JP4993877B2 - Anisotropic conductive adhesive sheet and finely connected structure - Google Patents
Anisotropic conductive adhesive sheet and finely connected structure Download PDFInfo
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- JP4993877B2 JP4993877B2 JP2005163407A JP2005163407A JP4993877B2 JP 4993877 B2 JP4993877 B2 JP 4993877B2 JP 2005163407 A JP2005163407 A JP 2005163407A JP 2005163407 A JP2005163407 A JP 2005163407A JP 4993877 B2 JP4993877 B2 JP 4993877B2
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- 239000000853 adhesive Substances 0.000 title claims description 132
- 230000001070 adhesive effect Effects 0.000 title claims description 132
- 239000002245 particle Substances 0.000 claims description 374
- 229920005989 resin Polymers 0.000 claims description 68
- 239000011347 resin Substances 0.000 claims description 68
- 238000000034 method Methods 0.000 claims description 48
- 239000003795 chemical substances by application Substances 0.000 claims description 29
- 229910000510 noble metal Inorganic materials 0.000 claims description 16
- 239000000956 alloy Substances 0.000 claims description 13
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 230000009477 glass transition Effects 0.000 claims description 12
- 239000012790 adhesive layer Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000002923 metal particle Substances 0.000 claims description 9
- 238000005507 spraying Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 59
- 238000009413 insulation Methods 0.000 description 25
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 24
- 239000000758 substrate Substances 0.000 description 18
- 238000009826 distribution Methods 0.000 description 16
- -1 for example Inorganic materials 0.000 description 16
- 239000003822 epoxy resin Substances 0.000 description 15
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 15
- 229910052737 gold Inorganic materials 0.000 description 15
- 239000010931 gold Substances 0.000 description 15
- 229920000647 polyepoxide Polymers 0.000 description 15
- 239000007787 solid Substances 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 12
- 239000010409 thin film Substances 0.000 description 12
- 238000002156 mixing Methods 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000002356 single layer Substances 0.000 description 9
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 229920005992 thermoplastic resin Polymers 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 230000001186 cumulative effect Effects 0.000 description 7
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 229920006287 phenoxy resin Polymers 0.000 description 7
- 239000013034 phenoxy resin Substances 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 239000003094 microcapsule Substances 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 239000007822 coupling agent Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000012046 mixed solvent Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229920000459 Nitrile rubber Polymers 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000002788 crimping Methods 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 229910001410 inorganic ion Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000012856 packing Methods 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 239000002516 radical scavenger Substances 0.000 description 4
- LVACOMKKELLCHJ-UHFFFAOYSA-N 3-trimethoxysilylpropylurea Chemical compound CO[Si](OC)(OC)CCCNC(N)=O LVACOMKKELLCHJ-UHFFFAOYSA-N 0.000 description 3
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- OAMZXMDZZWGPMH-UHFFFAOYSA-N ethyl acetate;toluene Chemical compound CCOC(C)=O.CC1=CC=CC=C1 OAMZXMDZZWGPMH-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 229920000578 graft copolymer Polymers 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- HEXHLHNCJVXPNU-UHFFFAOYSA-N 2-(trimethoxysilylmethyl)butane-1,4-diamine Chemical compound CO[Si](OC)(OC)CC(CN)CCN HEXHLHNCJVXPNU-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- BTXXTMOWISPQSJ-UHFFFAOYSA-N 4,4,4-trifluorobutan-2-one Chemical compound CC(=O)CC(F)(F)F BTXXTMOWISPQSJ-UHFFFAOYSA-N 0.000 description 1
- BQACOLQNOUYJCE-FYZZASKESA-N Abietic acid Natural products CC(C)C1=CC2=CC[C@]3(C)[C@](C)(CCC[C@@]3(C)C(=O)O)[C@H]2CC1 BQACOLQNOUYJCE-FYZZASKESA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GANNOFFDYMSBSZ-UHFFFAOYSA-N [AlH3].[Mg] Chemical class [AlH3].[Mg] GANNOFFDYMSBSZ-UHFFFAOYSA-N 0.000 description 1
- WIBOKTQZOPHFAJ-UHFFFAOYSA-N [Zr].[Bi] Chemical class [Zr].[Bi] WIBOKTQZOPHFAJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- PEEDYJQEMCKDDX-UHFFFAOYSA-N antimony bismuth Chemical class [Sb].[Bi] PEEDYJQEMCKDDX-UHFFFAOYSA-N 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- ZTXONRUJVYXVTJ-UHFFFAOYSA-N chromium copper Chemical compound [Cr][Cu][Cr] ZTXONRUJVYXVTJ-UHFFFAOYSA-N 0.000 description 1
- KVGIAPSCKHLYEF-UHFFFAOYSA-N chromium;indium;oxotin Chemical compound [Cr].[In].[Sn]=O KVGIAPSCKHLYEF-UHFFFAOYSA-N 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- MSYLJRIXVZCQHW-UHFFFAOYSA-N formaldehyde;6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound O=C.NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 MSYLJRIXVZCQHW-UHFFFAOYSA-N 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229920006173 natural rubber latex Polymers 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920006174 synthetic rubber latex Polymers 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Images
Landscapes
- Manufacturing Of Electrical Connectors (AREA)
- Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
- Non-Insulated Conductors (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
本発明は、微細回路接続性に優れた異方導電性接着シート及び接続構造体に関する。 The present invention relates to an anisotropic conductive adhesive sheet excellent in fine circuit connectivity and a connection structure.
これまで、微細回路を接続するための異方導電性接着シートに関して、接続性改良、短絡防止のために、種々の導電性粒子の検討および、異方導電性接着剤構成の検討がなされている。例えば、導電性粒子と同等の熱膨張係数をもつ絶縁粒子を配合する方法(特許文献1参照)、短絡防止のため、導電性粒子の表面に絶縁性粒子を付着させる方法(特許文献2参照)、あるいは、導電性粒子の表面を電気絶縁性樹脂で被覆する方法(特許文献3参照)、導電性粒子を含む層と含まない層を積層し、隣接する回路間の短絡を防止する方法(特許文献4、5参照)、端子回路を感光性樹脂で覆い、接続部以外の部分を選択硬化して粘着性を消失させ、粘着性を有する部分に導電性粒子を付着させ、次いで粘着性樹脂で覆って隣接する端子回路間の短絡を防止する方法(特許文献6参照)等が公知である。 So far, with regard to anisotropic conductive adhesive sheets for connecting microcircuits, various conductive particles and anisotropic conductive adhesive configurations have been studied in order to improve connectivity and prevent short circuits. . For example, a method of blending insulating particles having a thermal expansion coefficient equivalent to that of the conductive particles (see Patent Document 1), and a method of attaching the insulating particles to the surface of the conductive particles to prevent a short circuit (see Patent Document 2) Alternatively, a method of covering the surface of conductive particles with an electrically insulating resin (see Patent Document 3), a method of stacking a layer containing conductive particles and a layer not containing conductive particles, and preventing a short circuit between adjacent circuits (patent References 4 and 5), the terminal circuit is covered with a photosensitive resin, the part other than the connection part is selectively cured to eliminate the adhesiveness, the conductive particles are attached to the adhesive part, and then the adhesive resin is used. A method of covering and preventing a short circuit between adjacent terminal circuits (see Patent Document 6) is well known.
しかしながら、絶縁粒子を配合する等の従来技術においては、端子間方向においては導電性粒子同士の凝集による短絡を防止し、絶縁性を確保しなければならないので、絶縁粒子を多く配合する必要がある。一方、圧着時に、接続性を確保するためには接続部分から絶縁粒子を排除しなければならないため、充分な絶縁性確保のために多量の絶縁粒子数を配合することには限界があり、微細回路接続の場合、絶縁性確保と接続粒子数確保の両立を満足できるものではなかった。また、接着剤構成による短絡防止等の従来技術においても、微細回路接続の場合は、絶縁性確保と電気接続性を同時に満足できるものではなかった。 However, in the prior art such as blending insulating particles, it is necessary to prevent the short circuit due to the aggregation of the conductive particles in the inter-terminal direction and to ensure insulation, so it is necessary to blend many insulating particles. . On the other hand, in order to ensure connectivity during crimping, the insulating particles must be removed from the connecting portion, so there is a limit to blending a large number of insulating particles to ensure sufficient insulation. In the case of circuit connection, it was not possible to satisfy both the insulation and the number of connected particles. Further, even in the prior art such as short circuit prevention by the adhesive configuration, in the case of the fine circuit connection, insulation and electrical connectivity cannot be satisfied at the same time.
本発明は、微細回路の隣接する回路間の絶縁性を損なうことなく、良好な電気的接続性を実現する異方導電性接着シート、その製造方法、およびそれを用いた微細接続構造体を提供することを目的とする。 The present invention provides an anisotropic conductive adhesive sheet that realizes good electrical connectivity without impairing insulation between adjacent circuits of a fine circuit, a method for producing the same, and a finely connected structure using the same. The purpose is to do.
本発明者らは、上記課題を解決するために鋭意研究を重ねた結果、導電性粒子が、ある特定の範囲内に、ある特定割合以上の導電性粒子とは接触せずに存在しており、その導電性粒子の厚さ方向における存在領域にある特定の平均粒子径を有する絶縁粒子が存在していることを特徴とする異方導電性接着シートを用いることによって、上記課題を解決できることを見出した。 As a result of intensive studies to solve the above problems, the present inventors have found that the conductive particles are present in a certain range without contacting with a certain proportion or more of the conductive particles. By using an anisotropic conductive adhesive sheet characterized by the presence of insulating particles having a specific average particle diameter in the existing region in the thickness direction of the conductive particles, the above problem can be solved. I found it.
すなわち、本発明の一は、少なくとも硬化剤、硬化性の絶縁性樹脂、導電性粒子及び絶縁粒子からなる異方導電性接着シートであって、異方導電性接着シートの片側表面から厚み方向に沿って導電性粒子の平均粒径の2.0倍以内の領域中に導電性粒子個数の90%以上、絶縁粒子個数の90%以上が存在し、かつ、導電性粒子の90%以上が他の導電性粒子と接触せずに存在しており、近接する導電性粒子同士の平均粒子間隔が導電性粒子の平均粒径の0.5倍以上5倍以下であり、かつ絶縁粒子の平均粒径が導電性粒子の平均粒径より小さいことを特徴とする異方導電性接着シートである。 That is, one aspect of the present invention is an anisotropic conductive adhesive sheet comprising at least a curing agent, a curable insulating resin, conductive particles, and insulating particles, in the thickness direction from one surface of the anisotropic conductive adhesive sheet. In addition, 90% or more of the number of conductive particles, 90% or more of the number of insulating particles are present in a region within 2.0 times the average particle size of the conductive particles, and 90% or more of the conductive particles are other The average particle spacing between the adjacent conductive particles is 0.5 to 5 times the average particle size of the conductive particles, and the average particle of the insulating particles An anisotropic conductive adhesive sheet having a diameter smaller than the average particle diameter of conductive particles.
上記異方導電性接着シートにおいては、導電性粒子の平均粒径が1〜8μmであり、近接する導電性粒子同士の平均粒子間隔が20μm以下であり、かつ、異方導電性接着シートの厚みが該平均粒子間隔の1.5倍以上40μm以下であることが好ましい。また、導電性粒子が、貴金属被覆された樹脂粒子、貴金属被覆された金属粒子、金属粒子、貴金属被覆された合金粒子、及び合金粒子からなる群から選ばれる少なくとも1種の導電性粒子であることが好ましい。さらに、絶縁粒子の平均粒径が導電性粒子の平均粒径の0.05倍以上0.9倍以下であることが好ましく、絶縁粒子個数は導電性粒子個数の0.5倍から20倍の範囲であることが好ましい。
絶縁粒子のガラス転移温度は25℃以上150℃以下の樹脂からなることが好ましい。
In the anisotropic conductive adhesive sheet, the average particle diameter of the conductive particles is 1 to 8 μm, the average particle interval between adjacent conductive particles is 20 μm or less, and the thickness of the anisotropic conductive adhesive sheet is Is preferably 1.5 times or more and 40 μm or less of the average particle spacing. The conductive particles are at least one conductive particle selected from the group consisting of resin particles coated with noble metal, metal particles coated with noble metal, metal particles, alloy particles coated with noble metal, and alloy particles. Is preferred. Further, the average particle size of the insulating particles is preferably 0.05 times or more and 0.9 times or less than the average particle size of the conductive particles, and the number of insulating particles is 0.5 to 20 times the number of conductive particles. A range is preferable.
