JP5121304B2 - Polishing method and polishing apparatus - Google Patents

Polishing method and polishing apparatus Download PDF

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JP5121304B2
JP5121304B2 JP2007137169A JP2007137169A JP5121304B2 JP 5121304 B2 JP5121304 B2 JP 5121304B2 JP 2007137169 A JP2007137169 A JP 2007137169A JP 2007137169 A JP2007137169 A JP 2007137169A JP 5121304 B2 JP5121304 B2 JP 5121304B2
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polishing
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processing tool
optical component
polishing apparatus
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啓二 内山
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Olympus Corp
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Description

本発明は、研磨技術に関し、たとえば光学部品等の研磨に適用して有効な技術に関する。   The present invention relates to a polishing technique, for example, a technique effective when applied to polishing of optical parts and the like.

たとえば、レンズ等の光学部品を研磨加工する場合、光学部品の光学機能面となる被加工面と加工工具の加工面とを接触させ、相対移動することにより加工工具表面の形状を光学部品の被加工面に転写させて加工している。   For example, when polishing an optical component such as a lens, the surface to be processed which is the optical functional surface of the optical component and the processing surface of the processing tool are brought into contact with each other, and the shape of the surface of the processing tool is changed. It is transferred to the processing surface and processed.

このような研磨加工を行う場合、削り屑や工具摩耗物(総じてスラッジと呼ぶ)あるいは研磨剤が工具表面に固着する現象が起き易い。また、研磨加工中に光学部品の被加工面と加工工具の加工面との界面で局部的な高圧、高温状態が発生すると、該加工工具の加工面が変質し、局部的な硬化あるいは光沢面が生じる。さらに、この現象は一旦発生すると加工の進行に伴い拡大する傾向が強いことが経験的に分かっている。このような現象が発生すると光学部品の被加工面に多数の傷が発生しやすくなる。   When such a polishing process is performed, a phenomenon in which shavings, tool wear (generally referred to as sludge) or an abrasive adheres to the tool surface easily occurs. Also, if a local high pressure or high temperature condition occurs at the interface between the work surface of the optical component and the work surface of the processing tool during the polishing process, the work surface of the work tool will change and become locally hardened or glossy. Occurs. Furthermore, it has been empirically found that once this phenomenon occurs, it tends to expand with the progress of processing. When such a phenomenon occurs, a large number of scratches are likely to occur on the processing surface of the optical component.

特に、近年、カメラレンズや顕微鏡レンズでは低分散ガラスを使用した高精度レンズが用いられているが、低分散ガラスは通常の光学ガラスと比較して一般的に摩耗度が非常に大きいため、キズが発生しやすく不良率が高くなる傾向がある。特にポリウレタンシートを用いた研磨皿や樹脂基材に研磨砥粒を分散した固定砥粒工具等による高速研磨加工では、加工工具の目詰まりや研磨抵抗力による振動(いわゆる、ビビリ)により多数の深い傷が発生する。   In particular, in recent years, high-precision lenses using low-dispersion glass have been used in camera lenses and microscope lenses. However, low-dispersion glass generally has a much higher degree of wear than ordinary optical glass, so there are scratches. Tends to occur and the defect rate tends to increase. In particular, in high-speed polishing with a polishing dish using a polyurethane sheet or a fixed abrasive tool in which abrasive grains are dispersed on a resin base material, a large number of deepening occurs due to clogging of the processing tool or vibration (so-called chatter) caused by polishing resistance. Scratches occur.

これらの技術的課題の対策として、たとえば非特許文献1に開示される液中研磨と呼ばれる研磨方法が知られている。
すなわち、ボールフィールド容器に貯留された研磨剤中に浸漬した被加工物を保持する保持台と、被加工物を回転させるために保持台を回転させる回転軸を設け、砥粒を分散した研磨剤の液中に被加工物および加工工具を浸漬した状態で研磨加工を行うものである。
As a countermeasure against these technical problems, for example, a polishing method called submerged polishing disclosed in Non-Patent Document 1 is known.
Namely, an abrasive in which abrasive grains are dispersed by providing a holding base for holding a workpiece immersed in an abrasive stored in a ball field container, and a rotating shaft for rotating the holding base for rotating the workpiece. Polishing is performed in a state where the workpiece and the processing tool are immersed in the liquid.

しかしながら、この非特許文献1に示された方法では、常に研磨剤は回転軸の軸心を中心にして一定方向に流れているいわゆる層流状態のためワークを研磨加工したときに出るスラッジがワーク近傍に滞留してしまい、このスラッジがワークの加工面とポリシャーとの間に介在して、加工面にキズをつけてしまう懸念がある。   However, in the method disclosed in Non-Patent Document 1, the sludge generated when the workpiece is polished due to a so-called laminar flow state in which the abrasive always flows in a fixed direction around the axis of the rotating shaft is the workpiece. There is a concern that the sludge stays in the vicinity, and this sludge is interposed between the work surface of the workpiece and the polisher and scratches the work surface.

