JP5188836B2 - Manufacturing method of crystal unit - Google Patents

Description

The present invention relates to a process for preparing are that water crystal oscillator used in electronic equipment.

Conventionally, crystal resonators have been used in electronic devices. FIG. 12 is an exploded perspective view showing an example of a conventional crystal unit.
As shown in FIG. 12, the conventional crystal resonator 200 is made of, for example, a crystal resonator element 220 in which a vibration portion 222 in which an excitation electrode 223 is formed and a frame portion 221 surrounding the excitation portion 223 are integrally formed, and glass. The main body 210 is mainly composed of a base body 210 having a recess K1 on the other main surface and an external terminal G on the other main surface, and a lid body 230 made of glass and having a recess K2.
The crystal resonator 200 having this structure is joined so that the recesses K1 and K2 of the base body 210 and the lid body 230 face the excitation electrode 223 side of the vibration part 222 and the frame part 221 is sandwiched between the base body 210 and the lid body 230. (For example, refer to Patent Document 1).
The crystal resonator 200 having such a structure includes a connection portion 225 in which the vibration portion 222 is connected to the frame portion 221 at two locations, and is configured so that vibration energy does not leak to the frame portion 221 side. Has been.
In the case of the crystal resonator 200 having such a structure, anodic bonding may be used for bonding the frame portion 221 and the base portion 210 and for bonding the frame portion 221 and the lid portion 230 (see, for example, Patent Document 2). In this case, it is necessary to provide a metal film (not shown) on both surfaces of the frame portion 221 on the bonding surface.
In addition, in the quartz resonator element used in the quartz resonator, a quartz resonator element having a structure in which a groove is provided on one main surface of the quartz resonator and a recess is provided on the other principal surface is proposed. ing. The quartz resonator element is formed such that the thickness from the main surface in the concave portion parallel to the other main surface to the one main surface is smaller than the depth of the groove (for example, see Patent Document 3).

JP 2006-148758 A Japanese Patent No. 3390348 JP 2004-328028 A

However, the crystal resonator 200 having such a structure has a shape in a plan view, for example, a size in which the length in the long side direction is 2.0 mm or less and the length in the short side direction is 1.6 mm or less. When manufactured in a small size, the connection part 225 between the frame part 221 and the vibration part 222 of the crystal resonator element 220 becomes small, and the impact resistance against dropping may be reduced.
Further, a lid wafer (not shown) formed by arranging a plurality of lids 230 and a plurality of bases 210 are arranged on a quartz wafer formed by arranging a plurality of quartz resonator elements 220. When a base wafer (not shown) formed in this manner is bonded by anodic bonding, the bonded wafer may be warped due to a difference in expansion coefficient between crystal and glass.
Further, in the situation where miniaturization is progressing, the thickness of the quartz wafer is as thin as 60 μm to 10 μm, and in the state where the frame portion 221 and the vibrating portion 222 are connected only at a predetermined portion, the handling is bad and the quartz wafer Sometimes cracked.
Further, in the piezoelectric vibration element having the structure proposed in Patent Document 3, there is a possibility that the recess and the groove communicate with each other, and it is difficult to form the recess and process management of the groove.

Therefore, in the present invention to solve the aforementioned problems, while confining the vibration energy to the vibrating portion, and to provide a method for producing easily and to that water crystal oscillator manufacture.

In order to solve the above-mentioned problems , the present invention provides an excitation electrode and two pairs of routing patterns extending from the excitation electrode to one end of the crystal piece on both main surfaces of a square crystal piece. A method of manufacturing a crystal resonator comprising a crystal resonator element, a lid, and a base, wherein the crystal wafer having the crystal resonator element connected thereto is provided with a cylindrical recess for routing, and one of the crystal resonator elements Forming a recess that surrounds the excitation electrode and the routing pattern that is shallower than the cylindrical recess that surrounds the excitation electrode and the portion to be the routing pattern on the main surface, and the excitation electrode in the recess And a first metal film forming step of providing a metal film serving as the routing pattern at a predetermined position including the inside of the cylindrical recess, and a lid wafer in which the lid is continuous so as to cover the recess. Directly bonded lid wafer contact An inner metal film exposing step of grinding or polishing the crystal wafer to expose the metal film in the cylindrical recess, and a groove forming step of forming a groove along the edge of the recess in the crystal wafer, A second metal film forming step of providing the excitation electrode and the routing pattern on the quartz wafer; a position corresponding to the recess of the quartz wafer; and a position corresponding to an end of the routing pattern A base wafer joining step of directly joining the base wafer having the through-holes connected to the crystal wafer to the crystal wafer, and an external terminal metal provided with a metal film serving as an external terminal so as to be connected to the lead pattern on the base wafer The method includes a film forming step and a singulation step for dividing each crystal resonator into individual pieces.

