JP4949195B2 - Exposure apparatus and substrate correction apparatus - Google Patents

Exposure apparatus and substrate correction apparatus Download PDF

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JP4949195B2
JP4949195B2 JP2007278850A JP2007278850A JP4949195B2 JP 4949195 B2 JP4949195 B2 JP 4949195B2 JP 2007278850 A JP2007278850 A JP 2007278850A JP 2007278850 A JP2007278850 A JP 2007278850A JP 4949195 B2 JP4949195 B2 JP 4949195B2
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substrate
plate
exposure
sealed space
suction
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JP2009109553A (en
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貴 之 原
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Adtec Engineering Co Ltd
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Adtec Engineering Co Ltd
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Priority to KR1020080089216A priority patent/KR101450908B1/en
Priority to TW097135948A priority patent/TWI427441B/en
Priority to CN2008101680238A priority patent/CN101419409B/en
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0508—Flood exposure

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

この発明は、露光装置及び基板の矯正装置に関する。   The present invention relates to an exposure apparatus and a substrate correction apparatus.

プリント基板を製造する露光装置において、基板搬送装置より搬送された基板を位置決め用の露光テーブルに載置し、吸引固定して露光する構成が採用されている。   2. Description of the Related Art An exposure apparatus for manufacturing a printed circuit board employs a configuration in which a substrate transported from a substrate transport device is placed on an exposure table for positioning, and is sucked and fixed for exposure.

特開２００５−３７００３７JP 2005-370037 A

しかし、プリント配線用の基板は、半導体ウエーハ等に比べて反りや歪み等の基板変形が発生しやすく且つ変形量も大きく、露光テーブルとの間に隙間が発生し、その結果吸引のリークが生じて吸着が不完全或いは困難になる問題があった。
本発明は上記従来技術の問題を解決することを目的とする。 However, printed wiring boards are more susceptible to substrate deformation such as warping and distortion than semiconductor wafers, and the amount of deformation is large, creating a gap with the exposure table, resulting in suction leakage. Therefore, there is a problem that the adsorption becomes incomplete or difficult.
The object of the present invention is to solve the problems of the prior art.

上記目的を達成するために、本発明の露光装置は、プリント配線用の基板を載置する露光テーブルと、該露光テーブルに基板を搬送する搬送装置と、該搬送装置に設けられ、前記基板を前記露光テーブルに押しつけて変形基板を矯正する昇降可能なプレートと、前記テーブルとプレートとの間を密閉し、密閉空間を形成するシール装置と、前記シール装置により形成された密閉空間を吸引して負圧にする吸引装置と、を備え、前記プレートは前記密閉空間の負圧により下降して前記基板を前記露光テーブルに押しつけて基板を矯正する、ことを特徴とする。
また本発明の基板の矯正装置は、基板を載置するテーブルと、該テーブルに基板を搬送する搬送装置と、該搬送装置に設けられ、前記基板を前記テーブルに押しつけて変形基板を矯正する昇降可能なプレートと、前記テーブルとプレートとの間を密閉し、密閉空間を形成するシール装置と、前記シール装置により形成された密閉空間を吸引して負圧にする吸引装置と、を備え、前記プレートは前記密閉空間の負圧により下降して前記基板を前記テーブルに押しつけて基板を矯正する、ことを特徴とする。 In order to achieve the above object, an exposure apparatus of the present invention includes an exposure table on which a printed wiring board is placed, a transport apparatus that transports the substrate to the exposure table, and a transport apparatus that is provided in the transport apparatus. A plate that can be raised and lowered to press against the exposure table to correct the deformed substrate, a seal device that seals between the table and the plate to form a sealed space, and a sealed space formed by the seal device is sucked. A suction device for making a negative pressure, and the plate is lowered by the negative pressure in the sealed space and presses the substrate against the exposure table to correct the substrate.
The substrate correction apparatus according to the present invention includes a table on which the substrate is placed, a transfer device that transfers the substrate to the table, and a lift that is provided in the transfer device and presses the substrate against the table to correct the deformed substrate. A plate capable of sealing between the table and the plate to form a sealed space, and a suction device for sucking the sealed space formed by the seal device to create a negative pressure, The plate is lowered by a negative pressure in the sealed space and presses the substrate against the table to correct the substrate.

