JP4963159B2 - 圧電／電歪デバイス - Google Patents

圧電／電歪デバイス Download PDF

Info

Publication number
JP4963159B2
JP4963159B2 JP2004335751A JP2004335751A JP4963159B2 JP 4963159 B2 JP4963159 B2 JP 4963159B2 JP 2004335751 A JP2004335751 A JP 2004335751A JP 2004335751 A JP2004335751 A JP 2004335751A JP 4963159 B2 JP4963159 B2 JP 4963159B2
Authority
JP
Japan
Prior art keywords
piezoelectric
thin diaphragm
electrostrictive
diaphragm portion
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004335751A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006147840A5 (enExample
JP2006147840A (ja
Inventor
七瀧　　努
邦彦 吉岡
浩文 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP2004335751A priority Critical patent/JP4963159B2/ja
Priority to CN2005101169179A priority patent/CN1780010B/zh
Priority to US11/281,645 priority patent/US7221075B2/en
Priority to DE200560022974 priority patent/DE602005022974D1/de
Priority to EP20050257121 priority patent/EP1659644B1/en
Publication of JP2006147840A publication Critical patent/JP2006147840A/ja
Publication of JP2006147840A5 publication Critical patent/JP2006147840A5/ja
Application granted granted Critical
Publication of JP4963159B2 publication Critical patent/JP4963159B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047—Membrane type
    • H10N30/2048—Membrane type having non-planar shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions

Landscapes

  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Transducers For Ultrasonic Waves (AREA)
  • Measuring Fluid Pressure (AREA)
JP2004335751A 2004-11-19 2004-11-19 圧電／電歪デバイス Expired - Fee Related JP4963159B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004335751A JP4963159B2 (ja) 2004-11-19 2004-11-19 圧電／電歪デバイス
CN2005101169179A CN1780010B (zh) 2004-11-19 2005-10-25 压电/电致伸缩器件
US11/281,645 US7221075B2 (en) 2004-11-19 2005-11-17 Piezoelectric/electrostrictive device
DE200560022974 DE602005022974D1 (de) 2004-11-19 2005-11-18 Piezoelektrisches/Elektrostriktives Bauelement
EP20050257121 EP1659644B1 (en) 2004-11-19 2005-11-18 Piezoelectric/electrostrictive device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004335751A JP4963159B2 (ja) 2004-11-19 2004-11-19 圧電／電歪デバイス

Publications (3)

Publication Number Publication Date
JP2006147840A JP2006147840A (ja) 2006-06-08
JP2006147840A5 JP2006147840A5 (enExample) 2007-10-25
JP4963159B2 true JP4963159B2 (ja) 2012-06-27

Family

ID=35529576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004335751A Expired - Fee Related JP4963159B2 (ja) 2004-11-19 2004-11-19 圧電／電歪デバイス

Country Status (5)

Country Link
US (1) US7221075B2 (enExample)
EP (1) EP1659644B1 (enExample)
JP (1) JP4963159B2 (enExample)
CN (1) CN1780010B (enExample)
DE (1) DE602005022974D1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9056454B2 (en) 2013-06-19 2015-06-16 Ricoh Company, Ltd. Actuator, method of manufacturing the actuator, and liquid droplet ejecting head, liquid droplet ejecting apparatus, and image forming apparatus having the actuator
US9533502B2 (en) 2012-08-14 2017-01-03 Ricoh Company, Ltd. Electro-mechanical transducer element, liquid droplet ejecting head, image forming apparatus, and electro-mechanical transducer element manufacturing method

