JP5257131B2 - 光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法 - Google Patents

光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法 Download PDF

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Publication number
JP5257131B2
JP5257131B2 JP2009040027A JP2009040027A JP5257131B2 JP 5257131 B2 JP5257131 B2 JP 5257131B2 JP 2009040027 A JP2009040027 A JP 2009040027A JP 2009040027 A JP2009040027 A JP 2009040027A JP 5257131 B2 JP5257131 B2 JP 5257131B2
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Japan
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master
optical element
wavelength
substrate
resist layer
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JP2009040027A
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Japanese (ja)
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JP2009199086A5 (enExample
JP2009199086A (ja
Inventor
惣銘 遠藤
和弥 林部
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Sony Corp
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Sony Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
JP2009040027A 2009-02-23 2009-02-23 光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法 Expired - Fee Related JP5257131B2 (ja)

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JP2009040027A JP5257131B2 (ja) 2009-02-23 2009-02-23 光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009040027A JP5257131B2 (ja) 2009-02-23 2009-02-23 光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2007009628A Division JP4539657B2 (ja) 2007-01-18 2007-01-18 反射防止用光学素子

Publications (3)

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JP2009199086A JP2009199086A (ja) 2009-09-03
JP2009199086A5 JP2009199086A5 (enExample) 2010-03-04
JP5257131B2 true JP5257131B2 (ja) 2013-08-07

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JP2009040027A Expired - Fee Related JP5257131B2 (ja) 2009-02-23 2009-02-23 光学素子の製造方法、ならびに光学素子の作製用原盤およびその製造方法

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JP (1) JP5257131B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8747683B2 (en) 2009-11-27 2014-06-10 Sharp Kabushiki Kaisha Die for moth-eye, and method for producing die for moth-eye and moth-eye structure
JP2012020389A (ja) * 2010-07-16 2012-02-02 Oji Paper Co Ltd 単粒子膜被覆ロールの製造方法、凹凸形成ロールの製造方法、凹凸形成フィルムの製造方法および単粒子膜被覆装置
KR101351596B1 (ko) * 2013-03-12 2014-01-15 주식회사 탑나노임프린팅 반사 방지재
JP5848320B2 (ja) * 2013-12-20 2016-01-27 デクセリアルズ株式会社 円筒基材、原盤、及び原盤の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003131390A (ja) * 2001-03-22 2003-05-09 Seiko Epson Corp 微細構造体の製造方法、電子装置の製造方法及び製造装置
JP2003187459A (ja) * 2001-12-19 2003-07-04 Sony Corp ディスク記録媒体
JP4197100B2 (ja) * 2002-02-20 2008-12-17 大日本印刷株式会社 反射防止物品
JP4393042B2 (ja) * 2002-08-05 2010-01-06 大日本印刷株式会社 防眩性反射防止部材、及び光学部材
JP2006251318A (ja) * 2005-03-10 2006-09-21 Matsushita Electric Ind Co Ltd 反射防止構造体を有する部材の製造方法
JP4539657B2 (ja) * 2007-01-18 2010-09-08 ソニー株式会社 反射防止用光学素子

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JP2009199086A (ja) 2009-09-03

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