また、ワークの研磨加工によって劣化した研磨剤中の砥粒がワーク近傍に滞留すると共に、容器の内壁面付近を流れている加工に寄与可能な砥粒がワークの加工面に流れていかないため、常に劣化している砥粒で加工していることになり、加工能力が低下したり、長時間加工する場合、研磨剤中の砥粒が容器の底面に沈殿して加工に寄与しなくなってしまう。   In addition, the abrasive grains in the abrasive that have deteriorated due to the workpiece polishing process stay in the vicinity of the workpiece, and the abrasive grains that can contribute to the processing flowing near the inner wall surface of the container do not flow to the workpiece processing surface. If you are working with abrasive grains that are constantly deteriorated, the processing ability will decrease or if you process for a long time, the abrasive grains in the abrasive will settle on the bottom of the container and will not contribute to the processing .

さらに液中研磨は、ポリシャー等の加工工具の全体が研磨剤の液中に没入した構成であるため、研磨剤の粘性抵抗等の影響により、加工工具等の回転数を大きくできず、通常の研磨に比較して加工所要時間が非常に長くなり(たとえば数時間から数十時間)、著しく非効率である。   Furthermore, since the polishing tool in the liquid is configured so that the entire processing tool such as a polisher is immersed in the polishing liquid, the rotation speed of the processing tool cannot be increased due to the influence of the viscous resistance of the polishing agent. Compared with polishing, the time required for processing becomes very long (for example, several hours to several tens of hours), which is extremely inefficient.

一方、特許文献1には、ボールフィールド容器内を回転して流れる層流状態の研磨剤を、当該容器内に固定されたフィンによって乱して混合を促して乱流状態とし、被加工物の近傍に滞留しようとするスラッジを除去すると共に加工に寄与していない磨剤中の砥粒を加工面に供給することにより、前記非特許文献1のような液中研磨方法の欠点を解消しようとする研磨方法が提供されている。   On the other hand, Patent Document 1 discloses that a laminar flow state abrasive that rotates and flows in a ball field container is disturbed by fins fixed in the container to promote mixing to be in a turbulent state. By removing sludge that tends to stay in the vicinity and supplying abrasive grains in the abrasive that do not contribute to the processing to the processing surface, an attempt is made to eliminate the disadvantages of the submerged polishing method as in Non-Patent Document 1. A polishing method is provided.

しかし、この特許文献1の場合には、上述の非特許文献1に比較して加工効率は改善されるものの、液中研磨であることには変わりがなく、上述のように高速研磨による加工時間の短縮は困難であり、液中研磨に依らない一般的な研磨方法と比較してやはり非効率である。
(株)新技術開発センター、1985年9月発行、小林昭著『超精密加工技術実用マニアル』初版、第77頁5行目〜10行目 特開平8−323612号公報
However, in the case of this Patent Document 1, although the processing efficiency is improved as compared with the above-mentioned Non-Patent Document 1, it is still a submerged polishing, and the processing time by high-speed polishing is not changed as described above. However, it is difficult to shorten the length, and it is still inefficient compared with a general polishing method that does not depend on in-liquid polishing.
New Technology Development Center Co., Ltd., published in September 1985, Akira Kobayashi, “Practical Manual for Ultraprecision Machining Technology”, page 77, lines 5-10 JP-A-8-323612

本発明の目的は、短い加工所要時間にて摩耗度の比較的大きな光学部品を損傷することなく研磨することが可能な技術を提供することにある。
本発明の他の目的は、摩耗度の比較的大きな光学部品の研磨工程における歩留りや生産性の向上を実現することが可能な技術を提供することにある。
An object of the present invention is to provide a technique capable of polishing an optical component having a relatively high degree of wear without damaging it in a short processing time.
Another object of the present invention is to provide a technique capable of improving yield and productivity in a polishing process of an optical component having a relatively high degree of wear.

本発明の第1の観点は、光学部品の被加工面に加工工具を接触させ、加工液を供給しつつ前記光学部品と前記加工工具を相対運動させることにより研磨加工を行う研磨方法であって、
(A)研磨剤が含まれた加工液のみを供給しつつ研磨工程を行う工程と、
(B)前記工程を終了し、前記加工液と共に潤滑油を供給し、前記潤滑油により前記被加工面と前記加工工具の加工作用面との密着力を低減しつつ前記研磨加工を行う工程と、
を行う研磨方法を提供する。
A first aspect of the present invention is a polishing method for performing a polishing process by bringing a processing tool into contact with a surface to be processed of an optical component and moving the optical component and the processing tool relative to each other while supplying a processing liquid. ,
(A) a step of performing a polishing step while supplying only a machining fluid containing an abrasive;
(B) a step of finishing the step, supplying a lubricating oil together with the machining liquid, and performing the polishing while reducing an adhesion force between the work surface and a working surface of the processing tool by the lubricating oil ; ,
A polishing method is provided.