The glass transition temperature of the insulating particles is preferably made of a resin having a temperature of 25 ° C. or higher and 150 ° C. or lower.
本発明の二は、2軸延伸可能なフィルム上に粘着層を設けて積層体を形成し、該積層体の上に平均粒径1〜8μmの導電性粒子を付着させて導電性粒子付着フィルムを作製し、該導電性粒子付着フィルムを導電性粒子同士の平均粒子間隔が導電性粒子の平均粒径の0.5倍以上5倍以下になるように2軸延伸して保持し、その上に絶縁粒子を散布して導電性粒子間に絶縁粒子を付着させた後、少なくとも硬化剤、及び硬化性の絶縁性樹脂を含んでなる接着シートに該導電性粒子及び該絶縁粒子を転写して接着シートを作製する工程を含むことを特徴とする、本発明の一の異方導電性接着シートの製造方法である。
上記異方導電性接着シートの製造方法においては、2軸延伸可能なフィルムが長さ10m以上の長尺のフィルムであり、接着シートが長さ10m以上の長尺の接着シートであることが好ましい。
In the second aspect of the present invention, an adhesive layer is provided on a biaxially stretchable film to form a laminate, and conductive particles having an average particle diameter of 1 to 8 μm are adhered onto the laminate, thereby forming a conductive particle-adhered film. The conductive particle-adhering film is biaxially stretched and held so that the average particle spacing between the conductive particles is 0.5 to 5 times the average particle size of the conductive particles. After spraying the insulating particles to adhere the insulating particles between the conductive particles, the conductive particles and the insulating particles are transferred to an adhesive sheet containing at least a curing agent and a curable insulating resin. It is the manufacturing method of one anisotropic conductive adhesive sheet of this invention characterized by including the process of producing an adhesive sheet.
In the method for producing the anisotropic conductive adhesive sheet, the biaxially stretchable film is preferably a long film having a length of 10 m or more , and the adhesive sheet is preferably a long adhesive sheet having a length of 10 m or more. .
本発明の三は、微細接続端子を有する電子回路部品と回路基板とを本発明の一の異方導電性接着シートで電気的に接続する接続方法において、微細接続端子の高さが近接する導電性粒子の平均粒子間隔の3〜15倍かつ40μm以下であり、微細接続端子の間隔が該平均粒子間隔の1〜10倍かつ40μm以下であり、微細接続端子のピッチが該平均粒子間隔の3〜30倍かつ80μm以下であることを特徴とする接続方法である。
本発明の四は、本発明の三の接続方法により接続された電子回路部品と回路基板を含むことを特徴とする微細接続構造体である。
The third aspect of the present invention is a connection method in which an electronic circuit component having a fine connection terminal and a circuit board are electrically connected by one anisotropic conductive adhesive sheet of the present invention, wherein the height of the fine connection terminal is close to the conductive layer. 3 to 15 times the average particle spacing of the conductive particles and 40 μm or less, the spacing between the fine connection terminals is 1 to 10 times the average particle spacing and 40 μm or less, and the pitch of the fine connection terminals is 3 times the average particle spacing. The connection method is characterized by being 30 times and 80 μm or less.
A fourth aspect of the present invention is a finely connected structure characterized by including an electronic circuit component and a circuit board connected by the third connection method of the present invention.
本発明の異方導電性接着シート及び微細接続構造体は、隣接する接続端子間の良好な絶縁特性を有し、かつ接続した接続端子間の良好な電気的接続性を有する。すなわち、絶縁性が必要な異方導電性接着シートの面内方向には特定の間隔で導電性粒子を配置させ、その間隔内に絶縁粒子を配置させ、接続面の方向には、絶縁粒子がないことにより、圧着時の短絡を防止し、良好な接続性を確保することが出来る。 The anisotropic conductive adhesive sheet and the fine connection structure of the present invention have good insulation characteristics between adjacent connection terminals and good electrical connectivity between connected connection terminals. That is, the conductive particles are arranged at specific intervals in the in-plane direction of the anisotropic conductive adhesive sheet that requires insulation, the insulating particles are arranged within the intervals, and the insulating particles are arranged in the direction of the connection surface. By not being present, it is possible to prevent a short circuit during crimping and to ensure good connectivity.
以下、本発明について具体的に説明する。
まず、本発明の異方導電性接着シートにおける導電性粒子について説明する。
導電性粒子としては、貴金属被覆された樹脂粒子、貴金属被覆された金属粒子、金属粒子、貴金属被覆された合金粒子、及び合金粒子の中から選ばれた1種以上を用いることが好ましい。
貴金属被覆された樹脂粒子としては、ポリスチレン、ベンゾグアナミン、ポリメチルメタアクリレート等の球状粒子にニッケル、および金をこの順に被覆したものを用いることが好ましい。
Hereinafter, the present invention will be specifically described.
First, the conductive particles in the anisotropic conductive adhesive sheet of the present invention will be described.
As the conductive particles, it is preferable to use at least one selected from resin particles coated with noble metal, metal particles coated with noble metal, metal particles, alloy particles coated with noble metal, and alloy particles.
As the resin particles coated with the noble metal, it is preferable to use those obtained by coating spherical particles such as polystyrene, benzoguanamine, and polymethyl methacrylate with nickel and gold in this order.
接続する微細接続端子(バンプ)硬度に応じて、より柔軟な樹脂粒子を用いて貴金属被覆された樹脂粒子を形成することができる。
接続するバンプ硬度がビッカース硬度で50Hv未満である場合は、ポリメタアクリレート樹脂等の柔軟な樹脂粒子を用いることが好ましい。また、バンプ硬度が50Hv以上である場合は、ベンゾグアナミン樹脂等の硬質樹脂粒子を用いることが好ましい。
Resin particles coated with a noble metal can be formed using softer resin particles according to the hardness of the fine connection terminal (bump) to be connected.
When the bump hardness to be connected is less than 50 Hv in terms of Vickers hardness, it is preferable to use flexible resin particles such as polymethacrylate resin. Moreover, when bump hardness is 50 Hv or more, it is preferable to use hard resin particles, such as a benzoguanamine resin.
貴金属被覆された金属粒子としては、ニッケル、銅等の金属粒子に金、パラジウム、ロジウム等の貴金属を最外層に被覆したものを用いることが好ましい。被覆する方法としては、蒸着法、スパッタリング法等の薄膜形成法、乾式ブレンド法によるコーティング法、無電解めっき法、電解めっき法等の湿式法を用いることができる。量産性の点から、無電解めっき法が好ましい。 As the metal particles coated with the noble metal, it is preferable to use a metal particle such as nickel or copper coated with a noble metal such as gold, palladium or rhodium on the outermost layer. As a coating method, a thin film forming method such as a vapor deposition method or a sputtering method, a coating method using a dry blend method, a wet method such as an electroless plating method or an electrolytic plating method can be used. From the viewpoint of mass productivity, the electroless plating method is preferable.
金属粒子としては、銀、銅、ニッケル等の金属から選ばれるものを用いることが好ましい。合金粒子としては、融点が150℃以上500℃以下のものが好ましく、さらには150℃以上350℃以下の低融点合金粒子を用いることがより好ましい。融点が500℃以下であると、接続端子間に金属結合を形成することも可能であり、接続信頼性の点から好ましい。また、耐熱接続信頼性の観点から、融点が150℃以上であることが好ましい。 As the metal particles, those selected from metals such as silver, copper and nickel are preferably used. The alloy particles preferably have a melting point of 150 ° C. or more and 500 ° C. or less, and more preferably low melting point alloy particles having a melting point of 150 ° C. or more and 350 ° C. or less. When the melting point is 500 ° C. or less, a metal bond can be formed between the connection terminals, which is preferable from the viewpoint of connection reliability. Moreover, it is preferable that melting | fusing point is 150 degreeC or more from a viewpoint of heat-resistant connection reliability.
貴金属被覆された合金粒子としては、例えば、金、銀、銅、ニッケル、錫、亜鉛、ビスマス、インジウム等から選ばれた2種以上からなる合金粒子に上記方法等を用いて貴金属被覆したものを用いることができる。 As the alloy particles coated with the noble metal, for example, alloy particles composed of two or more kinds selected from gold, silver, copper, nickel, tin, zinc, bismuth, indium, etc. are coated with the noble metal using the above method or the like. Can be used.
合金粒子としては、例えば、金、銀、銅、ニッケル、錫、亜鉛、ビスマス、インジウム等から選ばれた2種以上からなる合金粒子が好ましい。融点が150℃以上500℃以下の合金粒子を用いる場合は、予め粒子表面にフラックス等を被覆しておくことが好ましい。いわゆるフラックスを用いることにより、表面の酸化物等を取り除くことができ好ましい。フラックスとしては、アビエチン酸等の脂肪酸等を用いることができる。 As the alloy particles, for example, alloy particles composed of two or more selected from gold, silver, copper, nickel, tin, zinc, bismuth, indium and the like are preferable. When alloy particles having a melting point of 150 ° C. or higher and 500 ° C. or lower are used, it is preferable to coat the particle surface with a flux or the like in advance. It is preferable to use a so-called flux because the surface oxides can be removed. As the flux, fatty acids such as abietic acid can be used.
導電性粒子の平均粒径と最大粒径の比は2以下であることが好ましく、1.5以下であることがより好ましい。該導電性粒子の粒度分布はより狭いほうが好ましく、該導電性粒子の粒径分布の幾何標準偏差は、1.2〜2.5であることが好ましく、1.2〜1.4であることが特に好ましい。幾何標準偏差が上記値であると粒径のバラツキが小さくなる。通常、接続する2端子間に一定のギャップが存在する場合には、粒径が揃っているほど、導電性粒子が有効に機能すると考えられる。 The ratio of the average particle size to the maximum particle size of the conductive particles is preferably 2 or less, and more preferably 1.5 or less. The particle size distribution of the conductive particles is preferably narrower, and the geometric standard deviation of the particle size distribution of the conductive particles is preferably 1.2 to 2.5, and preferably 1.2 to 1.4. Is particularly preferred. When the geometric standard deviation is the above value, the variation in particle size is reduced. Usually, when a certain gap exists between two terminals to be connected, it is considered that the conductive particles function more effectively as the particle diameters become uniform.
粒度分布の幾何標準偏差とは、粒度分布のσ値(累積84.13%の粒径値)を累積50%の粒径値で除した値である。粒度分布のグラフの横軸に粒径(対数)を設定し、縦軸に累積値(%、累積個数比、対数)を設定すると粒径分布はほぼ直線になり、粒径分布は対数正規分布に従う。累積値とは全粒子数に対して、ある粒径以下の粒子の個数比を示したもので、%で表す。粒径分布のシャープさはσ(累積84.13%の粒径値)と平均粒径(累積50%の粒径値)の比で表現される。σ値は実測値あるいは、前述グラフのプロット値からの読み取り値である。 The geometric standard deviation of the particle size distribution is a value obtained by dividing the σ value of the particle size distribution (particle size value of 84.13% cumulative) by the particle size value of 50% cumulative. When the particle size distribution (logarithm) is set on the horizontal axis of the particle size distribution graph and the cumulative value (%, cumulative number ratio, logarithm) is set on the vertical axis, the particle size distribution is almost linear, and the particle size distribution is lognormal distribution. Follow. The cumulative value indicates the number ratio of particles having a certain particle size or less with respect to the total number of particles, and is expressed in%. The sharpness of the particle size distribution is expressed by the ratio of σ (the cumulative particle size value of 84.13%) and the average particle size (the cumulative particle size value of 50%). The σ value is an actual measurement value or a read value from the plot value of the graph.