  According to another aspect of the present invention, there is provided a quartz resonator element in which excitation electrodes and two pairs of routing patterns extending from the excitation electrodes to one end of the quartz piece are provided on both main surfaces of a square quartz piece. A method of manufacturing a crystal resonator comprising a lid and a base, wherein the crystal wafer including the crystal resonator elements is provided with a cylindrical concave portion for routing, and the excitation is provided on one main surface of the crystal resonator element. A recess forming step of forming a recess surrounding the excitation electrode and the routing pattern, which is shallower than the cylindrical recess surrounding the electrode and the portion to be the routing pattern; and the excitation electrode and the cylindrical recess in the recess A first metal film forming step of providing a metal film to be the routing pattern at a predetermined position including: a substrate wafer in which the substrate having a through hole at a position corresponding to an end of the routing pattern is connected to the recess To cover the above A substrate wafer bonding step for directly bonding to a crystal wafer, an external terminal metal film forming step for providing a metal film serving as an external terminal so as to connect to the routing pattern on the substrate wafer, and grinding or polishing the crystal wafer. An inner metal film exposing step of exposing the metal film in the cylindrical recess, a groove forming step of forming a groove along the edge of the recess in the crystal wafer, the excitation electrode and the routing pattern on the crystal wafer A second metal film forming step of providing a lid wafer bonding step of directly bonding a lid wafer having a lid having a recess at a position corresponding to the recess of the quartz wafer to the quartz wafer, And a singulation process for dividing the crystal resonator into individual pieces.

  Moreover, this invention may provide the said groove part inside the said crystal piece rather than the said recessed part.

According to such a method of manufacturing a crystal resonator, a portion excluding the portion where the lid and base of the crystal resonator element are joined, that is, the inner portion surrounded by the recess and the groove that surround the excitation electrode and the routing pattern. The vibration energy can be confined in the vibration part, and even when a plurality of crystal vibration elements are arranged on the crystal wafer, the crystal vibration element maintains a flat shape without a notch separating the vibration part and the frame part. Therefore, cracking is prevented and handling becomes good. Therefore, the crystal resonator of the present invention can be easily manufactured.
In addition, since the lid and the base are bonded to the crystal resonator element using direct bonding, a crystal resonator without warping can be obtained.

  In addition, since the lid or base is bonded simultaneously with the formation of the crystal resonator element and the hermetic sealing is performed after the crystal resonator element, the lid and the substrate are completely bonded, the crystal resonator is manufactured. Thereby, the productivity of the crystal resonator element can be improved.

  Moreover, energy confinement according to a predetermined | prescribed frequency can be performed by providing the groove part inside the said crystal piece rather than a recessed part.

  Next, the best mode for carrying out the present invention (hereinafter referred to as “embodiment”) will be described in detail with reference to the drawings as appropriate. Note that each component is exaggerated for easy understanding of the state.

(First embodiment)
FIG. 1 is an exploded perspective view showing an example of a crystal resonator according to a first embodiment of the present invention. FIG. 2 is a schematic diagram showing the external terminal side of the crystal resonator according to the first embodiment of the present invention. 3A is a conceptual diagram showing a crystal wafer, FIG. 3B is a conceptual diagram showing an example of a state in which a recess is provided in the crystal wafer, and FIG. 3C is a diagram in which a metal film is provided in the recess of the crystal wafer. FIG. FIG. 4A is a conceptual diagram showing a state in which a lid wafer is bonded to a crystal wafer, FIG. 4B is a conceptual diagram showing an example of a state in which a metal film of the crystal wafer is exposed, and FIG. It is a conceptual diagram which shows an example of the state which provided the groove part in the crystal wafer. FIG. 5A is a conceptual diagram showing a state before the base wafer is bonded to the crystal wafer, and FIG. 5B is a conceptual diagram showing a state where the base wafer is bonded to the crystal wafer. FIG. 6A is a conceptual diagram showing an example of a state in which external terminals are provided on a base wafer, and FIG.

As shown in FIG. 1, the crystal resonator 100 according to the embodiment of the present invention mainly includes a base body 10, a crystal resonator element 20, and a lid 30.
The crystal unit 100 according to the embodiment of the present invention is manufactured by being separated from the wafer state.