本発明の第2の観点は、第1の観点に記載の研磨方法において、
前記潤滑油は低粘度の鉱物油からなり、
前記光学部品と前記加工工具との摺動抵抗の増大による振動が発生したとき、または前記振動の発生の予兆を検出したときに、前記鉱物油を間欠的に噴霧して供給する研磨方法を提供する。
According to a second aspect of the present invention, in the polishing method according to the first aspect,
The lubricating oil is composed of a low viscosity mineral oil,
Provided a polishing method for intermittently spraying and supplying the mineral oil when vibration due to an increase in sliding resistance between the optical component and the processing tool occurs or when a sign of occurrence of the vibration is detected To do.

本発明の第3の観点は、第1の観点に記載の研磨方法において、
前記光学部品は、摩耗度200以上および/またはヌープ硬さ550以下の物理的性質を有する研磨方法を提供する。
According to a third aspect of the present invention, in the polishing method according to the first aspect,
The optical component provides a polishing method having physical properties with a degree of wear of 200 or more and / or a Knoop hardness of 550 or less.

本発明の第4の観点は、第1の観点に記載の研磨方法において、
前記加工工具は樹脂を基材とした加工工具である研磨方法を提供する。
本発明の第5の観点は、光学部品を支持するホルダと、
前記光学部品の被加工面に摺接される加工工具と、
前記加工工具と前記光学部品との間に研磨剤を含む加工液を供給する第1ノズルと、
前記加工工具と前記光学部品との間に潤滑油を供給する第2ノズルと、
前記光学部品と前記加工工具を相対運動させる駆動機構と、
前記加工液を第1ノズルから吐出して潤滑油を第2ノズルから吐出しない工程と、前記工程を終了して、前記加工液を前記第1ノズルから吐出して前記潤滑油を前記第2ノズルから吐出する工程とを切り替えるための供給制御弁と、
を含む研磨装置を提供する。
According to a fourth aspect of the present invention, in the polishing method according to the first aspect,
The processing tool provides a polishing method which is a processing tool based on a resin.
A fifth aspect of the present invention provides a holder for supporting an optical component;
A processing tool slidably contacted with the processing surface of the optical component;
A first nozzle for supplying a processing liquid containing an abrasive between the processing tool and the optical component;
A second nozzle for supplying lubricating oil between the processing tool and the optical component;
A drive mechanism for relatively moving the optical component and the processing tool;
The process liquid is discharged from the first nozzle and the lubricant is not discharged from the second nozzle, and the process is terminated, and the process liquid is discharged from the first nozzle and the lubricant is discharged from the second nozzle. A supply control valve for switching between the process of discharging from,
A polishing apparatus is provided.

本発明の第6の観点は、第5の観点に記載の研磨装置において、さらに、
前記加工工具および前記ホルダの少なくとも一方の振動および/または回転負荷の変動を検出するセンサと、
前記潤滑油の供給を制御する供給制御弁と、
前記センサを介して検出される前記振動および/または回転負荷の変動に基づいて前記供給制御弁の開度を制御する加工制御手段と、
を含む研磨装置を提供する。
According to a sixth aspect of the present invention, in the polishing apparatus according to the fifth aspect,
A sensor for detecting a vibration of at least one of the processing tool and the holder and / or fluctuation of a rotational load;
A supply control valve for controlling the supply of the lubricating oil;
Processing control means for controlling the opening of the supply control valve based on fluctuations in the vibration and / or rotational load detected via the sensor;
A polishing apparatus is provided.

本発明の第7の観点は、第6の観点に記載の研磨装置において、
前記潤滑油は低粘度の鉱物油からなり、
前記加工制御手段は、前記センサを介して前記光学部品と前記加工工具との摺動抵抗の増大による振動を検出したとき、または前記振動の発生の予兆を検出したときに、前記鉱物油が間欠的に噴霧して供給されるように前記供給制御弁を制御する研磨装置を提供する。
According to a seventh aspect of the present invention, in the polishing apparatus according to the sixth aspect,
The lubricating oil is composed of a low viscosity mineral oil,
When the processing control means detects vibration due to an increase in sliding resistance between the optical component and the processing tool via the sensor, or detects a sign of occurrence of the vibration, the mineral oil is intermittent. There is provided a polishing apparatus for controlling the supply control valve so as to be sprayed and supplied.

本発明の第8の観点は、第5の観点に記載の研磨装置において、
前記光学部品は、摩耗度200以上および/またはヌープ硬さ550以下の物理的性質を有する研磨装置を提供する。
According to an eighth aspect of the present invention, in the polishing apparatus according to the fifth aspect,
The optical component provides a polishing apparatus having physical properties with a degree of wear of 200 or more and / or a Knoop hardness of 550 or less.

本発明の第9の観点は、第5の観点に記載の研磨装置において、
前記加工工具は樹脂を基材とした加工工具である研磨装置を提供する。
According to a ninth aspect of the present invention, in the polishing apparatus according to the fifth aspect,
The processing tool provides a polishing apparatus which is a processing tool based on a resin.

