JPH03181316A - Method for making nf3 harmless - Google Patents
Method for making nf3 harmlessInfo
- Publication number
- JPH03181316A JPH03181316A JP1320477A JP32047789A JPH03181316A JP H03181316 A JPH03181316 A JP H03181316A JP 1320477 A JP1320477 A JP 1320477A JP 32047789 A JP32047789 A JP 32047789A JP H03181316 A JPH03181316 A JP H03181316A
- Authority
- JP
- Japan
- Prior art keywords
- oxide
- gas
- oxidizing gas
- contact
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 17
- 239000007789 gas Substances 0.000 claims abstract description 26
- 230000001590 oxidative effect Effects 0.000 claims abstract description 13
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 6
- 239000003463 adsorbent Substances 0.000 claims abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000002808 molecular sieve Substances 0.000 claims abstract description 4
- 239000001272 nitrous oxide Substances 0.000 claims abstract description 4
- 239000001301 oxygen Substances 0.000 claims abstract description 4
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 4
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052802 copper Inorganic materials 0.000 claims abstract description 3
- 229910052742 iron Inorganic materials 0.000 claims abstract description 3
- 239000000741 silica gel Substances 0.000 claims abstract description 3
- 229910002027 silica gel Inorganic materials 0.000 claims abstract description 3
- 229910000314 transition metal oxide Inorganic materials 0.000 claims abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 238000001179 sorption measurement Methods 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 229910052723 transition metal Inorganic materials 0.000 abstract description 3
- 150000003624 transition metals Chemical class 0.000 abstract description 3
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 238000011282 treatment Methods 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 16
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 102220486294 Mannose-1-phosphate guanyltransferase beta_N20A_mutation Human genes 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical compound C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002760 rocket fuel Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ＮＦ３の除害方法に係り、特に、酸化性ガス
が共存しているガス中からＮＰ、を効率よく分解するこ
とのできるＮＦ３の除害方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for eliminating NF3, and in particular, to a method for removing NF3 that can efficiently decompose NP from a gas in which oxidizing gas coexists. Regarding abatement methods.
ＮＦ３は、ロケット燃料のほか、最近では超ＬＳＩのエ
ツチングガスやＣＶＤのクリーニングガスとして使用さ
れている。しかしながら、このガスは常温できわめて安
定であると同時に水に対する溶解度も低く、かつまた、
ＴＬＶ値が１０ｐｐｍとされており、除害すべきではあ
るが処理困難な物質の１つである。In addition to rocket fuel, NF3 has recently been used as an etching gas for ultra-LSIs and a cleaning gas for CVD. However, this gas is extremely stable at room temperature, and at the same time has low solubility in water.
It has a TLV value of 10 ppm, and although it should be removed, it is one of the substances that is difficult to treat.
ＮＦ３の除害方法としては、
（１） 炭素塊と３００〜６００℃で反応させる方法
（特開昭６２−２３７９２９号公報）（２） 金属チ
タンと２００℃以上の温度で接触させる方法（特開昭６
１−２８７４２４号公報〉（３） 金属シリコンと１
００℃以上で反応させる方法（特開昭６３−１２３２２
号公報）（４）金属タングステンないし、金属モリブデ
ンと２５０℃以上の温度で接触させる方法（特開昭６２
−２２５２２８号公報）
がある。Methods for eliminating NF3 include: (1) a method of reacting with carbon lumps at 300 to 600°C (Japanese Unexamined Patent Publication No. 62-237929); (2) a method of contacting with metallic titanium at a temperature of 200°C or higher (Japanese Unexamined Patent Application Publication No. 62-237929); Showa 6
1-287424 Publication> (3) Metallic silicon and 1
Method of reacting at 00°C or higher (Japanese Patent Application Laid-Open No. 63-12322
(4) Method of contacting with metallic tungsten or metallic molybdenum at a temperature of 250°C or higher (JP-A-62
-225228).