  The base 10 is made of glass and has a rectangular shape in plan view having the same dimensions as the crystal resonator element 20. The substrate 10 has a recess K 1 on the main surface side to be bonded to the crystal resonator element 20, and an external terminal on the other main surface. G is provided. Moreover, it has two pairs of 2nd through-holes H in the recessed part K1 in the position facing the edge part T (refer FIG. 1) of the routing pattern 23 provided in two pairs mentioned later. . A metal film is formed in the second through hole H, and the lead pattern 23 and the external terminal G are provided by the metal film. As shown in FIGS. 6A and 6B, the substrate 10 includes a lid wafer W3 in which a plurality of lids 30 are provided on a quartz wafer W1 having a predetermined size and a plurality of substrates 10. After being bonded to the base wafer W <b> 2 provided with, a piece is formed.

The lid body 30 is made of glass, and is formed in a plate shape having a rectangular shape in plan view with the same size as the crystal resonator element 20. 6A and 6B, the lid 30 includes a lid wafer W3 in which a plurality of lids 30 are provided on a quartz wafer W1 having a predetermined size, and a plurality of substrates. After the substrate wafer W <b> 2 provided with 10 is bonded, it is formed into individual pieces.
The bonding surface between the base wafer W2 and the lid wafer W3 is a mirror surface.

  For example, a rectangular AT-cut crystal piece 21 is used as the crystal resonator element 20 and is formed to have a predetermined thickness. The crystal resonator element 20 is an individual part in which a plurality of crystal wafers W1 (see FIG. 6A) having a predetermined size are connected in a matrix, and a plurality of lids 30 are provided. The lid wafer W3 and the substrate wafer W2 provided with a plurality of substrates are joined and then separated into individual pieces (see FIG. 6B).

Further, as shown in FIGS. 1 and 6B, the crystal resonator element 20 becomes an excitation electrode 22 and a lead pattern 23 along the edge of the joint surface joined to the base 10 on one main surface thereof. A recess 25 is provided so as to surround the portion. The recess 25 is provided so that the excitation electrode 22 and the routing pattern 23 are provided therein, that is, so as to surround the excitation electrode 22 and the routing pattern 23. The area of the concave portion 25 is provided so as to be divided into a portion formed as a size of a crystal resonator element used in a flat plate state and a portion for providing the routing pattern 23. Therefore, the crystal vibrating element 20 is formed integrally with the flat vibrating portion and the routing portion having the same thickness, and the frame portion having a thickness larger than this is continuous without providing a cut. Is formed. Further, the groove 24 is provided in an annular shape on the other main surface of the crystal resonator element 20 along the edge of the recess 25. In addition, this groove part 24 is provided so that it may be located inside the recessed part K1 provided in the base | substrate 10. FIG.
Further, the first through hole 21A is provided in the recess 25 at a position that becomes the end T (see FIG. 1) of the routing pattern 23B. The first through hole 21A is provided at a position corresponding to the position of the end T (see FIG. 1) of the routing pattern 23 provided on the surface opposite to the surface facing the base body 10.
The shape of the first through hole 21A may be a cylindrical shape, a truncated cone shape, or the like.

  As shown in FIGS. 3A and 3B, the recess 25 and the first through hole 21A are provided by a manufacturing method described later. Although details will be described later, in the state of the quartz wafer W1, the cylindrical recess 21A is formed by sandblasting or the like. Thereafter, as shown in FIG. 3C, the recess 25 is formed by photolithography and etching techniques so as to be shallower than the cylindrical recess 21A from the side where the cylindrical recess 21A is formed. After providing an excitation electrode 22 made of a first metal film, which will be described later, and a routing pattern 23, the quartz wafer W1 is ground to such an extent that the first metal film in the cylindrical recess 21A is exposed with the recess 25 covered. I do. Thereby, the cylindrical recess 21A becomes the first through hole 21A with the first metal film inside (the recess forming step).

  As shown in FIG. 1, an excitation electrode 22 is provided on both main surfaces of the crystal piece 21, and two pairs of routing patterns 23 (23A, 23B) extending from the excitation electrode 22 to one end of the crystal piece 21. ) And are provided. For example, when the crystal piece 21 is formed in a rectangular shape, the routing pattern 23 is formed to extend to the end portion on the short side.

  In addition, the routing pattern 23 is provided on each of the excitation electrodes 22 provided on both main surfaces of the crystal piece 21 to form a pair. Further, the end portion T (see FIG. 1) of one routing pattern 23B is routed to the surface side where the other routing pattern 23A is provided through the first through hole 21A provided in the crystal piece 21. ing.