本発明によれば、短い加工所要時間にて摩耗度の比較的大きな光学部品を損傷することなく研磨することが可能な技術を提供することができる。
また、摩耗度の比較的大きな光学部品の研磨工程における歩留りや生産性の向上を実現することが可能な技術を提供することができる。
ADVANTAGE OF THE INVENTION According to this invention, the technique which can grind | polish without damaging an optical component with a comparatively big abrasion degree in a short processing time can be provided.
In addition, it is possible to provide a technique capable of improving yield and productivity in a polishing process of an optical component having a relatively high degree of wear.

以下、図面を参照しながら、本発明の実施の形態について詳細に説明する。
図1は、本発明の一実施の形態である研磨方法を実施する研磨装置の構成の一例を示す略断面図であり、図2は、実施の形態の研磨装置の加工対象の光学部品の物理的性質の一例を示すグラフである。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a schematic cross-sectional view showing an example of the configuration of a polishing apparatus that performs a polishing method according to an embodiment of the present invention. FIG. 2 shows the physical properties of an optical component to be processed by the polishing apparatus according to the embodiment. It is a graph which shows an example of a physical property.

実施の形態の研磨装置Mは、加工工具1、駆動軸1b(駆動機構)、ホルダ3、カンザシ4(駆動機構)、第1ノズル5、および第2ノズル7を備えている。
光学部品等の被加工レンズ2はホルダ3に保持され、自在継手部4aを介してカンザシ4に傾動自在および回転自在に支持され、加工工具1の加工作用面1aに揺動可能に当接されている。
The polishing apparatus M according to the embodiment includes a processing tool 1, a drive shaft 1 b (drive mechanism), a holder 3, a Kanzashi 4 (drive mechanism), a first nozzle 5, and a second nozzle 7.
A lens 2 to be processed, such as an optical component, is held by a holder 3 and supported by a cantilever 4 via a universal joint 4a so as to be tiltable and rotatable, and is in contact with a machining surface 1a of the machining tool 1 so as to be swingable. ing.

加工工具1は、ホルダ3に保持された被加工レンズ2の被加工面2aに摺接する加工作用面1aを備え、加工作用面1aの背面側には、当該加工工具1支持して回転変位、および揺動変位を与える駆動軸1bが接続されている。   The processing tool 1 includes a processing surface 1a that is in sliding contact with the processing surface 2a of the processing lens 2 held by the holder 3. On the back side of the processing surface 1a, the processing tool 1 is supported and rotationally displaced. Further, a drive shaft 1b that gives a rocking displacement is connected.

研磨加工は研磨剤が含まれた加工液6を第1ノズル5から加工工具1の加工作用面1aに供給しながら行われる。
実施の形態の場合、第1ノズル5の他に第2ノズル7が設けられており、必要に応じて、たとえば、低粘度の鉱物油からなる潤滑油8を加工工具1の加工作用面1aに、たとえば霧状に噴霧して供給することが可能になっている。
The polishing process is performed while supplying the processing liquid 6 containing the abrasive from the first nozzle 5 to the processing surface 1 a of the processing tool 1.
In the case of the embodiment, a second nozzle 7 is provided in addition to the first nozzle 5, and if necessary, for example, lubricating oil 8 made of a low-viscosity mineral oil is applied to the working surface 1 a of the working tool 1. For example, it can be sprayed and supplied in the form of a mist.

すなわち、実施の形態の研磨装置Mの場合には、研磨加工時に、加工液6の供給と同時に、第2ノズル7から加工作用面1aに対して、たとえば、潤滑油8を間欠的に噴霧しつつ研磨加工を行う。   That is, in the case of the polishing apparatus M of the embodiment, for example, the lubricating oil 8 is intermittently sprayed from the second nozzle 7 to the processing surface 1a simultaneously with the supply of the processing liquid 6 during the polishing process. While polishing.

これにより、研磨加工中に、加工液6および潤滑油8が、被加工レンズ2の被加工面2aと、加工工具1の加工作用面1aの間に供給される。
本実施の形態の場合、加工工具1は、一例として高速研磨加工で多く使用されるポリウレタンシート皿で構成されている。
As a result, the machining fluid 6 and the lubricating oil 8 are supplied between the workpiece surface 2 a of the workpiece lens 2 and the machining surface 1 a of the machining tool 1 during polishing.
In the case of the present embodiment, the processing tool 1 is constituted by a polyurethane sheet pan that is frequently used in high-speed polishing as an example.