平均粒径及び粒度分布は、公知の方法、装置を用いて測定することができ、湿式粒度分布計、レーザー式粒度分布計等を用いることができる。あるいは、電子顕微鏡等で粒子を観察し、平均粒径、粒度分布を算出しても構わない。本発明の平均粒径及び粒度分布はレーザー式粒度分布計により求めることが出来る。 The average particle size and particle size distribution can be measured using a known method and apparatus, and a wet particle size distribution meter, a laser particle size distribution meter, or the like can be used. Alternatively, the average particle size and particle size distribution may be calculated by observing the particles with an electron microscope or the like. The average particle size and particle size distribution of the present invention can be determined by a laser particle size distribution meter.
導電性粒子の平均粒径は1〜8μmであることが好ましく、2〜6μmであることがさらに好ましい。絶縁性の観点から8μm以下が好ましく、接続端子等の高さバラツキ等の影響を受けにくく、また、電気的接続性の観点から1μm以上が好ましい。 The average particle diameter of the conductive particles is preferably 1 to 8 μm, and more preferably 2 to 6 μm. The thickness is preferably 8 μm or less from the viewpoint of insulation, and is preferably less than 1 μm from the viewpoint of electrical connectivity, and is not easily affected by variations in height of connection terminals and the like.
本発明の異方導電性接着シートにおける絶縁粒子としては、充分な絶縁性が可能であれば、どのようなものでも使用可能である。例えば、アクリル樹脂、スチレン樹脂、アクリル−スチレン共重合体樹脂等の熱可塑性樹脂粒子、ベンゾグアナミン樹脂、フェノール樹脂等の樹脂粒子、固形エポキシ樹脂等の熱硬化性樹脂粒子、酸化ケイ素、酸化チタン等のセラミックス粒子等を用いることができる。圧着時に接続性を確保しやすいため、熱可塑性樹脂であることが好ましい。加圧接続時に接続性確保の点から、ガラス転移温度が25℃以上150℃以下の樹脂であることが特に好ましい。形状としては、球状粒子が好ましい。ガラス転移温度の測定方法としては、公知の方法を用いることができる。具体的には、TMA―50熱機械分析装置(島津製作所製)を用いて昇温速度10℃/分の条件で測定することができる。 As the insulating particles in the anisotropic conductive adhesive sheet of the present invention, any particles can be used as long as sufficient insulating properties are possible. For example, thermoplastic resin particles such as acrylic resin, styrene resin, acrylic-styrene copolymer resin, resin particles such as benzoguanamine resin and phenol resin, thermosetting resin particles such as solid epoxy resin, silicon oxide, titanium oxide, etc. Ceramic particles or the like can be used. A thermoplastic resin is preferred because it is easy to ensure the connectivity during crimping. A resin having a glass transition temperature of 25 ° C. or higher and 150 ° C. or lower is particularly preferable from the viewpoint of securing connectivity during pressure connection. As the shape, spherical particles are preferable. As a method for measuring the glass transition temperature, a known method can be used. Specifically, it can be measured using a TMA-50 thermomechanical analyzer (manufactured by Shimadzu Corporation) at a temperature rising rate of 10 ° C./min.
絶縁粒子の平均粒径は、導電性粒子の平均粒径より小さく、かつ導電性粒子間隔よりも小さいが、導電性粒子の平均粒径の0.05倍以上0.9倍以下であることが好ましい。絶縁性の観点からは0.05倍以上であることが好ましく、接続性の観点から導電性粒子の平均粒径より小さいことが好ましい。絶縁粒子個数は、導電性粒子個数の0.5倍から20倍の範囲にあることが好ましく、1倍から5倍の範囲がさらに好ましい。絶縁性確保の点から0.5倍以上が好ましく、接着性の観点から20倍以下が好ましい。 The average particle size of the insulating particles is smaller than the average particle size of the conductive particles and smaller than the conductive particle interval, but may be 0.05 to 0.9 times the average particle size of the conductive particles. preferable. From the viewpoint of insulation, it is preferably 0.05 times or more, and from the viewpoint of connectivity, it is preferably smaller than the average particle diameter of the conductive particles. The number of insulating particles is preferably in the range of 0.5 to 20 times the number of conductive particles, and more preferably in the range of 1 to 5 times. 0.5 times or more is preferable from the viewpoint of ensuring insulation, and 20 times or less is preferable from the viewpoint of adhesiveness.
本発明の異方導電性接着シートにおいては、面方向の導電性粒子の間に絶縁粒子を有する部分があり、接続方向である導電性粒子の上下に絶縁粒子がない構造のため、圧着時に該接続面の絶縁粒子を排除する必要が無く、絶縁粒子を均一配合する構造に比較してより少量の絶縁粒子で効果的に絶縁性を付与可能である。 In the anisotropic conductive adhesive sheet of the present invention, there are portions having insulating particles between the conductive particles in the surface direction, and there are no insulating particles above and below the conductive particles in the connecting direction. There is no need to eliminate the insulating particles on the connection surface, and it is possible to effectively provide insulation with a smaller amount of insulating particles compared to a structure in which the insulating particles are uniformly mixed.
また、通常の製法では、絶縁粒子を予め、絶縁性接着剤溶液中に配合する方式をとる場合が多いが、その場合は、溶剤の影響を無視できず、絶縁性接着剤溶液中での絶縁粒子の膨潤、ゲル化、凝集等の懸念から絶縁粒子として使用可能な樹脂に制限があった。本発明の異方導電性接着シートの製造方法では、既に溶剤を含まない状態の絶縁性接着シートへ、乾式で絶縁粒子を転写する方法も可能である。従って、溶剤に対する使用可能な絶縁粒子の材料樹脂の制限も無く、その効果を発揮することができる。 In addition, the usual production method often employs a method in which insulating particles are preliminarily mixed in an insulating adhesive solution, but in this case, the influence of the solvent cannot be ignored, and the insulating particles in the insulating adhesive solution cannot be ignored. Resins that can be used as insulating particles have been limited due to concerns such as particle swelling, gelation, and aggregation. In the method for producing an anisotropic conductive adhesive sheet of the present invention, a method of transferring insulating particles in a dry manner to an insulating adhesive sheet that already contains no solvent is also possible. Therefore, there is no limitation on the material resin of the insulating particles that can be used for the solvent, and the effect can be exhibited.
次いで本発明の異方導電性接着シートについて説明する。
本発明の異方導電性接着シートは、導電性接着シートの片側表面から厚み方向に沿って導電性粒子の平均粒径の2.0倍以内の領域中に導電性粒子個数の90%以上が存在している。好ましくは、95%以上が存在している。
また、絶縁粒子においても、導電性接着シートの片側表面から厚み方向に沿って導電性粒子の平均粒径の2.0倍以内の領域中に絶縁粒子個数の90%以上が存在している。好ましくは、95%以上が存在している。
Next, the anisotropic conductive adhesive sheet of the present invention will be described.
The anisotropic conductive adhesive sheet of the present invention has 90% or more of the number of conductive particles in a region within 2.0 times the average particle diameter of the conductive particles along the thickness direction from one surface of the conductive adhesive sheet. Existing. Preferably, 95% or more is present.
Also, in the insulating particles, 90% or more of the number of insulating particles is present in a region within 2.0 times the average particle diameter of the conductive particles along the thickness direction from the one side surface of the conductive adhesive sheet. Preferably, 95% or more is present.
本発明の異方導電性接着シートにおいて、近接する導電性粒子同士の平均粒子間隔は、導電性粒子の平均粒径の0.5倍以上5倍以下である。好ましくは、20μm以下で、かつ平均粒径の1.5倍以上3倍以下である。接続時の粒子流動による粒子凝集の防止、及び絶縁性確保の観点から、平均粒径の0.5倍以上であることが好ましく、微細接続の観点から平均粒径の5倍以下が好ましい。 In the anisotropic conductive adhesive sheet of the present invention, the average particle interval between adjacent conductive particles is 0.5 to 5 times the average particle size of the conductive particles. Preferably, it is 20 μm or less and 1.5 to 3 times the average particle size. From the viewpoint of preventing particle aggregation due to particle flow at the time of connection and ensuring insulation, the average particle diameter is preferably 0.5 times or more, and from the viewpoint of fine connection, it is preferably 5 times or less of the average particle diameter.
本発明において、近接する導電性粒子とは、任意の導電性粒子を選定し、該導電性粒子に最も近い6個の導電性粒子を言う。近接する導電性粒子との平均粒子間隔は以下の通りである。
まず、本発明の異方導電性接着シートを、導電性粒子が存在する面側から光学顕微鏡で拡大した写真を撮影する。次に、任意の20個の導電性粒子を選定し、そのそれぞれの導電性粒子に最も近い6個の導電性粒子との距離を測定し、全体の平均値を求めて、平均粒子間隔とする。絶縁粒子の存在位置も上記と同様にして拡大写真から読み取ることができる。
In the present invention, the adjacent conductive particles are selected from arbitrary conductive particles and refer to six conductive particles closest to the conductive particles. The average particle spacing between adjacent conductive particles is as follows.
First, the photograph which expanded the anisotropically conductive adhesive sheet of this invention with the optical microscope from the surface side in which electroconductive particle exists is image | photographed. Next, arbitrary 20 conductive particles are selected, the distance from the 6 conductive particles closest to the respective conductive particles is measured, the average value of the whole is obtained, and the average particle interval is obtained. . The location of the insulating particles can be read from the enlarged photograph in the same manner as described above.
異方導電性接着シートの厚みは上述の平均粒子間隔の1.5倍以上40μm以下であることが好ましく、2倍以上40μm以下であることがより好ましい。機械的接続強度の観点から平均粒子間隔の1.5倍以上が好ましく、接続時の粒子流動による接続粒子数減少を防止する観点から40μm以下であることが好ましい。 The thickness of the anisotropic conductive adhesive sheet is preferably 1.5 times or more and 40 μm or less, more preferably 2 times or more and 40 μm or less of the above average particle interval. From the viewpoint of mechanical connection strength, the average particle spacing is preferably 1.5 times or more, and from the viewpoint of preventing reduction in the number of connected particles due to particle flow during connection, it is preferably 40 μm or less.
異方導電性接着シートにおける導電性粒子の配合量としては、硬化剤及び硬化性の絶縁性樹脂を合わせた成分100質量部に対して、0.5質量部から20質量部であることが好ましく、1質量部から10質量部であることが特に好ましい。絶縁性の観点から20質量部以下が好ましく、電気的接続性の観点から0.5質量部以上が好ましい。
本発明の異方導電性接着シートは、異方導電性接着シートの片側表面から一部または全部の導電性粒子および絶縁粒子の一部分が露出していても差し支えない。
The blending amount of the conductive particles in the anisotropic conductive adhesive sheet is preferably 0.5 parts by mass to 20 parts by mass with respect to 100 parts by mass of the components including the curing agent and the curable insulating resin. It is particularly preferable that the amount is 1 to 10 parts by mass. 20 parts by mass or less is preferable from the viewpoint of insulation, and 0.5 parts by mass or more is preferable from the viewpoint of electrical connectivity.
In the anisotropic conductive adhesive sheet of the present invention, some or all of the conductive particles and insulating particles may be exposed from one side surface of the anisotropic conductive adhesive sheet.