Therefore, the end portions T (see FIG. 1) of the two pairs of routing patterns 23 (23A, 23B) are positioned side by side on the end portion side of one main surface of the crystal piece 21.
In addition, as shown in FIG. 2, the two pairs of routing patterns 23 (23A, 23B) are provided on the crystal piece 21 so as to reach a position overlapping a bonding surface of the base 10 described later.
The routing pattern 23 (23 </ b> A, 23 </ b> B) is provided and routed in a groove provided in the crystal piece 21 of the crystal resonator element 20 in the bonding surface between the base 10 and the lid 30. . Thereby, since the drawing pattern 23 does not protrude from the main surface of the crystal piece 21, the direct bonding between the crystal wafer W1 and the base body W2 and between the crystal wafer W1 and the lid wafer W3 can be easily performed. It has become.

The excitation electrode 22 and the routing pattern 23 are provided by a manufacturing method described later.
As shown in FIG. 3C, the excitation electrode 22 and the lead pattern 23 (23B) are formed by sputtering or vapor deposition on the surface of the exposed quartz wafer W1 where the protective first wafer WA is not stuck and the cylindrical recess 21A. A first metal film is provided (first metal film forming step). That is, after the first metal film is provided on the entire surface of the exposed quartz wafer W1, the excess first metal film on the quartz wafer W1 is removed by using a photolithography technique or an etching technique, and the excitation electrode 22 is pulled. The first metal film is left on the exposed surface of the crystal wafer W1 so as to be the turning pattern 23 (23B). As a result, the first metal film serving as the routing pattern 23 is provided in a predetermined position including the excitation electrode 22 and the cylindrical recess 21A in the recess 25 (first metal film forming step).

In this state, as shown in FIGS. 4A and 4B, a lid wafer W3 in which the lid 30 is connected to the crystal wafer W1 is directly bonded (lid wafer bonding step). The lid wafer W3 has a plate shape, serves as a lid for the crystal unit 100, and serves to protect the surface of the attached crystal wafer W1. In this direct bonding, when the base wafer W2 is bonded to the quartz wafer W1, bonding is performed at normal temperature and normal pressure.
For example, in this direct bonding, the bonding surface of the crystal wafer W1 and the bonding surface of the lid wafer W3 are cleaned in advance with an oxidizing liquid such as a sulfuric acid hydrogen peroxide mixed solution so that a hydrophilic treatment is performed. In addition, by superimposing the bonding surface of the crystal wafer W1 and the bonding surface of the lid wafer W3, a hydrogen bond between hydroxyl groups occurs at the interface between the crystal wafer W1 and the lid wafer W3, and the bonded state is obtained. Become.
Alternatively, direct bonding may be performed at room temperature.
For example, in a state where, for example, Ar (argon) gas is jetted into the vacuum chamber, the bonding surface of the crystal wafer W1 and the bonding surface of the lid wafer W3 are shaved by activation by plasma generated by an ion gun. After that, the bonded surface of the crystal wafer W1 and the bonded surface of the lid wafer W3 are overlapped to be in a bonded state.
When the lid wafer W3 is bonded to the crystal wafer W1, the lid wafer W3 and the crystal wafer W1 are overlapped and directly bonded with the bonding surfaces of the respective lid bodies 30 facing the crystal wafer W1 side. .

As shown in FIG. 4B, in the state where the lid wafer W3 is bonded to the crystal wafer W1, the crystal wafer W1 is ground or polished to expose the metal film in the cylindrical recess 21A (internal metal film). Exposure process). Note that the bonding surface of the crystal wafer W1 is a mirror surface.
Thereby, 21 A of cylindrical recessed parts become the 1st through-hole 21A which has a 1st metal film inside.
When the internal metal film exposing step is performed in this state, the crystal wafer W1, that is, each crystal piece 21 (see FIG. 1) can be formed to a predetermined thickness.

Next, as shown in FIG. 4C, a groove portion 24 is formed on the other main surface of the crystal wafer W1 along the edge of the recess 25 provided on one main surface of the crystal wafer W1 (groove portion forming step). .
Similarly to the recess 25, the groove is also formed by a photolithography technique and an etching technique.