従来技術は、いずれも単体とＮＦ３を高温で反応させる
方法を採用しているが、この際０２やＮ２０Ａ、’ｉ’
の酸化性の物質が共存すると、処理剤として使用した金
属がこれらと反応し、無駄に消耗されると同時に、酸化
された金属ないし０．やＮ２（）そのものとＮＦ３が反
応し、窒素酸化物が副生じ、これらを別途処理する方策
を講じなければならない。All conventional technologies employ a method of reacting a simple substance with NF3 at high temperature, but in this case, 02, N20A, 'i'
If oxidizing substances coexist, the metal used as a treatment agent will react with them and be wasted, and at the same time, the oxidized metal or 0. When NF3 reacts with N2 () itself, nitrogen oxides are produced as by-products, and measures must be taken to deal with these separately.
また、（］２やＮ２０等はＣ１，やＦ２等の酸化性物質
と異なり、常温での反応性が乏しく、事前にこれらのみ
を除去しておくことも困難である。Further, unlike oxidizing substances such as C1 and F2, (]2, N20, etc. have poor reactivity at room temperature, and it is difficult to remove only these in advance.
そこで、本発明は、上記の問題点を解消し、酸化性ガス
の共存下においてもＮＦ、を有効に除去し、また、副生
ずる窒素酸化物も除去することのできるＮＦ３の除害方
法を提供することを目的とする。Therefore, the present invention solves the above problems and provides a method for eliminating NF3 that can effectively remove NF even in the coexistence of oxidizing gases and also remove by-product nitrogen oxides. The purpose is to
上記目的を達成するために、本発明では、酸化生ガスと
ＮＦ３とを含むガスを、遷移金属の酸化物と２５０℃以
上の温度で接触させ、ＮＦ３中のふっ素を該金属のふつ
化物として酸化物表面に固定し、窒素はＮＯ及び／又は
ＮＯ２に変換して吸着剤により吸着除去することを特徴
とするＮＦｓの除害方法、としたものである。In order to achieve the above object, in the present invention, a gas containing an oxidizing gas and NF3 is brought into contact with an oxide of a transition metal at a temperature of 250°C or higher, and fluorine in NF3 is oxidized as a fluoride of the metal. This is a method for eliminating NFs, which is characterized by fixing it on the surface of an object, converting nitrogen into NO and/or NO2, and removing the NFs by adsorption with an adsorbent.
すなわち、本発明は、酸素及び／又は亜酸化窒素専の酸
化性ガスが共存する排ガス中に含まれるＮＦ３を処理す
るにあたって、まず第１に鉄、マンガン、銅等の遷移金
属の酸化物と２５０℃以上の温度で接触させＮＦ、中の
ふっ素については該金属のふつ化物として酸化物表面上
に固定し、窒素についてはＮＯ及び／又はＮＯ，に変換
する。第２に、ここで発生したＮＯ及び／又はＮＯ２を
活性炭・アルミナ・シリカゲル・モレキュラーシーブ・
ＭｎＯ２・ＣｕＯ・ホブカライド等の吸着剤で吸着する
。これらの一連の工程により酸素および／または亜酸化
窒素等の共存下にあるＮＰ。That is, in treating NF3 contained in exhaust gas in which oxidizing gases such as oxygen and/or nitrous oxide coexist, the present invention first treats oxides of transition metals such as iron, manganese, and copper with When brought into contact with NF at a temperature of 0.degree. C. or higher, the fluorine contained therein is fixed on the oxide surface as a fluoride of the metal, and the nitrogen is converted to NO and/or NO. Second, the NO and/or NO2 generated here can be removed using activated carbon, alumina, silica gel, molecular sieve, etc.
Adsorb with adsorbents such as MnO2, CuO, and hobcalide. Through these series of steps, NPs are produced in the coexistence of oxygen and/or nitrous oxide.
を完全に除去し、かつ外部環境に対して支障のある物質
を一切排出しない方法を提供するものである。The objective is to provide a method that completely removes substances and does not emit any substances that are harmful to the external environment.