本発明の異方導電性接着シートにおいて、該異方導電性接着シートの厚み方向に対して、導電性粒子の存在している位置は、焦点方向の変位を測定できるレーザー顕微鏡により測定することができる。またこのとき同時に、導電性粒子が他の導電性粒子と接触せずに存在している個数を測定することもできる。前記レーザー顕微鏡を用いて焦点方向の変位を測定する場合、その変位測定分解能は0.1μm以下であることが好ましく、0.01μm以下であることが特に好ましい。 In the anisotropic conductive adhesive sheet of the present invention, the position where the conductive particles are present relative to the thickness direction of the anisotropic conductive adhesive sheet can be measured by a laser microscope capable of measuring the displacement in the focal direction. it can. At the same time, it is also possible to measure the number of conductive particles that exist without contacting other conductive particles. When the displacement in the focal direction is measured using the laser microscope, the displacement measurement resolution is preferably 0.1 μm or less, and particularly preferably 0.01 μm or less.
次に、本発明における導電性粒子が他の導電性粒子と接触せずに存在している異方導電性接着シートの製造方法について説明する。
本発明において「導電性粒子が他の導電性粒子と接触せずに存在する」とは、導電性粒子同士が凝集せずに各々単独に存在することを意味する。以下、この意味で「単独に存在する」、「単独粒子」なる表現を用いることがある。本発明においては、導電性粒子の90%以上が他の導電性粒子と接触せずに存在しているが、95%以上が他の導電性粒子と接触せずに存在しているのが、好ましい。
Next, the manufacturing method of the anisotropically conductive adhesive sheet in which the electroconductive particle in this invention exists without contacting with other electroconductive particle is demonstrated.
In the present invention, “the conductive particles are present without being in contact with other conductive particles” means that the conductive particles are present independently without being aggregated. Hereinafter, the expressions “exist alone” and “single particle” may be used in this sense. In the present invention, 90% or more of the conductive particles are present without being in contact with other conductive particles, but 95% or more are present without being in contact with other conductive particles. preferable.
本発明の異方導電性接着シートの製造方法としては、2軸延伸可能なフィルム又はシート上に、粘着層を形成し、その上に導電性粒子を単層配列し、それらを延伸することにより、該導電性粒子を分散配列させ、延伸した状態を保った状態で絶縁粒子を散布し、導電性粒子および絶縁粒子を少なくとも硬化剤及び硬化性の絶縁性樹脂からなる接着シートに転写させる方法が好ましい。 As a method for producing the anisotropic conductive adhesive sheet of the present invention, an adhesive layer is formed on a biaxially stretchable film or sheet, conductive particles are arranged in a single layer thereon, and they are stretched. A method in which the conductive particles are dispersed and arranged, the insulating particles are dispersed in a stretched state, and the conductive particles and the insulating particles are transferred to an adhesive sheet made of at least a curing agent and a curable insulating resin. preferable.
2軸延伸可能なフィルムとしては、公知の樹脂フィルム等を用いることができるが、ポリエチレン樹脂、ポリプロピレン樹脂、ポリエステル樹脂、ポリビニルブチラール樹脂、ポリビニルアルコール樹脂、ポリ塩化ビニリデン樹脂等の単独あるいは共重合体等、又は、ニトリルゴム、ブタジエンゴム、シリコーンゴム等のゴムシート等の柔軟で延伸可能な樹脂フィルムを用いることが好ましい。ポリプロピレン樹脂、ポリエステル樹脂が特に好ましい。延伸後の収縮率は10%以下になることが好ましい。 As the biaxially stretchable film, a known resin film or the like can be used, but a polyethylene resin, a polypropylene resin, a polyester resin, a polyvinyl butyral resin, a polyvinyl alcohol resin, a polyvinylidene chloride resin alone or a copolymer, etc. Alternatively, it is preferable to use a flexible and stretchable resin film such as a rubber sheet such as nitrile rubber, butadiene rubber, or silicone rubber. Polypropylene resin and polyester resin are particularly preferable. The shrinkage after stretching is preferably 10% or less.
2軸延伸可能なフィルム上に導電性粒子を分散配列し、固定する方法としては、公知の方法を用いることができる。例えば、少なくとも熱可塑性樹脂を含む粘着層を該2軸延伸可能なフィルム上に形成し、その上に導電性粒子を接触させて付着させ、ゴムロール等で荷重をかけて単層に配置する方法を採ることができる。この場合、隙間無く充填するためには、付着−ロール操作を数回繰り返す方法が好ましい。球状の導電性粒子の場合、最密充填が最も安定した構造なので比較的容易に充填することができる。あるいは、該2軸延伸可能なフィルム上に粘着剤を塗布して接着層を形成し、その上に導電性粒子を付着させ、必要なら数回付着を繰り返し、単層で分散配置する方法等を用いることができる。 As a method for dispersing and fixing conductive particles on a biaxially stretchable film, a known method can be used. For example, a method in which a pressure-sensitive adhesive layer containing at least a thermoplastic resin is formed on the biaxially stretchable film, and conductive particles are brought into contact with and adhered to the film, and placed in a single layer by applying a load with a rubber roll or the like. Can be taken. In this case, a method of repeating the adhesion-roll operation several times is preferable for filling without gaps. In the case of spherical conductive particles, since the closest packing is the most stable structure, it can be filled relatively easily. Alternatively, a method of applying a pressure-sensitive adhesive on the biaxially stretchable film to form an adhesive layer, attaching conductive particles thereon, repeating the attachment several times if necessary, and dispersing and arranging in a single layer, etc. Can be used.
導電性粒子を単層配列させた2軸延伸可能なフィルムを延伸させる方法としては、公知の方法を用いることができるが、均一分散配列という点から、2軸延伸装置を用いることが好ましい。粒子間隔の点から延伸度合いは、50%以上、400%以下であることが好ましく、100%以上、300%以下であることがより好ましい。なお、100%延伸するとは、延伸方向に沿って延伸した部分の長さが延伸前の長さの100%であることを言う。延伸方向は、任意であるが、延伸角度が90°の2軸延伸が好ましく、同時延伸が好ましい。2軸延伸の場合、各方向の延伸度合いは同じであっても異なっていても構わない。 As a method for stretching a biaxially stretchable film in which conductive particles are arranged in a single layer, a known method can be used, but a biaxial stretching device is preferably used from the viewpoint of uniform dispersion alignment. From the viewpoint of particle spacing, the degree of stretching is preferably 50% or more and 400% or less, and more preferably 100% or more and 300% or less. In addition, 100% stretching means that the length of the portion stretched along the stretching direction is 100% of the length before stretching. The stretching direction is arbitrary, but biaxial stretching with a stretching angle of 90 ° is preferable, and simultaneous stretching is preferable. In the case of biaxial stretching, the degree of stretching in each direction may be the same or different.
2軸延伸装置としては、同時2軸連続延伸装置が好ましい。
同時2軸連続延伸装置としては、公知のものを使用することができるが、長辺側をチャック金具で固定し、それらの間隔を縦横同時に延伸することにより連続延伸するテンター型延伸機が好ましい。延伸度を調整する方式としては、スクリュー方式、パンタグラフ方式を用いることが可能だが、調整の精度の観点から、パンタグラフ方式がより好ましい。加熱しながら延伸する場合は、延伸部分の手前に予熱ゾーンを設けて、延伸部分の後方に熱固定ゾーンを設けることが好ましい。
As the biaxial stretching apparatus, a simultaneous biaxial continuous stretching apparatus is preferable.
As the simultaneous biaxial continuous stretching apparatus, a known one can be used, but a tenter type stretching machine that continuously stretches by fixing the long side with a chuck fitting and simultaneously stretching the distance in the vertical and horizontal directions is preferable. As a method for adjusting the degree of stretching, a screw method or a pantograph method can be used, but a pantograph method is more preferable from the viewpoint of accuracy of adjustment. When stretching while heating, it is preferable to provide a preheating zone before the stretched portion and a heat setting zone behind the stretched portion.
本発明の異方導電性接着シートは、少なくとも硬化剤、硬化性の絶縁性樹脂、及び導電性粒子からなる単層のシートであってもよいし、さらに該シートに導電性粒子を含まず少なくとも絶縁性樹脂を含む樹脂シートを積層した複層のシートであっても構わない。 The anisotropic conductive adhesive sheet of the present invention may be a single-layer sheet comprising at least a curing agent, a curable insulating resin, and conductive particles, and further does not include conductive particles in the sheet. It may be a multilayer sheet in which resin sheets containing an insulating resin are laminated.
本発明の異方導電性接着シートに用いる硬化性の絶縁性樹脂としては、熱硬化性樹脂、光硬化性樹脂、光及び熱硬化性樹脂、電子線硬化性樹脂等を用いることができる。取り扱いの容易さから、熱硬化性の絶縁性樹脂を用いることが好ましい。熱硬化性樹脂としては、エポキシ樹脂、アクリル樹脂等を用いることができるが、エポキシ樹脂が特に好ましい。 As the curable insulating resin used for the anisotropic conductive adhesive sheet of the present invention, a thermosetting resin, a photocurable resin, light and thermosetting resin, an electron beam curable resin, or the like can be used. In view of ease of handling, it is preferable to use a thermosetting insulating resin. As the thermosetting resin, an epoxy resin, an acrylic resin, or the like can be used, and an epoxy resin is particularly preferable.
エポキシ樹脂は、1分子中に2個以上のエポキシ基を有する化合物であり、グリシジルエーテル基、グリシジルエステル基、脂環式エポキシ基を有する化合物、分子内の二重結合をエポキシ化した化合物が好ましい。具体的には、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ナフタレン型エポキシ樹脂、ノボラックフェノール型エポキシ樹脂あるいは、それらの変性エポキシ樹脂を用いることができる。 The epoxy resin is a compound having two or more epoxy groups in one molecule, and is preferably a compound having a glycidyl ether group, a glycidyl ester group or an alicyclic epoxy group, or a compound obtained by epoxidizing a double bond in the molecule. . Specifically, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene type epoxy resin, novolac phenol type epoxy resin, or modified epoxy resins thereof can be used.
本発明に用いる硬化剤は、前記硬化性の絶縁性樹脂を硬化できるものであればよい。硬化性の絶縁性樹脂として、熱硬化性樹脂を用いる場合は、100℃以上で熱硬化性樹脂と反応し、硬化できるものが好ましい。エポキシ樹脂の場合は、保存性の点から、潜在性硬化剤であることが好ましく、例えば、イミダゾール系硬化剤、カプセル型イミダゾール系硬化剤、カチオン系硬化剤、ラジカル系硬化剤、ルイス酸系硬化剤、アミンイミド系硬化剤、ポリアミン塩系硬化剤、ヒドラジド系硬化剤等を用いることができる。保存性、低温反応性の点から、カプセル型のイミダゾール系硬化剤が好ましい。 The curing agent used in the present invention may be any one that can cure the curable insulating resin. When a thermosetting resin is used as the curable insulating resin, a resin that can be cured by reacting with the thermosetting resin at 100 ° C. or higher is preferable. In the case of an epoxy resin, a latent curing agent is preferable from the viewpoint of storage stability. For example, an imidazole curing agent, a capsule type imidazole curing agent, a cationic curing agent, a radical curing agent, a Lewis acid curing agent. An agent, an amine imide curing agent, a polyamine salt curing agent, a hydrazide curing agent, and the like can be used. From the viewpoint of storage stability and low-temperature reactivity, capsule-type imidazole curing agents are preferred.