After the groove 24 is formed, as shown in FIG. 5A, the excitation electrode 22 and the routing pattern 23 (23A) are formed by sputtering or vapor deposition on the exposed surface of the crystal wafer W1 and surrounded by the groove 24. ) Is provided (second metal film forming step).
That is, after the second metal film is provided on the entire exposed surface of the quartz wafer W1, the excess second metal film on the quartz wafer W1 is removed by using a photolithography method or an etching method, and the excitation electrode 22 is pulled. The second metal film is left on the exposed surface of the crystal wafer W1 so as to be the turning pattern 23 (23A).

  If it does in this way, the excitation electrode 22 and the routing pattern 23 (23A, 23B) can be easily formed in the part used as each crystal piece 21 of the crystal wafer W1. In addition, the 1st metal film and 2nd metal film which are used for the excitation electrode 22 and the routing pattern 23 (23A, 23B) are comprised from the metal film which consists of the same material.

  As shown in FIG. 5A, after providing the excitation electrode 22 and the routing pattern 23 on both main surfaces of the crystal wafer W1, the recess K1 is provided at a position corresponding to the recess 25 of the crystal wafer W1, A substrate wafer W2 in which a substrate 10 having a second through hole H is connected to a position corresponding to the end T (see FIG. 1) of the routing pattern 23 is directly bonded to the crystal wafer W1 (substrate wafer bonding step).

  When bonding the base wafer W2 to be the base 10 and the crystal wafer W1 to be the crystal vibrating element 20, as shown in FIGS. 5A and 6A, the base 10 and the base 10 The base wafer W2 and the crystal wafer W1 are overlaid with the concave portion K1 provided in the portion to be directed toward the crystal wafer W1.

In this state, as shown in FIGS. 5A and 5B, for example, direct bonding is performed at normal temperature and normal pressure (base wafer bonding step).
For example, in this direct bonding, the bonding surface of the crystal wafer W1 and the bonding surface of the base wafer W2 are washed in advance with an oxidizing liquid such as a sulfuric acid hydrogen peroxide mixed solution so that a hydrophilic treatment is performed. In addition, by superimposing the bonding surface of the crystal wafer W1 and the bonding surface of the base wafer W2, hydrogen bonding between the hydroxyl groups occurs at the interface between the crystal wafer W1 and the base wafer W2, and the bonding state is established. Moreover, even if it joins by normal pressure in the atmosphere of inert gas which plays a role as antioxidant gas, such as nitrogen gas and argon gas, even if it joins by a normal pressure, the excitation electrode 22 and the drawing pattern 23 are comprised. It is possible to prevent the metal film from being oxidized. In this way, by performing direct bonding at normal temperature and normal pressure, it is possible to prevent the occurrence of warpage because high heat is not applied to the crystal wafer W1. Also, by performing direct bonding in such an environment at normal temperature and normal pressure, temperature management and pressure management become unnecessary, so workability is improved and the manufacture of the crystal unit can be facilitated. .
Alternatively, direct bonding may be performed at room temperature.
For example, in a state where Ar (argon) gas is jetted into the vacuum chamber, for example, the bonding surface of the crystal wafer W1 and the bonding surface of the base wafer W2 are shaved by activation by plasma generated by an ion gun. Thereafter, the bonded surface of the crystal wafer W1 and the bonded surface of the base wafer W2 are overlapped to be bonded. In this way, by performing direct bonding in normal temperature and in a vacuum atmosphere, it is possible to prevent the occurrence of warpage because high heat is not applied to the crystal wafer W1. In addition, by performing direct bonding in an environment of such a normal temperature and in a vacuum atmosphere, temperature management becomes unnecessary, so that workability can be improved and the crystal resonator can be easily manufactured.
In addition, by performing the external terminal formation process to be described later, heat is applied to the crystal wafer W1 and the base wafer W2 to increase the bonding strength.

As shown in FIG. 6A, a metal film to be an external terminal G is provided on the base wafer W2 so as to be connected to the routing pattern 23 (external terminal metal film forming step).
After the base wafer W2 and the quartz wafer W1 are bonded, external terminals G are provided on the exposed main surface of the base wafer W2. As described above, the external terminal G is provided on the main surface opposite to the main surface on which the recess K1 of the base body 10 is provided, and is provided so that the second through hole H is located inside. The metal film that becomes the external terminal G is also formed inside the second through hole H. This metal film is connected to the end T (see FIG. 1) of the routing pattern 23A and the end routed through the first through hole 21A of the routing pattern 23B. By forming this metal film, the recess 25 is hermetically sealed.
The external terminal G can be formed using a technique such as vapor deposition, sputtering, electrolytic plating, or electroless plating.