ＮＦ３（化学的に処理する場合には、高温で反応を’ｔ
ｉＩ＆わなければならないことは、従来技術からち１す
１らかである。その際に、０２やＮ、０等の酸化性物質
が共存すれば、従来技術のように、金１ｉ１ｉ”、９４
そのままＮＦ、の処理剤に使用するかぎり、酸化されて
しまいＮＦ３の処理に役立たなくなったり、ＮＯやＮＯ
２の生成が起きたりして、所期の１−１的を達すること
ができないのは避けられない。NF3 (in the case of chemical treatment, the reaction must be carried out at high temperature)
What has to be done is simple from the prior art. At that time, if oxidizing substances such as 02, N, and 0 coexist, gold 1i1i", 94
If it is used as a treatment agent for NF, it will be oxidized and become useless for treating NF3, and NO and NO
It is inevitable that the desired 1-1 target cannot be achieved due to the generation of 2.
そこで、Ｆｅ−Ｍｎ−Ｃｕ等の遷移元素の酸化物を処理
剤とし、２５０℃以上の温度において、ＮＦ。Therefore, using an oxide of a transition element such as Fe-Mn-Cu as a treatment agent, NF treatment is performed at a temperature of 250°C or higher.
と１］２やＮ、０を含むガスと接触させ処理を行う。1] Processing is performed by contacting with a gas containing 2, N, and 0.
処Ｐｌ剤は、既に酸化されているので０２やＮ２０の共
７１：による影響をうけずにＮＦ、と反応し、従って処
Ｊｌｌｌｈ１１の処理能力は、０□やＮ、Ｏの量に依ら
ず一定したものとなる。なお、酸化物としてはアルミナ
やシリカ等の軽元素のものもあるが、これらは活性が低
く２５０〜３００℃程度では、ＮＦ３とはあまり反応し
ない。Since the treated Pl agent has already been oxidized, it reacts with NF without being affected by 0□ or N20, and therefore the treatment capacity of the treated Pl agent is constant regardless of the amount of 0□, N, and O. It becomes what it is. Incidentally, some oxides include light elements such as alumina and silica, but these have low activity and do not react much with NF3 at about 250 to 300°C.
酸化物とＮＦ２との反応において、ＮＦｓ中のふっ素は
ぶつ化物として処理剤表面に固定されるが、窒素につい
てはＮＯ及び／又はＮＯ□に変換されて排出される。Ｎ
Ｏ及び／又はＮＯ２は、ＴＬＶ値がそれぞれ２５ ｐｐ
ｍと３ ｐｐｍであり、そのまま排出するべきではない
ので、引き続き活性炭・アルミナゲル・モレキュラーシ
ーブ・ＭｎＯ２・ＣｕＯ・ホブカライド等の吸着剤で吸
着除去し完全に無毒化した処理ガスのみを排出する。In the reaction between the oxide and NF2, the fluorine in the NFs is fixed on the surface of the treatment agent as a fluoride, but the nitrogen is converted to NO and/or NO□ and is discharged. N
O and/or NO2 each have a TLV value of 25 pp
Since the treated gas should not be discharged as it is, it is removed by adsorption with an adsorbent such as activated carbon, alumina gel, molecular sieve, MnO2, CuO, or hobcalide, and only the completely detoxified treated gas is discharged.
〔実施例〕
以下、実施例により本発明を具体的に説明するが、本発
明はこれらの実施例に限定されるものではない。[Examples] The present invention will be specifically described below with reference to Examples, but the present invention is not limited to these Examples.
実施例１〜３
４０φのＳＵＳ製容器に、層高５０ｍｍになるように処
理剤を充てんし、処理剤層の中心温度が、３５０℃±５
０℃になるよう外部からヒータで加熱し、Ｎ２ガスで希
釈したＮＦ、を０．５ｊ！／ｍｉｎで流す。出口側のＮ
Ｐ３濃度をガスクロマトグラフィーにより追跡し、ＴＬ
Ｖ値１０ｐｐｍを超えるまで処理を行い、それ迄に導入
したＮＰ。Examples 1 to 3 A 40φ SUS container was filled with a treatment agent so that the layer height was 50 mm, and the center temperature of the treatment agent layer was 350°C ± 5.
0.5j of NF heated externally with a heater to 0°C and diluted with N2 gas! /min. N on the exit side
P3 concentration was tracked by gas chromatography and TL
NP was treated until the V value exceeded 10 ppm and introduced until then.