本発明の異方導電性接着シートには、硬化剤及び硬化性の絶縁性樹脂以外に、熱可塑性樹脂等を配合しても構わない。熱可塑性樹脂を配合することにより、容易にシート状に形成することが出来る。この場合の配合量は、硬化剤及び硬化性の絶縁性樹脂を合わせた成分100質量部に対して200質量部以下であることが好ましく、100質量部以下であることが特に好ましい。 The anisotropic conductive adhesive sheet of the present invention may contain a thermoplastic resin or the like in addition to the curing agent and the curable insulating resin. By blending a thermoplastic resin, it can be easily formed into a sheet. In this case, the blending amount is preferably 200 parts by mass or less, particularly preferably 100 parts by mass or less, based on 100 parts by mass of the components including the curing agent and the curable insulating resin.
本発明の硬化性の絶縁性樹脂に配合できる熱可塑性樹脂は、フェノキシ樹脂、ポリビニルアセタール樹脂、ポリビニルブチラール樹脂、アルキル化セルロース樹脂、ポリエステル樹脂、アクリル樹脂、スチレン樹脂、ウレタン樹脂、ポリエチレンテレフタレート樹脂等であり、それらから選ばれる1種または2種以上の樹脂を組み合わせても差し支えない。これらの樹脂の中、水酸基、カルボキシル基等の極性基を有する樹脂は、接着強度の点から好ましい。また、熱可塑性樹脂は、ガラス転移温度が80℃以上である熱可塑性樹脂を1種以上含むことが好ましい。 Thermoplastic resins that can be blended with the curable insulating resin of the present invention include phenoxy resin, polyvinyl acetal resin, polyvinyl butyral resin, alkylated cellulose resin, polyester resin, acrylic resin, styrene resin, urethane resin, polyethylene terephthalate resin, etc. There may be a combination of one or more resins selected from them. Among these resins, a resin having a polar group such as a hydroxyl group or a carboxyl group is preferable from the viewpoint of adhesive strength. Moreover, it is preferable that a thermoplastic resin contains 1 or more types of thermoplastic resins whose glass transition temperature is 80 degreeC or more.
本発明の異方導電性接着シートには、上記構成成分に添加剤を配合しても差し支えない。異方導電性接着シートと被着物との密着性を向上させるために、添加剤として、カップリング剤を配合することができる。該カップリング剤としては、シランカップリング剤、チタンカップリング剤、アルミカップリング剤等を用いることができるが、シランカップリング剤が好ましい。該シランカップリング剤としては、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−メルカプトトリメトキシシラン、γ−アミノプロピルトリメトキシシラン、β−アミノエチル−γ−アミノプロピルトリメトキシシラン、γ−ウレイドプロピルトリメトキシシラン等を用いることができる。 In the anisotropic conductive adhesive sheet of the present invention, an additive may be blended with the above components. In order to improve the adhesion between the anisotropic conductive adhesive sheet and the adherend, a coupling agent can be blended as an additive. As the coupling agent, a silane coupling agent, a titanium coupling agent, an aluminum coupling agent, or the like can be used, and a silane coupling agent is preferable. Examples of the silane coupling agent include γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-mercaptotrimethoxysilane, γ-aminopropyltrimethoxysilane, β-aminoethyl-γ- Aminopropyltrimethoxysilane, γ-ureidopropyltrimethoxysilane, and the like can be used.
該カップリング剤の配合量は硬化剤および硬化性の絶縁性樹脂を合わせた成分100質量部に対して、0.01質量部から1質量部が好ましい。密着性向上の観点から0.01質量部以上が好ましく、信頼性の観点から1質量部以下が好ましい。 The blending amount of the coupling agent is preferably 0.01 parts by mass to 1 part by mass with respect to 100 parts by mass of the components including the curing agent and the curable insulating resin. 0.01 mass part or more is preferable from a viewpoint of adhesive improvement, and 1 mass part or less is preferable from a reliability viewpoint.
さらに、吸湿時において、異方導電性接着シート中のイオン性成分による絶縁性低下を防止するため、添加剤としてイオン捕捉剤を配合することができる。該イオン捕捉剤としては、有機イオン交換体、無機イオン交換体、無機イオン吸着剤等を用いることができるが、耐熱性に優れる無機イオン交換体が好ましい。 Furthermore, an ion scavenger can be blended as an additive in order to prevent a decrease in insulation due to an ionic component in the anisotropic conductive adhesive sheet during moisture absorption. As the ion scavenger, an organic ion exchanger, an inorganic ion exchanger, an inorganic ion adsorbent, and the like can be used, but an inorganic ion exchanger excellent in heat resistance is preferable.
該無機イオン交換体としては、ジルコニウム系化合物、ジルコニウムビスマス系化合物、アンチモンビスマス系化合物、マグネシウムアルミニウム化合物を用いることができる。交換するイオンのタイプとしては、陽イオンタイプ、陰イオンタイプ、両イオンタイプがあるが、イオンマイグレーション直接の原因になる金属イオン(陽イオン)、電気伝導度を上昇し、金属イオンの生成原因になる陰イオンを両方とも交換できるため両イオンタイプが好ましい。 As the inorganic ion exchanger, zirconium compounds, zirconium bismuth compounds, antimony bismuth compounds, and magnesium aluminum compounds can be used. There are positive ion type, negative ion type, and both ion types as ion types to be exchanged, but metal ions (positive ions) that cause direct ion migration, increase electrical conductivity, and cause generation of metal ions. Both anions are preferred because both anions can be exchanged.
配合する該イオン捕捉剤の平均粒径は、0.01μm以上5μm以下であることが好ましく、0.01μm以上1μm以下であることがより好ましい。
イオン捕捉剤の配合量としては、樹脂成分100質量部に対して0.01質量部から3質量部であることが好ましい。配合量が0.01質量部未満の場合は、イオン捕捉効果が不充分であり、電気的接続の観点から3質量部以下が好ましい。
The average particle size of the ion scavenger to be blended is preferably 0.01 μm or more and 5 μm or less, and more preferably 0.01 μm or more and 1 μm or less.
The compounding amount of the ion scavenger is preferably 0.01 to 3 parts by mass with respect to 100 parts by mass of the resin component. When the blending amount is less than 0.01 parts by mass, the ion trapping effect is insufficient, and 3 parts by mass or less is preferable from the viewpoint of electrical connection.
次に本発明の異方導電性接着シートの製造方法について説明する。
まず、2軸延伸可能なフィルム上に粘着層を設けて積層体を形成し、該積層体の上に平均粒径1〜8μmの導電性粒子を付着させ導電性粒子付着フィルムを作製し、該導電性粒子付着フィルムを該導電性粒子の近接する粒子との平均粒子間隔が導電性粒子の平均粒径の0.5倍以上5倍以下かつ20μm以下となるように2軸延伸して保持し、延伸した状態を保ったまま、その上に絶縁粒子を散布し、その後、少なくとも硬化剤及び硬化性の絶縁性樹脂を含んでなる接着シートに導電性粒子および絶縁粒子を転写することにより、本発明の異方導電性接着シートを製造することができる。
好ましくは、2軸延伸可能なフィルムは長尺のフィルムであり、接着シートも長尺の接着シートである。本願において長尺とは長さが10m以上であることを指す。長尺の接着シートを用いれば連続して接続構造体を生産でき効率がよい。
Next, the manufacturing method of the anisotropically conductive adhesive sheet of this invention is demonstrated.
First, an adhesive layer is provided on a biaxially stretchable film to form a laminate, and conductive particles having an average particle diameter of 1 to 8 μm are adhered on the laminate to produce a conductive particle-adhered film. The conductive particle-attached film is biaxially stretched and held so that the average particle interval between the conductive particles and the adjacent particles is 0.5 to 5 times and 20 μm or less the average particle size of the conductive particles. By keeping the stretched state, the insulating particles are sprayed thereon, and then the conductive particles and the insulating particles are transferred to an adhesive sheet containing at least a curing agent and a curable insulating resin. The anisotropic conductive adhesive sheet of the invention can be produced.
Preferably, the biaxially stretchable film is a long film, and the adhesive sheet is also a long adhesive sheet. In the present application, the long length means that the length is 10 m or more. If a long adhesive sheet is used, a connection structure can be produced continuously, which is efficient.
接着シートは硬化剤及び硬化性の絶縁性樹脂を含んでなる接着層であり、この接着シートは通常は剥離可能なベースフィルム(保持フィルム)上に形成される。このため、得られる異方導電性接着シートは、通常は剥離可能なベースフィルム上に形成される。
本願明細書では、この異方導電性接着シートとベースフィルムとの積層体を異方導電性接着シートと言うことがある。
The adhesive sheet is an adhesive layer comprising a curing agent and a curable insulating resin, and this adhesive sheet is usually formed on a peelable base film (holding film). For this reason, the anisotropically conductive adhesive sheet obtained is normally formed on the peelable base film.
In the present specification, the laminate of the anisotropic conductive adhesive sheet and the base film may be referred to as an anisotropic conductive adhesive sheet.
粘着層に使用する粘着剤は、公知のものを使用することができるが、加熱しながら2軸延伸する場合は、非熱架橋性の粘着剤を用いることが好ましい。具体的には、天然ゴムラテックス系粘着剤、合成ゴムラテックス系粘着剤、合成樹脂エマルジョン系粘着剤、シリコーン系粘着剤、エチレン−酢酸ビニル共重合体粘着剤等を単独で、又は組み合わせて用いることができる。 As the pressure-sensitive adhesive used for the pressure-sensitive adhesive layer, a known one can be used, but when biaxial stretching is performed while heating, it is preferable to use a non-thermal crosslinkable pressure-sensitive adhesive. Specifically, natural rubber latex adhesives, synthetic rubber latex adhesives, synthetic resin emulsion adhesives, silicone adhesives, ethylene-vinyl acetate copolymer adhesives, etc. may be used alone or in combination. Can do.
粘着層の厚みは、使用する導電性粒子の平均粒径の1/50から3倍の範囲が好ましく、1/10から2倍の範囲がより好ましい。導電性粒子付着時及び延伸時に導電性粒子を保持する観点から、粘着層の厚みは該導電性粒子の平均粒径の1/50以上が好ましく、延伸後の接着シートへの粒子転写の観点から3倍以下が好ましい。粘着層形成方法としては、溶剤又は水に分散又は溶解したものを、グラビアコーター、ダイコーター、ナイフコーター、バーコーター等の公知の方法で塗布し、乾燥する方法を用いることができる。ホットメルトタイプの粘着剤を使用する場合は、無溶剤でロールコートすることができる。 The thickness of the adhesive layer is preferably in the range of 1/50 to 3 times the average particle diameter of the conductive particles used, and more preferably in the range of 1/10 to 2 times. From the viewpoint of holding the conductive particles at the time of adhesion and stretching of the conductive particles, the thickness of the adhesive layer is preferably 1/50 or more of the average particle diameter of the conductive particles, from the viewpoint of particle transfer to the adhesive sheet after stretching. 3 times or less is preferable. As the method for forming the adhesive layer, a method in which a dispersion or solution in a solvent or water is applied and dried by a known method such as a gravure coater, a die coater, a knife coater, or a bar coater can be used. When a hot-melt type pressure-sensitive adhesive is used, it can be roll-coated without a solvent.
該導電性粒子を粘着層に塗布するにあたっては、ほぼ隙間無く単層に配置すること(密集充填)が好ましい。密集充填する方法としては、前述の、2軸延伸可能なフィルム上に導電性粒子を分散配列し、固定する方法を用いることができる。なお、密集充填とは、充填された粒子間の平均粒子間隔が、平均粒径の1/2以下であるように充填することをいうものとする。より好ましくは、充填された粒子間の平均粒子間隔が、平均粒径の1/5以下である。 In applying the conductive particles to the adhesive layer, it is preferable to dispose the conductive particles in a single layer (close packing) with almost no gap. As a method for dense packing, the above-described method of dispersing and arranging conductive particles on a biaxially stretchable film can be used. In addition, close packing means filling so that the average particle | grain space | interval between the filled particles may be 1/2 or less of an average particle diameter. More preferably, the average particle interval between the filled particles is 1/5 or less of the average particle size.
