JP5150620B2 - 提案構造解析処理の実行可能性を判断する方法 - Google Patents

提案構造解析処理の実行可能性を判断する方法 Download PDF

Info

Publication number
JP5150620B2
JP5150620B2 JP2009510541A JP2009510541A JP5150620B2 JP 5150620 B2 JP5150620 B2 JP 5150620B2 JP 2009510541 A JP2009510541 A JP 2009510541A JP 2009510541 A JP2009510541 A JP 2009510541A JP 5150620 B2 JP5150620 B2 JP 5150620B2
Authority
JP
Japan
Prior art keywords
data
ray
nominal
composition
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009510541A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009537811A (ja
JP2009537811A5 (https=
Inventor
ピーター ジョン ステイサム
チャールズ ペンマン
Original Assignee
オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド filed Critical オックスフォード インストルメンツ ナノテクノロジー ツールス リミテッド
Publication of JP2009537811A publication Critical patent/JP2009537811A/ja
Publication of JP2009537811A5 publication Critical patent/JP2009537811A5/ja
Application granted granted Critical
Publication of JP5150620B2 publication Critical patent/JP5150620B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2009510541A 2006-05-16 2007-05-16 提案構造解析処理の実行可能性を判断する方法 Active JP5150620B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0609744.8 2006-05-16
GBGB0609744.8A GB0609744D0 (en) 2006-05-16 2006-05-16 Method of determining the feasibility of a proposed x-ray structure analysis process
PCT/GB2007/001803 WO2007132243A1 (en) 2006-05-16 2007-05-16 A method of determining the feasibility of a proposed structure analysis process

Publications (3)

Publication Number Publication Date
JP2009537811A JP2009537811A (ja) 2009-10-29
JP2009537811A5 JP2009537811A5 (https=) 2010-04-08
JP5150620B2 true JP5150620B2 (ja) 2013-02-20

Family

ID=36660296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009510541A Active JP5150620B2 (ja) 2006-05-16 2007-05-16 提案構造解析処理の実行可能性を判断する方法

Country Status (5)

Country Link
US (1) US8346521B2 (https=)
EP (1) EP2024734B1 (https=)
JP (1) JP5150620B2 (https=)
GB (1) GB0609744D0 (https=)
WO (1) WO2007132243A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7411188B2 (en) * 2005-07-11 2008-08-12 Revera Incorporated Method and system for non-destructive distribution profiling of an element in a film
US8065094B2 (en) 2008-07-30 2011-11-22 Oxford Instruments Nonotechnology Tools Unlimited Method of calculating the structure of an inhomogeneous sample
US8300501B2 (en) * 2009-12-23 2012-10-30 The United States Of America As Represented By The Scretary Of The Navy Supercavitating projectile tracking system and method
US8513603B1 (en) * 2010-05-12 2013-08-20 West Virginia University In-situ determination of thin film and multilayer structure and chemical composition using x-ray fluorescence induced by grazing incidence electron beams during thin film growth
US8666703B2 (en) * 2010-07-22 2014-03-04 Tokyo Electron Limited Method for automated determination of an optimally parameterized scatterometry model
US9899185B1 (en) * 2015-04-21 2018-02-20 Applied Materials Israel Ltd. Resolving ambiguities in an energy spectrum
JP6377582B2 (ja) * 2015-08-06 2018-08-22 株式会社リガク Ｘ線分析の操作ガイドシステム、操作ガイド方法、及び操作ガイドプログラム
EP3825681B1 (en) 2019-11-20 2025-03-12 Bruker Nano GmbH Method for determining a material composition
JP7105261B2 (ja) * 2020-02-18 2022-07-22 日本電子株式会社 オージェ電子分光装置および分析方法
US20240339293A1 (en) * 2021-07-23 2024-10-10 Oxford Instruments Nanotechnology Tools Limited Improved navigation for electron microscopy
WO2023194014A1 (en) * 2022-04-04 2023-10-12 Asml Netherlands B.V. E-beam optimization for overlay measurement of buried features
CN118465199B (zh) * 2024-07-11 2024-11-12 江华新材料科技(江苏)有限公司 一种聚乳酸无纺布的抗菌性能检测方法及装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2884692B2 (ja) * 1990-04-19 1999-04-19 株式会社島津製作所 蒸着膜で被覆した試料の定量測定法
JP3010598B2 (ja) * 1990-12-29 2000-02-21 株式会社島津製作所 薄膜で覆われた試料のｘ線分光分析方法
JP3132678B2 (ja) * 1991-07-25 2001-02-05 株式会社島津製作所 薄膜試料の厚さ測定及び元素定量分析方法
FR2705785B1 (fr) * 1993-05-28 1995-08-25 Schlumberger Ind Sa Procédé pour déterminer la fonction d'atténuation d'un objet par rapport à la transmission d'une épaisseur de référence d'un matériau de référence et dispositif pour la mise en Óoeuvre du procédé.
DE19739321C2 (de) 1997-09-09 2001-09-27 Helmut Fischer Gmbh & Co Verfahren und Einrichtung zum Bestimmen der Meßunsicherheit bei Röntgenfluoreszenz-Schichtdickenmessungen
JP3409742B2 (ja) * 1999-03-19 2003-05-26 日本軽金属株式会社 モンテカルロシミュレーションを用いたｅｐｍａ分析法
JP3729186B2 (ja) * 2000-04-11 2005-12-21 理学電機工業株式会社 蛍光ｘ線分析装置
JP2002257757A (ja) * 2001-03-05 2002-09-11 Rigaku Industrial Co 蛍光ｘ線分析装置
US6675106B1 (en) * 2001-06-01 2004-01-06 Sandia Corporation Method of multivariate spectral analysis
DE10159828B4 (de) * 2001-12-06 2007-09-20 Rigaku Industrial Corporation, Takatsuki Röntgenfluoreszenzspektrometer
JP3519397B1 (ja) * 2002-10-09 2004-04-12 沖電気工業株式会社 固体表面層の膜厚方向組成プロファイル解析方法
JP2004151045A (ja) * 2002-11-01 2004-05-27 Hitachi High-Technologies Corp 電子顕微鏡またはｘ線分析装置及び試料の分析方法
US7108424B2 (en) * 2004-03-11 2006-09-19 Agilent Technologies, Inc. Method and apparatus for calibration of indirect measurement systems
GB0512945D0 (en) * 2005-06-24 2005-08-03 Oxford Instr Analytical Ltd Method and apparatus for material identification