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446542B2 (en) * 2005-03-04 2008-11-04 Omniprobe, Inc. Apparatus and method for automated stress testing of flip-chip packages
JP5088916B2 (ja) * 2005-10-28 2012-12-05 富士フイルム株式会社 無機膜基板の製造方法
JP4539992B2 (ja) * 2006-06-07 2010-09-08 東芝テック株式会社 インクジェット記録装置
KR100819933B1 (ko) * 2006-06-20 2008-04-10 (주)제이엠씨 돔형의 압전박막 소자 및 그 제조방법
JP4611251B2 (ja) * 2006-07-04 2011-01-12 日本碍子株式会社 流体特性測定装置
KR101069927B1 (ko) 2009-02-25 2011-10-05 삼성전기주식회사 잉크젯 헤드
JP5669452B2 (ja) * 2009-07-28 2015-02-12 キヤノン株式会社 振動体の製造方法
CN101998216A (zh) * 2009-08-28 2011-03-30 友泰讯科(北京)科技有限公司 一种扬声器和便携式电子设备
US8261618B2 (en) * 2010-11-22 2012-09-11 General Electric Company Device for measuring properties of working fluids
CN102290527B (zh) * 2011-09-22 2013-03-20 中国科学院上海硅酸盐研究所 一种弯曲形压电单晶片的制备方法
JP5497222B2 (ja) 2012-09-28 2014-05-21 バンドー化学株式会社 静電容量型センサシート及び静電容量型センサシートの製造方法
JP6172437B2 (ja) * 2013-03-13 2017-08-02 セイコーエプソン株式会社 液体噴射ヘッド及び液体噴射装置
US9835511B2 (en) * 2015-05-08 2017-12-05 Rosemount Aerospace Inc. High temperature flexural mode piezoelectric dynamic pressure sensor
US10241500B2 (en) * 2015-08-10 2019-03-26 Buerkert Werke Gmbh Film transducer and actuator strip for a film transducer
CN105032717B (zh) * 2015-09-18 2017-10-17 京东方科技集团股份有限公司 一种封框胶涂布喷嘴及封框胶涂布装置
CN205847241U (zh) * 2016-05-19 2016-12-28 瑞声科技(新加坡)有限公司 电子设备
CN107396275B (zh) * 2017-07-21 2019-05-17 维沃移动通信有限公司 一种振幅检测装置、方法及移动终端
CN107520110A (zh) * 2017-07-31 2017-12-29 瑞声科技(新加坡)有限公司 压电超声换能器及其制备方法
CN109572261A (zh) * 2018-10-17 2019-04-05 东莞福哥电子有限公司 一种弧面型碳膜印刷层的制作方法
WO2020112947A1 (en) * 2018-11-29 2020-06-04 The Trustees Of Dartmouth College Electrostatic-actuator-based, tunable, soft robots
CN110756418A (zh) * 2019-10-29 2020-02-07 海鹰企业集团有限责任公司 调节高频曲面换能器频率的方法
JP2023042042A (ja) * 2021-09-14 2023-03-27 日清紡ホールディングス株式会社 圧電体デバイス
JP2023042043A (ja) * 2021-09-14 2023-03-27 日清紡ホールディングス株式会社 圧電体デバイス