2軸延伸後のフィルムの膜厚は、転写する接着性シート及び接着性シートのベースフィルムの膜厚を合計した厚みの1/10から1倍であることが好ましく、1/5から1/2であることが特に好ましい。延伸後のフィルムのハンドリング性の観点から、1/10以上であることが好ましく、延伸後の接着性シートへの粒子転写の観点から1倍以下であることが好ましい。 The film thickness of the biaxially stretched film is preferably 1/10 to 1 times the total thickness of the adhesive sheet to be transferred and the base film of the adhesive sheet, and 1/5 to 1/2. It is particularly preferred that From the viewpoint of handling properties of the stretched film, it is preferably 1/10 or more, and from the viewpoint of particle transfer to the adhesive sheet after stretching, it is preferably 1 time or less.
延伸した状態を保ったまま、絶縁粒子を散布する方法としては、帯電による絶縁粒子同士の凝集を防止する為、絶縁粒子を除電処理することが好ましい。 As a method of spraying the insulating particles while maintaining the stretched state, it is preferable that the insulating particles are subjected to charge removal treatment in order to prevent aggregation of the insulating particles due to charging.
次に、微細接続端子を有する電子回路部品とそれに対応する回路を有する回路基板とを異方導電性接着シートで電気的に接続する、本発明の接続方法を説明する。
該接続方法において、該電子回路部品の微細接続端子の高さは導電性粒子の平均粒子間隔の3〜15倍かつ40μm以下であり、該微細接続端子の間隔は該平均粒子間隔の1〜10倍かつ40μm以下であり、該微細接続端子のピッチは該平均粒子間隔の3〜30倍かつ80μm以下である。該電子回路部品とそれに対応する回路を有する回路基板とは、本発明の異方導電性接着シートを用いて電気的に接続する。
Next, the connection method of the present invention, in which an electronic circuit component having fine connection terminals and a circuit board having a corresponding circuit are electrically connected with an anisotropic conductive adhesive sheet, will be described.
In the connection method, the height of the fine connection terminal of the electronic circuit component is 3 to 15 times the average particle interval of the conductive particles and 40 μm or less, and the interval of the fine connection terminal is 1 to 10 of the average particle interval. The pitch of the fine connection terminals is 3 to 30 times the average particle interval and 80 μm or less. The electronic circuit component and a circuit board having a corresponding circuit are electrically connected using the anisotropic conductive adhesive sheet of the present invention.
微細接続端子の高さは、導電性粒子の平均粒子間隔の3〜15倍かつ40μm以下であり、4倍〜10倍が好ましい。微細接続構造体の機械的強度の観点から3倍以上が好ましく、接続時に接着性シートの樹脂流動により導電性粒子の移動が起こり、該微細接続端子下部にある導電性粒子数の減少による接続性低下の観点から、15倍以下であり、かつ40μm以下が好ましい。 The height of the fine connection terminal is 3 to 15 times the average particle interval of the conductive particles and 40 μm or less, and preferably 4 to 10 times. Three times or more is preferable from the viewpoint of the mechanical strength of the fine connection structure, and the conductive particles move due to the resin flow of the adhesive sheet at the time of connection. From the viewpoint of reduction, it is 15 times or less and preferably 40 μm or less.
該微細接続端子間隔は平均粒子間隔の1〜10倍かつ40μm以下であり、1〜10倍かつ20μm以下が好ましく、2〜5倍かつ15μm以下がより好ましい。絶縁性の観点から1倍以上が好ましく、微細接続の観点から10倍以下かつ40μm以下が好ましい。ピッチは、平均粒子間隔の3〜30倍かつ80μm以下であり、5〜20倍かつ40μm以下であることが好ましい。接続性の観点から3倍以上が好ましく、微細接続の観点から30倍以下かつ80μm以下が好ましい。 The fine connection terminal interval is 1 to 10 times the average particle interval and 40 μm or less, preferably 1 to 10 times and 20 μm or less, more preferably 2 to 5 times and 15 μm or less. 1 times or more is preferable from the viewpoint of insulation, and 10 times or less and 40 μm or less are preferable from the viewpoint of fine connection. The pitch is 3 to 30 times the average particle interval and 80 μm or less, and preferably 5 to 20 times and 40 μm or less. It is preferably 3 times or more from the viewpoint of connectivity, and preferably 30 times or less and 80 μm or less from the viewpoint of fine connection.
本発明はまた、上記微細接続方法により接続された微細接続構造体にも関する。
本発明の微細接続構成体を構成する回路基板の材質は、有機基板でも無機基板でも、差し支えない。有機基板としては、ポリイミドフィルム基板、ポリアミドフィルム基板、ポリエーテルスルホンフィルム基板、エポキシ樹脂をガラスクロスに含浸させたリジッド基板、ビスマレイミド−トリアジン樹脂をガラスクロスに含浸させたリジッド基板等を用いることができる。無機基板としては、シリコン基板、ガラス基板、アルミナ基板、窒化アルミ基板等を用いることができる。配線基板の配線材料は、インジウム錫酸化物、インジウム亜鉛酸化物等の無機配線材料、金メッキ銅、クロム−銅、アルミニウム、金バンプ等の金属配線材料、アルミニウム、クロム等の金属材料でインジウム錫酸化物等の無機配線材料を覆った複合配線材料等を用いることができる。
The present invention also relates to a fine connection structure connected by the fine connection method.
The material of the circuit board constituting the finely connected structure of the present invention may be an organic substrate or an inorganic substrate. As the organic substrate, a polyimide film substrate, a polyamide film substrate, a polyethersulfone film substrate, a rigid substrate obtained by impregnating a glass cloth with an epoxy resin, a rigid substrate obtained by impregnating a glass cloth with a bismaleimide-triazine resin, or the like may be used. it can. As the inorganic substrate, a silicon substrate, a glass substrate, an alumina substrate, an aluminum nitride substrate, or the like can be used. The wiring material of the wiring board is inorganic wiring materials such as indium tin oxide and indium zinc oxide, metal wiring materials such as gold-plated copper, chromium-copper, aluminum and gold bumps, and metal materials such as aluminum and chromium indium tin oxide. A composite wiring material covering an inorganic wiring material such as an object can be used.
本発明の異方導電性接着シートを適応する用途、あるいは本発明の微細接続構造体を構成する電子回路部品としては、液晶ディスプレイ機器、プラズマディスプレイ機器、エレクトロルミネッセンスディスプレイ機器等の表示機器の配線板接続用途および、それら機器のLSI等の電子部品実装用途、その他の機器の配線基板接続部分、LSI等の電子部品実装用途に使用することができる。上記表示機器の中でも、信頼性を必要とされるプラズマディスプレイ機器、エレクトロルミネッセンスディスプレイ機器に用いるのが好ましい。
次に、実施例および比較例によって本発明を説明する。
As an application to which the anisotropic conductive adhesive sheet of the present invention is applied, or as an electronic circuit component constituting the finely connected structure of the present invention, a wiring board of a display device such as a liquid crystal display device, a plasma display device, an electroluminescence display device, etc. It can be used for connection applications, electronic component mounting applications such as LSIs for those devices, wiring board connection parts of other devices, and electronic component mounting applications such as LSIs. Among the display devices, it is preferably used for plasma display devices and electroluminescence display devices that require reliability.
Next, the present invention will be described with reference to examples and comparative examples.
[実施例1]
フェノキシ樹脂(ガラス転移温度98℃、数平均分子量14000)39g、ビスフェノールA型エポキシ樹脂(エポキシ当量190、25℃粘度、14000mPa・S)24g、γ−グリシドキシプロピルトリメトキシシラン0.4gを酢酸エチル−トルエンの混合溶剤(混合比1:1)に溶解し、固形分50%溶液とする。
マイクロカプセル型潜在性イミダゾール硬化剤を含有する液状エポキシ樹脂(マイクロカプセルの平均粒径5μm、活性温度125℃)37g、前記固形分50%溶液に配合分散させる。その後、厚さ50μmのポリエチレンテレフタレートフィルム(ベースフィルム)上に塗布し、60℃で15分間送風乾燥し、膜厚18μmのフィルム状の接着シートを得た。
[Example 1]
Acetic acid is 39 g of phenoxy resin (glass transition temperature 98 ° C., number average molecular weight 14000), bisphenol A type epoxy resin (epoxy equivalent 190, viscosity at 25 ° C., 14000 mPa · S) 24 g, and 0.4 g of γ-glycidoxypropyltrimethoxysilane. Dissolve in a mixed solvent of ethyl-toluene (mixing ratio 1: 1) to obtain a 50% solid content solution.
A liquid epoxy resin containing a microcapsule-type latent imidazole curing agent (average particle diameter of microcapsule 5 μm, active temperature 125 ° C.) 37 g is mixed and dispersed in the 50% solid content solution. Then, it apply | coated on the 50-micrometer-thick polyethylene terephthalate film (base film), and air-dried at 60 degreeC for 15 minute (s), and obtained the film-form adhesive sheet of 18-micrometer-thickness.
厚さ40μmの無延伸ポリプロピレンフィルム上に、粘着層としてニトリルゴムラテックス−メチルメタアクリレートのグラフト共重合体接着剤を5μmの厚みを塗布したものに平均粒径3.0μmの金めっきプラスチック粒子(導電性粒子)をほぼ隙間無く単層塗布した。すなわち、該導電性粒子を該フィルム幅より大きい容器内に数層以上の厚みになるよう敷き詰めたものを用意し、該導電性粒子に対して粘着剤の塗布面を下向きにして押し付けて付着させ、その後過剰な粒子を軟質ゴムからなるスクレバーで掻き落とした。
この操作を2回繰り返すことにより、隙間無く単層塗布した導電性粒子付着フィルムを得た。
A gold-plated plastic particle having an average particle size of 3.0 μm (conductive) coated on a non-stretched polypropylene film having a thickness of 40 μm and a 5 μm thick graft copolymer adhesive of nitrile rubber latex-methyl methacrylate as an adhesive layer. The single particles were applied almost without any gaps. That is, the conductive particles are prepared in a container having a thickness of several layers or more in a container larger than the film width, and the adhesive particles are pressed and adhered to the conductive particles with the application surface of the adhesive facing downward. Then, excess particles were scraped off with a scrubber made of soft rubber.
By repeating this operation twice, a conductive particle adhesion film coated with a single layer without a gap was obtained.
このフィルムを2軸延伸装置(東洋精機製X6H−S、パンタグラフ方式のコーナーストレッチ型の2軸延伸装置)を用いて縦横にそれぞれ10個のチャックを用いて固定し115℃、120秒間予熱し、その後20%/秒の速度で100%延伸して固定した。固定後、平均粒径1μmの球状ベンゾグアナミン−ホルムアルデヒド縮合樹脂粒子(比重1.40)を1g/m2の割合で散布した。その後、この延伸フィルムに前記接着シートをラミネートした後、剥離し、異方導電性接着シートを得た。 This film was fixed using 10 chucks vertically and horizontally using a biaxial stretching device (X6H-S manufactured by Toyo Seiki, pantograph type corner stretching type biaxial stretching device), preheated at 115 ° C. for 120 seconds, Thereafter, the film was stretched 100% and fixed at a rate of 20% / second. After fixation, spherical benzoguanamine-formaldehyde condensation resin particles (specific gravity 1.40) having an average particle diameter of 1 μm were sprayed at a rate of 1 g / m 2 . Then, after laminating the adhesive sheet on the stretched film, it was peeled off to obtain an anisotropic conductive adhesive sheet.