Also Published As

Publication number Publication date
US20100017172A1 (en) 2010-01-21
WO2007132243A1 (en) 2007-11-22
JP2009537811A (ja) 2009-10-29
EP2024734B1 (en) 2018-06-20
GB0609744D0 (en) 2006-06-28
EP2024734A1 (en) 2009-02-18
US8346521B2 (en) 2013-01-01

Similar Documents

Publication Publication Date Title
JP5150620B2 (ja) 提案構造解析処理の実行可能性を判断する方法
Stump et al. Uncertainties of predictions from parton distribution functions. I. The Lagrange multiplier method
Stump et al. Inclusive jet production, parton distributions, and the search for new physics
JP4641619B2 (ja) プラズマプロセスによる表面プロファイルを予測するための方法及び装置
JP5264061B2 (ja) 物質同定のための方法及び装置
CN112834485B (zh) 激光诱导击穿光谱元素定量分析的一种非定标方法
Brunetti et al. Use of Monte Carlo simulations for cultural heritage X-ray fluorescence analysis
WO2016103312A1 (ja) 分析データ処理方法及び装置
US7002143B2 (en) Method and apparatus for compensating waveforms, spectra, and profiles derived therefrom for effects of drift
GB2561879A (en) Spectroscopic analysis
US8065094B2 (en) Method of calculating the structure of an inhomogeneous sample
EP4012391B1 (en) Method and device for analyzing the diffraction pattern of a mixture, and information storage medium therefor
CN102103079B (zh) 一种光谱分析方法
Jones et al. A bootstrap method for gain calibration and resolution determination of a lead-glass calorimeter
Shinotsuka et al. Sample structure prediction from measured XPS data using Bayesian estimation and SESSA simulator
WO2011159264A1 (en) A thickness determination method
CN105717093B (zh) 一种基于大数据库辨识的水泥特性分析方法
Seesahai Plasma temperature measurements in the context of spectral interference
Gullayanon A calibration methodology for energy dispersive X-ray fluorescence measurements based upon synthetically generated reference spectra
KR20240157646A (ko) 비지도형 머신 러닝을 사용하는 고-처리율/정밀 xps 계측을 위한 생산 솔루션
Arnould et al. Specific effects and deconvolution in submicrometre EPMA: application to binary diffusion
CN110579467B (zh) 一种时间分辨激光诱导击穿光谱定量方法
JP7288553B1 (ja) プラズマ処理装置、データ解析装置及び半導体装置製造システム
US7536266B2 (en) Universal X-ray fluorescence calibration technique for wire surface analysis
Aiken et al. Mutual Information and Sensitivity Analysis of a T6 Expansion Tunnel Experiment

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100222

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120116

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120328

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20120606

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20120806

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20121101

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20121203

R150 Certificate of patent or registration of utility model

Ref document number: 5150620

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151207

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350