加工開始後、ある時間経過すると被加工レンズ2の被加工面2aの鏡面化に伴って、加工工具1の加工作用面1aとの間にスラッジが付着し、また同時に密着力の増加に伴って振動(いわゆるビビリ)が発生して、円滑な研磨を阻害する要因になる。このとき、本実施の形態では、上述の研磨加工を継続しながら、同時に第2ノズル7から加工作用面1aに、潤滑油8を間欠的に噴霧する。   When a certain period of time has elapsed after the start of processing, sludge adheres to the processing surface 1a of the processing tool 1 as the processing surface 2a of the processing lens 2 becomes mirror-finished, and at the same time, as the adhesion increases. Vibration (so-called chattering) occurs and becomes a factor that hinders smooth polishing. At this time, in the present embodiment, the lubricating oil 8 is intermittently sprayed from the second nozzle 7 onto the working surface 1a at the same time while continuing the above polishing process.

本実施の形態によれば、被加工レンズ2の被加工面2aと加工工具1の加工作用面1aの接触面に潤滑油8が供給されるため、潤滑油8の潤滑効果により、加工作用面1aと被加工面2aの間の密着力が低減され、スラッジの排出促進、ビビリ振動の抑止が可能となる。   According to the present embodiment, since the lubricating oil 8 is supplied to the contact surface between the processing surface 2a of the processing lens 2 and the processing surface 1a of the processing tool 1, the processing surface is processed by the lubricating effect of the lubricating oil 8. The adhesion force between 1a and the work surface 2a is reduced, and sludge discharge promotion and chatter vibration can be suppressed.

この場合、潤滑油8は被加工面2aと加工作用面1aとの間に浸透しやすくなければならず、また研磨速度を低下させないように低粘度であることが望ましい。また、第2ノズル7から潤滑油8を間欠的に加工作用面1aに噴霧することにより、潤滑に必要な極少量のみの潤滑油8を供給することができるため、過度の潤滑による研磨能率の低下を起こすことがなく、さらに潤滑油8の使用量の節約や、加工液6と潤滑油8の分離も容易に行うことができる。   In this case, the lubricating oil 8 must easily penetrate between the work surface 2a and the working surface 1a, and desirably has a low viscosity so as not to reduce the polishing rate. Further, since the lubricating oil 8 is intermittently sprayed from the second nozzle 7 onto the working surface 1a, only a very small amount of the lubricating oil 8 necessary for lubrication can be supplied. There is no reduction, and further, the amount of use of the lubricating oil 8 can be saved, and the machining fluid 6 and the lubricating oil 8 can be easily separated.

本実施の形態によれば、たとえば、加工工具1および被加工レンズ2を研磨液の中に没入させない通常の研磨装置Mの構成のままであっても、加工能率を低下させることなく、被加工レンズ2の傷等の発生を防止しつつ、加工工具1の比較的高速な回転等により、高速な研磨を行うことができる。   According to the present embodiment, for example, even if the configuration of a normal polishing apparatus M that does not immerse the processing tool 1 and the lens 2 to be processed into the polishing liquid is maintained, the processing efficiency is not reduced. High-speed polishing can be performed by relatively high-speed rotation of the processing tool 1 while preventing the lens 2 from being scratched.

図2に、光学ガラスの物理的性質である、摩耗度Aaとヌープ硬さHKのグラフを示す。
この図2に示したように、低分散ガラスのグループG2は、傷が入りやすいガラスのグループG1とともに、一般的な光学ガラスのグループG0と比較して、摩耗度Aa、ヌープ硬さHKが全く異なるグループを形成している。
FIG. 2 shows a graph of the abrasion degree Aa and Knoop hardness HK, which are physical properties of the optical glass.
As shown in FIG. 2, the low-dispersion glass group G2 has a wear degree Aa and Knoop hardness HK that are completely different from those of the general optical glass group G0, as well as the glass group G1 that is easily damaged. Form different groups.

すなわち、低分散ガラスのグループG2および傷が入りやすいガラスのグループG1は、摩耗度Aaが200以上であり、当該値が200未満の一般的な光学ガラスのグループG0とは摩耗度Aaの値が明らかに異なっている。   That is, the group G2 of low dispersion glass and the group G1 of easily scratched glass have an abrasion degree Aa of 200 or more, and the value of the abrasion degree Aa is different from that of a general optical glass group G0 having the value less than 200. Clearly different.

同様に、ヌープ硬さHKについてみると、低分散ガラスのグループG2および傷が入りやすいガラスのグループG1は、概ね550以下であるのに対して、一般的な光学ガラスのグループG0の場合には、450〜800の広い範囲に分散している。   Similarly, regarding the Knoop hardness HK, the group G2 of the low dispersion glass and the group G1 of the glass that is easily damaged are approximately 550 or less, whereas in the case of the general optical glass group G0, , Dispersed in a wide range of 450 to 800.