得られた異方導電性接着シートの導電性粒子のうち、無作為に100個を選び、焦点方向の変位を測定できるレーザー顕微鏡(キーエンス社製、VK9500、形状測定分解能0.01μm)を用いて、異方導電性接着シート表面からの距離を測定した。その結果、導電性粒子の99%が異方導電性接着シート表面より5μmの範囲内に存在することがわかった。また、光学顕微鏡観察の結果、導電性粒子100個のうち98%が単独粒子であった。また、平均粒子間隔は4.30μmであり、これは、平均粒径の1.43倍であった。絶縁粒子個数は、導電性粒子の4.9倍であり、97%が異方導電性接着シート表面より5μmの範囲内に存在していた。 Among the conductive particles of the obtained anisotropic conductive adhesive sheet, 100 particles were selected at random, and a laser microscope (VK9500, manufactured by Keyence Corporation, shape measurement resolution 0.01 μm) capable of measuring displacement in the focal direction was used. The distance from the anisotropic conductive adhesive sheet surface was measured. As a result, it was found that 99% of the conductive particles were present within a range of 5 μm from the anisotropic conductive adhesive sheet surface. As a result of observation with an optical microscope, 98% of 100 conductive particles were single particles. Further, the average particle interval was 4.30 μm, which was 1.43 times the average particle size. The number of insulating particles was 4.9 times that of the conductive particles, and 97% was present within a range of 5 μm from the anisotropic conductive adhesive sheet surface.
[実施例2]
フェノキシ樹脂(ガラス転移温度98℃、数平均分子量14000)41g、ナフタレン型エポキシ樹脂(エポキシ当量136、半固形)33g、γ−ウレイドプロピルトリメトキシシラン0.06gを酢酸エチル−トルエンの混合溶剤(混合比1:1)に溶解し、固形分50%溶液とする。マイクロカプセル型潜在性イミダゾール硬化剤を含有する液状エポキシ樹脂(マイクロカプセルの平均粒径7μm、活性温度125℃)26g、前記固形分50%溶液に配合分散させる。その後、厚さ50μmのポリエチレンテレフタレートフィルム上に塗布し、60℃で15分間送風乾燥し、膜厚17μmのフィルム状の接着シートを得た。
[Example 2]
41 g of phenoxy resin (glass transition temperature 98 ° C., number average molecular weight 14000), 33 g of naphthalene type epoxy resin (epoxy equivalent 136, semi-solid), 0.06 g of γ-ureidopropyltrimethoxysilane were mixed with ethyl acetate-toluene mixed solvent (mixed) To a 50% solid content solution. A liquid epoxy resin containing a microcapsule-type latent imidazole curing agent (average particle diameter of microcapsule 7 μm, active temperature 125 ° C.) 26 g is mixed and dispersed in the 50% solid content solution. Then, it apply | coated on the 50-micrometer-thick polyethylene terephthalate film, and air-dried at 60 degreeC for 15 minute (s), and obtained the film-like adhesive sheet of film thickness of 17 micrometers.
厚さ45μmの無延伸ポリエチレンフィルム上に実施例1と同じニトリルゴムラテックス−メチルメタアクリレートのグラフト共重合体接着剤を3μm塗布したものに平均粒径3.8μmの金めっきプラスチック粒子を実施例1と同様の方法によりほぼ隙間無く単層塗布した導電性粒子付着フィルムを得た。
このフィルムを延伸温度を80℃にする以外は実施例1と同様の方法により2軸延伸装置を用いて縦横にそれぞれ120%延伸して固定した。固定後、平均粒径2μmの球状架橋スチレン樹脂粒子(比重1.05、ガラス転移温度105℃)を1.8g/m2の割合で散布した。その後、この延伸フィルムに前記接着シートをラミネートした後、剥離し、異方導電性接着シートを得た。
Example 1 Gold-plated plastic particles having an average particle size of 3.8 μm were applied to a non-stretched polyethylene film having a thickness of 45 μm and 3 μm of the same nitrile rubber latex-methyl methacrylate graft copolymer adhesive as in Example 1 applied. A conductive particle adhesion film coated with a single layer with almost no gap was obtained by the same method as above.
The film was stretched and fixed 120% vertically and horizontally by the same method as in Example 1 except that the stretching temperature was 80 ° C. After fixing, spherical crosslinked styrene resin particles having an average particle diameter of 2 μm (specific gravity 1.05, glass transition temperature 105 ° C.) were sprayed at a rate of 1.8 g / m 2 . Then, after laminating the adhesive sheet on the stretched film, it was peeled off to obtain an anisotropic conductive adhesive sheet.
得られた異方導電性接着シートの導電性粒子のうち、無作為に100個を選び、焦点方向の変位を測定できるレーザー顕微鏡(キーエンス社製、VK9500、形状測定分解能0.01μm)を用いて、異方導電性接着シート表面からの距離を測定した。その結果、導電性粒子の99%が異方導電性接着シート表面から7μmの範囲内により存在することがわかった。また、光学顕微鏡観察の結果、導電性粒子100個のうち97%が単独粒子であった。また、平均粒子間隔は6.46μmであり、これは、平均粒径の1.70倍であった。絶縁粒子個数は、導電性粒子の3.0倍であり、98%が異方導電性接着シート表面より7μmの範囲内に存在していた。 Among the conductive particles of the obtained anisotropic conductive adhesive sheet, 100 particles were selected at random, and a laser microscope (VK9500, manufactured by Keyence Corporation, shape measurement resolution 0.01 μm) capable of measuring displacement in the focal direction was used. The distance from the anisotropic conductive adhesive sheet surface was measured. As a result, it was found that 99% of the conductive particles were present within a range of 7 μm from the anisotropic conductive adhesive sheet surface. As a result of observation with an optical microscope, 97% of 100 conductive particles were single particles. The average particle spacing was 6.46 μm, which was 1.70 times the average particle size. The number of insulating particles was 3.0 times that of the conductive particles, and 98% was present within a range of 7 μm from the surface of the anisotropic conductive adhesive sheet.
[実施例3]
フェノキシ樹脂(ガラス転移温度45℃、数平均分子量12000)10g、フェノキシ樹脂(ガラス転移温度98℃、数平均分子量14000)33g、ナフタレン型エポキシ樹脂(エポキシ当量136、半固形)26g、γ−グリシドキシプロピルトリエトキシシラン0.1gを酢酸エチル−トルエンの混合溶剤(混合比1:1)に溶解し、固形分50%溶液とする。マイクロカプセル型潜在性イミダゾール硬化剤を含有する液状エポキシ樹脂(マイクロカプセルの平均粒径7μm、活性温度125℃)31g、前記固形分50%溶液に配合分散させる。その後、厚さ50μmのポリエチレンテレフタレートフィルム上に塗布し、60℃で15分間送風乾燥し、膜厚15μmのフィルム状の接着シートを得た。
[Example 3]
10 g of phenoxy resin (glass transition temperature 45 ° C., number average molecular weight 12000), 33 g of phenoxy resin (glass transition temperature 98 ° C., number average molecular weight 14000), 26 g of naphthalene type epoxy resin (epoxy equivalent 136, semi-solid), γ-glycid 0.1 g of xylpropyltriethoxysilane is dissolved in a mixed solvent of ethyl acetate-toluene (mixing ratio 1: 1) to obtain a 50% solid content solution. A liquid epoxy resin containing a microcapsule-type latent imidazole curing agent (average particle diameter of microcapsule 7 μm, active temperature 125 ° C.) 31 g is mixed and dispersed in the 50% solid content solution. Then, it apply | coated on the 50-micrometer-thick polyethylene terephthalate film, and it air-dried for 15 minutes at 60 degreeC, and obtained the film-form adhesive sheet of 15-micrometer-thickness.
厚さ45μmの無延伸ポリプロピレンフィルム上にエチレン−酢酸ビニル共重合体接着剤を5μm塗布したものに平均粒径3.2μmの金めっき銅粒子を実施例1と同様の方法によりほぼ隙間無く単層塗布した導電性粒子付着フィルムを得た。
このフィルムを実施例1と同様の方法により2軸延伸装置を用いて縦横にそれぞれ150%延伸して固定した。固定後、平均粒径1μmの球状シリカ粒子(比重1.82)を1.7g/m2の割合で散布した。その後、この延伸フィルムに前記接着シートをラミネートした後、剥離し、異方導電性接着シートを得た。
A gold-plated copper particle having an average particle size of 3.2 μm was applied to a non-stretched polypropylene film having a thickness of 45 μm coated with 5 μm of an ethylene-vinyl acetate copolymer adhesive by a method similar to that of Example 1 to form a single layer. The applied conductive particle adhesion film was obtained.
This film was fixed by stretching 150% in the longitudinal and lateral directions using a biaxial stretching apparatus in the same manner as in Example 1. After fixation, spherical silica particles having an average particle diameter of 1 μm (specific gravity 1.82) were sprayed at a rate of 1.7 g / m 2 . Then, after laminating the adhesive sheet on the stretched film, it was peeled off to obtain an anisotropic conductive adhesive sheet.
得られた異方導電性接着シートの導電性粒子のうち、無作為に100個を選び、焦点方向の変位を測定できるレーザー顕微鏡(キーエンス社製、VK9500、形状測定分解能0.01μm)を用いて、異方導電性接着シート表面からの距離を測定した。その結果、導電性粒子の98%が異方導電性接着シート表面より6μmの範囲内に存在することがわかった。また、光学顕微鏡観察の結果、導電性粒子100個のうち96%が単独粒子であった。また、平均粒子間隔は6.75μmであり、これは、平均粒径の2.11倍であった。絶縁粒子個数は、導電性粒子の12倍であり、98%が異方導電性接着シート表面より6μmの範囲内に存在していた。 Among the conductive particles of the obtained anisotropic conductive adhesive sheet, 100 particles were selected at random, and a laser microscope (VK9500, manufactured by Keyence Corporation, shape measurement resolution 0.01 μm) capable of measuring displacement in the focal direction was used. The distance from the anisotropic conductive adhesive sheet surface was measured. As a result, it was found that 98% of the conductive particles were present within a range of 6 μm from the anisotropic conductive adhesive sheet surface. As a result of observation with an optical microscope, 96% of 100 conductive particles were single particles. Further, the average particle interval was 6.75 μm, which was 2.11 times the average particle size. The number of insulating particles was 12 times that of the conductive particles, and 98% was present in the range of 6 μm from the anisotropic conductive adhesive sheet surface.
[比較例1]
フェノキシ樹脂(ガラス転移温度98℃、数平均分子量14000)37g、ビスフェノールA型エポキシ樹脂(エポキシ当量190、25℃粘度、14000mPa・S)26g、γ−グリシドキシプロピルトリメトキシシラン0.3gを酢酸エチル−トルエンの混合溶剤(混合比1:1)に溶解し、固形分50%溶液とする。
マイクロカプセル型潜在性イミダゾール硬化剤を含有する液状エポキシ樹脂(マイクロカプセルの平均粒径5μm、活性温度125℃)37g、平均粒径3.8μmの金めっきプラスチック粒子2.0gを前記固形分50%溶液に配合分散させる。
その後、厚さ50μmのポリエチレンテレフタレートフィルム上に塗布し、60℃で15分間送風乾燥し、膜厚20μmのフィルム状の異方導電性接着シートを得た。
得られた異方導電性接着シートの導電性粒子のうち、無作為に100個を選び、レーザー式の変位計を用いて、異方導電性接着シート表面からの距離を測定した。その結果、導電性粒子は異方導電性接着シートの膜厚方向においてランダムに存在することがわかった。また、測定した導電性粒子100個のうち78%が単独粒子であった。また、表面に露出している粒子は1%であった。
[Comparative Example 1]
Acetic acid containing 37 g of phenoxy resin (glass transition temperature 98 ° C., number average molecular weight 14000), bisphenol A type epoxy resin (epoxy equivalent 190, 25 ° C. viscosity, 14000 mPa · S) 26 g, and γ-glycidoxypropyltrimethoxysilane 0.3 g Dissolve in a mixed solvent of ethyl-toluene (mixing ratio 1: 1) to obtain a 50% solid content solution.
