JP5234230B1 - 着色樹脂組成物及び樹脂ブラックマトリクス基板 - Google Patents

着色樹脂組成物及び樹脂ブラックマトリクス基板 Download PDF

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Publication number
JP5234230B1
JP5234230B1 JP2012540196A JP2012540196A JP5234230B1 JP 5234230 B1 JP5234230 B1 JP 5234230B1 JP 2012540196 A JP2012540196 A JP 2012540196A JP 2012540196 A JP2012540196 A JP 2012540196A JP 5234230 B1 JP5234230 B1 JP 5234230B1
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Japan
Prior art keywords
resin composition
black
colored resin
pigment
black matrix
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JP2012540196A
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English (en)
Japanese (ja)
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JPWO2013031753A1 (ja
Inventor
欣彦 井上
涼介 相原
徹 岡沢
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Toray Industries Inc
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Toray Industries Inc
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Priority to JP2012540196A priority Critical patent/JP5234230B1/ja
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/04—Carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5455—Silicon-containing compounds containing nitrogen containing at least one group
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/28—Adhesive materials or arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
JP2012540196A 2011-08-29 2012-08-28 着色樹脂組成物及び樹脂ブラックマトリクス基板 Active JP5234230B1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012540196A JP5234230B1 (ja) 2011-08-29 2012-08-28 着色樹脂組成物及び樹脂ブラックマトリクス基板

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2011185668 2011-08-29
JP2011185668 2011-08-29
PCT/JP2012/071651 WO2013031753A1 (ja) 2011-08-29 2012-08-28 着色樹脂組成物及び樹脂ブラックマトリクス基板
JP2012540196A JP5234230B1 (ja) 2011-08-29 2012-08-28 着色樹脂組成物及び樹脂ブラックマトリクス基板

Publications (2)

Publication Number Publication Date
JP5234230B1 true JP5234230B1 (ja) 2013-07-10
JPWO2013031753A1 JPWO2013031753A1 (ja) 2015-03-23

Family

ID=47756238

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JP2012540196A Active JP5234230B1 (ja) 2011-08-29 2012-08-28 着色樹脂組成物及び樹脂ブラックマトリクス基板

Country Status (5)

Country Link
JP (1) JP5234230B1 (zh)
KR (1) KR101846977B1 (zh)
CN (1) CN103765254B (zh)
TW (1) TWI512403B (zh)
WO (1) WO2013031753A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5327345B2 (ja) * 2012-02-23 2013-10-30 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材。
JP6182999B2 (ja) * 2013-06-25 2017-08-23 日油株式会社 カラーフィルター保護膜用熱硬化性樹脂組成物、及びその硬化膜を備えるカラーフィルター
CN105378615B (zh) * 2013-07-25 2019-05-31 东丽株式会社 触控面板用负型感光性白色组合物、触控面板及触控面板的制造方法
JP6373571B2 (ja) * 2013-11-14 2018-08-15 東京応化工業株式会社 ブラックカラムスペーサ形成用感光性樹脂組成物
KR20160071994A (ko) 2014-12-12 2016-06-22 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치
KR20170094419A (ko) 2014-12-15 2017-08-17 메르크 파텐트 게엠베하 편광 광 방출 디바이스
KR20160078540A (ko) 2014-12-24 2016-07-05 세명일렉트로닉스 주식회사 잉크젯 프린팅용 도료 조성물
KR20180030644A (ko) 2015-07-17 2018-03-23 메르크 파텐트 게엠베하 발광성 입자, 잉크 제제, 중합체 조성물, 광학 디바이스, 이들의 제조 및 발광성 입자의 이용
JP7034908B2 (ja) 2015-09-29 2022-03-14 メルク パテント ゲーエムベーハー 感光性組成物および色変換フィルム
CN108883622A (zh) 2016-03-31 2018-11-23 默克专利有限公司 颜色转换片和光学器件
WO2018037913A1 (ja) * 2016-08-22 2018-03-01 富士フイルム株式会社 遮光性組成物、遮光膜、固体撮像素子、カラーフィルタ、及び、液晶表示装置
US20200017763A1 (en) 2016-12-20 2020-01-16 Merck Patent Gmbh Optical medium and an optical device
WO2021152411A1 (en) * 2020-01-29 2021-08-05 3M Innovative Properties Company Retroreflective element and retroreflective film

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003165867A (ja) * 2001-11-28 2003-06-10 Hitachi Chemical Dupont Microsystems Ltd シランカップリング剤
JP2006265349A (ja) * 2005-03-23 2006-10-05 Lintec Corp 感圧接着剤組成物及び光学部材
JP2006316032A (ja) * 2005-05-16 2006-11-24 Asahi Kasei Electronics Co Ltd シランカップリング剤
WO2008065944A1 (fr) * 2006-11-30 2008-06-05 Toray Industries, Inc. Composition de siloxane photosensible, film durci formé à partir de celle-ci et dispositif ayant le film durci
WO2010055154A1 (de) * 2008-11-17 2010-05-20 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Dialkoxy- oder dihydroxyphenylreste enthaltende silane, daraus hergestellte klebstoffe sowie verfahren zur herstellung der silane und der klebstoffe
WO2011114995A1 (ja) * 2010-03-17 2011-09-22 東レ株式会社 シランカップリング剤、ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5281357B2 (ja) 2008-10-23 2013-09-04 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜
JP5623886B2 (ja) * 2009-12-09 2014-11-12 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003165867A (ja) * 2001-11-28 2003-06-10 Hitachi Chemical Dupont Microsystems Ltd シランカップリング剤
JP2006265349A (ja) * 2005-03-23 2006-10-05 Lintec Corp 感圧接着剤組成物及び光学部材
JP2006316032A (ja) * 2005-05-16 2006-11-24 Asahi Kasei Electronics Co Ltd シランカップリング剤
WO2008065944A1 (fr) * 2006-11-30 2008-06-05 Toray Industries, Inc. Composition de siloxane photosensible, film durci formé à partir de celle-ci et dispositif ayant le film durci
WO2010055154A1 (de) * 2008-11-17 2010-05-20 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Dialkoxy- oder dihydroxyphenylreste enthaltende silane, daraus hergestellte klebstoffe sowie verfahren zur herstellung der silane und der klebstoffe
WO2011114995A1 (ja) * 2010-03-17 2011-09-22 東レ株式会社 シランカップリング剤、ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材

Also Published As

Publication number Publication date
WO2013031753A1 (ja) 2013-03-07
KR101846977B1 (ko) 2018-04-09
TW201319753A (zh) 2013-05-16
TWI512403B (zh) 2015-12-11
KR20140061346A (ko) 2014-05-21
JPWO2013031753A1 (ja) 2015-03-23
CN103765254B (zh) 2016-04-06
CN103765254A (zh) 2014-04-30

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