低分散ガラスのグループG2やグループG1は表面がやわらかく、摩耗しやすいため、ビビリ振動やスラッジの影響を受けて被加工面2aに傷が非常に入りやすいが、本実施の形態では、上述のように、低粘度の鉱物油等からなる潤滑油8を加工工具1の加工作用面1aと被加工レンズ2の被加工面2aに供給することにより振動が抑えられるので、被加工レンズ2が、たとえば、摩耗度Aaが200以上でヌープ硬さHKが550以下の低分散ガラス等の場合においても、研磨加工中に被加工面2aを損傷することなく、高速な研磨を効率よく行うことができる。   The low-dispersion glass group G2 and group G1 have a soft surface and are likely to be worn, so that the work surface 2a is easily damaged by chatter vibration and sludge. In the present embodiment, as described above, Further, since the vibration is suppressed by supplying the lubricating oil 8 made of mineral oil or the like having a low viscosity to the processing surface 1a of the processing tool 1 and the processing surface 2a of the processing lens 2, the processing lens 2 is, for example, Even in the case of a low-dispersion glass having an abrasion degree Aa of 200 or more and a Knoop hardness HK of 550 or less, high-speed polishing can be performed efficiently without damaging the work surface 2a during polishing.

すなわち、被加工レンズ2が、低分散ガラスのグループG2や傷が入りやすいガラスのグループG1からなる硝材で構成される場合においても、被加工面2aの傷の発生を最小限に抑えた高速な研磨加工が可能となる。   That is, even when the lens 2 to be processed is made of a glass material including the group G2 of low dispersion glass and the glass group G1 that is likely to be scratched, the generation of scratches on the processing surface 2a is minimized. Polishing is possible.

換言すれば、低分散ガラスや傷が入りやすいガラスからなる被加工レンズ2の研磨加工工程において、被加工レンズ2の歩留りの向上およびスループットの向上による生産性の向上を実現できる。   In other words, in the polishing process of the lens 2 to be processed that is made of low-dispersion glass or glass that is easily damaged, it is possible to improve the yield of the lens 2 to be processed and the productivity by improving the throughput.

なお、上述の例では、加工工具1としてポリウレタンシート皿を用い、砥粒等の研磨剤が含まれた加工液6を供給して研磨を行う場合を例示したが、これに限らず、たとえば、図1における加工工具1の代わりに、樹脂基材に研磨砥粒を分散させた構造の加工工具1−1を用いることもできる。   In the above-described example, a polyurethane sheet dish is used as the processing tool 1 and the case where the polishing is performed by supplying the processing liquid 6 containing an abrasive such as abrasive grains is exemplified. Instead of the processing tool 1 in FIG. 1, a processing tool 1-1 having a structure in which abrasive grains are dispersed in a resin base material can be used.

この加工工具1−1を用いる固定砥粒加工は上述の実施の形態に示す遊離砥粒加工と比べて被加工レンズ2と加工工具1−1の密着力がさらに強くなり、被加工面2aに傷も入りやすくなるが、本実施の形態のように、低粘度の鉱物油からなる潤滑油8を供給することにより密着力が軽減される。なお、潤滑油8の供給方法は、加工工具1と被加工レンズ2の密着力の強さに応じて、噴霧することなく連続的あるいは間欠的に供給しても良い。   In the fixed abrasive machining using the machining tool 1-1, the contact force between the lens 2 to be machined and the machining tool 1-1 is further increased as compared with the free abrasive machining shown in the above-described embodiment, and the machining surface 2a is subjected to contact. Although it becomes easy to enter a damage | wound, adhesive force is reduced by supplying the lubricating oil 8 which consists of a low-viscosity mineral oil like this Embodiment. The method for supplying the lubricating oil 8 may be continuously or intermittently supplied without spraying depending on the strength of the adhesion between the processing tool 1 and the lens 2 to be processed.

この結果、加工工具1−1を用いる固定砥粒加工においても、ビビリ振動の発生を抑えて、被加工レンズ2の被加工面2aに傷が発生しない高速な研磨加工が可能となる。
図3は、本実施の形態の変形例である研磨装置の構成を示す略断面図である。この変形例の研磨装置M1の場合、上述の図1に例示した研磨装置Mの構成に加えて、加工制御部10(加工制御手段)、供給制御弁11、センサ12を備えている。
As a result, even in the fixed abrasive machining using the machining tool 1-1, it is possible to suppress the occurrence of chatter vibration and perform high-speed polishing without causing scratches on the workpiece surface 2a of the lens 2 to be processed.
FIG. 3 is a schematic cross-sectional view showing a configuration of a polishing apparatus which is a modification of the present embodiment. In the case of the polishing apparatus M1 of this modification, in addition to the configuration of the polishing apparatus M illustrated in FIG. 1 described above, a processing control unit 10 (processing control means), a supply control valve 11, and a sensor 12 are provided.

センサ12は、加工工具1のビビリ振動や、その前兆現象である駆動軸1bの回転負荷の変動を検出する機能を備えている。
供給制御弁11は、第2ノズル7に設けられ、第2ノズル7から供給される潤滑油8の供給の有無や、供給量を制御する機能を備えている。
The sensor 12 has a function of detecting chatter vibrations of the processing tool 1 and fluctuations in the rotational load of the drive shaft 1b, which is a precursor.
The supply control valve 11 is provided in the second nozzle 7 and has a function of controlling whether or not the lubricant 8 supplied from the second nozzle 7 is supplied and the supply amount.

