JP5031215B2 - 多機能ｘ線分析システム - Google Patents

多機能ｘ線分析システム Download PDF

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Publication number
JP5031215B2
JP5031215B2 JP2005274293A JP2005274293A JP5031215B2 JP 5031215 B2 JP5031215 B2 JP 5031215B2 JP 2005274293 A JP2005274293 A JP 2005274293A JP 2005274293 A JP2005274293 A JP 2005274293A JP 5031215 B2 JP5031215 B2 JP 5031215B2
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Japan
Prior art keywords
ray
sample
angle
rays
detection element
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JP2005274293A
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English (en)
Japanese (ja)
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JP2006138837A5 (enExample
JP2006138837A (ja
Inventor
ヨクヒン ボリス
クロクーマル アレキサンダー
ラファエリ トザチ
マゾル イサク
ギヴァートズマン アモス
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ジョルダン バレー アプライド ラディエイション リミテッド
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Priority claimed from US10/946,426 external-priority patent/US7120228B2/en
Application filed by ジョルダン バレー アプライド ラディエイション リミテッド filed Critical ジョルダン バレー アプライド ラディエイション リミテッド
Publication of JP2006138837A publication Critical patent/JP2006138837A/ja
Publication of JP2006138837A5 publication Critical patent/JP2006138837A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
    • G01N15/0806—Details, e.g. sample holders, mounting samples for testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20075—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring interferences of X-rays, e.g. Borrmann effect

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP2005274293A 2004-09-21 2005-09-21 多機能ｘ線分析システム Expired - Lifetime JP5031215B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/946,426 US7120228B2 (en) 2004-09-21 2004-09-21 Combined X-ray reflectometer and diffractometer
US10/946,426 2004-09-21
US11/200,857 2005-08-10
US11/200,857 US7551719B2 (en) 2004-09-21 2005-08-10 Multifunction X-ray analysis system

Publications (3)

Publication Number Publication Date
JP2006138837A JP2006138837A (ja) 2006-06-01
JP2006138837A5 JP2006138837A5 (enExample) 2011-06-02
JP5031215B2 true JP5031215B2 (ja) 2012-09-19

Family

ID=36619748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005274293A Expired - Lifetime JP5031215B2 (ja) 2004-09-21 2005-09-21 多機能ｘ線分析システム

Country Status (2)

Country Link
JP (1) JP5031215B2 (enExample)
KR (1) KR101231731B1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7120228B2 (en) * 2004-09-21 2006-10-10 Jordan Valley Applied Radiation Ltd. Combined X-ray reflectometer and diffractometer
KR20080015735A (ko) * 2006-08-15 2008-02-20 조르단 밸리 세미컨덕터즈 리미티드 Ｘ선 빔 스폿 크기 제어
JP5081556B2 (ja) * 2007-09-28 2012-11-28 株式会社リガク デバイシェラー光学系を備えたｘ線回折測定装置とそのためのｘ線回折測定方法
US8903044B2 (en) * 2011-01-31 2014-12-02 Rigaku Corporation X-ray diffraction apparatus
US9588066B2 (en) * 2014-01-23 2017-03-07 Revera, Incorporated Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
KR102426344B1 (ko) * 2016-09-19 2022-07-27 소레크 뉴클리어 리서치 센터 샘플을 식별하는 ｘｒｆ 시스템과 방법
CN110567997B (zh) * 2019-10-11 2024-07-12 中国科学院上海应用物理研究所 一种用于散射实验站的真空腔体组件
EP3845891B1 (en) * 2019-12-30 2022-02-09 Xenocs SAS X-ray scattering apparatus
KR102135213B1 (ko) * 2020-01-10 2020-07-17 주식회사 에이피엔 초점 조절 방식의 방사선 콜리메이터 장치
CN119958472B (zh) * 2024-12-31 2025-11-21 深圳中科飞测科技股份有限公司 一种x射线散射量测设备、监控方法及介质
CN119915852A (zh) * 2025-02-14 2025-05-02 深圳市埃芯半导体科技有限公司 一种基于x射线小角衍射的晶圆检测系统及方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0666741A (ja) * 1992-08-24 1994-03-11 Mc Sci:Kk Ｘ線回折装置
JPH08313458A (ja) * 1995-05-17 1996-11-29 Rigaku Corp Ｘ線装置
JP3519203B2 (ja) * 1996-02-20 2004-04-12 理学電機株式会社 Ｘ線装置
JP2904191B2 (ja) * 1997-06-23 1999-06-14 日本電気株式会社 Ｘ線回折顕微方法およびｘ線回折顕微装置
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6895075B2 (en) * 2003-02-12 2005-05-17 Jordan Valley Applied Radiation Ltd. X-ray reflectometry with small-angle scattering measurement
JP3548556B2 (ja) * 2001-12-28 2004-07-28 株式会社リガク Ｘ線回折装置
DE60334910D1 (de) * 2002-08-02 2010-12-23 X Ray Optical Sys Inc Optische Vorrichtung aus einer Vielzahl von gekrümmten optischen Kristallen zum Fokussieren von Röntgenstrahlen
JP4327477B2 (ja) * 2003-02-27 2009-09-09 株式会社島津製作所 Ｘ線透視装置

Also Published As

Publication number Publication date
KR101231731B1 (ko) 2013-02-08
KR20060051491A (ko) 2006-05-19
JP2006138837A (ja) 2006-06-01

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