JP4991950B1 - ミスト成膜装置 - Google Patents

ミスト成膜装置 Download PDF

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Publication number
JP4991950B1
JP4991950B1 JP2011088960A JP2011088960A JP4991950B1 JP 4991950 B1 JP4991950 B1 JP 4991950B1 JP 2011088960 A JP2011088960 A JP 2011088960A JP 2011088960 A JP2011088960 A JP 2011088960A JP 4991950 B1 JP4991950 B1 JP 4991950B1
Authority
JP
Japan
Prior art keywords
film
substrate
mist
film forming
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011088960A
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English (en)
Japanese (ja)
Other versions
JP2012219357A (ja
Inventor
壽宏 田村
裕士 今田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP2011088960A priority Critical patent/JP4991950B1/ja
Priority to PCT/JP2011/069897 priority patent/WO2012140792A1/fr
Application granted granted Critical
Publication of JP4991950B1 publication Critical patent/JP4991950B1/ja
Publication of JP2012219357A publication Critical patent/JP2012219357A/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP2011088960A 2011-04-13 2011-04-13 ミスト成膜装置 Expired - Fee Related JP4991950B1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011088960A JP4991950B1 (ja) 2011-04-13 2011-04-13 ミスト成膜装置
PCT/JP2011/069897 WO2012140792A1 (fr) 2011-04-13 2011-09-01 Appareil de formation de film et procédé de formation de film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011088960A JP4991950B1 (ja) 2011-04-13 2011-04-13 ミスト成膜装置

Publications (2)

Publication Number Publication Date
JP4991950B1 true JP4991950B1 (ja) 2012-08-08
JP2012219357A JP2012219357A (ja) 2012-11-12

Family

ID=46793851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011088960A Expired - Fee Related JP4991950B1 (ja) 2011-04-13 2011-04-13 ミスト成膜装置

Country Status (2)

Country Link
JP (1) JP4991950B1 (fr)
WO (1) WO2012140792A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112016006798B4 (de) * 2016-04-26 2024-02-22 Toshiba Mitsubishi-Electric Industrial Systems Corporation Schichtaufbringungsvorrichtung
CN108699681B (zh) * 2016-04-26 2020-08-25 东芝三菱电机产业系统株式会社 成膜装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH036013A (ja) * 1989-06-02 1991-01-11 Nec Kyushu Ltd 半導体製造装置
JPH11340145A (ja) * 1998-05-25 1999-12-10 Sharp Corp 基板処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH036013A (ja) * 1989-06-02 1991-01-11 Nec Kyushu Ltd 半導体製造装置
JPH11340145A (ja) * 1998-05-25 1999-12-10 Sharp Corp 基板処理装置

Also Published As

Publication number Publication date
JP2012219357A (ja) 2012-11-12
WO2012140792A1 (fr) 2012-10-18

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