As shown in FIG. 6B, after the base wafer W2 is bonded to the crystal wafer W1, it is singulated into each crystal resonator 100 (individualization step).
When the base wafer W2 is bonded to the crystal wafer W1, the lid wafer W3 is bonded to one main surface of the crystal wafer W1, and the lid wafer W3 is bonded to the other main surface. That is, a plurality of crystal units 100 are provided on one wafer. The connected crystal resonators 20 are separated into individual crystal resonators (see FIG. 7B). Thereby, a plurality of crystal units 100 can be manufactured simultaneously.

Thus, since the manufacturing method of the piezoelectric vibrator according to the embodiment of the present invention is configured, the handling of the crystal wafer W1 is good, and the warpage at the time of bonding can be prevented. Therefore, according to the method for manufacturing a piezoelectric vibrator of the present invention, it is possible to easily manufacture a crystal vibrator.
Further, such a crystal resonator 100 can confine vibration energy, and since the four sides of the crystal resonator element 20 are joined by the lid body 30 and the base body 10, impact resistance when dropped is provided. Can be improved.

(Second embodiment)
FIG. 7 is an exploded perspective view showing an example of the crystal resonator according to the second embodiment of the present invention. FIG. 8A is a conceptual diagram showing a state before the base wafer is bonded to the crystal wafer, FIG. 8B is a conceptual diagram showing a state where the base wafer is bonded to the crystal wafer, and FIG. 8C is a base wafer. It is a conceptual diagram which shows an example of the state which provided the external terminal in. FIG. 9A is a conceptual diagram showing an example of a state in which the metal film of the crystal wafer is exposed, FIG. 9B is a conceptual diagram showing an example of a state in which the metal film is provided on the crystal wafer, and FIG. It is a conceptual diagram which shows the state before joining a cover body wafer to a crystal wafer. FIG. 10A is a conceptual diagram illustrating a state in which a lid wafer is bonded to a crystal wafer, and FIG. 10B is a conceptual diagram illustrating a state in which the lid wafer is separated.
As shown in FIG. 7, in the piezoelectric vibrator 101 according to the second embodiment of the present invention, the base 10 is formed on a flat plate, the concave portion K <b> 2 is formed in the lid 30, and the main surface of the crystal resonator element 20 is formed. Of these, the substrate 10 is joined to the side where the recess 25 is provided, and the lid 30 is joined to the side where the groove 24 is provided.

  Here, the base 10 is formed in a flat plate shape, and a second through hole H is provided at a position facing the end T (see FIG. 7) of the routing pattern 23 of the crystal resonator element 20.

At this time, the manufacturing method of the crystal unit is as follows.
After opening the cylindrical recess 21A in the crystal wafer W1, the recess 25 is formed (recess forming step), and the excitation electrode 23 and the lead pattern 23 are provided in the recess 25 by a metal film (first metal film forming step). Here, the routing pattern 23 is also provided in the cylindrical recess 21A (see FIGS. 3A to 3C). Next, as shown in FIGS. 8A and 8B, the base wafer W1 is bonded to the crystal wafer W1 so as to cover the recess 25 (base wafer bonding step). In this state, as shown in FIG. 8C, the external terminal G is provided at a position to be the base 10 of the base wafer W2 (external terminal metal film forming step). By sealing the recesses 25 in this order, it is possible to prevent liquids such as etching performed thereafter from entering the recesses 25.

  Next, as shown in FIG. 8B, the quartz wafer W1 is ground or polished to form the cylindrical recess 21A in the first through hole 21A, and the metal film in the cylindrical recess 21A is exposed (internal Metal film exposure process). In this state, as shown in FIG. 9A, the groove portion 24 is formed along the edge of the concave portion 25 in the exposed crystal wafer W1 (groove portion forming step). As shown in FIG. 9B, the excitation electrode 22 and the lead pattern 23 are provided in the inner portion surrounded by the groove 24 (second metal film forming step), and FIG. 9C and FIG. As shown, the lid wafer W3 is directly bonded to the crystal wafer W1 and the recess K2 is directed to the crystal wafer W1 (cover wafer bonding step). Thereafter, since the base wafer W2 and the lid wafer W3 are bonded to the crystal wafer W1, they are separated into individual crystal resonators 101 as shown in FIG.

As described above, even when the method for manufacturing a crystal resonator according to the embodiment of the present invention is configured, the crystal wafer W1 is handled well and warping during bonding can be prevented. Therefore, according to the crystal resonator manufacturing method of the present invention, the crystal resonator 101 can be easily manufactured.
Further, such a crystal resonator 101 can confine vibration energy, and since the four sides of the crystal resonator element 20 are joined by the lid body 30 and the base body 10, impact resistance when dropped is provided. Can be improved.

(Modification)
Note that modifications of the crystal resonator according to each embodiment of the present invention will be described.
The groove width of the groove portion 24 provided in the crystal resonator element 20 may be widened to a predetermined width.
Thereby, the vibration energy can be confined in the inside surrounded by the groove portion at a predetermined frequency in the same manner as the quartz resonator element beveled into a plate-like quartz piece.
(Further modifications)

Further modifications will be described.
As shown in FIG. 11 (a), the groove provided in the crystal resonator element may have a structure in which the groove portion is provided only in the portion to be vibrated along at least three sides of the edge of the recess provided in the crystal resonator element. . In this case, by providing the excitation electrode in the portion surrounded by the groove portion, it becomes a portion that vibrates, and by providing the groove portion, the energy confinement of vibration can be improved.
Furthermore, as shown in FIG. 11 (b), the groove width of the groove portion may be widened with a predetermined width. In this case, excitation electrodes may be provided in the inside of the groove and the portion surrounded by the groove. A portion surrounded by the groove has a plano-convex shape. In addition, when an excitation electrode is provided in the plano-convex shape portion, it becomes a portion that vibrates, and the same energy confinement as when a flat crystal piece is beveled can be improved. Also, there is no sound leakage.
Further, as shown in FIG. 11 (c), the contour of the groove is formed so that the outer side is a quadrangle and the inner side is a circle, and the portion surrounded by the circular contour of the groove and the inside of the groove are excited. An electrode may be provided. A portion surrounded by the inner contour of the groove portion has a plano-convex shape. In addition, when an excitation electrode is provided in the plano-convex shape portion, it becomes a portion that vibrates, and the same energy confinement as when a flat crystal piece is beveled can be improved. Moreover, acoustic leakage can be eliminated.

As mentioned above, although embodiment of this invention was described, this invention is not limited to the said embodiment. For example, the frequency adjustment step (frequency adjustment step) may be performed in a state where the excitation electrode and the lead pattern are provided on both main surfaces of the quartz wafer.
This frequency adjustment is performed in a state where the probe of the measuring instrument is applied because two pairs of routing patterns are provided side by side on one main surface in both the first embodiment and the second embodiment. Can be maintained. Therefore, frequency adjustment can be easily performed.
The frequency adjustment is performed by scraping the excitation electrode 22 or attaching a metal film. For example, the frequency can be adjusted by removing a part of the excitation electrode 22 by a technique such as laser or ion milling, or the frequency can be adjusted by providing a metal film on a part of the excitation electrode 22 by vapor deposition or the like. Yes (not shown).
The crystal resonator according to each embodiment of the present invention has, for example, a shape in which the length in the long side direction is 2.5 mm and the length in the short side direction is 2.0 mm, and the length in the long side direction is 2. When applied to a shape with a length of 0 mm and a short side direction of 1.6 mm, a length of a long side direction of 1.6 mm and a length of the short side direction of 1.2 mm, or a smaller shape Also effective.

1 is an exploded perspective view showing an example of a crystal resonator according to a first embodiment of the present invention. It is a schematic diagram which shows the external terminal side of the crystal resonator which concerns on 1st embodiment of this invention. (A) is a conceptual diagram which shows a crystal wafer, (b) is a conceptual diagram which shows an example of the state which provided the recessed part in the crystal wafer, (c) is the state which provided the metal film in the recessed part of the crystal wafer It is a conceptual diagram which shows an example. (A) is a conceptual diagram which shows the state which joined the cover body wafer to the quartz wafer, (b) is a conceptual diagram which shows an example of the state which exposed the metal film of the quartz wafer, (c) is a quartz crystal It is a conceptual diagram which shows an example of the state which provided the groove part in the wafer. (A) It is a conceptual diagram which shows the state before joining a base wafer to a crystal wafer, (b) is a conceptual diagram which shows the state which joined the base wafer to the crystal wafer. (A) is a conceptual diagram which shows an example of the state which provided the external terminal in the base wafer, (b) is a conceptual diagram which shows the state made into the piece, and is AA sectional drawing of FIG. It is a disassembled perspective view which shows an example of the crystal oscillator based on 2nd embodiment of this invention. (A) is a conceptual diagram which shows the state before joining a base wafer to a crystal wafer, (b) is a conceptual diagram which shows the state which joined the base wafer to the crystal wafer, (c) is an external view to a base wafer. It is a conceptual diagram which shows an example of the state which provided the terminal. (A) is a conceptual diagram which shows an example of the state which exposed the metal film of the crystal wafer, (b) is a conceptual diagram which shows an example of the state which provided the metal film in the crystal wafer, (c) Crystal wafer It is a conceptual diagram which shows the state before joining a cover body wafer. (A) is a conceptual diagram which shows the state which joined the cover body wafer to the quartz wafer, (b) is a conceptual diagram which shows the state made into the piece. (A) is a figure which shows an example of the modification of a quartz-crystal vibration element, (b) is a figure which shows an example of the other modification of a quartz-crystal vibration element, (c) Still another modification of a quartz-crystal vibration element It is a figure which shows an example. It is a disassembled perspective view which shows an example of the conventional crystal oscillator.

