JP5010198B2 - Light emitting device - Google Patents

Light emitting device Download PDF

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JP5010198B2
JP5010198B2 JP2006203963A JP2006203963A JP5010198B2 JP 5010198 B2 JP5010198 B2 JP 5010198B2 JP 2006203963 A JP2006203963 A JP 2006203963A JP 2006203963 A JP2006203963 A JP 2006203963A JP 5010198 B2 JP5010198 B2 JP 5010198B2
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light
substrate
led chips
led
emitting device
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JP2008034487A (en
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和司 吉田
將有 鎌倉
昌男 桐原
威 中筋
健一郎 田中
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

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Abstract

<P>PROBLEM TO BE SOLVED: To provide an inexpensive light-emitting device that allows to separately, simultaneously, and highly accurately detect light emitted from each of plural kinds of LED chips having different light-emitting colors while achieving miniaturization. <P>SOLUTION: In the light-emitting device, a mounting substrate 2 has each projector 2c internally projected from the tip of each wall 2b, and each projector 2c is provided with each of a plurality of light detecting elements 4 for separately detecting light emitted from each of the LED chips 1a-1d respectively having each light-emitting color. The mounting substrate 2 is composed so as to provide each light shield 39 that partitions an internal space surrounded by an LED mounting substrate 20 of a base substrate and the walls 2b, into each storage space for each of the LED chips 1a-1d respectively having each light-emitting color, in order to prevent the light respectively emitted from each of the LED chips 1a-1d from entering into light-receiving faces of two or more light detecting elements 4. <P>COPYRIGHT: (C)2008,JPO&amp;INPIT

Description

本発明は、発光色の異なる複数種のLEDチップおよび各発光色のLEDチップから放射される光を各別に検出する複数の光検出素子を備えた発光装置に関するものである。   The present invention relates to a light emitting device including a plurality of types of LED chips having different emission colors and a plurality of light detection elements that individually detect light emitted from the LED chips of each emission color.

従来から、発光色の異なる複数種のLEDチップ(例えば、赤色LEDチップ、緑色LEDチップ、青色LEDチップ)と、各LEDチップへ各別に駆動電流を供給する複数の駆動回路と、各LEDチップから放射される光の一部を光電変換する光電変換素子からなる光検出素子(光センサ)と、光検出素子の出力が基準値に保たれるように各駆動回路から各LEDチップへ供給する駆動電流をフィードバック制御する制御回路とを備え、各発光色ごとのLEDチップの温度特性や寿命特性の違いによらず所望の光色や色温度の混色光(例えば、白色光)が得られるようにした表示装置が提案されている(例えば、特許文献1参照)。   Conventionally, a plurality of types of LED chips having different emission colors (for example, a red LED chip, a green LED chip, and a blue LED chip), a plurality of drive circuits for supplying a drive current to each LED chip, and each LED chip Photodetection element (photosensor) composed of a photoelectric conversion element that photoelectrically converts a part of the emitted light, and a drive that is supplied from each drive circuit to each LED chip so that the output of the photodetection element is maintained at a reference value And a control circuit that feedback-controls the current so that mixed light (for example, white light) having a desired light color and color temperature can be obtained regardless of differences in temperature characteristics and lifetime characteristics of the LED chips for each emission color. A display device has been proposed (see, for example, Patent Document 1).

ここにおいて、上記特許文献1には、図6に示すように、互いに発光色の異なる複数個のLEDチップ100と、当該複数個のLEDチップ100が一表面側に搭載されるベース基板部であるベース基板221と、ベース基板221の上記一表面側において各LEDチップ100を囲む壁部を構成し各LEDチップ100から側方へ放射された光をベース基板221に対向配置された光拡散板230側へ反射させる反射枠222とを備え、反射枠222の内側面にフォトダイオードからなる光検出素子400を配設した発光装置が開示されている。
特開平10−49074号公報(段落〔0025〕および図11)
Here, in Patent Document 1, as shown in FIG. 6, there are a plurality of LED chips 100 having different emission colors and a base substrate portion on which the plurality of LED chips 100 are mounted on one surface side. A base substrate 221 and a light diffusing plate 230 in which a wall portion surrounding each LED chip 100 is formed on the one surface side of the base substrate 221 and light emitted from each LED chip 100 to the side is disposed to face the base substrate 221. A light-emitting device is disclosed that includes a reflection frame 222 that reflects to the side, and a photodetecting element 400 that is a photodiode disposed on the inner surface of the reflection frame 222.
Japanese Patent Laid-Open No. 10-49074 (paragraph [0025] and FIG. 11)

ところで、図6に示した構成の発光装置は、光検出素子400をベース基板221の上記一表面上においてLEDチップ100と並設した構成に比べて小型化でき、回路基板などへの実装面積を小さくすることができるが、光検出素子400の受光面に各LEDチップ100から放射された光が入射するので、各発光色のLEDチップ100それぞれから放射された光を各別に且つ同時に精度良く検出することができなかった。なお、光検出素子400の受光面側に各LEDチップ100の発光色を選択的に透過させるフィルタを設けることも考えられるが、各LEDチップ100の発光色に応じてフィルタを形成ないし用意する必要があり、製造コストや管理コストなどのコストが高くなってしまい、特に、LEDチップ100の発光色の組み合わせが異なる複数品種の発光装置を製造するような場合に、各品種の発光装置のコストアップの原因となってしまう。   By the way, the light emitting device having the configuration shown in FIG. 6 can be downsized as compared with the configuration in which the light detection element 400 is arranged in parallel with the LED chip 100 on the one surface of the base substrate 221, and the mounting area on the circuit board or the like can be reduced. Although the light can be reduced, the light emitted from each LED chip 100 is incident on the light receiving surface of the light detection element 400, so that the light emitted from each LED chip 100 of each emission color can be detected separately and simultaneously with high accuracy. I couldn't. Although it is possible to provide a filter that selectively transmits the light emission color of each LED chip 100 on the light receiving surface side of the light detection element 400, it is necessary to form or prepare a filter according to the light emission color of each LED chip 100. This increases the cost of manufacturing and management costs. In particular, when manufacturing multiple types of light emitting devices with different combinations of light emitting colors of the LED chip 100, the cost of each type of light emitting device is increased. It becomes the cause of.

また、図6に示した構成の発光装置は、光検出素子400の受光面へ光拡散板230を通して外乱光が入射してしまい、S/N比が低くなってしまう。   In the light emitting device having the configuration shown in FIG. 6, disturbance light is incident on the light receiving surface of the light detecting element 400 through the light diffusing plate 230, and the S / N ratio is lowered.

本発明は上記事由に鑑みて為されたものであり、その目的は、小型化を図りつつ、発光色の異なる複数種のLEDチップそれぞれから放射された光を各別に且つ同時に精度良く検出することができ、しかも、低コスト化が可能な発光装置を提供することにある。   The present invention has been made in view of the above-mentioned reasons, and its object is to detect light emitted from each of a plurality of types of LED chips having different emission colors with high accuracy while simultaneously reducing the size. It is another object of the present invention to provide a light emitting device that can reduce the cost.