の容積と処理剤の容積から処理能力を求め比較する。同
５．ｆに、処理剤層出口でＮＯとＮ口、の発生ｉ１０）
合計量を、窒素酸化物用の検知管で、またフン素化合物
発生量を、アルカリ溶液吸収−イオンク０マドグラフィ
ーにより求め、処理反応に伴って生成する副生成物量を
求めた。Determine and compare the processing capacity from the volume of the processing agent and the volume of the processing agent. Same 5. In f, NO and N ports are generated at the exit of the processing agent layer i10)
The total amount was determined using a detection tube for nitrogen oxides, the amount of fluorine compounds generated was determined by alkaline solution absorption-ion chromatography, and the amount of by-products generated during the treatment reaction was determined.
実施例１では、１ＩＩｌｆｆｌφのＣｕ線を１０ｍｍの
長さに切断したものを処理剤とし、ＮＦ、を２％として
処理４行った。表−１に示すようにＮＯ・ＮＯ２・Ｆの
発生はなく、１５ ｆ−ＮＰ、／Ｉｔの処理能力を示し
た。In Example 1, 1IIlfflφ Cu wire cut into 10 mm length was used as the treatment agent, and 4 treatments were performed with NF at 2%. As shown in Table 1, there was no generation of NO, NO2, F, and the treatment capacity was 15 f-NP,/It.
実ｈｈ例２では、実施例１と同一条件で、０２を２％に
なるように添加して処理を行った。同じく表 １に示す
ように、０□の添加により、処理剤が０２とも反応して
処理能力がＡ程度になると同時に、導入したＮＦ３とほ
ぼ等量のＮＯ・Ｎ０２の発生が認められた。In Actual hh Example 2, treatment was carried out under the same conditions as in Example 1, with the addition of 2% 02. Similarly, as shown in Table 1, by adding 0□, the processing agent reacted with 02, and the processing capacity reached about A, and at the same time, it was observed that NO/N02 was generated in an amount almost equal to the introduced NF3.
実施例３では、実施例２と同一条件で、処理剤を針状の
Ｃｕから７〜２０ｍｅｓｈの粒状のＣｕＯに換えて処理
を行った。ＮＯ・Ｎ０２の発生量は実施例２とほぼ同じ
であるが、ＮＦ３処理能力は実施例１と同等以上あった
。In Example 3, the treatment was carried out under the same conditions as in Example 2, except that the treatment agent was changed from needle-shaped Cu to granular CuO of 7 to 20 mesh. Although the amount of NO/N02 generated was almost the same as in Example 2, the NF3 processing capacity was equal to or higher than that in Example 1.
実施例４〜７
実施例３と同二装置・同一条件で、処理剤を同一粒径の
Ｆｅｚｅ３・Ｍｎ０ｚ ｅ ＳｉＯ□’ Ａｌ２Ｏ３に
換えて処理を行った。結果を表−２に一括して示す。Examples 4 to 7 Treatments were carried out using the same apparatus and under the same conditions as in Example 3, except that the treatment agent was changed to Feze3.Mn0zeSiO□'Al2O3 having the same particle size. The results are summarized in Table 2.
Ｆｅ、Ｎ３やＭｎＯ２は、Ｃｕ１ｌと同様に充分な処理
が可能であるが、５１０２やＡｌ２Ｏ，の場合は、処理
開始直後にＮＦ３が人口濃度とほぼ同等の濃度に達して
しまった。Fe, N3, and MnO2 can be sufficiently treated like Cu11, but in the case of 5102 and Al2O, the concentration of NF3 reached almost the same as the population concentration immediately after the start of treatment.
実施例８
実施例３と同一条件でＮＦ３処理を行い、処理後のガス
を４０φのカラムに層高５０ｍｍになるよう充てんした
８〜１２ｍｅＳｈの活性炭に常温下で流しＮＯ及びＮＯ
２を処理した。その結果、前段に設けたＣｕＯで処理し
たＮＦ３が約９１！−ＮＰ、／１処理剤になた時点、す
なわちＣｕＯのＮＦ３処理能力の約２を消賀した時点で
ＮＯとＮ０２の合計量がｌ Ｑ ｐｐｍをこえた。Example 8 NF3 treatment was carried out under the same conditions as in Example 3, and the gas after treatment was poured at room temperature into activated carbon of 8 to 12 meSh filled in a 40φ column to a bed height of 50 mm to remove NO and NO.