本発明の露光装置及び矯正装置によれば、密閉空間を作って真空密着によりプレートを介して基板をテーブルに押しつけるため、強力な荷重をかけることが出来、基板が厚板で強い反力のある変形も矯正することができる。そのため露光装置にあっては、基板吸着時のリークを防止し、効率的な露光を行うことができる。
しかも、大きな荷重をかけるために大型の装置を必要とせず、装置の小型化が実現できる。
また、プレートの大きさを適用する最大の基板サイズに合わせておけば、基板サイズに関係なく、基板をエッジ部まで確実に挟み込み、基板全面へ均等な荷重をかけることが可能である、等の効果がある。 According to the exposure apparatus and the correction apparatus of the present invention, since the substrate is pressed against the table via the plate by vacuum contact with a sealed space, a strong load can be applied, and the substrate is a thick plate and has a strong reaction force. Deformation can also be corrected. Therefore, in the exposure apparatus, leakage at the time of substrate adsorption can be prevented and efficient exposure can be performed.
In addition, a large apparatus is not required to apply a large load, and the apparatus can be downsized.
In addition, if the size of the plate is matched to the maximum substrate size to be applied, it is possible to securely sandwich the substrate to the edge regardless of the substrate size, and to apply a uniform load to the entire surface of the substrate, etc. effective.

以下本発明のプリント配線基板用の露光装置の実施の形態を図面に基づいて説明する。
図１において、露光テーブル１は露光すべき被露光対象であるプリント配線用の基板９９を載置し、該基板９９に対して光源５０、マスク５１，投影レンズ５２により露光が行われる。露光テーブル１は駆動装置（図示せず）により、ＸＹＺ方向移動可能であり、且つθ方向に回転可能になっている。 Embodiments of an exposure apparatus for a printed wiring board according to the present invention will be described below with reference to the drawings.
In FIG. 1, a printed wiring board 99 to be exposed is placed on an exposure table 1, and the substrate 99 is exposed by a light source 50, a mask 51, and a projection lens 52. The exposure table 1 can be moved in the XYZ directions and rotated in the θ direction by a driving device (not shown).

露光テーブル１には吸引孔１０が設けられており、吸引ポンプ１１により基板９９を吸引して固定するように構成されている。吸引ポンプ１１には圧力センサ１２が設けられており、吸引圧力を検出して、吸引が正常に行われているか否か検出できるようになっている。   The exposure table 1 is provided with a suction hole 10 and configured to suck and fix the substrate 99 by a suction pump 11. The suction pump 11 is provided with a pressure sensor 12 so that the suction pressure can be detected to detect whether or not the suction is normally performed.

露光テーブル１の入り側には搬送装置２が設けられており、搬入コンベア５３により前工程から搬送されてきた基板９９を露光テーブル１上に載置するように構成されている。   A transport device 2 is provided on the entrance side of the exposure table 1, and is configured to place the substrate 99 transported from the previous process by the transport conveyor 53 on the exposure table 1.

搬送装置２は、プレート２０を有し、このプレート２０は昇降ガイド２５により上下方向昇降自由に保持されている。プレート２０には保持吸引孔２１が設けられ、保持吸引ポンプ２２により基板９９を吸引し、吊り上げて保持するように構成されている。
プレート２０の周囲にはパッキン３が設けられており、露光テーブル１に接触して、露光テーブル１と吸引孔１０との間に密閉空間９０を形成できるようになっている。
パッキン３はパッキンポンプ３１により伸縮可能になっており、パッキン３に空気が充填されたときに膨らんでパッキンとして機能するようになっている。 The conveying device 2 has a plate 20, and the plate 20 is held by an elevating guide 25 so as to freely move up and down. A holding suction hole 21 is provided in the plate 20, and the substrate 99 is sucked by a holding suction pump 22 and is lifted and held.
A packing 3 is provided around the plate 20 so that a sealed space 90 can be formed between the exposure table 1 and the suction hole 10 by contacting the exposure table 1.
The packing 3 can be expanded and contracted by a packing pump 31, and when the packing 3 is filled with air, it expands and functions as a packing.