加工制御部10は、たとえばマイクロコンピュータ等で構成され、センサ12から入力される情報(ビビリ振動や、その前兆現象である駆動軸1bの回転負荷の変動等)に基づいて、供給制御弁11の開度を制御することで、第2ノズル7から加工作用面1aに供給される潤滑油8の供給開始と供給停止のタイミングや供給量を制御する機能を備えている。   The processing control unit 10 is composed of, for example, a microcomputer and the like, and based on information input from the sensor 12 (such as chatter vibrations and fluctuations in the rotational load of the drive shaft 1b that is a precursor thereof) By controlling the opening degree, it has a function of controlling the supply start and stop timing and supply amount of the lubricating oil 8 supplied from the second nozzle 7 to the working surface 1a.

そして、加工制御部10は、研磨加工中にセンサ12を介して、加工工具1のビビリ振動や前兆現象を監視し、ビビリ振動や前兆現象が検出された場合に、供給制御弁11を開いて、潤滑油8を加工作用面1aに供給する動作を自動的に行う。   And the process control part 10 monitors the chatter vibration and the precursor phenomenon of the processing tool 1 through the sensor 12 during the polishing process, and opens the supply control valve 11 when the chatter vibration or the precursor phenomenon is detected. The operation of supplying the lubricating oil 8 to the working surface 1a is automatically performed.

これにより、加工作用面1aに対する潤滑油8の供給動作を自動的に最適化することができる。
以上説明したように、上述の本発明の実施の形態によれば、たとえば、低分散ガラス等のように摩耗度が大きく傷が入りやすい硝材からなる被加工レンズ2等の研磨加工を行う場合に、加工速度に制約のある液中研磨等の低速研磨加工に依らずに、加工工具1や固定砥粒を用いた加工工具1−1を用いる一般の高速な研磨加工においても、被加工レンズ2の被加工面2aに傷等の不良を発生させない研磨加工を実現できる。
Thereby, the supply operation | movement of the lubricating oil 8 with respect to the working surface 1a can be optimized automatically.
As described above, according to the above-described embodiment of the present invention, for example, when polishing the lens 2 to be processed and the like made of a glass material having a high degree of wear and being easily damaged, such as low dispersion glass. In the general high-speed polishing using the processing tool 1-1 or the processing tool 1-1 using the fixed abrasive grains without depending on the low-speed polishing processing such as submerged polishing with a processing speed limitation, the lens 2 to be processed A polishing process that does not cause defects such as scratches on the processed surface 2a can be realized.

なお、本発明は、上述の実施の形態に例示した構成に限らず、その趣旨を逸脱しない範囲で種々変更可能であることは言うまでもない。   Needless to say, the present invention is not limited to the configuration exemplified in the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention.

本発明の一実施の形態である研磨方法を実施する研磨装置の構成の一例を示す略断面図である。It is a schematic sectional drawing which shows an example of a structure of the grinding | polishing apparatus which implements the grinding | polishing method which is one embodiment of this invention. 研磨装置の加工対象の光学部品の物理的性質の一例を示すグラフである。It is a graph which shows an example of the physical property of the optical component of the process target of a grinding | polishing apparatus. 本発明の一実施の形態である研磨装置の変形例を示す略断面図である。It is a schematic sectional drawing which shows the modification of the grinding | polishing apparatus which is one embodiment of this invention.

符号の説明Explanation of symbols

1 加工工具
1−1 加工工具
1a 加工作用面
1b 駆動軸
2 被加工レンズ
2a 被加工面
3 ホルダ
4 カンザシ
4a 自在継手部
5 第1ノズル
6 加工液
7 第2ノズル
8 潤滑油
10 加工制御部
11 供給制御弁
12 センサ
M 研磨装置
M1 研磨装置
DESCRIPTION OF SYMBOLS 1 Processing tool 1-1 Processing tool 1a Processing action surface 1b Drive shaft 2 Processing lens 2a Processing surface 3 Holder 4 Kanzashi 4a Universal joint part 5 1st nozzle 6 Processing fluid 7 2nd nozzle 8 Lubricating oil 10 Processing control part 11 Supply control valve 12 Sensor M Polishing device M1 Polishing device

Claims (9)