請求項1の発明は、発光色が互いに異なる複数種のLEDチップと、各LEDチップが搭載されるベース基板部および各LEDチップを囲む形でベース基板部から突設された壁部を有する実装基板とを備え、実装基板は、壁部の先端部から内方へ張り出した張出部を有するとともに、当該張出部に各発光色のLEDチップそれぞれから放射された光を各別に検出する複数の光検出素子が設けられ、ベース基板部と壁部とで囲まれた内部空間を各発光色のLEDチップそれぞれの収納空間に区画し各LEDチップそれぞれから放射された光が2つ以上の光検出素子の受光面へ入射するのを阻止する遮光部が設けられてなることを特徴とする。   The invention of claim 1 is a mounting having a plurality of types of LED chips having different emission colors, a base substrate portion on which each LED chip is mounted, and a wall portion protruding from the base substrate portion so as to surround each LED chip. A mounting board having a projecting portion projecting inwardly from the tip of the wall portion, and a plurality of each detecting light emitted from each LED chip of each emission color in the projecting portion. The light detection element is provided, and the internal space surrounded by the base substrate portion and the wall portion is divided into storage spaces for the respective LED chips of the respective emission colors, and light emitted from each of the LED chips is two or more lights. It is characterized in that a light-shielding portion for preventing the light from entering the light-receiving surface of the detection element is provided.

この発明によれば、実装基板が壁部の先端部から内方へ張り出した張出部を有するとともに、当該張出部に各発光色のLEDチップそれぞれから放射された光を各別に検出する複数の光検出素子が設けられているので、複数種のLEDチップと複数の光検出素子とを同一平面上に配置する場合に比べて小型化を図れ、また、ベース基板部と壁部とで囲まれた内部空間を各発光色のLEDチップそれぞれの収納空間に区画し各LEDチップそれぞれから放射された光が2つ以上の光検出素子の受光面へ入射するのを阻止する遮光部が設けられているので、各発光色のLEDチップと各光検出素子とを1対1で対応させることができ、各発光色のLEDチップから放射された光を対応する光検出素子で精度良く検出することができ、しかも、各光検出素子それぞれに透過特性の異なるフィルタを設ける必要がないから、低コスト化が可能となる。   According to the present invention, the mounting substrate has the protruding portion that protrudes inward from the tip portion of the wall portion, and a plurality of light beams that are detected individually from the LED chips of the respective emission colors in the protruding portion. Therefore, it is possible to reduce the size compared to the case where a plurality of types of LED chips and a plurality of light detection elements are arranged on the same plane, and the base substrate portion and the wall portion surround the light detection device. The internal space is divided into storage spaces for the respective LED chips of the respective emission colors, and a light shielding portion is provided for preventing light emitted from each of the LED chips from entering the light receiving surfaces of two or more light detection elements. Therefore, the LED chips of the respective emission colors and the respective light detection elements can be made to correspond one-to-one, and the light emitted from the LED chips of the respective emission colors can be accurately detected by the corresponding light detection elements. And each light No need to leave providing different filter transmittance characteristics to each element, thus making it possible to lower costs.

請求項2の発明は、請求項1の発明において、前記遮光部は、前記ベース基板部から突設され前記内部空間を前記各収納空間に区画する仕切壁からなることを特徴とする。   According to a second aspect of the present invention, in the first aspect of the present invention, the light shielding portion includes a partition wall that protrudes from the base substrate portion and divides the internal space into the storage spaces.

この発明によれば、前記各LEDチップそれぞれから放射される光の放射範囲を遮光部により制限することができる。   According to this invention, the radiation range of the light radiated | emitted from each said LED chip can be restrict | limited by the light-shielding part.

請求項1の発明では、小型化を図りつつ、発光色の異なる複数種のLEDチップそれぞれから放射された光を各別に且つ同時に精度良く検出することができ、しかも、低コスト化が可能となるという効果がある。   According to the first aspect of the present invention, the light emitted from each of a plurality of types of LED chips having different emission colors can be detected separately and accurately with a reduction in size, and the cost can be reduced. There is an effect.

(実施形態1)
以下、本実施形態の発光装置について図1〜図3に基づいて説明する。
(Embodiment 1)
Hereinafter, the light emitting device of the present embodiment will be described with reference to FIGS.

本実施形態の発光装置は、発光色が互いに異なる複数種のLEDチップ1a,1b,1c,1dと、各LEDチップ1a〜1dを収納する収納凹所2aが一表面に形成され収納凹所2aの内底面に各LEDチップ1a〜1dが実装された実装基板2と、実装基板2の上記一表面側において収納凹所2aを閉塞する形で実装基板2に固着された透光性部材3と、実装基板2に設けられ各発光色のLEDチップ1a〜1dそれぞれから放射された光を各別に検出する複数(ここでは、4つ)の光検出素子4と、実装基板2の収納凹所2aに充填された透光性の封止樹脂(例えば、シリコーン樹脂、アクリル樹脂など)からなり各LEDチップ1a〜1dおよび各LEDチップ1a〜1dそれぞれに接続されたボンディングワイヤ14を封止した封止部5と備えている。ここで、実装基板2は、上記一表面側において収納凹所2aの周部から内方へ突出した庇状の張出部2cを有しており、当該張出部2cに各光検出素子4が設けられている。なお、本実施形態では、実装基板2と透光性部材3とでパッケージを構成しているが、透光性部材3は、必ずしも設けなくてもよく、必要に応じて適宜設ければよい。   In the light emitting device of this embodiment, a plurality of types of LED chips 1a, 1b, 1c, and 1d having different emission colors and a storage recess 2a that stores the LED chips 1a to 1d are formed on one surface, and the storage recess 2a. A mounting substrate 2 in which the LED chips 1a to 1d are mounted on the inner bottom surface thereof, and a translucent member 3 fixed to the mounting substrate 2 so as to close the housing recess 2a on the one surface side of the mounting substrate 2. , A plurality (four in this case) of light detection elements 4 provided on the mounting substrate 2 for detecting light emitted from the LED chips 1a to 1d of the respective emission colors, and a housing recess 2a of the mounting substrate 2 Each of the LED chips 1a to 1d and the bonding wires 14 that are connected to the LED chips 1a to 1d, each of which is made of a translucent sealing resin (for example, silicone resin, acrylic resin, etc.) filled in It is provided with a part 5. Here, the mounting substrate 2 has a hook-like protruding portion 2c protruding inward from the peripheral portion of the housing recess 2a on the one surface side, and each light detection element 4 is provided in the protruding portion 2c. Is provided. In the present embodiment, the package is constituted by the mounting substrate 2 and the translucent member 3, but the translucent member 3 is not necessarily provided, and may be appropriately provided as necessary.

ここにおいて、本実施形態では、LEDチップ1a,1b,1c,1dとして、それぞれ、赤色LEDチップ、緑色LEDチップ、青色LEDチップ、黄色LEDチップを採用しており、赤色光と緑色光と青色光と黄色光の混色光として白色光を得ることができる。ただし、各LEDチップ1a〜1dの発光色は特に限定するものではなく、所望の混色光に応じて適宜選択すればよい。   Here, in this embodiment, red LED chips, green LED chips, blue LED chips, and yellow LED chips are employed as the LED chips 1a, 1b, 1c, and 1d, respectively, and red light, green light, and blue light are used. White light can be obtained as a mixed light of yellow light and yellow light. However, the emission colors of the LED chips 1a to 1d are not particularly limited, and may be appropriately selected according to desired mixed color light.

