JP4968544B2 - センサ - Google Patents
センサ Download PDFInfo
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- JP4968544B2 JP4968544B2 JP2008129018A JP2008129018A JP4968544B2 JP 4968544 B2 JP4968544 B2 JP 4968544B2 JP 2008129018 A JP2008129018 A JP 2008129018A JP 2008129018 A JP2008129018 A JP 2008129018A JP 4968544 B2 JP4968544 B2 JP 4968544B2
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- 238000001514 detection method Methods 0.000 claims description 48
- 239000012528 membrane Substances 0.000 claims description 11
- 239000002650 laminated plastic Substances 0.000 claims description 4
- 230000003321 amplification Effects 0.000 claims description 3
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 3
- 230000000295 complement effect Effects 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000003068 static effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 description 12
- 239000000428 dust Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
- Measuring Fluid Pressure (AREA)
Description
Claims (20)
- 第1のチャネルおよび第2のチャネルを含むキャリアと、
前記キャリア上に配置され、膜を有する静電容量検知素子と
前記キャリア上に配置され、前記静電容量検知素子を覆うカバーと、
を備え、
前記膜と前記キャリアとの間には第1のチャンバが形成され、前記膜と前記カバーとの間には第2のチャンバが形成され、前記第1のチャンバと前記第2のチャンバとは前記膜の両側にそれぞれ配置され、前記第1のチャネルは、前記第1および第2のチャンバの一方と連通し、前記第2のチャネルは、前記第1および第2のチャンバの他方と連通する、センサ。 - 前記第1のチャネルまたは前記第2のチャネルの開口は、多孔質構造を有する、請求項1に記載のセンサ。
- 前記第2のチャネルは、前記第1のチャネルより長い、請求項1に記載のセンサ。
- 前記第1のチャネルまたは前記第2のチャネルは、機械的スクリーンを含む、請求項1に記載のセンサ。
- 前記機械的スクリーンは、多孔性材料からなる、請求項4に記載のセンサ。
- 前記カバーは、前記第2のチャンバと連通する孔を有し、前記第1のチャネルは、前記第1のチャンバと連通する、請求項1に記載のセンサ。
- 前記静電容量検知素子は、相補型金属酸化膜半導体(CMOS)デバイスである、請求項1に記載のセンサ。
- 前記CMOSデバイスは、検知回路をさらに含む、請求項7に記載のセンサ。
- 前記検知回路は、読み出し回路、増幅回路、および、加圧回路を含む、請求項8に記載のセンサ。
- 前記静電容量検知素子は、微小電気機械システム(MEMS)デバイス、および、制御チップを含み、前記制御チップは、前記MEMSデバイスに電気的に接続される、請求項1に記載のセンサ。
- 前記制御チップは、読み出し回路を含む、請求項10に記載のセンサ。
- 前記静電容量検知素子は、電気音響素子、または、圧力検知素子である、請求項1に記載のセンサ。
- 前記キャリアは、プリント回路基板(PCB)、または、導電性プラスチック積層である、請求項1に記載のセンサ。
- キャリアと、
複数の導電性バンプと、
膜を含む静電容量検知素子と、
前記静電容量検知素子を覆うカバーと、
を備え、
前記静電容量検知素子は、前記導電性バンプを介して前記キャリアに接続され、前記静電容量検知素子、前記導電性バンプ、および、前記キャリア間にはチャネルが形成され、前記カバーと前記静電容量検知素子との間にはチャンバが形成され、前記チャンバと前記チャネルとは、前記膜の両側にそれぞれ配置される、センサ。 - 前記カバーは、前記チャンバと連通する孔を有する、請求項14に記載のセンサ。
- 前記静電容量検知素子は、CMOSデバイスである、請求項14に記載のセンサ。
- 前記CMOSデバイスは、検知回路をさらに含む、請求項16に記載のセンサ。
- 前記検知回路は、読み出し回路、増幅回路、および、加圧回路を含む、請求項17に記載のセンサ。
- 前記静電容量検知素子は、電気音響素子、または、圧力検知素子である、請求項14に記載のセンサ。
- 前記キャリアは、PCBまたは導電性プラスチック積層である、請求項14に記載のセンサ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096141675A TWI336770B (en) | 2007-11-05 | 2007-11-05 | Sensor |
TW096141675 | 2007-11-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009118455A JP2009118455A (ja) | 2009-05-28 |
JP4968544B2 true JP4968544B2 (ja) | 2012-07-04 |
Family
ID=40587462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008129018A Active JP4968544B2 (ja) | 2007-11-05 | 2008-05-16 | センサ |
Country Status (3)
Country | Link |
---|---|
US (2) | US7902843B2 (ja) |
JP (1) | JP4968544B2 (ja) |
TW (1) | TWI336770B (ja) |
Families Citing this family (24)
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US7841533B2 (en) * | 2003-11-13 | 2010-11-30 | Metrologic Instruments, Inc. | Method of capturing and processing digital images of an object within the field of view (FOV) of a hand-supportable digitial image capture and processing system |