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5545461A (en) * 1994-02-14 1996-08-13 Ngk Insulators, Ltd. Ceramic diaphragm structure having convex diaphragm portion and method of producing the same
US6049158A (en) * 1994-02-14 2000-04-11 Ngk Insulators, Ltd. Piezoelectric/electrostrictive film element having convex diaphragm portions and method of producing the same
JP3162584B2 (ja) * 1994-02-14 2001-05-08 日本碍子株式会社 圧電／電歪膜型素子及びその製造方法
JP3313531B2 (ja) * 1994-06-03 2002-08-12 日本碍子株式会社 圧電／電歪膜型素子及びその製造方法
CN1050008C (zh) * 1994-08-11 2000-03-01 日本碍子株式会社 压电/电致伸缩膜元件及其制作方法
CN1050229C (zh) * 1994-08-11 2000-03-08 日本碍子株式会社 压电/电致伸缩膜元件及其制作方法
JP3366158B2 (ja) * 1994-09-06 2003-01-14 日本碍子株式会社 セラミックダイヤフラム構造体及びその製造方法
JP3471447B2 (ja) * 1994-11-16 2003-12-02 日本碍子株式会社 セラミックダイヤフラム構造体およびその製造方法
JP3388060B2 (ja) * 1994-11-25 2003-03-17 日本碍子株式会社 流体の特性測定用素子及び流体の特性測定装置
JP3501860B2 (ja) * 1994-12-21 2004-03-02 日本碍子株式会社 圧電／電歪膜型素子及びその製造方法
JPH09164674A (ja) * 1995-12-15 1997-06-24 Minolta Co Ltd インクジェット記録装置
DE69714909T2 (de) * 1996-05-27 2003-04-30 Ngk Insulators, Ltd. Piezoelektrisches Element des Dünnschichttyps
JP3589560B2 (ja) * 1998-01-27 2004-11-17 株式会社リコー インクジェットヘッド及びその製造方法
JP3462400B2 (ja) * 1998-09-14 2003-11-05 日本碍子株式会社 セラミックダイヤフラム構造体の製造方法
US6407481B1 (en) * 1999-03-05 2002-06-18 Ngk Insulators, Ltd. Piezoelectric/electrostrictive device having convexly curved diaphragm
JP2000334946A (ja) * 1999-05-28 2000-12-05 Ricoh Co Ltd インクジェットヘッド及びインクジェット記録装置
US6404109B1 (en) * 1999-10-01 2002-06-11 Ngk Insulators, Ltd. Piezoelectric/electrostrictive device having increased strength
JP3728623B2 (ja) * 2001-03-02 2005-12-21 日本碍子株式会社 圧電／電歪膜型素子

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9533502B2 (en) 2012-08-14 2017-01-03 Ricoh Company, Ltd. Electro-mechanical transducer element, liquid droplet ejecting head, image forming apparatus, and electro-mechanical transducer element manufacturing method
US9056454B2 (en) 2013-06-19 2015-06-16 Ricoh Company, Ltd. Actuator, method of manufacturing the actuator, and liquid droplet ejecting head, liquid droplet ejecting apparatus, and image forming apparatus having the actuator

Also Published As

Publication number Publication date
DE602005022974D1 (de) 2010-09-30
EP1659644B1 (en) 2010-08-18
CN1780010A (zh) 2006-05-31
EP1659644A2 (en) 2006-05-24
US7221075B2 (en) 2007-05-22
EP1659644A3 (en) 2007-01-24
JP2006147840A (ja) 2006-06-08
US20060108896A1 (en) 2006-05-25
CN1780010B (zh) 2010-09-01

Similar Documents

Publication Publication Date Title
JP4963159B2 (ja) 圧電／電歪デバイス
US8759990B2 (en) Energy harvesting device including MEMS composite transducer
US8633634B2 (en) MEMs-based cantilever energy harvester
JP5019120B2 (ja) 検出センサ
JP3482939B2 (ja) 圧電／電歪膜型素子
US8680695B2 (en) Energy harvesting using MEMS composite transducer
US7183694B2 (en) Piezoelectric/electrostrictive device
JP3465675B2 (ja) 圧電／電歪膜型素子
Nguyen et al. Optimized electrode coverage of membrane actuators based on epitaxial PZT thin films
JP5031737B2 (ja) 圧電／電歪膜型素子
US7126255B2 (en) Piezoelectric/electrostrictive film-type device
JP3728623B2 (ja) 圧電／電歪膜型素子
JP5004797B2 (ja) 圧電／電歪膜型素子
WO2012145279A2 (en) Energy harvesting device including mems composite transducer
JP2010223622A (ja) 角速度検出装置
JP5009507B2 (ja) 圧電／電歪膜型素子
JP4936909B2 (ja) 流体特性測定装置の使用方法
Gaucher Piezoelectric micro-electro-mechanical systems for acoustic applications
JP4805787B2 (ja) 圧電／電歪膜型センサ
WO2022220142A1 (ja) 超音波トランスデューサー、距離測定装置および超音波トランスデューサーの製造方法
CN118730321A (zh) 一种谐振式温度传感器

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070911

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070911

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110523

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110531

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110728

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120321

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120322

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150406

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees