JP5022015B2 - 半導体レーザ素子及びそれを用いた光モジュール - Google Patents
半導体レーザ素子及びそれを用いた光モジュール Download PDFInfo
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
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- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H01S5/00—Semiconductor lasers
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- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
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- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1082—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region with a special facet structure, e.g. structured, non planar, oblique
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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Description
<実施の形態1>
図4は、本発明の第一の実施に係る波長1.3μm帯のInGaAlAs系短共振器マルチモードレーザの斜視図である。
素子の作製は以下の順で行った。始めにn型InP基板101上に有機金属気相成長を用いてInGaAlAsからなる歪MQW活性層102を成長した。この際、後に回折格子104を形成するための回折格子供給層(InGaAsP(組成波長1.2μm)100nm)を最上層に成長した(図示はせず)。
DBR領域側を前方とし、素子の前後端面にはそれぞれ約0.1%、90%の低反射膜108、高反射膜109を施した。完成した素子をジャンクションアップで、サブマウント上にダイボンディングした後、ステム上の43Ω終端抵抗とともにワイヤリングにより高周波接続した。
<実施の形態2>
図7は、本発明の第二の実施に係る波長1.3μm帯のInGaAlAs系短共振器マルチモードレーザの斜視図である。レーザ共振器の基本構造は、実施の形態1と同一である。本実施例では、レーザの出力端近傍に45度全反射半導体ミラー211を配置することで、レーザ出力光を基板裏面から取り出すことができる。このため、一種の面発光レーザとみなすこともできる。45度全反射半導体ミラー211直下の基板裏面表面にはInPレンズ212を配置した。45度全反射半導体ミラー211、InPレンズ212は共に公知のウェットエッチングにより形成した。なお、この時のエッチングの加工精度は、概45±5度である。また、InPレンズ212表面には無反射コート膜213を形成した。この結果、前方光導波路層205を通過したレーザ発振光は、透明なInP基板201を通過し基板裏面から出射される。
<実施の形態3>
図8は、本発明の第三の実施に係る波長1.3μm帯のInGaAlAs系短共振器マルチモードレーザの光モジュール斜視図である。
図8に示したようにアイソレータを用いないことによる部品コストの低減と共に、非常に簡素化された光学モジュール構成に基づき、従来構造に比べ経済的な改善も大きいことを付記する。
以上、3例の実施の形態にて本発明の主に、光通信用途の半導体レーザへの適用事例を説明した。本発明の適用範囲は光通信用途の半導体レーザに限られるものではなく、適度な光出力を低い消費電力で実現する任意の導波路型および面発光型半導体レーザに適用可能であることを付記する。
201…n型InP基板、202…InGaAlAs歪MQW活性層、203…InGaAsP光導波路層、204…回折格子、205…p型InPクラッド層およびp+-InGaAs型コンタクト層、206…表面電極、207…裏面電極、209…高反射膜、211…45°ミラー、212…裏面レンズ、213…低反射膜、
401…1.3μm帯InGaAlAs系短共振器マルチモードレーザ、402…キャン型モジュールパッケージ、403…キャップレンズ、404…モニタフォトダイオード、
501…キャン型モジュール、502…ファイバ一体型フェルール。
Claims (6)
- 半導体基板上の第1の領域に形成されたレーザ光を放射するための活性層と、
前記第1の領域に隣接する前記半導体基板上の第2の領域に形成された導波路層と、
前記活性層上に形成された回折格子層と、
前記回折格子層および前記導波路層を含む領域を覆うように形成されたクラッド層と、
前記クラッド層上の所定の領域に形成された表面電極と、
前記半導体基板の一側面に形成され、前記活性層で放射されたレーザ光を反射する反射膜とを有し、
前記活性層と回折格子層とを有する共振器の長さが50乃至100μmであり、
前記回折格子層と前記クラッド層を具備してなる規格化結合反射係数が3以上である分布帰還鏡をレーザ共振器の光学フィードバック系とし、
レーザ発振モードが複数の縦共振波長で同時発振していることを特徴とする半導体レーザ素子。 - 前記活性層への電流注入のオン・オフにより、レーザ光信号を発生させることを特徴とする請求項1記載の半導体レーザ素子。
- 前記導波路層の出射端部または出射端面近傍に、レーザ光出力の出射方向を変えるための斜めミラーを有することを特徴とする請求項1記載の半導体レーザ素子。
- 前記斜めミラーは、前記半導体基板の表面に対して40度乃至50度の傾斜角度を有することを特徴とする請求項3記載の半導体レーザ素子。
- 請求項1記載の半導体レーザ素子と、前記半導体レーザ素子から放射されるレーザ光を集光する光学レンズとを含む部材が搭載されたパッケージと、
前記光学レンズを透過したレーザ光を受光し伝搬する光ファイバとを有し、
前記レーザ光出力を、アイソレータを介さずに前記光ファイバに導くことを特徴とする光モジュール。 - 請求項1記載の半導体レーザ素子が搭載されたパッケージと、
前記半導体レーザ素子から放射されたレーザ光を受光し伝搬する光ファイバとを有し、
前記レーザ光出力を、光学レンズを用いて前記光ファイバに導くことを特徴とした光モジュール。
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JP2006337384A JP5022015B2 (ja) | 2006-12-14 | 2006-12-14 | 半導体レーザ素子及びそれを用いた光モジュール |
US11/705,406 US7933304B2 (en) | 2006-12-14 | 2007-02-13 | Semiconductor laser diode and optical module employing the same |
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JP2010010155A (ja) * | 2008-06-24 | 2010-01-14 | Hitachi Ltd | 光モジュール |
JP5194179B1 (ja) * | 2012-01-31 | 2013-05-08 | 国立大学法人東北大学 | 半導体レーザ装置および非線形光学効果利用機器 |
JP6200642B2 (ja) * | 2012-11-30 | 2017-09-20 | 日本オクラロ株式会社 | 光学装置 |
US9048618B2 (en) * | 2013-03-12 | 2015-06-02 | Finisar Corporation | Short gain cavity distributed bragg reflector laser |
JP6220246B2 (ja) * | 2013-11-26 | 2017-10-25 | 日本電信電話株式会社 | 直接変調レーザ |
JP6247944B2 (ja) * | 2014-01-29 | 2017-12-13 | 日本オクラロ株式会社 | 水平共振器面出射型レーザ素子 |
CN111863675A (zh) * | 2020-08-27 | 2020-10-30 | 无锡奥普特自动化技术有限公司 | 全自动反射镜耦光系统用自动加电机构 |
CN116454728B (zh) * | 2023-06-16 | 2023-08-25 | 上海三菲半导体有限公司 | 分布式反馈激光二极管、应用及制备方法 |
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JPH01283892A (ja) * | 1988-05-10 | 1989-11-15 | Furukawa Electric Co Ltd:The | 半導体レーザ素子 |
JPH03266489A (ja) * | 1990-03-16 | 1991-11-27 | Hitachi Ltd | 半導体レーザ |
JPH1117274A (ja) * | 1997-06-19 | 1999-01-22 | Hitachi Ltd | モードロック半導体レーザ装置、及びこれを用いた光通信システム |
JPH1155224A (ja) * | 1997-08-07 | 1999-02-26 | Toshiba Corp | 波長多重通信用装置、光通信方式およびシステム |
JP2000223774A (ja) * | 1999-01-28 | 2000-08-11 | Nippon Telegr & Teleph Corp <Ntt> | 波長可変光源 |
JP2002033551A (ja) * | 2000-07-18 | 2002-01-31 | Hitachi Ltd | 光送信装置及び光伝送システム |
JP4297321B2 (ja) * | 2001-07-27 | 2009-07-15 | 古河電気工業株式会社 | 半導体レーザ装置、半導体レーザモジュールおよびこれを用いたラマン増幅器 |
JP4026334B2 (ja) * | 2001-07-30 | 2007-12-26 | 株式会社日立製作所 | 半導体レーザ、分布帰還型半導体レーザおよび波長可変半導体レーザ |
US20030063645A1 (en) * | 2001-09-28 | 2003-04-03 | The Furukawa Electric Co., Ltd. | Semiconductor laser device and method for suppressing fabry perot oscillations |
JP2003234538A (ja) * | 2002-02-08 | 2003-08-22 | Sumitomo Electric Ind Ltd | 半導体レーザ素子 |
JP2004055622A (ja) * | 2002-07-16 | 2004-02-19 | Furukawa Electric Co Ltd:The | 半導体レーザ装置、半導体レーザモジュールおよび光ファイバ増幅器 |
JP4634010B2 (ja) * | 2003-01-28 | 2011-02-16 | 株式会社日立製作所 | 半導体光素子 |
JP2005136158A (ja) * | 2003-10-30 | 2005-05-26 | Matsushita Electric Ind Co Ltd | 光送信装置 |
US7598527B2 (en) * | 2004-01-20 | 2009-10-06 | Binoptics Corporation | Monitoring photodetector for integrated photonic devices |
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