Explanation of symbols

DESCRIPTION OF SYMBOLS 100,101 Crystal oscillator 10 Base | substrate 20 Crystal oscillator 30 Lid 21 Crystal piece 21A 1st through-hole (cylindrical recessed part)
22 Excitation electrode 23, 23A, 23B Route pattern 24 Groove 25 Recess W1 Crystal wafer W2 Base wafer W3 Cover wafer WA Protection first wafer WB Protection second wafer K1, K2 Recess H Second through hole G External terminal

Claims (3)

A quartz resonator element provided with excitation electrodes on both main surfaces of a rectangular quartz piece and two pairs of routing patterns extending from the excitation electrodes to one end of the quartz piece; a lid and a base; A method of manufacturing a crystal unit comprising:
The crystal wafer having the crystal resonator element connected thereto is provided with a cylindrical recess for routing, and is shallower than the cylindrical recess that surrounds the excitation electrode and the portion to be the routing pattern on one main surface of the crystal resonator element. A recess forming step for forming a recess surrounding the excitation electrode and the routing pattern;
A first metal film forming step of providing a metal film serving as the routing pattern at a predetermined position including the excitation electrode and the cylindrical recess in the recess;
A lid wafer bonding step of directly bonding the lid wafer in which the lid body is continuous so as to cover the concave portion to the crystal wafer;
An internal metal film exposing step of grinding or polishing the quartz wafer to expose the metal film in the cylindrical recess;
A groove forming step of forming a groove along the edge of the recess in the crystal wafer;
A second metal film forming step of providing the excitation electrode and the routing pattern on the quartz wafer;
Substrate wafer bonding for directly bonding a base wafer having a concave portion at a position corresponding to the concave portion of the crystal wafer and having the base having a through hole at a position corresponding to an end of the routing pattern to the crystal wafer. Process,
An external terminal metal film forming step of providing a metal film serving as an external terminal so as to be connected to the routing pattern on the base wafer;
A singulation process for individual crystal units,
A method of manufacturing a crystal resonator , comprising : A quartz resonator element provided with excitation electrodes on both main surfaces of a rectangular quartz piece and two pairs of routing patterns extending from the excitation electrodes to one end of the quartz piece; a lid and a base; A method of manufacturing a crystal unit comprising:
The crystal wafer having the crystal resonator element connected thereto is provided with a cylindrical recess for routing, and is shallower than the cylindrical recess that surrounds the excitation electrode and the portion to be the routing pattern on one main surface of the crystal resonator element. A recess forming step for forming a recess surrounding the excitation electrode and the routing pattern;
A first metal film forming step of providing a metal film serving as the routing pattern at a predetermined position including the excitation electrode and the cylindrical recess in the recess;
A base wafer bonding step of directly bonding the base wafer in which the base body having a through hole at a position corresponding to the end portion of the routing pattern is connected to the crystal wafer so as to cover the concave portion;
An external terminal metal film forming step of providing a metal film serving as an external terminal so as to be connected to the routing pattern on the base wafer;
An internal metal film exposing step of grinding or polishing the quartz wafer to expose the metal film in the cylindrical recess;
A groove forming step of forming a groove along the edge of the recess in the crystal wafer;
A second metal film forming step of providing the excitation electrode and the routing pattern on the quartz wafer;
A lid wafer bonding step of directly bonding a lid wafer having a lid having a concave portion at a position corresponding to the concave portion of the quartz wafer to the quartz wafer;
A singulation process for individual crystal units,
A method of manufacturing a crystal resonator, comprising: The method for manufacturing a crystal resonator according to claim 1, wherein the groove is provided inside the crystal piece with respect to the recess.

Images