光学部品の被加工面に加工工具を接触させ、加工液を供給しつつ前記光学部品と前記加工工具を相対運動させることにより研磨加工を行う研磨方法であって、
(A)研磨剤が含まれた加工液のみを供給しつつ研磨工程を行う工程と、
(B)前記工程を終了し、前記加工液と共に潤滑油を供給し、前記潤滑油により前記被加工面と前記加工工具の加工作用面との密着力を低減しつつ前記研磨加工を行う工程と、
を行うことを特徴とする研磨方法。
A polishing method in which a processing tool is brought into contact with a processing surface of an optical component, and polishing is performed by relatively moving the optical component and the processing tool while supplying a processing liquid,
(A) a step of performing a polishing step while supplying only a machining fluid containing an abrasive;
(B) a step of finishing the step, supplying a lubricating oil together with the machining liquid, and performing the polishing while reducing an adhesion force between the work surface and a working surface of the processing tool by the lubricating oil ; ,
Polishing method characterized by performing.
請求項1記載の研磨方法において、
前記潤滑油は低粘度の鉱物油からなり、
前記光学部品と前記加工工具との摺動抵抗の増大による振動が発生したとき、または前記振動の発生の予兆を検出したときに、前記鉱物油を間欠的に噴霧して供給することを特徴とする研磨方法。
The polishing method according to claim 1,
The lubricating oil is composed of a low viscosity mineral oil,
The mineral oil is intermittently sprayed and supplied when vibration due to an increase in sliding resistance between the optical component and the processing tool occurs or when a sign of occurrence of the vibration is detected. Polishing method.
請求項1記載の研磨方法において、
前記光学部品は、摩耗度200以上および/またはヌープ硬さ550以下の物理的性質を有することを特徴とする研磨方法。
The polishing method according to claim 1,
The polishing method according to claim 1, wherein the optical component has a physical property with an abrasion degree of 200 or more and / or Knoop hardness of 550 or less.
請求項1記載の研磨方法において、
前記加工工具は樹脂を基材とした加工工具であることを特徴とする研磨方法。
The polishing method according to claim 1,
The polishing method, wherein the processing tool is a processing tool based on a resin.
光学部品を支持するホルダと、
前記光学部品の被加工面に摺接される加工工具と、
前記加工工具と前記光学部品との間に研磨剤を含む加工液を供給する第1ノズルと、
前記加工工具と前記光学部品との間に潤滑油を供給する第2ノズルと、
前記光学部品と前記加工工具を相対運動させる駆動機構と、
前記加工液を第1ノズルから吐出して潤滑油を第2ノズルから吐出しない工程と、前記工程を終了して、前記加工液を前記第1ノズルから吐出して前記潤滑油を前記第2ノズルから吐出する工程とを切り替えるための供給制御弁と、
を含むことを特徴とする研磨装置。
A holder for supporting optical components;
A processing tool slidably contacted with the processing surface of the optical component;
A first nozzle for supplying a processing liquid containing an abrasive between the processing tool and the optical component;
A second nozzle for supplying lubricating oil between the processing tool and the optical component;
A drive mechanism for relatively moving the optical component and the processing tool;
The process liquid is discharged from the first nozzle and the lubricant is not discharged from the second nozzle, and the process is terminated, and the process liquid is discharged from the first nozzle and the lubricant is discharged from the second nozzle. A supply control valve for switching between the process of discharging from,
A polishing apparatus comprising:
請求項5記載の研磨装置において、さらに、
前記加工工具および前記ホルダの少なくとも一方の振動および/または回転負荷の変動を検出するセンサと、
前記潤滑油の供給を制御する供給制御弁と、
前記センサを介して検出される前記振動および/または回転負荷の変動に基づいて前記供給制御弁の開度を制御する加工制御手段と、
を含むことを特徴とする研磨装置。
The polishing apparatus according to claim 5, further comprising:
A sensor for detecting a vibration of at least one of the processing tool and the holder and / or fluctuation of a rotational load;
A supply control valve for controlling the supply of the lubricating oil;
Processing control means for controlling the opening of the supply control valve based on fluctuations in the vibration and / or rotational load detected via the sensor;
A polishing apparatus comprising:
請求項6記載の研磨装置において、
前記潤滑油は低粘度の鉱物油からなり、
前記加工制御手段は、前記センサを介して前記光学部品と前記加工工具との摺動抵抗の増大による振動を検出したとき、または前記振動の発生の予兆を検出したときに、前記鉱物油が間欠的に噴霧して供給されるように前記供給制御弁を制御することを特徴とする研磨装置。
The polishing apparatus according to claim 6, wherein
The lubricating oil is composed of a low viscosity mineral oil,
When the processing control means detects vibration due to an increase in sliding resistance between the optical component and the processing tool via the sensor, or detects a sign of occurrence of the vibration, the mineral oil is intermittent. A polishing apparatus, wherein the supply control valve is controlled so as to be sprayed and supplied.
請求項5記載の研磨装置において、
前記光学部品は、摩耗度200以上および/またはヌープ硬さ550以下の物理的性質を有することを特徴とする研磨装置。
The polishing apparatus according to claim 5, wherein
The polishing apparatus according to claim 1, wherein the optical component has physical properties with a degree of wear of 200 or more and / or a Knoop hardness of 550 or less.
請求項5記載の研磨装置において、
前記加工工具は樹脂を基材とした加工工具であることを特徴とする研磨装置。
The polishing apparatus according to claim 5, wherein
The polishing apparatus, wherein the processing tool is a processing tool based on a resin.
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