2 was processed. As a result, NF3 treated with CuO provided in the previous stage was approximately 91! -NP,/1 treatment agent, that is, when about 2 of CuO's NF3 treatment capacity was removed, the total amount of NO and N02 exceeded 1 Q ppm.
〔発１！Ｊ１の効果〕
本発明によれば、ＮＦ３の除害処理において０２やＮ２
［］等の酸化性ガスが共存してもこれらの妨害をうける
ことなく ＮＦ、を効率よく除去することができる。[Voice 1! Effect of J1] According to the present invention, in the abatement treatment of NF3, 02 and N2
Even if oxidizing gases such as [] coexist, NF can be efficiently removed without being hindered by these gases.
ＴＩ’ ＋ｉ’ｌ出軸人 同 同 代 坤 人 同 株式会社荏原総合研究所 荏原インフィルコ株式会社 株式会社 荏原製作所 吉 嶺 桂 松 １） 大TI’+i’l same same Generation gon people same Ebara Research Institute Co., Ltd. Ebara Infilco Corporation Ebara Corporation Yoshi Mine Katsura Pine 1) Large
Claims (1)
酸化物と２５０℃以上の温度で接触させ、ＮＦ＿３中の
ふっ素を該金属のふっ化物として酸化物表面に固定し、
窒素はＮＯ及び／又はＮＯ＿２に変換して吸着剤により
吸着除去することを特徴とするＮＦ＿３の除害方法。 ２、遷移金属の酸化物が、鉄、マンガン、銅の酸化物か
ら選ばれた１種以上からなる請求項１記載のＮＦ＿３の
除害方法。 ３、吸着剤が、活性炭・アルミナ・シリカゲル・モレキ
ュラーシーブ・ＣｕＯ・ＭｎＯ＿２・ホプカライトから
選ばれた１種以上からなる請求項１記載のＮＦ＿３の除
害方法。 ４、酸化性ガスが、酸素及び／又は亜酸化窒素からなる
請求項１記載のＮＦ＿３の除害方法。[Claims] 1. A gas containing an oxidizing gas and NF_3 is brought into contact with a transition metal oxide at a temperature of 250°C or higher, and fluorine in NF_3 is fixed on the surface of the oxide as a fluoride of the metal. death,
A method for abatement of NF_3, characterized in that nitrogen is converted into NO and/or NO_2 and removed by adsorption with an adsorbent. 2. The method for abatement of NF_3 according to claim 1, wherein the transition metal oxide comprises one or more selected from oxides of iron, manganese, and copper. 3. The method for abatement of NF_3 according to claim 1, wherein the adsorbent comprises one or more selected from activated carbon, alumina, silica gel, molecular sieve, CuO, MnO_2, and hopcalite. 4. The method for abatement of NF_3 according to claim 1, wherein the oxidizing gas comprises oxygen and/or nitrous oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1320477A JPH03181316A (en) | 1989-12-12 | 1989-12-12 | Method for making nf3 harmless |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1320477A JPH03181316A (en) | 1989-12-12 | 1989-12-12 | Method for making nf3 harmless |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03181316A true JPH03181316A (en) | 1991-08-07 |
Family
ID=18121882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1320477A Expired - Lifetime JPH03181316A (en) | 1989-12-12 | 1989-12-12 | Method for making nf3 harmless |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03181316A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06319947A (en) * | 1993-05-10 | 1994-11-22 | Ube Ind Ltd | Toxicity-removing agent for etching exhaust gas and method for using the same |
| EP0666101A1 (en) * | 1994-02-03 | 1995-08-09 | MITSUI TOATSU CHEMICALS, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| WO2001023073A1 (en) * | 1999-09-30 | 2001-04-05 | L'air Liquide, Societe Anonyme À Directoire Et Conseil De Surveillance Pour L´Etude Et L´Exploitation Des Procedes Georges Claude | Exhaust gas treating device |
| WO2010095512A1 (en) * | 2009-02-23 | 2010-08-26 | セントラル硝子株式会社 | Method and apparatus for decomposing nitrogen trifluoride |
| CN114761106A (en) * | 2019-12-13 | 2022-07-15 | 通用电器技术有限公司 | Use of transition metal oxides for removing fluorinated by-products from gases, apparatus and method for removing such by-products |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63137736A (en) * | 1986-11-28 | 1988-06-09 | Asahi Glass Co Ltd | Etching exhaust gas damage removing device |