搬送装置２のプレート２０には、更にパッキン３の内側に真空吸引孔４０が設けられ、真空ポンプ４に連通している。この真空ポンプ４の吸引により前記した密閉空間９０を吸引してほぼ真空に近い状態まで密閉空間９０内圧を低下させることが出来るように構成されている。
なお、２’は搬出用の搬送装置、５４は搬出コンベアである。 The plate 20 of the transport device 2 is further provided with a vacuum suction hole 40 inside the packing 3 and communicates with the vacuum pump 4. The suction of the vacuum pump 4 sucks the above-described sealed space 90 so that the internal pressure of the sealed space 90 can be reduced to a state close to a vacuum.
In addition, 2 'is a conveyance apparatus for carrying out, 54 is a carrying-out conveyor.

制御装置５は露光装置全体の制御を行っており、前記露光テーブル１、保持吸引ポンプ２２、パッキンポンプ３１、真空ポンプ４、吸引ポンプ１１も制御装置５により制御されている。   The control device 5 controls the entire exposure apparatus. The exposure table 1, the holding suction pump 22, the packing pump 31, the vacuum pump 4, and the suction pump 11 are also controlled by the control device 5.

図２により動作を説明する。
搬送装置２が搬入コンベア５３より基板９９を受け取り、保持吸引孔２１と保持吸引ポンプ２２により吸引保持し、露光テーブル１に搬送する。（ａ）
次に露光テーブル１が基板９９を受け取るため上昇し、プレート２０を押し上げる位置まで上昇したら、吸引孔１０と吸引ポンプ１１により基板９９を吸引して基板吸着を行う。同時に保持吸引ポンプ２２からブローして搬送装置２による保持を解く。（ｂ） The operation will be described with reference to FIG.
The transport device 2 receives the substrate 99 from the carry-in conveyor 53, sucks and holds it by the holding suction holes 21 and the holding suction pump 22, and transports them to the exposure table 1. (A)
Next, when the exposure table 1 rises to receive the substrate 99 and rises to a position where the plate 20 is pushed up, the substrate 99 is sucked by the suction hole 10 and the suction pump 11 to perform substrate suction. At the same time, it is blown from the holding suction pump 22 to release the holding by the transfer device 2. (B)

基板９９が変形している場合、基板９９と露光テーブル１の間に隙間が出来、吸引ポンプ１１による吸引の基板吸着圧力が上がらない。これを制御装置５が圧力センサ１２からの検出信号により検出し、パッキン３に正圧をかけ伸張させ、露光テーブル１と接触させて密閉空間９０を生成する。（ｃ）   When the substrate 99 is deformed, a gap is formed between the substrate 99 and the exposure table 1, and the suction pressure of the suction substrate by the suction pump 11 does not increase. This is detected by the control device 5 based on the detection signal from the pressure sensor 12, and the packing 3 is applied with a positive pressure to be expanded and brought into contact with the exposure table 1 to generate a sealed space 90. (C)

次に、保持吸引ポンプ２２のブローを停止し、真空吸引孔４０と真空ポンプ４により密閉空間９０を吸引し、密閉空間９０内を真空に近い状態にする。プレート２０は昇降ガイド２５により上下方向昇降自由であるから、大気圧によりプレート２０は押圧され、プレート２０と露光テーブル１により基板９９に荷重をかけ、基板９９を矯正する。（ｄ）
基板９９は真空圧力により大きな荷重を掛けられるため、効果的に変形が矯正される。 Next, the blow of the holding suction pump 22 is stopped, and the sealed space 90 is sucked by the vacuum suction hole 40 and the vacuum pump 4 to make the sealed space 90 close to a vacuum. Since the plate 20 can be moved up and down freely by the lifting guide 25, the plate 20 is pressed by the atmospheric pressure, and a load is applied to the substrate 99 by the plate 20 and the exposure table 1 to correct the substrate 99. (D)
Since the substrate 99 is subjected to a large load by the vacuum pressure, the deformation is effectively corrected.

