことがある。 In order to perform carbon monoxide detoxification treatment using the detoxifying agent, the detoxifying agent is filled in a suitable cylinder such as a column, and the detoxification target gas containing carbon monoxide is contained in the cylinder. It may be distributed. At this time, the packing density of the detoxifying agent in the cylinder is preferably about 0.5 to 1.5 g / cm 3 . When the packing density is less than 0.5 g / cm 3 , the strength of the molded product becomes weak, and the processing amount per unit volume decreases. In addition, when the packing density is higher than 1.5 g / cm 3 , the differential pressure may increase and adversely affect the processing.
表1に示すように、二酸化マンガン(MnO2)又は三酸化二マンガン(Mn2O3)をそれぞれ主成分とし、添加物として金、白金、銀、ロジウムをそれぞれ添加して直径2mmの球状に成形した本発明の各除害剤と、これらの添加物を添加せずに二酸化マンガン(MnO2)又は三酸化二マンガン(Mn2O3)を直径2mmの球状に成形した従来の各除害剤とを、5cm間隔で熱電対を挿入した内径50mm、長さ500mmのステンレス製のカラムにそれぞれ充填した。 As shown in Table 1, manganese dioxide (MnO 2 ) or dimanganese trioxide (Mn 2 O 3 ) is the main component, and gold, platinum, silver, and rhodium are added as additives to form a spherical shape with a diameter of 2 mm. Each abatement agent of the present invention formed and each conventional abatement formed by adding manganese dioxide (MnO 2 ) or dimanganese trioxide (Mn 2 O 3 ) into a spherical shape with a diameter of 2 mm without adding these additives. The agent was packed in a stainless steel column having an inner diameter of 50 mm and a length of 500 mm into which thermocouples were inserted at intervals of 5 cm.
前記各充填剤を充填したカラム内に、窒素をベースガスとし、一酸化炭素を1%の濃度で含む試験ガスを2L/minで流通させ、一酸化炭素の除害能力(破過時間)を測定した。破過時間は、カラム出口に接続した一酸化炭素用のガスモニタ(バイオニクス機器株式会社製:TG−1200TEB)で出口ガス中の一酸化炭素を測定し、試験ガス導入開始から一酸化炭素が検出されるまでの時間とした。また、一部の試験ガスには水分を加えて相対湿度を70%に調整した。さらに、各除害剤の比表面積をBET1点法による吸着式比表面積測定装置(島津製作所製フローソーブII2300形)によって測定し、金属成分は、蛍光X線分析装置(リガク製:ZSX−100e)によって分析した。 A test gas containing nitrogen as a base gas and carbon monoxide at a concentration of 1% is circulated at a rate of 2 L / min in the column packed with each of the packing materials, and the carbon monoxide detoxifying ability (breakthrough time) is achieved. It was measured. The breakthrough time is measured by measuring the carbon monoxide in the outlet gas using a carbon monoxide gas monitor (manufactured by Bionics Co., Ltd .: TG-1200TEB) connected to the column outlet. It was time to be. Further, moisture was added to some test gases to adjust the relative humidity to 70%. Furthermore, the specific surface area of each detoxifying agent was measured with an adsorption-type specific surface area measuring device (Shimadzu Corporation Flowsorb II2300 type) by the BET 1-point method, and the metal component was measured with a fluorescent X-ray analyzer (manufactured by Rigaku: ZSX-100e). analyzed.
各除害剤における主成分、比表面積、添加物、添加量、湿度及び破過時間を表1に示す。
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