37 g of liquid epoxy resin containing microcapsule type latent imidazole curing agent (average particle size of microcapsule 5 μm, active temperature 125 ° C.) and 2.0 g of gold-plated plastic particles having an average particle size of 3.8 μm are mixed with 50% solid content. Mix and disperse in the solution.
Then, it apply | coated on the 50-micrometer-thick polyethylene terephthalate film, air-dried at 60 degreeC for 15 minute (s), and the film-form anisotropic conductive adhesive sheet of 20-micrometer-thickness was obtained.
Of the conductive particles of the obtained anisotropic conductive adhesive sheet, 100 particles were randomly selected, and the distance from the anisotropic conductive adhesive sheet surface was measured using a laser displacement meter. As a result, it was found that the conductive particles exist randomly in the film thickness direction of the anisotropic conductive adhesive sheet. In addition, 78% of 100 conductive particles measured were single particles. Moreover, 1% of the particles were exposed on the surface.
[比較例2]
フェノキシ樹脂(ガラス転移温度45℃、数平均分子量12000)42g、ナフタレン型エポキシ樹脂(エポキシ当量136、半固形)32g、γ−ウレイドプロピルトリメトキシシラン0.06gを酢酸エチル−トルエンの混合溶剤(混合比1:1)に溶解し、固形分50%溶液とする。マイクロカプセル型潜在性イミダゾール硬化剤を含有する液状エポキシ樹脂(マイクロカプセルの平均粒径5μm、活性温度125℃)26g、平均粒径3.2μmの金めっき銅粒子6.0g、平均粒径2.0μmの球状シリカ粒子(比重1.83)10gを前記固形分50%溶液に配合分散させる。その後、厚さ50μmのポリエチレンテレフタレートフィルム上に塗布し、60℃で15分間送風乾燥し、膜厚20μmのフィルム状の異方導電性接着シートを得た。
得られた異方導電性接着シートの導電性粒子のうち、無作為に100個を選び、レーザー式の変位計を用いて、異方導電性接着シート表面からの距離を測定した。その結果、導電性粒子は異方導電性接着シートの膜厚方向においてランダムに存在することがわかった。また、測定した導電性粒子100個のうち60%が単独粒子であった。
[Comparative Example 2]
42 g of phenoxy resin (glass transition temperature 45 ° C., number average molecular weight 12000), 32 g of naphthalene type epoxy resin (epoxy equivalent 136, semi-solid), 0.06 g of γ-ureidopropyltrimethoxysilane were mixed with ethyl acetate-toluene mixed solvent (mixed) To a 50% solid content solution. 26 g of a liquid epoxy resin containing a microcapsule-type latent imidazole curing agent (average particle size of microcapsule 5 μm, active temperature 125 ° C.), 6.0 g of gold-plated copper particles having an average particle size of 3.2 μm, and an average particle size of 2. 10 g of 0 μm spherical silica particles (specific gravity 1.83) are mixed and dispersed in the 50% solid content solution. Then, it apply | coated on the 50-micrometer-thick polyethylene terephthalate film, air-dried at 60 degreeC for 15 minute (s), and the film-form anisotropic conductive adhesive sheet of 20-micrometer-thickness was obtained.
Of the conductive particles of the obtained anisotropic conductive adhesive sheet, 100 particles were randomly selected, and the distance from the anisotropic conductive adhesive sheet surface was measured using a laser displacement meter. As a result, it was found that the conductive particles exist randomly in the film thickness direction of the anisotropic conductive adhesive sheet. Moreover, 60% of 100 measured conductive particles were single particles.
(接続抵抗値測定方法)
縦横が1.6mm×15.1mmのシリコン片(厚み0.5mm)全面に酸化膜を形成後、外辺部から40μm内側に横74.5μm、縦120μmのアルミ薄膜(1000A)をそれぞれが0.1μm間隔になるように長辺側に各々175個、短辺側に各々16個形成する。それらアルミ薄膜上に15μm間隔になるように横25μm、縦100μmの金バンプ(厚み15μm)をそれぞれ2個ずつ形成するために、それぞれの金バンプ配置個所の外周部から7.5μm内側に横10μm、縦85μmの開口部を残す以外の部分にポリイミドの保護膜を常法により前記開口部以外の全面に形成する。その後、前記金バンプを形成し、試験チップとする。
(Connection resistance measurement method)
After an oxide film is formed on the entire surface of a silicon piece (thickness 0.5 mm) having a length and width of 1.6 mm × 15.1 mm, an aluminum thin film (1000 A) having a width of 74.5 μm and a length of 120 μm is formed on the inner side by 40 μm. 175 pieces are formed on the long side and 16 pieces are formed on the short side, respectively, so as to have an interval of 1 μm. In order to form two gold bumps (thickness: 15 μm) each having a width of 25 μm and a length of 100 μm on the aluminum thin film at intervals of 15 μm, a width of 10 μm inside 7.5 μm from the outer peripheral portion of each gold bump placement location. Then, a polyimide protective film is formed on the entire surface other than the opening by a conventional method except for leaving the opening having a length of 85 μm. Thereafter, the gold bump is formed to obtain a test chip.
厚み0.7mmの無アルカリガラス上に前記アルミ薄膜上の金バンプが隣接するアルミ薄膜上の金バンプと対になる位置関係で接続されるようにインジウム錫酸化物膜(1400A)の接続パッド(横66μm、縦120μm)を形成する。20個の金バンプが接続される毎に前記接続パッドにインジウム錫酸化物薄膜の引き出し配線を形成し、引出し配線上はアルミニウム−チタン薄膜(チタン1%、3000A)を形成し、接続評価基板とする。前記接続評価基板上に、前記接続パッドがすべて覆われるように、幅2mm、長さ17mmの異方導電性接着シートの該導電性粒子の存在する側を仮張りし、2.5mm幅の圧着ヘッドを用いて、80℃、0.3MPa、3秒間加圧した後、ポリエチレンテレフタレートのベースフィルムを剥離する。そこへ、前記接続パッドと金バンプの位置が合うように試験チップを載せ、220℃、5秒間5.2MPa加圧圧着する。圧着後、前記引出し配線間(金バンプ20個のデイジーチェイン)の抵抗値を四端子法の抵抗計で抵抗測定し、接続抵抗値とする。 A connection pad (1400A) of indium tin oxide film (1400A) so that the gold bumps on the aluminum thin film are connected to the gold bumps on the adjacent aluminum thin film on a non-alkali glass having a thickness of 0.7 mm. 66 μm wide and 120 μm long). Each time 20 gold bumps are connected, an indium tin oxide thin film lead wiring is formed on the connection pad, and an aluminum-titanium thin film (titanium 1%, 3000 A) is formed on the lead wiring. To do. A side of the anisotropic conductive adhesive sheet having a width of 2 mm and a length of 17 mm is temporarily stretched on the connection evaluation substrate so as to cover all the connection pads, and a pressure bonding of 2.5 mm width is performed. After pressing with a head at 80 ° C., 0.3 MPa for 3 seconds, the polyethylene terephthalate base film is peeled off. A test chip is placed there so that the connection pads and the gold bumps are aligned, and pressure bonding with 5.2 MPa is performed at 220 ° C. for 5 seconds. After the crimping, the resistance value between the lead wires (daisy chain of 20 gold bumps) is measured with a four-terminal resistance meter to obtain a connection resistance value.
(絶縁抵抗試験方法)
厚み0.7mmの無アルカリガラス上に前記アルミ薄膜上の2個の金バンプがそれぞれ接続されるような位置関係にインジウム錫酸化物膜(1400A)の接続パッド(横65μm、縦120μm)を形成する。前記接続パッドを1個おきに5個接続できるようにインジウム錫酸化物薄膜の接続配線を形成し、さらにそれらと対になり、櫛型パターンを形成するように1個おきに5個接続できるようにインジウム錫酸化物薄膜の接続配線を形成する。それぞれの接続配線にインジウム錫酸化物薄膜の引出し配線を形成し、引き出し配線上にアルミニウム−チタン薄膜(チタン1%、3000A)を形成して、絶縁性評価基板とする。前記絶縁性評価基板上に、前記接続パッドがすべて覆われるように、幅2mm、長さ17mmの異方導電性接着シートを仮張りし、2.5mm幅の圧着ヘッドを用いて、80℃、0.3MPa、3秒間加圧した後、ポリエチレンテレフタレートのベースフィルムを剥離する。そこへ、前記接続パッドと金バンプの位置が合うように試験チップを載せ、180℃、10秒間2.4MPa加圧圧着し、絶縁抵抗試験基板とする。
(Insulation resistance test method)
A connection pad (65 μm wide, 120 μm long) of an indium tin oxide film (1400 A) is formed on a non-alkali glass with a thickness of 0.7 mm so that the two gold bumps on the aluminum thin film are connected to each other. To do. A connection wiring of an indium tin oxide thin film is formed so that every other five connection pads can be connected, and a pair of them is paired to form a comb pattern so that every fifth connection pad can be connected. Then, an indium tin oxide thin film connection wiring is formed. An indium tin oxide thin film lead-out wiring is formed on each connection wiring, and an aluminum-titanium thin film (titanium 1%, 3000 A) is formed on the lead-out wiring to form an insulating evaluation substrate. On the insulating evaluation substrate, an anisotropic conductive adhesive sheet having a width of 2 mm and a length of 17 mm is temporarily stretched so as to cover all the connection pads, and a pressure head having a width of 2.5 mm is used. After pressurizing at 0.3 MPa for 3 seconds, the polyethylene terephthalate base film is peeled off. Then, a test chip is mounted so that the position of the connection pad and the gold bump is matched, and pressure bonding is performed at 2.4 MPa for 10 seconds at 180 ° C. to obtain an insulation resistance test substrate.
この絶縁抵抗試験基板を85℃、85%相対湿度中に保持しながら、定電圧定電流電源を用いて、対になる引き出し配線間に30Vの直流電圧を印加する。この配線間の絶縁抵抗を5分間毎に測定し、絶縁抵抗値が10MΩ以下になるまでの時間を測定し、その値を絶縁低下時間とする。この絶縁低下時間が240時間未満の場合を×、240時間以上の場合を○とする。
以上の結果を表1に示す。表1から明らかなように、本発明の異方導電性接着シートは、非常に優れた絶縁信頼性を示す。
While maintaining this insulation resistance test substrate at 85 ° C. and 85% relative humidity, a DC voltage of 30 V is applied between the pair of lead wires using a constant voltage constant current power source. The insulation resistance between the wires is measured every 5 minutes, the time until the insulation resistance value becomes 10 MΩ or less is measured, and the value is defined as the insulation decrease time. The case where the insulation decrease time is less than 240 hours is indicated as x, and the case where the insulation decrease time is 240 hours or more is indicated as ◯.
The results are shown in Table 1. As is clear from Table 1, the anisotropic conductive adhesive sheet of the present invention exhibits very excellent insulation reliability.
本発明の異方導電性接着シートは、低接続抵抗、高絶縁信頼性を示し、微細回路接続が求められるベアチップ接続用材料および、高精細なディスプレイ装置等の接続材料として好適である。 The anisotropic conductive adhesive sheet of the present invention exhibits low connection resistance and high insulation reliability, and is suitable as a connection material for bare chip connection materials that require fine circuit connection and high-definition display devices.
1 硬化剤と硬化性の絶縁性樹脂
2 絶縁粒子
3 貴金属被覆
4 樹脂粒子
5 導電性粒子
DESCRIPTION OF SYMBOLS 1 Hardener and curable insulating resin 2 Insulating particle 3 Noble metal coating 4 Resin particle 5 Conductive particle
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