JP5078201B2 - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法 Download PDF

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Publication number
JP5078201B2
JP5078201B2 JP2001208711A JP2001208711A JP5078201B2 JP 5078201 B2 JP5078201 B2 JP 5078201B2 JP 2001208711 A JP2001208711 A JP 2001208711A JP 2001208711 A JP2001208711 A JP 2001208711A JP 5078201 B2 JP5078201 B2 JP 5078201B2
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region
film
semiconductor film
heat treatment
metal element
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Expired - Fee Related
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JP2001208711A
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Japanese (ja)
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JP2002100569A (ja
JP2002100569A5 (enExample
Inventor
節男 中嶋
浩二 大力
康行 荒井
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Recrystallisation Techniques (AREA)
JP2001208711A 2000-07-11 2001-07-10 半導体装置の作製方法 Expired - Fee Related JP5078201B2 (ja)

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Application Number Priority Date Filing Date Title
JP2001208711A JP5078201B2 (ja) 2000-07-11 2001-07-10 半導体装置の作製方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000209950 2000-07-11
JP2000-209950 2000-07-11
JP2000209950 2000-07-11
JP2001208711A JP5078201B2 (ja) 2000-07-11 2001-07-10 半導体装置の作製方法

Publications (3)

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JP2002100569A JP2002100569A (ja) 2002-04-05
JP2002100569A5 JP2002100569A5 (enExample) 2008-08-07
JP5078201B2 true JP5078201B2 (ja) 2012-11-21

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003230138A1 (en) * 2002-05-22 2003-12-02 Koninklijke Philips Electronics N.V. Active matrix display devices and the manufacture thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3717634B2 (ja) * 1997-06-17 2005-11-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3844566B2 (ja) * 1997-07-30 2006-11-15 株式会社半導体エネルギー研究所 半導体装置の作製方法

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JP2002100569A (ja) 2002-04-05

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