基板９９の変形が矯正され、リークが解消されると吸引ポンプ１１による基板吸着が正常に行われる。圧力センサ１２からの吸着圧力が所定の設定値に達したら、真空ポンプ４を停止し、パッキン３を収縮させて密閉空間９０を開放し、露光テーブル１を下降させる。そして搬送装置２を搬入コンベア５３上に退避させる。その後位置合わせなどを行い、露光を実行する。（ｅ）   When the deformation of the substrate 99 is corrected and the leak is eliminated, the substrate suction by the suction pump 11 is normally performed. When the suction pressure from the pressure sensor 12 reaches a predetermined set value, the vacuum pump 4 is stopped, the packing 3 is contracted to open the sealed space 90, and the exposure table 1 is lowered. Then, the conveying device 2 is retracted onto the carry-in conveyor 53. After that, alignment is performed and exposure is performed. (E)

次に図３により制御装置５の動作を説明する。
搬送装置２が基板９９を露光テーブル１に搬送し、載置すると（ステップＳ１）、吸引ポンプ１１を稼働して基板９９を吸引して基板吸着を行う（ステップＳ２）。圧力センサ１２からの検出圧力をチェックし、所定値以上であれば、吸着が正常に行われていると判断し、ステップＳ７に飛び露光動作を行う（ステップＳ３）。検出圧力が所定値に達していない場合、吸着が正常に行われていないと判断し、パッキンポンプ３１を稼働しパッキン３に正圧をかけて膨張させ、密閉空間９０を生成させ（ステップＳ４）、プレート２０により基板９９に荷重をかけ、基板９９を矯正する（ステップＳ５）。基板９９が矯正され、正常な吸着が行われ、圧力センサ１２からの検出圧力が所定の設定値に達したら（ステップＳ６）、真空ポンプ４を停止し、搬送装置２を退避させ、露光処理を実行する（ステップＳ７）。 Next, the operation of the control device 5 will be described with reference to FIG.
When the transport device 2 transports and places the substrate 99 on the exposure table 1 (step S1), the suction pump 11 is operated to suck the substrate 99 and perform substrate suction (step S2). The detected pressure from the pressure sensor 12 is checked, and if it is equal to or greater than a predetermined value, it is determined that the suction is normally performed, and the process jumps to step S7 to perform an exposure operation (step S3). If the detected pressure does not reach the predetermined value, it is determined that the adsorption is not normally performed, and the packing pump 31 is operated to expand the packing 3 by applying a positive pressure to generate the sealed space 90 (step S4). Then, a load is applied to the substrate 99 by the plate 20 to correct the substrate 99 (step S5). When the substrate 99 is corrected, normal suction is performed, and the detected pressure from the pressure sensor 12 reaches a predetermined set value (step S6), the vacuum pump 4 is stopped, the transfer device 2 is retracted, and exposure processing is performed. Execute (Step S7).

なお、上記では本発明を露光装置に提供した場合について説明したが、基板９９を変形を矯正する矯正装置として実現することも可能である。   Although the case where the present invention is provided to the exposure apparatus has been described above, the substrate 99 can be realized as a correction apparatus that corrects deformation.

本発明の一実施形態を示す概略図。Schematic which shows one Embodiment of this invention. 本発明の一実施形態の動作を示す説明図。Explanatory drawing which shows operation | movement of one Embodiment of this invention. 本発明の一実施形態の動作を示すフローチャート図。The flowchart figure which shows operation | movement of one Embodiment of this invention.

符号の説明Explanation of symbols

１：露光テーブル、２：搬送装置、３：パッキン、４：真空ポンプ、５：制御装置、１０：吸引孔、１１：吸引ポンプ、１２：圧力センサ、２０：プレート、２１：保持吸引孔、２２：保持吸引ポンプ、２５：昇降ガイド、３０：真空ポンプ、３１：パッキンポンプ、４０：真空吸引孔、５０：光源、５１：マスク、５２：投影レンズ、５３：搬入コンベア、５４：搬出コンベア、９０：密閉空間、９９：基板。 1: Exposure table 2: Transport device 3: Packing 4: Vacuum pump 5: Control device 10: Suction hole 11: Suction pump 12: Pressure sensor 20: Plate 21: Holding suction hole 22 : Holding suction pump, 25: lifting guide, 30: vacuum pump, 31: packing pump, 40: vacuum suction hole, 50: light source, 51: mask, 52: projection lens, 53: carry-in conveyor, 54: carry-out conveyor, 90 : Sealed space, 99: substrate.

