JP5156306B2 - 光学異方性測定装置および光学異方性測定方法 - Google Patents

光学異方性測定装置および光学異方性測定方法 Download PDF

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JP5156306B2
JP5156306B2 JP2007239254A JP2007239254A JP5156306B2 JP 5156306 B2 JP5156306 B2 JP 5156306B2 JP 2007239254 A JP2007239254 A JP 2007239254A JP 2007239254 A JP2007239254 A JP 2007239254A JP 5156306 B2 JP5156306 B2 JP 5156306B2
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optical anisotropy
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JP2009069054A (ja
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真 大川内
義巳 澤村
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Otsuka Electronics Co Ltd
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JP2007239254A 2007-09-14 2007-09-14 光学異方性測定装置および光学異方性測定方法 Active JP5156306B2 (ja)

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US9989454B2 (en) 2013-10-04 2018-06-05 Axometrics, Inc. Method and apparatus for measuring parameters of optical anisotropy
JP6832782B2 (ja) * 2017-04-20 2021-02-24 株式会社日立製作所 分光分析方法、分光分析装置
KR102486442B1 (ko) * 2019-06-07 2023-01-09 주식회사 엘지화학 편광판의 액정얼룩 검사장치 및 편광판의 액정얼룩 검사방법
JP7341849B2 (ja) * 2019-10-24 2023-09-11 大塚電子株式会社 光学測定装置および光学測定方法

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WO2000065331A2 (en) * 1999-04-22 2000-11-02 Kla-Tencor Corporation System for analyzing surface characteristics with self-calibrating capability
JP2001004534A (ja) * 1999-06-16 2001-01-12 Nec Corp 薄膜分子配向評価法及び評価装置並びに記録媒体

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