JP5155173B2 - 気化ゾーンへの粒子状材料の供給 - Google Patents
気化ゾーンへの粒子状材料の供給 Download PDFInfo
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- JP5155173B2 JP5155173B2 JP2008537742A JP2008537742A JP5155173B2 JP 5155173 B2 JP5155173 B2 JP 5155173B2 JP 2008537742 A JP2008537742 A JP 2008537742A JP 2008537742 A JP2008537742 A JP 2008537742A JP 5155173 B2 JP5155173 B2 JP 5155173B2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/264,349 US7993459B2 (en) | 2005-10-24 | 2005-10-24 | Delivering particulate material to a vaporization zone |
| US11/264,349 | 2005-10-24 | ||
| PCT/US2006/039756 WO2007050293A1 (en) | 2005-10-24 | 2006-10-11 | Delivering particulate material to a vaporization zone |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009512786A JP2009512786A (ja) | 2009-03-26 |
| JP2009512786A5 JP2009512786A5 (enExample) | 2009-05-07 |
| JP5155173B2 true JP5155173B2 (ja) | 2013-02-27 |
Family
ID=37853028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008537742A Active JP5155173B2 (ja) | 2005-10-24 | 2006-10-11 | 気化ゾーンへの粒子状材料の供給 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7993459B2 (enExample) |
| EP (1) | EP1966409B1 (enExample) |
| JP (1) | JP5155173B2 (enExample) |
| KR (1) | KR101196334B1 (enExample) |
| DE (1) | DE602006016863D1 (enExample) |
| TW (1) | TWI377714B (enExample) |
| WO (1) | WO2007050293A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7883583B2 (en) * | 2008-01-08 | 2011-02-08 | Global Oled Technology Llc | Vaporization apparatus with precise powder metering |
| US8741062B2 (en) * | 2008-04-22 | 2014-06-03 | Picosun Oy | Apparatus and methods for deposition reactors |
| US8048230B2 (en) * | 2008-11-14 | 2011-11-01 | Global Oled Technology Llc | Metering and vaporizing particulate material |
| US8062427B2 (en) * | 2008-11-14 | 2011-11-22 | Global Oled Technology Llc | Particulate material metering and vaporization |
| US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
| JP2013503256A (ja) * | 2009-08-26 | 2013-01-31 | 株式会社テラセミコン | 蒸着ガス供給装置 |
| KR101225377B1 (ko) * | 2012-04-02 | 2013-01-25 | 주식회사 야스 | 유기물질 카트리지 및 박막제작에 이를 사용하는 방법 |
| DE102016111214B3 (de) * | 2016-06-20 | 2017-06-29 | Ancosys Gmbh | Vorrichtung zur Pulverdosierung für chemische Produktionsprozesse unter Reinraumbedingungen, Verwendung derselben und Zudosierungsverfahren |
| CN107088150B (zh) * | 2017-05-01 | 2023-02-28 | 宁德职业技术学院 | 一种葡萄籽花青素蒸脸美容器 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2447789A (en) | 1945-03-23 | 1948-08-24 | Polaroid Corp | Evaporating crucible for coating apparatus |
| US2524560A (en) * | 1945-09-22 | 1950-10-03 | Us Automatic Box Machinery Co | Method and machine for filling containers with powdered material and for removing dust and airborne particles at region ambient the container |
| US2800252A (en) * | 1954-03-17 | 1957-07-23 | Eugene A Wahl | Powder-feeding apparatus |
| US3270857A (en) * | 1964-02-24 | 1966-09-06 | Deere & Co | Screw-conveyor feeder |
| US3447789A (en) * | 1967-05-31 | 1969-06-03 | Chemrock Corp | Portable perlite handling apparatus and method |
| US3754529A (en) * | 1970-06-08 | 1973-08-28 | Nat Beryllia Corp | Apparatus for continuously depositing beryllia through vaporization of a basic formate |
| US4885211A (en) | 1987-02-11 | 1989-12-05 | Eastman Kodak Company | Electroluminescent device with improved cathode |
| US4990371A (en) * | 1989-08-01 | 1991-02-05 | Gte Products Corporation | Process for coating small solids |
| EP0585848A1 (de) * | 1992-09-02 | 1994-03-09 | Hoechst Aktiengesellschaft | Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten |
| US5937996A (en) * | 1998-01-13 | 1999-08-17 | Vibrascrew Inc. | Vibrating screw feeder |
| US6685762B1 (en) * | 1998-08-26 | 2004-02-03 | Superior Micropowders Llc | Aerosol method and apparatus for making particulate products |
| JP2000068055A (ja) | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法 |
| DE10048759A1 (de) * | 2000-09-29 | 2002-04-11 | Aixtron Gmbh | Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD |
| US6774318B2 (en) * | 2001-02-14 | 2004-08-10 | Process Control Corporation | Removable material hopper assembly and method of using same to eliminate residual ingredient material |
| US6749906B2 (en) | 2002-04-25 | 2004-06-15 | Eastman Kodak Company | Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
| US20040144321A1 (en) | 2003-01-28 | 2004-07-29 | Eastman Kodak Company | Method of designing a thermal physical vapor deposition system |
| KR101137901B1 (ko) | 2003-05-16 | 2012-05-02 | 에스브이티 어소시에이츠, 인코포레이티드 | 박막 증착 증발기 |
| JP4551996B2 (ja) * | 2003-10-09 | 2010-09-29 | グローバル・オーエルイーディー・テクノロジー・リミテッド・ライアビリティ・カンパニー | 蒸発装置 |
| US7501152B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
-
2005
- 2005-10-24 US US11/264,349 patent/US7993459B2/en active Active
-
2006
- 2006-10-11 KR KR1020087009716A patent/KR101196334B1/ko active Active
- 2006-10-11 EP EP06836266A patent/EP1966409B1/en active Active
- 2006-10-11 DE DE602006016863T patent/DE602006016863D1/de active Active
- 2006-10-11 JP JP2008537742A patent/JP5155173B2/ja active Active
- 2006-10-11 WO PCT/US2006/039756 patent/WO2007050293A1/en not_active Ceased
- 2006-10-23 TW TW095139040A patent/TWI377714B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI377714B (en) | 2012-11-21 |
| JP2009512786A (ja) | 2009-03-26 |
| KR20080059247A (ko) | 2008-06-26 |
| WO2007050293A1 (en) | 2007-05-03 |
| KR101196334B1 (ko) | 2012-11-01 |
| EP1966409B1 (en) | 2010-09-08 |
| US20070092645A1 (en) | 2007-04-26 |
| US7993459B2 (en) | 2011-08-09 |
| DE602006016863D1 (de) | 2010-10-21 |
| TW200725959A (en) | 2007-07-01 |
| EP1966409A1 (en) | 2008-09-10 |
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