Claims (3)

プリント配線用の基板を載置する露光テーブルと、
該露光テーブルに基板を搬送する搬送装置と、
該搬送装置に設けられ、前記基板を前記露光テーブルに押しつけて変形基板を矯正する昇降可能なプレートと、
前記テーブルとプレートとの間を密閉し、密閉空間を形成するシール装置と、
前記シール装置により形成された密閉空間を吸引して負圧にする吸引装置と、を備え、
前記プレートは前記密閉空間の負圧により下降して前記基板を前記露光テーブルに押しつけて基板を矯正する、
ことを特徴とする基板の露光装置。 An exposure table on which a printed wiring board is placed;
A transfer device for transferring the substrate to the exposure table;
A plate that can be moved up and down to correct the deformed substrate by pressing the substrate against the exposure table;
A sealing device that seals between the table and the plate to form a sealed space;
A suction device that sucks the sealed space formed by the sealing device to create a negative pressure, and
The plate is lowered by the negative pressure of the sealed space and presses the substrate against the exposure table to correct the substrate;
A substrate exposure apparatus. 前記プレートに基板を保持するための吸引装置が設けられ、
前記搬送装置は、該吸引装置に基板を保持して基板の搬送を行う、
請求項１に記載の露光装置。 A suction device for holding the substrate on the plate is provided;
The transfer device holds the substrate in the suction device and transfers the substrate.
The exposure apparatus according to claim 1. 基板を載置するテーブルと、
該テーブルに基板を搬送する搬送装置と、
該搬送装置に設けられ、前記基板を前記テーブルに押しつけて変形基板を矯正する昇降可能なプレートと、
前記テーブルとプレートとの間を密閉し、密閉空間を形成するシール装置と、
前記シール装置により形成された密閉空間を吸引して負圧にする吸引装置と、を備え、
前記プレートは前記密閉空間の負圧により下降して前記基板を前記テーブルに押しつけて基板を矯正する、
ことを特徴とする基板の矯正装置。 A table on which the substrate is placed;
A transfer device for transferring a substrate to the table;
A plate that is provided in the transfer device and that can be raised and lowered to press the substrate against the table and correct the deformed substrate;
A sealing device that seals between the table and the plate to form a sealed space;
A suction device that sucks the sealed space formed by the sealing device to create a negative pressure, and
The plate is lowered by the negative pressure of the sealed space and presses the substrate against the table to correct the substrate,
An apparatus for correcting a substrate, characterized in that:
JP2007278850A 2007-10-26 2007-10-26 Exposure apparatus and substrate correction apparatus Active JP4949195B2 (en)

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JP2007278850A JP4949195B2 (en) 2007-10-26 2007-10-26 Exposure apparatus and substrate correction apparatus
KR1020080089216A KR101450908B1 (en) 2007-10-26 2008-09-10 Exposing device and corrector of board
TW097135948A TWI427441B (en) 2007-10-26 2008-09-19 Exposure device and substrate correction device
CN2008101680238A CN101419409B (en) 2007-10-26 2008-09-25 Exposure device and rectification device of baseal plate

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CN102607772A (en) * 2012-03-06 2012-07-25 常熟金像电子有限公司 Testing method for marginal adaptation of exposure table of exposure machine
JP6663252B2 (en) * 2016-03-01 2020-03-11 株式会社アドテックエンジニアリング Exposure equipment for printed circuit boards
JP6774714B2 (en) 2016-07-25 2020-10-28 株式会社アドテックエンジニアリング Work stage and exposure equipment
KR102208102B1 (en) * 2017-03-07 2021-01-27 야마하하쓰도키 가부시키가이샤 Component mounting device and board holding method
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KR101450908B1 (en) 2014-10-14
TWI427441B (en) 2014-02-21
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KR20090042710A (en) 2009-04-30
CN101419409B (en) 2013-06-05

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