実装基板2は、各LEDチップ1a〜1dが一表面側に搭載される矩形板状のLED搭載用基板20と、LED搭載用基板20の上記一表面側に対向配置され円形状の光取出窓41が形成されるとともに各光検出素子4が形成された光検出素子形成基板40と、LED搭載用基板20と光検出素子形成基板40との間に介在し光取出窓41に連通する矩形状の開口窓31が形成された中間層基板30とで構成されており、LED搭載用基板20と中間層基板30と光検出素子形成基板40とで囲まれた空間が上記収納凹所2aを構成している。ここにおいて、LED搭載用基板20および中間層基板30および光検出素子形成基板40の外周形状は矩形状であり、中間層基板30および光検出素子形成基板40はLED搭載用基板20と同じ外形寸法に形成されている。また、光検出素子形成基板40の厚み寸法はLED搭載用基板20および中間層基板30の厚み寸法に比べて小さく設定されている。なお、本実施形態では、LED実装用基板20が、各LEDチップ1a〜1dが搭載されるベース基板部を構成し、中間層基板30と光検出素子形成基板40とで、各LEDチップ1a〜1dを囲む形でベース基板部から突設された壁部2bを構成し、光検出素子形成基板40において中間層基板30の開口窓31上に張り出した部位が、壁部2bの先端部から内方へ突出する張出部2cを構成している。   The mounting substrate 2 includes a rectangular plate-shaped LED mounting substrate 20 on which each LED chip 1a to 1d is mounted on one surface side, and a circular light extraction window disposed to face the one surface side of the LED mounting substrate 20 41 is formed, and a light detection element forming substrate 40 on which each light detection element 4 is formed, and a rectangular shape that is interposed between the LED mounting substrate 20 and the light detection element formation substrate 40 and communicates with the light extraction window 41. A space surrounded by the LED mounting substrate 20, the intermediate layer substrate 30, and the light detection element forming substrate 40 constitutes the housing recess 2a. is doing. Here, the outer peripheral shapes of the LED mounting substrate 20, the intermediate layer substrate 30, and the light detection element formation substrate 40 are rectangular, and the intermediate layer substrate 30 and the light detection element formation substrate 40 have the same outer dimensions as the LED mounting substrate 20. Is formed. Further, the thickness dimension of the light detection element forming substrate 40 is set smaller than the thickness dimension of the LED mounting substrate 20 and the intermediate layer substrate 30. In the present embodiment, the LED mounting substrate 20 constitutes a base substrate portion on which the LED chips 1a to 1d are mounted, and the intermediate layer substrate 30 and the light detection element formation substrate 40 constitute the LED chips 1a to 1d. A wall portion 2b that protrudes from the base substrate portion so as to surround 1d is configured, and a portion of the light detection element forming substrate 40 that protrudes above the opening window 31 of the intermediate layer substrate 30 is formed from the front end portion of the wall portion 2b. The overhang | projection part 2c which protrudes toward the direction is comprised.

上述のLED搭載用基板20、中間層基板30、光検出素子形成基板40は、それぞれ、導電形がn形で主表面が(100)面のシリコン基板20a,30a,40aを用いて形成してあり、中間層基板30の内側面が、アルカリ系溶液(例えば、TMAH溶液、KOH溶液など)を用いた異方性エッチングにより形成された(111)面により構成されており(つまり、中間層基板30は、開口窓31の開口面積がLED搭載用基板20から離れるにつれて徐々に大きくなっており)、LEDチップ1a〜1dから側方(壁部2b側)へ放射された光を前方(張出部2c側)へ反射するミラー2dを構成している。要するに、本実施形態では、中間層基板30が各LEDチップ1a〜1dから側方へ放射された光を前方へ反射させる枠状のリフレクタを兼ねている。   The LED mounting substrate 20, the intermediate layer substrate 30, and the light detection element formation substrate 40 described above are formed using silicon substrates 20 a, 30 a, and 40 a each having an n-type conductivity and a (100) plane main surface. In addition, the inner side surface of the intermediate layer substrate 30 is configured by a (111) plane formed by anisotropic etching using an alkaline solution (for example, TMAH solution, KOH solution, etc.) (that is, the intermediate layer substrate) 30, the opening area of the opening window 31 gradually increases as the distance from the LED mounting substrate 20 increases.) Light emitted from the LED chips 1 a to 1 d to the side (wall portion 2 b side) is forward (projected). This constitutes a mirror 2d that reflects to the part 2c side). In short, in the present embodiment, the intermediate layer substrate 30 also serves as a frame-like reflector that reflects light emitted from the LED chips 1a to 1d to the side.

LED搭載用基板20は、シリコン基板20aの一表面側(図1(a)における上面側)に、LEDチップ1a〜1dの両電極それぞれと電気的に接続される2つ1組の導体パターン25a,25aが4組形成されるとともに、中間層基板30に形成された2つの貫通孔配線34,34を介して光検出素子4と電気的に接続される2つ1組の導体パターン25b,25bが4組形成されており、各導体パターン25a,25a,25b,25bとシリコン基板20aの他表面側(図1(a)における下面側)に形成された各外部接続用電極27a,27a,27b,27bとがそれぞれ貫通孔配線24を介して電気的に接続されている。また、LED搭載用基板20は、シリコン基板20aの上記一表面側に、中間層基板30と接合するための接合用金属層29も形成されている。   The LED mounting substrate 20 has two conductor patterns 25a that are electrically connected to the electrodes of the LED chips 1a to 1d on one surface side (the upper surface side in FIG. 1A) of the silicon substrate 20a. , 25a are formed, and a pair of conductor patterns 25b, 25b that are electrically connected to the photodetecting element 4 through two through-hole wirings 34, 34 formed in the intermediate layer substrate 30. Are formed, and each external connection electrode 27a, 27a, 27b formed on the other surface side (the lower surface side in FIG. 1A) of each conductor pattern 25a, 25a, 25b, 25b and the silicon substrate 20a. 27b are electrically connected to each other through the through-hole wiring 24. The LED mounting substrate 20 is also formed with a bonding metal layer 29 for bonding to the intermediate layer substrate 30 on the one surface side of the silicon substrate 20a.

本実施形態におけるLEDチップ1a〜1dは、結晶成長用基板として導電性基板を用い厚み方向の両面に電極(図示せず)が形成された可視光LEDチップである。そこで、LED搭載用基板20は、各LEDチップ1a〜1dが電気的に接続される2つの導体パターン25a,25aのうちの一方の導体パターン25aを、LEDチップ1a〜1dがダイボンディングされる矩形状のダイパッド部25aaと、ダイパッド部25aaに連続一体に形成され貫通孔配線24との接続部位となる引き出し配線部25abとで構成してある。要するに、LEDチップ1a〜1dは、上記一方の導体パターン25aのダイパッド部25aaにダイボンディングされており、ダイパッド部25aa側の電極がダイパッド部25aaに接合されて電気的に接続され、光取り出し面側の電極がボンディングワイヤ14を介して他方の導体パターン25aと電気的に接続されている。   The LED chips 1a to 1d in the present embodiment are visible light LED chips in which a conductive substrate is used as a crystal growth substrate and electrodes (not shown) are formed on both surfaces in the thickness direction. Therefore, the LED mounting substrate 20 is formed by connecting one of the two conductor patterns 25a and 25a to which the LED chips 1a to 1d are electrically connected to the LED chip 1a to 1d. The die pad portion 25aa has a shape, and a lead-out wiring portion 25ab that is continuously formed integrally with the die pad portion 25aa and serves as a connection portion with the through-hole wiring 24. In short, the LED chips 1a to 1d are die-bonded to the die pad portion 25aa of the one conductor pattern 25a, and the electrodes on the die pad portion 25aa side are joined and electrically connected to the die pad portion 25aa, and the light extraction surface side The electrode is electrically connected to the other conductor pattern 25a through the bonding wire.

また、LED搭載用基板20は、シリコン基板20aの上記他表面側における各ダイパッド部25aaそれぞれの投影領域に、シリコン基板20aよりも熱伝導率の高い金属材料からなる矩形状の放熱用パッド部28が形成されており、シリコン基板20aの厚み方向において重なるダイパッド部25aaと放熱用パッド部28とがシリコン基板20aよりも熱伝導率の高い金属材料(例えば、Cuなど)からなる複数の円柱状のサーマルビア26を介して熱的に結合されており、LEDチップ1a〜1dで発生した熱が各サーマルビア26および放熱用パッド部28を介して放熱されるようになっている。   Further, the LED mounting substrate 20 has a rectangular heat dissipation pad portion 28 made of a metal material having a higher thermal conductivity than the silicon substrate 20a in the projection region of each die pad portion 25aa on the other surface side of the silicon substrate 20a. The die pad portion 25aa and the heat dissipation pad portion 28 that overlap in the thickness direction of the silicon substrate 20a are formed of a plurality of cylindrical shapes made of a metal material (for example, Cu) having a higher thermal conductivity than the silicon substrate 20a. The thermal vias 26 are thermally coupled to each other, and the heat generated in the LED chips 1a to 1d is radiated through the thermal vias 26 and the heat radiation pad portions 28.

ところで、LED搭載用基板20は、シリコン基板20aに、上述の各貫通孔配線24それぞれが内側に形成される複数の貫通孔22aと、上述の各サーマルビア26それぞれが内側に形成される複数の貫通孔22bとが厚み方向に貫設され、シリコン基板20aの上記一表面および上記他表面と各貫通孔22a,22bの内面とに跨って熱酸化膜(シリコン酸化膜)からなる絶縁膜23が形成されており、各導体パターン25a,25a,25b,25b、接合用金属層29、各外部接続用電極27a,27a,27b,27b、各放熱用パッド部28、各貫通孔配線24および各サーマルビア26がシリコン基板20aと電気的に絶縁されている。   By the way, the LED mounting substrate 20 has a plurality of through holes 22a in which each of the above-described through-hole wirings 24 is formed inside and a plurality of each of the above-described thermal vias 26 are formed in the silicon substrate 20a. A through hole 22b is provided in the thickness direction, and an insulating film 23 made of a thermal oxide film (silicon oxide film) is formed across the one surface and the other surface of the silicon substrate 20a and the inner surfaces of the through holes 22a and 22b. The conductor patterns 25a, 25a, 25b, and 25b, the bonding metal layer 29, the external connection electrodes 27a, 27a, 27b, and 27b, the heat dissipation pad portions 28, the through-hole wirings 24, and the thermal elements are formed. The via 26 is electrically insulated from the silicon substrate 20a.

ここにおいて、各導体パターン25a,25a,25b,25b、接合用金属層29、各外部接続用電極27a,27a,27b,27b、各放熱用パッド部28は、絶縁膜23上に形成されたTi膜と当該Ti膜上に形成されたAu膜との積層膜により構成されており、同時に形成してある。なお、本実施形態では、絶縁膜23上のTi膜の膜厚を15〜50nm、Ti膜上のAu膜の膜厚を500nmに設定してあるが、これらの数値は一例であって特に限定するものではない。また、各Au膜の材料は、純金に限らず不純物を添加したものでもよい。また、各Au膜と絶縁膜23との間に密着性改善用の密着層としてTi膜を介在させてあるが、密着層の材料はTiに限らず、例えば、Cr、Nb、Zr、TiN、TaNなどでもよい。また、貫通孔配線24およびサーマルビア26の材料としては、Cuを採用しているが、Cuに限らず、例えば、Niなどを採用してもよい。   Here, each conductor pattern 25a, 25a, 25b, 25b, bonding metal layer 29, each external connection electrode 27a, 27a, 27b, 27b, and each heat radiation pad portion 28 are formed on the insulating film 23. It is composed of a laminated film of a film and an Au film formed on the Ti film, and is formed at the same time. In this embodiment, the thickness of the Ti film on the insulating film 23 is set to 15 to 50 nm, and the thickness of the Au film on the Ti film is set to 500 nm. However, these numerical values are only examples and are particularly limited. Not what you want. Further, the material of each Au film is not limited to pure gold, and may be one added with impurities. In addition, although a Ti film is interposed as an adhesion layer for improving adhesion between each Au film and the insulating film 23, the material of the adhesion layer is not limited to Ti, for example, Cr, Nb, Zr, TiN, TaN or the like may be used. Moreover, although Cu is adopted as the material of the through-hole wiring 24 and the thermal via 26, it is not limited to Cu, and for example, Ni may be adopted.

中間層基板30は、シリコン基板30aの一表面側(図1(a)における下面側)に、LED搭載用基板20の2つの導体パターン25b,25bと接合されて電気的に接続される2つ1組の導体パターン(図示せず)が4組形成されるとともに、LED搭載用基板20の接合用金属層29と接合される接合用金属層36が形成されている。また、中間層基板30は、シリコン基板30aの他表面側(図1(a)における上面側)に、貫通孔配線34,34を介して上記一表面側の2つ1組の導体パターンと電気的に接続される2つ1組の導体パターン37,37が4組形成されるとともに、光検出素子形成基板40と接合するための接合用金属層38が形成されている。   Two intermediate layer substrates 30 are joined to and electrically connected to the two conductor patterns 25b and 25b of the LED mounting substrate 20 on one surface side (the lower surface side in FIG. 1A) of the silicon substrate 30a. Four sets of conductor patterns (not shown) are formed, and a bonding metal layer 36 to be bonded to the bonding metal layer 29 of the LED mounting substrate 20 is formed. Further, the intermediate layer substrate 30 is electrically connected to the other surface side of the silicon substrate 30a (upper surface side in FIG. 1 (a)) through the through-hole wirings 34, 34, and a pair of conductor patterns on the one surface side. Four sets of two conductor patterns 37, 37 that are connected to each other are formed, and a bonding metal layer 38 for bonding to the light detection element forming substrate 40 is formed.

また、中間層基板30は、上述の複数の貫通孔配線34それぞれが内側に形成される複数の貫通孔32がシリコン基板30aの厚み方向に貫設され、シリコン基板30aの上記一表面および上記他表面と各貫通孔32の内面とに跨って熱酸化膜(シリコン酸化膜)からなる絶縁膜33が形成されており、上記一表面側の各導体パターンおよび上記他表面側の各導体パターン37,37および各接合用金属層36,38がシリコン基板30aと電気的に絶縁されている。ここにおいて、上記一表面側の各導体パターンおよび上記他表面側の各導体パターン37,37および各接合用金属層36,38は、絶縁膜33上に形成されたTi膜と当該Ti膜上に形成されたAu膜との積層膜により構成されており、同時に形成してある。なお、本実施形態では、絶縁膜33上のTi膜の膜厚を15〜50nm、Ti膜上のAu膜の膜厚を500nmに設定してあるが、これらの数値は一例であって特に限定するものではない。ここにおいて、各Au膜の材料は、純金に限らず不純物を添加したものでもよい。また、各Au膜と絶縁膜33との間に密着性改善用の密着層としてTi膜を介在させてあるが、密着層の材料はTiに限らず、例えば、Cr、Nb、Zr、TiN、TaNなどでもよい。また、貫通孔配線34の材料としては、Cuを採用しているが、Cuに限らず、例えば、Niなどを採用してもよい。   In addition, the intermediate layer substrate 30 has a plurality of through holes 32 formed therein in the thickness direction of the silicon substrate 30a, and the one surface of the silicon substrate 30a and the other. An insulating film 33 made of a thermal oxide film (silicon oxide film) is formed across the surface and the inner surface of each through hole 32, and each conductor pattern on the one surface side and each conductor pattern 37 on the other surface side, 37 and each of the bonding metal layers 36 and 38 are electrically insulated from the silicon substrate 30a. Here, the conductor patterns on the one surface side, the conductor patterns 37 and 37 on the other surface side, and the bonding metal layers 36 and 38 are formed on the Ti film formed on the insulating film 33 and the Ti film, respectively. It is composed of a laminated film with the formed Au film and is formed at the same time. In this embodiment, the thickness of the Ti film on the insulating film 33 is set to 15 to 50 nm, and the thickness of the Au film on the Ti film is set to 500 nm. However, these numerical values are only examples and are particularly limited. Not what you want. Here, the material of each Au film is not limited to pure gold, and may be added with impurities. Further, although a Ti film is interposed as an adhesion improving layer for adhesion between each Au film and the insulating film 33, the material of the adhesion layer is not limited to Ti, for example, Cr, Nb, Zr, TiN, TaN or the like may be used. Moreover, although Cu is adopted as the material of the through-hole wiring 34, it is not limited to Cu, and for example, Ni may be adopted.

光検出素子形成基板40は、シリコン基板40aの一表面側(図1(a)における下面側)に、中間層基板30の2つの導体パターン37,37と接合されて電気的に接続される2つ1組の導体パターン47a,47b(図3参照)が4組形成されるとともに、中間層基板30の接合用金属層38と接合される接合用金属層48が形成されている。ここにおいて、各光検出素子4は、フォトダイオードにより構成されており、光検出素子形成基板40に形成された2つ1組の導体パターン47a,47bの一方の導体パターン47aは、光検出素子4を構成するフォトダイオードのp形領域4aに電気的に接続され、他方の導体パターン47bは、上記フォトダイオードのn形領域4bを構成するシリコン基板40aに電気的に接続されている。   The photodetecting element forming substrate 40 is bonded to and electrically connected to the two conductor patterns 37 and 37 of the intermediate layer substrate 30 on one surface side (the lower surface side in FIG. 1A) of the silicon substrate 40a. Four sets of conductor patterns 47a and 47b (see FIG. 3) are formed, and a bonding metal layer 48 bonded to the bonding metal layer 38 of the intermediate layer substrate 30 is formed. Here, each light detection element 4 is configured by a photodiode, and one conductor pattern 47a of the pair of conductor patterns 47a and 47b formed on the light detection element formation substrate 40 is the light detection element 4. Is electrically connected to the p-type region 4a of the photodiode, and the other conductor pattern 47b is electrically connected to the silicon substrate 40a constituting the n-type region 4b of the photodiode.

また、光検出素子形成基板40は、シリコン基板40aの上記一表面側にシリコン酸化膜からなる絶縁膜43が形成されており、当該絶縁膜43がフォトダイオードの反射防止膜を兼ねている。また、光検出素子形成基板40は、上記一方の導体パターン47aが、絶縁膜43に形成した第1のコンタクトホール(図示せず)を通してp形領域43aと電気的に接続され、上記他方の導体パターン47bが絶縁膜43に形成した第2のコンタクトホール(図示せず)を通してn形領域4bと電気的に接続されている。ここにおいて、各導体パターン47a,47bおよび接合用金属層48は、絶縁膜43上に形成されたTi膜と当該Ti膜上に形成されたAu膜との積層膜により構成されており、同時に形成してある。なお、本実施形態では、絶縁膜43上のTi膜の膜厚を15〜50nm、Ti膜上のAu膜の膜厚を500nmに設定してあるが、これらの数値は一例であって特に限定するものではない。ここにおいて、各Au膜の材料は、純金に限らず不純物を添加したものでもよい。また、各Au膜と絶縁膜43との間に密着性改善用の密着層としてTi膜を介在させてあるが、密着層の材料はTiに限らず、例えば、Cr、Nb、Zr、TiN、TaNなどでもよい。   Further, in the photodetecting element forming substrate 40, an insulating film 43 made of a silicon oxide film is formed on the one surface side of the silicon substrate 40a, and the insulating film 43 also serves as an antireflection film of the photodiode. In the photodetecting element forming substrate 40, the one conductor pattern 47a is electrically connected to the p-type region 43a through a first contact hole (not shown) formed in the insulating film 43, and the other conductor is formed. The pattern 47b is electrically connected to the n-type region 4b through a second contact hole (not shown) formed in the insulating film 43. Here, each of the conductor patterns 47a and 47b and the bonding metal layer 48 is composed of a laminated film of a Ti film formed on the insulating film 43 and an Au film formed on the Ti film, and is formed at the same time. It is. In this embodiment, the thickness of the Ti film on the insulating film 43 is set to 15 to 50 nm, and the thickness of the Au film on the Ti film is set to 500 nm. However, these numerical values are only examples and are particularly limited. Not what you want. Here, the material of each Au film is not limited to pure gold, and may be added with impurities. Further, although a Ti film is interposed as an adhesion improving layer for adhesion between each Au film and the insulating film 43, the material of the adhesion layer is not limited to Ti, for example, Cr, Nb, Zr, TiN, TaN or the like may be used.

上述の実装基板2の形成にあたっては、各光検出素子4、絶縁膜43、各導体パターン47a,47b、および接合用金属層48が形成されたシリコン基板40aと中間層基板30とを低温での直接接合が可能な常温接合法などにより接合する第1の接合工程を行った後、シリコン基板40aを所望の厚みまで研磨する研磨工程を行い、その後、誘導結合プラズマ(ICP)型のドライエッチング装置などを用いてシリコン基板40aに光取出窓41を形成する光取出窓形成工程を行うことで光検出素子形成基板40を完成させてから、LEDチップ1a〜1dが実装され各ボンディングワイヤ14の結線が行われたLED搭載用基板20と中間層基板30とを常温接合法などにより接合する第2の接合工程を行うようにすればよい。なお、常温接合法では、接合前に互いの接合表面へアルゴンのプラズマ若しくはイオンビーム若しくは原子ビームを真空中で照射して各接合表面の清浄化・活性化を行ってから、接合表面同士を接触させ、常温下で直接接合する。   In forming the mounting substrate 2 described above, the silicon substrate 40a and the intermediate layer substrate 30 on which the respective light detection elements 4, the insulating film 43, the respective conductor patterns 47a and 47b, and the bonding metal layer 48 are formed are formed at a low temperature. After performing a first bonding step for bonding by a room temperature bonding method or the like capable of direct bonding, a polishing step for polishing the silicon substrate 40a to a desired thickness is performed, and then an inductively coupled plasma (ICP) type dry etching apparatus After completing the light extraction window forming step of forming the light extraction window 41 on the silicon substrate 40a using the above, the light detection element formation substrate 40 is completed, and then the LED chips 1a to 1d are mounted and the bonding wires 14 are connected. What is necessary is just to perform the 2nd joining process which joins the board | substrate 20 for LED mounting and intermediate | middle layer board | substrate 30 by which normal temperature joining was performed. In the normal temperature bonding method, the bonding surfaces are contacted with each other after the bonding surfaces are cleaned and activated by irradiating the bonding surfaces with argon plasma, ion beam or atomic beam in vacuum before bonding. And bond directly at room temperature.

上述の第1の接合工程では、シリコン基板40aの接合用金属層48と中間層基板30の接合用金属層38とが接合されるとともに、シリコン基板40aの導体パターン47a,47bと中間層基板30の導体パターン37,37とが接合され電気的に接続される。ここで、導体パターン47a,47bと導体パターン37,37との接合部位は、貫通孔配線34に重なる領域からずらしてあるので、導体パターン47a,47bと導体パターン37,37との互いの接合面の平坦度を高めることができ、接合歩留まりを高めることができるとともに接合信頼性を高めることができる。また、第2の接合工程では、LED搭載用基板20の接合用金属層29と中間層基板30の接合用金属層36とが接合されるとともに、LED搭載用基板20の導体パターン25b,25bと中間層基板30の導体パターン35,35とが接合され電気的に接続される。ここで、導体パターン25b,25bと導体パターン35,35との接合部位は、貫通孔配線24に重なる領域および貫通孔配線34に重なる領域からずらしてあるので、導体パターン25b,25bと導体パターン35,35との互いの接合面の平坦度を高めることができ、接合歩留まりを高めることができるとともに接合信頼性を高めることができる。   In the first bonding step, the bonding metal layer 48 of the silicon substrate 40a and the bonding metal layer 38 of the intermediate layer substrate 30 are bonded, and the conductor patterns 47a and 47b of the silicon substrate 40a and the intermediate layer substrate 30 are bonded. The conductor patterns 37 and 37 are joined and electrically connected. Here, since the joint portions of the conductor patterns 47a and 47b and the conductor patterns 37 and 37 are shifted from the region overlapping the through-hole wiring 34, the joint surfaces of the conductor patterns 47a and 47b and the conductor patterns 37 and 37 are mutually connected. The flatness of the substrate can be increased, the junction yield can be increased, and the junction reliability can be increased. In the second bonding step, the bonding metal layer 29 of the LED mounting substrate 20 and the bonding metal layer 36 of the intermediate layer substrate 30 are bonded, and the conductor patterns 25b and 25b of the LED mounting substrate 20 The conductor patterns 35 and 35 of the intermediate layer substrate 30 are joined and electrically connected. Here, since the joint portions of the conductor patterns 25b and 25b and the conductor patterns 35 and 35 are shifted from the region overlapping the through-hole wiring 24 and the region overlapping the through-hole wiring 34, the conductor patterns 25b and 25b and the conductor pattern 35 are arranged. , 35, the flatness of the mutual joint surfaces can be increased, the joint yield can be increased, and the joint reliability can be enhanced.

また、上述の透光性部材3は、透光性材料(例えば、シリコーン、アクリル樹脂、ガラスなど)からなる透光性基板を用いて形成してある。ここで、透光性部材3は、実装基板2と同じ外周形状の矩形板状に形成されており、実装基板2側とは反対の光取り出し面に、LEDチップ1a〜1dから放射された光の全反射を抑制する微細凹凸構造が形成されている。ここにおいて、透光性部材3の光取り出し面に形成する微細凹凸構造は、多数の微細な凹部が2次元周期構造を有するように形成されている。なお、上述の微細凹凸構造は、例えば、レーザ加工技術やエッチング技術やインプリントリソグラフィ技術などを利用して形成すればよい。   Moreover, the above-mentioned translucent member 3 is formed using the translucent board | substrate which consists of translucent materials (for example, silicone, an acrylic resin, glass, etc.). Here, the translucent member 3 is formed in a rectangular plate shape having the same outer peripheral shape as the mounting substrate 2, and light emitted from the LED chips 1 a to 1 d on the light extraction surface opposite to the mounting substrate 2 side. A fine concavo-convex structure that suppresses total reflection is formed. Here, the fine concavo-convex structure formed on the light extraction surface of the translucent member 3 is formed such that many fine concave portions have a two-dimensional periodic structure. The fine concavo-convex structure described above may be formed using, for example, a laser processing technique, an etching technique, an imprint lithography technique, or the like.

本実施形態の発光装置の製造にあたっては、上述の各シリコン基板20a,30a,40aとして、それぞれLED搭載用基板20、中間層基板30、光検出素子形成基板40を多数形成可能なシリコンウェハを用いるとともに、上述の透光性基板として透光性部材3を多数形成可能なウェハ状のもの(透光性ウェハ)を用い、上述の第1の接合工程、研磨工程、第2の接合工程、光取出窓形成工程、第2の接合工程、実装基板2の収納凹所2aに封止樹脂を充填して封止部5を形成する封止部形成工程、封止部形成工程の後で実装基板2と透光性部材3とを接合する第3の接合工程などの各工程をウェハレベルで行うことでウェハレベルパッケージ構造体を形成してから、ダイシング工程により実装基板2のサイズに分割されている。したがって、LED搭載用基板20と中間層基板30と光検出素子形成基板40と透光性部材3とが同じ外形サイズとなり、小型のパッケージを実現できるとともに、製造が容易になる。また、中間層基板30におけるミラー2dと光検出素子形成基板40における光検出素子4との相対的な位置精度を高めることができ、LEDチップ1a〜1dから側方へ放射された光がミラー2dにより反射されて各LEDチップ1a〜1dに対応する光検出素子4へ導かれる。   In manufacturing the light emitting device of this embodiment, a silicon wafer capable of forming a large number of LED mounting substrates 20, intermediate layer substrates 30, and light detection element formation substrates 40 is used as each of the silicon substrates 20a, 30a, and 40a described above. In addition, a wafer-like one (translucent wafer) capable of forming a large number of translucent members 3 is used as the above-described translucent substrate, and the above-described first bonding step, polishing step, second bonding step, light The mounting substrate after the extraction window forming step, the second bonding step, the sealing portion forming step of filling the housing recess 2a of the mounting substrate 2 with the sealing resin to form the sealing portion 5, and the sealing portion forming step The wafer level package structure is formed by performing each process such as a third joining process for joining 2 and the translucent member 3 at the wafer level, and then divided into the size of the mounting substrate 2 by the dicing process. Yes. Therefore, the LED mounting substrate 20, the intermediate layer substrate 30, the light detection element forming substrate 40, and the translucent member 3 have the same outer size, so that a small package can be realized and manufacturing is facilitated. In addition, the relative positional accuracy between the mirror 2d in the intermediate layer substrate 30 and the light detecting element 4 in the light detecting element forming substrate 40 can be improved, and the light emitted from the LED chips 1a to 1d to the side is mirror 2d. And is guided to the light detection elements 4 corresponding to the LED chips 1a to 1d.

ところで、本実施形態の発光装置は、上述のように、光検出素子形成基板40に各発光色のLEDチップ1a〜1dそれぞれから放射された光を各別に検出する4つの光検出素子4が設けられており、4つの光検出素子4と互いに発光色の異なる4つのLEDチップ1a〜1dとを1対1で対応させるために、ベース基板部であるLED搭載用基板20と壁部2bとで囲まれた内部空間(つまり、実装基板2における収納凹所2aの内部空間)を各発光色のLEDチップ1a〜1dそれぞれの収納空間に区画し各LEDチップ1a〜1dそれぞれから放射された光が2つ以上の光検出素子4の受光面へ入射するのを阻止する十字状の遮光部39が、中間層基板30に連続一体に形成されている。見方を変えれば、本実施形態の発光装置では、遮光部39が、ベース基板部であるLED搭載用基板20から突設され上記内部空間を上記各収納空間に区画する十字状の仕切壁により構成されている。ここで、本実施形態の発光装置では、中間層基板30の開口窓31が遮光部39によって4つの小空間31aに区画されており、各LEDチップ1a〜1dそれぞれから放射される光の放射範囲が遮光部39により制限される。ここにおいて、本実施形態では、中間層基板30における遮光部39がアルカリ系溶液を用いた異方性エッチングにより開口窓31と同時に形成されており、遮光部39の各側面が開口窓31の内側面と同様に(111)面となっているので、遮光部39の各側面がLEDチップ1a〜1dから放射された光を前方へ反射するミラーとして機能する。なお、本実施形態の発光装置では、ベース基板部たるLED搭載用基板20からの遮光部39の突出高さが壁部2bの突出高さよりも低くなっており、遮光部39の先端面と透光性部材3とが離間しているので、遮光部39に起因して影(暗部)が生じるのを防止することができる。   By the way, as described above, the light emitting device according to the present embodiment is provided with the four light detecting elements 4 that individually detect the light emitted from the LED chips 1a to 1d of the respective emission colors on the light detecting element forming substrate 40. In order to associate the four light detection elements 4 with the four LED chips 1a to 1d having different emission colors on a one-to-one basis, the LED mounting substrate 20 that is the base substrate portion and the wall portion 2b The enclosed internal space (that is, the internal space of the storage recess 2a in the mounting substrate 2) is partitioned into the storage spaces of the LED chips 1a to 1d of the respective emission colors, and the light emitted from the LED chips 1a to 1d is emitted. A cross-shaped light shielding portion 39 that prevents the light incident on the light receiving surfaces of the two or more light detecting elements 4 is formed integrally with the intermediate layer substrate 30. In other words, in the light emitting device according to the present embodiment, the light shielding portion 39 is configured by a cross-shaped partition wall that protrudes from the LED mounting substrate 20 that is the base substrate portion and divides the internal space into the storage spaces. Has been. Here, in the light emitting device of the present embodiment, the opening window 31 of the intermediate layer substrate 30 is partitioned into four small spaces 31a by the light shielding portion 39, and the emission range of light emitted from each of the LED chips 1a to 1d. Is limited by the light shielding unit 39. Here, in this embodiment, the light shielding part 39 in the intermediate layer substrate 30 is formed simultaneously with the opening window 31 by anisotropic etching using an alkaline solution, and each side surface of the light shielding part 39 is within the opening window 31. Since it is a (111) surface like the side surface, each side surface of the light shielding portion 39 functions as a mirror that reflects light emitted from the LED chips 1a to 1d forward. In the light emitting device according to the present embodiment, the protruding height of the light shielding portion 39 from the LED mounting substrate 20 as the base substrate portion is lower than the protruding height of the wall portion 2b. Since the optical member 3 is separated, it is possible to prevent a shadow (dark part) from being generated due to the light shielding part 39.

以上説明した本実施形態の発光装置では、実装基板2が壁部2bの先端部から内方へ張り出した張出部2cを有するとともに、当該張出部2cに互いに発光色の異なる4つのLEDチップ1a〜1dそれぞれから放射された光を各別に検出する4つ光検出素子4が設けられているので、4つのLEDチップ1a〜1dと4つの光検出素子4とを同一平面上に配置する場合に比べて小型化を図れる。また、本実施形態の発光装置では、張出部2cにおけるLED搭載用基板20側に各光検出素子4の受光面があるので、各光検出素子4の受光面へ外乱光が入射するのを防止することができ、各光検出素子4の出力のS/N比をより高めることが可能になる。   In the light emitting device of the present embodiment described above, the mounting substrate 2 has the overhanging portion 2c that protrudes inward from the tip end portion of the wall portion 2b, and four LED chips having different emission colors from each other in the overhanging portion 2c. Since the four light detection elements 4 for detecting the light emitted from the respective light beams 1a to 1d are provided, the four LED chips 1a to 1d and the four light detection elements 4 are arranged on the same plane. The size can be reduced compared to. Further, in the light emitting device of the present embodiment, since the light receiving surface of each photodetecting element 4 is on the LED mounting substrate 20 side in the overhanging portion 2c, disturbance light is incident on the light receiving surface of each photodetecting element 4. Therefore, the S / N ratio of the output of each photodetecting element 4 can be further increased.

さらに、本実施形態の発光装置では、ベース基板部たるLED搭載用基板20と壁部2bとで囲まれた内部空間を各発光色のLEDチップ1a〜1dそれぞれの収納空間に区画し各LEDチップ1a〜1dそれぞれから放射された光が2つ以上の光検出素子4の受光面へ入射するのを阻止する遮光部39が設けられているので、各発光色のLEDチップ1a〜1dと各光検出素子4とを1対1で対応させることができ、各光検出素子4において対応するLEDチップ1a〜1dから放射された光のみを選択的に検出可能となり、各発光色のLEDチップ1a〜1dから放射された光を対応する光検出素子4で精度良く検出することができ、しかも、各光検出素子4それぞれに透過特性の異なるフィルタを設ける必要がないから、低コスト化が可能となる。また、本実施形態では、実装基板2を複数のシリコン基板20a,30a,40aを用いて形成しているので、フォトダイオードのような光電変換素子からなる光検出素子4を一般的な半導体製造プロセスによって実装基板2中に容易に形成することが可能となり、低コスト化を図れる。また、本実施形態では、実装基板2の形成にあたって上述の各接合工程において、低温での直接接合が可能な常温接合法を採用しているので、各接合工程でLEDチップ1a〜1dのジャンクション温度が最大ジャンクション温度を超えるのを防止することができる。   Furthermore, in the light emitting device according to the present embodiment, the internal space surrounded by the LED mounting substrate 20 as the base substrate portion and the wall portion 2b is partitioned into storage spaces for the respective LED chips 1a to 1d of the respective emission colors. Since the light-shielding part 39 which prevents the light radiated | emitted from each of 1a-1d from injecting into the light-receiving surface of two or more photodetectors 4 is provided, LED chip 1a-1d of each luminescent color and each light The detection elements 4 can be made to correspond to each other on a one-to-one basis, and only the light emitted from the corresponding LED chips 1a to 1d can be selectively detected in each light detection element 4. The light emitted from 1d can be detected with high precision by the corresponding light detection element 4, and it is not necessary to provide a filter with different transmission characteristics for each light detection element 4, so that the cost can be reduced. The ability. In the present embodiment, since the mounting substrate 2 is formed using a plurality of silicon substrates 20a, 30a, and 40a, the photodetecting element 4 composed of a photoelectric conversion element such as a photodiode is formed in a general semiconductor manufacturing process. As a result, it can be easily formed in the mounting substrate 2, and the cost can be reduced. Moreover, in this embodiment, since the room temperature bonding method in which direct bonding at a low temperature can be performed in each of the above-described bonding processes in forming the mounting substrate 2, the junction temperatures of the LED chips 1 a to 1 d in each bonding process. Can be prevented from exceeding the maximum junction temperature.

また、本実施形態の発光装置では、実装基板2のLED搭載用基板20においてLEDチップ1a〜1dがダイボンディングされるダイパッド部25aaごとに複数のサーマルビア26を設けてあるので、LEDチップ1a〜1dで発生した熱を効率よく外部へ逃がすことができ、LEDチップ1a〜1dのジャンクション温度の温度上昇を抑制できるから、各LEDチップ1a〜1dへの入力電力を大きくでき、光出力の高出力化を図れる。   Further, in the light emitting device of the present embodiment, since a plurality of thermal vias 26 are provided for each die pad portion 25aa where the LED chips 1a to 1d are die-bonded on the LED mounting substrate 20 of the mounting substrate 2, the LED chips 1a to The heat generated in 1d can be efficiently released to the outside, and the temperature rise of the junction temperature of the LED chips 1a to 1d can be suppressed, so that the input power to each of the LED chips 1a to 1d can be increased and the light output is high. Can be realized.

また、本実施形態の発光装置では、LED搭載用基板20の上記一表面側に搭載されたLEDチップ1a〜1dが、LED搭載用基板20の厚み方向に貫設された貫通孔配線24を介して、上記他表面側に形成された外部接続用電極27aと電気的に接続され、光検出素子形成基板40に形成された各光検出素子4が、中間層基板30の厚み方向に貫設された貫通孔配線34およびLED搭載用基板20の厚み方向に貫設された貫通孔配線24を介して、LED搭載用基板20の上記他表面側に形成された外部接続用電極27bと電気的に接続されているので、プリント基板などの回路基板へ表面実装することができ、しかも、実装基板2の一表面側においてLEDチップ1a〜1dや各光検出素子4それぞれと電気的に接続される配線を引き回す場合に比べて、実装基板2の小型化を図れる。   Further, in the light emitting device of the present embodiment, the LED chips 1a to 1d mounted on the one surface side of the LED mounting substrate 20 are connected via the through-hole wiring 24 penetrating in the thickness direction of the LED mounting substrate 20. Thus, each photodetecting element 4 electrically connected to the external connection electrode 27a formed on the other surface side and formed on the photodetecting element forming substrate 40 is penetrated in the thickness direction of the intermediate layer substrate 30. The external connection electrode 27b formed on the other surface side of the LED mounting substrate 20 is electrically connected through the through-hole wiring 34 and the through-hole wiring 24 provided in the thickness direction of the LED mounting substrate 20. Since they are connected, they can be surface-mounted on a circuit board such as a printed circuit board, and the wirings are electrically connected to the LED chips 1a to 1d and the respective light detection elements 4 on one surface side of the mounting board 2. Pull As compared with the case of turning, downsizing of the mounting substrate 2.

また、本実施形態の発光装置を例えば回路基板などに実装して照明装置を構成する場合、当該回路基板に各LEDチップ1a〜1dを駆動する駆動回路部と、各光検出素子4により検出される光強度がそれぞれの目標値に保たれるように駆動回路部から各発光色のLEDチップ1a〜1dに流れる電流をフィードバック制御する制御回路部などを設けておくことにより、各光検出素子4それぞれの出力に基づいて各発光色のLEDチップ1a〜1dの光出力を各別に制御することができ、各発光色ごとのLEDチップ1a〜1dの光出力の経時変化の違いなどによらず混色光(ここでは、白色光)の光色や色温度の精度を向上することができる。要するに、所望の混色光を安定して得ることができる。   Further, when the lighting device is configured by mounting the light emitting device of the present embodiment on a circuit board or the like, for example, it is detected by the drive circuit unit that drives the LED chips 1 a to 1 d on the circuit board and the light detection elements 4. By providing a control circuit unit that feedback-controls the current flowing from the drive circuit unit to the LED chips 1a to 1d of the respective emission colors so that the light intensity to be maintained at the respective target values, each light detection element 4 is provided. Based on the respective outputs, the light outputs of the LED chips 1a to 1d of the respective emission colors can be individually controlled, and the colors are mixed regardless of the temporal changes in the light outputs of the LED chips 1a to 1d for the respective emission colors. The accuracy of the light color and color temperature of light (here, white light) can be improved. In short, desired mixed color light can be stably obtained.

(実施形態2)
以下、本実施形態の発光装置について図4および図5に基づいて説明する。
(Embodiment 2)
Hereinafter, the light-emitting device of this embodiment will be described with reference to FIGS. 4 and 5.

本実施形態の発光装置の基本構成は実施形態1と略同じであり、遮光部39が中間層基板30のシリコン基板30aとは別材料により形成されている点などが相違する。なお、実施形態1と同様の構成要素には同一の符号を付して説明を省略する。   The basic configuration of the light emitting device of the present embodiment is substantially the same as that of the first embodiment, except that the light shielding portion 39 is formed of a material different from the silicon substrate 30a of the intermediate layer substrate 30. In addition, the same code | symbol is attached | subjected to the component similar to Embodiment 1, and description is abbreviate | omitted.

本実施形態における遮光部39は、感光性樹脂(例えば、SU8など)からなる感光性樹脂層を中間層基板30の開口窓31内に形成した後で、当該感光性樹脂層をフォトリソグラフィ技術によりパターニングし、当該パターニングされた感光性樹脂層の露出表面を覆う金属膜を例えばスパッタ法などにより被着することにより形成されている。   In the present embodiment, the light shielding portion 39 is formed by forming a photosensitive resin layer made of a photosensitive resin (for example, SU8) in the opening window 31 of the intermediate layer substrate 30, and then forming the photosensitive resin layer by a photolithography technique. It is formed by patterning and depositing a metal film covering the exposed surface of the patterned photosensitive resin layer by, for example, sputtering.

しかして、本実施形態の発光装置においても、実施形態1と同様に、小型化を図りつつ、発光色の異なる複数種のLEDチップ1a〜1dそれぞれから放射された光を各別に且つ同時に精度良く検出することができ、しかも、低コスト化が可能となる。   Thus, in the light emitting device according to the present embodiment, as in the first embodiment, the light emitted from each of the plurality of types of LED chips 1a to 1d having different emission colors can be individually and accurately accurately while reducing the size. In addition, the cost can be reduced.

実施形態1の発光装置を示し、(a)は概略断面図、(b)は要部概略平面図である。The light-emitting device of Embodiment 1 is shown, (a) is a schematic sectional drawing, (b) is a principal part schematic plan view. 同上の発光装置の概略分解斜視図である。It is a general | schematic disassembled perspective view of a light-emitting device same as the above. 同上における光検出素子形成基板の概略下面図である。It is a schematic bottom view of the optical detection element formation board | substrate in the same as the above. 実施形態2の発光装置の概略断面図である。6 is a schematic cross-sectional view of a light emitting device according to Embodiment 2. FIG. 同上の発光装置の要部概略平面図である。It is a principal part schematic plan view of a light-emitting device same as the above. 従来例を示す概略断面図である。It is a schematic sectional drawing which shows a prior art example.

符号の説明Explanation of symbols

1a〜1d LEDチップ
2 実装基板
2b 壁部
2c 張出部
4 光検出素子
20 LED搭載用基板(ベース基板部)
39 遮光部(仕切壁)
DESCRIPTION OF SYMBOLS 1a-1d LED chip 2 Mounting board 2b Wall part 2c Overhang | projection part 4 Photodetection element 20 Board | substrate for LED mounting (base board part)
39 Shading part (partition wall)

Claims (2)

発光色が互いに異なる複数種のLEDチップと、各LEDチップが搭載されるベース基板部および各LEDチップを囲む形でベース基板部から突設された壁部を有する実装基板とを備え、実装基板は、壁部の先端部から内方へ張り出した張出部を有するとともに、当該張出部に各発光色のLEDチップそれぞれから放射された光を各別に検出する複数の光検出素子が設けられ、ベース基板部と壁部とで囲まれた内部空間を各発光色のLEDチップそれぞれの収納空間に区画し各LEDチップそれぞれから放射された光が2つ以上の光検出素子の受光面へ入射するのを阻止する遮光部が設けられてなることを特徴とする発光装置。   A plurality of types of LED chips having different emission colors, a base substrate portion on which each LED chip is mounted, and a mounting substrate having a wall portion protruding from the base substrate portion so as to surround each LED chip. Has a protruding portion that protrudes inward from the tip of the wall portion, and a plurality of light detecting elements that individually detect the light emitted from each LED chip of each emission color is provided in the protruding portion. The interior space surrounded by the base substrate portion and the wall portion is partitioned into storage spaces for each LED chip of each light emitting color, and light emitted from each LED chip is incident on the light receiving surfaces of two or more light detection elements A light-emitting device, characterized in that a light-shielding portion for preventing the light-emitting device is provided. 前記遮光部は、前記ベース基板部から突設され前記内部空間を前記各収納空間に区画する仕切壁からなることを特徴とする請求項1記載の発光装置。
The light-emitting device according to claim 1, wherein the light shielding portion includes a partition wall that protrudes from the base substrate portion and divides the internal space into the storage spaces.
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