-
1989
- 1989-12-12 JP JP1320477A patent/JPH03181316A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63137736A (en) * | 1986-11-28 | 1988-06-09 | Asahi Glass Co Ltd | Etching exhaust gas damage removing device |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06319947A (en) * | 1993-05-10 | 1994-11-22 | Ube Ind Ltd | Toxicity-removing agent for etching exhaust gas and method for using the same |
| EP0666101A1 (en) * | 1994-02-03 | 1995-08-09 | MITSUI TOATSU CHEMICALS, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| WO2001023073A1 (en) * | 1999-09-30 | 2001-04-05 | L'air Liquide, Societe Anonyme À Directoire Et Conseil De Surveillance Pour L´Etude Et L´Exploitation Des Procedes Georges Claude | Exhaust gas treating device |
| JP2001096135A (en) * | 1999-09-30 | 2001-04-10 | Air Liquide Japan Ltd | Waste gas treatment apparatus |
| JP4545852B2 (en) * | 1999-09-30 | 2010-09-15 | 日本エア・リキード株式会社 | Exhaust gas treatment equipment |
| WO2010095512A1 (en) * | 2009-02-23 | 2010-08-26 | セントラル硝子株式会社 | Method and apparatus for decomposing nitrogen trifluoride |
| CN114761106A (en) * | 2019-12-13 | 2022-07-15 | 通用电器技术有限公司 | Use of transition metal oxides for removing fluorinated by-products from gases, apparatus and method for removing such by-products |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101094672B1 (en) | Method and apparatus for the treatment of nitrogen oxides using an ozone and catalyst hybrid system | |
| JPH03181316A (en) | Method for making nf3 harmless | |
| EP0792681A1 (en) | Process for cleaning a halogen containing gas | |
| JP2001054721A (en) | Method and device for decomposing fluorocarbons | |
| JP6379339B2 (en) | Gas purification method | |
| JPH0523814B2 (en) | ||
| KR100684201B1 (en) | Method for the abatement of waste gas comprising fluorine and its adsorption column device | |
| JPH0669528B2 (en) | How to remove nitrogen trifluoride | |
| JP2691927B2 (en) | How to remove harmful components | |
| JP3463873B2 (en) | How to recycle perfluoro compounds | |
| CN210993762U (en) | Tail gas treatment equipment | |
| JPH10216479A (en) | Detoxifying method of gaseous nitrogen trifluoride | |
| JP4459648B2 (en) | Method and apparatus for treating gas containing fluorine-containing compound | |
| EP0963779A1 (en) | Method of treating exhaust gases containing halogen based compound | |
| JP3957521B2 (en) | Oxidation catalyst and oxidation method and apparatus using the same | |
| JPH0710334B2 (en) | NF3 Exhaust gas treatment method and device | |
| JP3308365B2 (en) | How to remove nitrogen trifluoride gas | |
| JPH10286432A (en) | Purifying method of harmful gas | |
| JPS6312322A (en) | Treatment of exhaust gas | |
| JPH06134256A (en) | Purification of harmful gas | |
| JPH07116466A (en) | Method for decomposing fluorine-based etching gas or cleaning gas | |
| JP2007175595A (en) | Exhaust gas treatment facility and exhaust gas treatment method | |
| JP3271783B2 (en) | Nitrogen oxide removal agent and removal method | |
| JP2514144B2 (en) | NF3 Decomposition gas treatment method | |
| JP3515766B2 (en) | Removal method of carbon disulfide |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090615 Year of fee payment: 16 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100615 Year of fee payment: 17 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100615 Year of fee payment: 17 |