JP4375460B2 (ja) * | 2007-08-08 | 2009-12-02 | 株式会社デンソー | 圧力センサ |
US8193596B2 (en) * | 2008-09-03 | 2012-06-05 | Solid State System Co., Ltd. | Micro-electro-mechanical systems (MEMS) package |
US8351634B2 (en) * | 2008-11-26 | 2013-01-08 | Analog Devices, Inc. | Side-ported MEMS microphone assembly |
DE102008054428A1 (de) * | 2008-12-09 | 2010-06-10 | Robert Bosch Gmbh | Aufbau eines Drucksensors |
US8390083B2 (en) | 2009-09-04 | 2013-03-05 | Analog Devices, Inc. | System with recessed sensing or processing elements |
US8476087B2 (en) | 2011-04-21 | 2013-07-02 | Freescale Semiconductor, Inc. | Methods for fabricating sensor device package using a sealing structure |
US8384168B2 (en) * | 2011-04-21 | 2013-02-26 | Freescale Semiconductor, Inc. | Sensor device with sealing structure |
US9372104B2 (en) * | 2012-03-07 | 2016-06-21 | Deka Products Limited Partnership | Volumetric measurement device, system and method |
DE102012102021A1 (de) * | 2012-03-09 | 2013-09-12 | Epcos Ag | Mikromechanisches Messelement und Verfahren zur Herstellung eines mikromechanischen Messelements |
US9046546B2 (en) | 2012-04-27 | 2015-06-02 | Freescale Semiconductor Inc. | Sensor device and related fabrication methods |
DE102012215239B4 (de) * | 2012-08-28 | 2023-12-21 | Robert Bosch Gmbh | Bauteil und Verfahren zum Prüfen eines solchen Bauteils |
US9226052B2 (en) * | 2013-01-22 | 2015-12-29 | Invensense, Inc. | Microphone system with non-orthogonally mounted microphone die |
CN104576883B (zh) | 2013-10-29 | 2018-11-16 | 普因特工程有限公司 | 芯片安装用阵列基板及其制造方法 |
TWI539831B (zh) * | 2014-12-05 | 2016-06-21 | 財團法人工業技術研究院 | 微機電麥克風封裝 |
US9666558B2 (en) | 2015-06-29 | 2017-05-30 | Point Engineering Co., Ltd. | Substrate for mounting a chip and chip package using the substrate |
US20170081179A1 (en) | 2015-09-22 | 2017-03-23 | Freescale Semiconductor, Inc. | Mems sensor with side port and method of fabricating same |
KR101776725B1 (ko) * | 2015-12-11 | 2017-09-08 | 현대자동차 주식회사 | 멤스 마이크로폰 및 그 제조방법 |
CN106937187A (zh) * | 2015-12-29 | 2017-07-07 | 钰太芯微电子科技(上海)有限公司 | 一种侧进孔的麦克风结构 |
WO2017170457A1 (ja) * | 2016-03-28 | 2017-10-05 | 国立大学法人東北大学 | 圧力センサ |
DE102017212748B4 (de) * | 2017-07-25 | 2021-02-11 | Infineon Technologies Ag | Sensorvorrichtungen und Verfahren zum Herstellen von diesen |
US20200031661A1 (en) * | 2018-07-24 | 2020-01-30 | Invensense, Inc. | Liquid proof pressure sensor |
CN110650419A (zh) * | 2019-10-24 | 2020-01-03 | 朝阳聚声泰(信丰)科技有限公司 | 一种新型的单指向mems麦克风及其生产方法 |
TWI732617B (zh) * | 2020-03-25 | 2021-07-01 | 美律實業股份有限公司 | 振動感測器 |
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-
2007
- 2007-11-05 TW TW096141675A patent/TWI336770B/zh active
-
2008
- 2008-04-28 US US12/110,369 patent/US7902843B2/en active Active
- 2008-05-16 JP JP2008129018A patent/JP4968544B2/ja active Active
-
2011
- 2011-01-31 US US13/017,052 patent/US8035402B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW200921058A (en) | 2009-05-16 |
JP2009118455A (ja) | 2009-05-28 |
US8035402B2 (en) | 2011-10-11 |
TWI336770B (en) | 2011-02-01 |
US20110121843A1 (en) | 2011-05-26 |
US7902843B2 (en) | 2011-03-08 |
US20090115430A1 (en) | 2009-05-07 |
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