JP4940731B2 - Solid-state imaging device and portable imaging device - Google Patents
Solid-state imaging device and portable imaging device Download PDFInfo
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- JP4940731B2 JP4940731B2 JP2006098881A JP2006098881A JP4940731B2 JP 4940731 B2 JP4940731 B2 JP 4940731B2 JP 2006098881 A JP2006098881 A JP 2006098881A JP 2006098881 A JP2006098881 A JP 2006098881A JP 4940731 B2 JP4940731 B2 JP 4940731B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49111—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
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Description
本発明は、CCDやCMOSなどの固体撮像素子を用いた固体撮像装置に関し、より詳しくは、固体撮像素子の撮像面をガラス基板に対向させてこのガラス基板に接続した、いわゆるチップオンガラス(Chip on Glass)構造の固体撮像装置に関する。 The present invention relates to a solid-state imaging device using a solid-state imaging device such as a CCD or CMOS, and more specifically, a so-called chip-on-glass (Chip) in which an imaging surface of a solid-state imaging device is opposed to a glass substrate and connected to the glass substrate. on Glass) structure solid-state imaging device.
上記のような固体撮像装置は、所要の端子が設けられたガラス基板と、該ガラス基板に対して撮像面のマイクロレンズが対向するよう配置されかつ前記ガラス基板の端子にAuバンプなどにより接続された矩形状の固体撮像素子とからなる。そして、固体撮像素子とガラス基板との間にエポキシ樹脂などの光硬化性の樹脂層を形成し接続の機械的強度を確保するとともに外部からのゴミの浸入を防止している。その際、シリコン樹脂などからなるマイクロレンズを前記樹脂層で充填すると、互いの屈折率が近似しているため、マイクロレンズの光学特性が損なわれる。そのため、マイクロレンズをガラス基板から所定の間隔をあけて対向させたうえで、マイクロレンズの設置領域を除く固体撮像素子とガラス基板との間に樹脂層を設けて密封空間を形成し、マイクロレンズをこの密封空間内に封止している。なお、この密封空間内には外気圧とほぼ同じ空気が封入されている(例えば特許文献1)。
しかしながら、固体撮像装置の使用環境における温度変化、あるいは固体撮像素子が自ら発する熱の影響などにより、密封空間内に封止された空気が膨張または収縮すると、密封空間を形成している固体撮像素子、ガラス基板および樹脂層がいずれも硬い材料で構成されているため、これら各部材に無理な応力がかかるおそれがある。そうすると、ガラス基板や固体撮像素子に歪みが発生し光学特性が低下したり、場合によっては各部材が破損したりすることが懸念される。 However, when the air sealed in the sealed space expands or contracts due to a change in temperature in the usage environment of the solid-state imaging device or the influence of heat generated by the solid-state imaging device, the solid-state imaging device that forms the sealed space In addition, since both the glass substrate and the resin layer are made of a hard material, there is a possibility that an excessive stress is applied to these members. If it does so, distortion will generate | occur | produce in a glass substrate or a solid-state image sensor, and there is a concern that an optical characteristic may fall, or each member may be damaged depending on the case.
したがって、本発明は、かかる歪みや破損が発生する心配の少ない固体撮像装置を実現することを目的とする。 Therefore, an object of the present invention is to realize a solid-state imaging device that is less likely to cause such distortion and breakage.
本発明の固体撮像装置は、所要の端子が設けられたガラス基板と、該ガラス基板に対して撮像面のマイクロレンズが所定の間隔をあけて対向するよう配置されかつ前記ガラス基板の端子に接続された固体撮像素子とを備え、前記マイクロレンズを除く前記固体撮像素子と前記ガラス基板との間に絶縁性部材を充填して前記マイクロレンズを密封空間内に封止した固体撮像装置であって、前記絶縁性部材には前記密封空間内のエアの膨張、収縮にともない該エアが出入りする開口が設けられ、前記ガラス基板から前記固体撮像素子には前記開口を跨いで架設された弾性を有する膜が設けられ、該膜により前記密封空間内のエアを密封していることを特徴とする。 The solid-state imaging device of the present invention is arranged such that a glass substrate provided with a required terminal and a microlens on the imaging surface facing the glass substrate with a predetermined interval and connected to the terminal of the glass substrate A solid-state imaging device comprising: an insulative member filled between the glass substrate and the solid-state imaging device excluding the microlens, wherein the microlens is sealed in a sealed space. The insulating member is provided with an opening through which the air enters and exits as the air in the sealed space expands and contracts, and has elasticity that spans the opening from the glass substrate to the solid-state imaging device. A film is provided, and the air in the sealed space is sealed by the film .
このようにすれば、絶縁性部材の開口が密封空間内のエアの膨張、収縮を許容可能に閉塞されているので、固体撮像装置の使用時に温度変化が生じて密封空間内のエアが膨張もしくは収縮しても、密封空間内のエアをこの開口から出入りさせることができ、ガラス基板や固体撮像素子が変形したり破損したりしにくくすることができる。また、この開口は閉塞されているので、マイクロレンズを封止する密封空間内にゴミなどが浸入するおそれがない。 In this way, since the opening of the insulating member is closed to allow the expansion and contraction of the air in the sealed space to allow, the temperature change occurs when the solid-state imaging device is used, and the air in the sealed space expands or Even if it shrinks, the air in the sealed space can enter and exit from the opening, and the glass substrate and the solid-state imaging device can be hardly deformed or damaged. In addition, since the opening is closed, there is no possibility that dust or the like enters the sealed space that seals the microlens.
なお、密封空間内のエアは、固体撮像装置の実際の使用時における外気環境に近い条件のものが好ましく、ゴミ等が極力排除された空気を、ほぼ外気圧と同じ圧力にて封止する。また、開口を閉塞する手段は、密封空間内のエアの出入りに対応できる必要があり、柔軟性のある膜で直接覆う他、例えばエアダンパーに連通させるなども考えられる。 Note that the air in the sealed space is preferably in a condition close to the outside air environment when the solid-state imaging device is actually used, and the air from which dust or the like is excluded as much as possible is sealed at substantially the same pressure as the outside air pressure. In addition, the means for closing the opening needs to be able to cope with the entry and exit of air in the sealed space. In addition to directly covering with a flexible film, for example, communicating with an air damper may be considered.
また、前記絶縁性部材の開口は弾性を有する膜により閉塞されていてもよい。この場合、弾性を有する膜の伸縮により密封空間内のエアの膨張、収縮を許容できるようになり、簡単な構成でありながら撮像面周りの部材の変形や破損を効果的に防止できる。なお、弾性を有する膜としては、例えばフィルムやゴムなどの薄い柔軟性のある材料が好ましい。 Further, the opening of the insulating member may be closed by an elastic film. In this case, expansion and contraction of the air in the sealed space can be permitted by expansion and contraction of the elastic film, and deformation and breakage of members around the imaging surface can be effectively prevented with a simple configuration. In addition, as a film | membrane which has elasticity, thin flexible materials, such as a film and rubber | gum, are preferable, for example.
また、開口の設け方としては、固体撮像素子の周縁全体を絶縁性部材で封止した後に絶縁性部材の一部に孔をあけるようにしてもよいし、また、全体を封止せず矩形状の固体撮像素子の周縁の一部分、例えば一辺のみ絶縁性部材を形成しないようにしてもよい。弾性を有する膜としては、形成、貼り付けが容易なよう、片面に粘着層が形成されたフィルムなどが好ましい。 In addition, as for the way of providing the opening, after sealing the entire periphery of the solid-state imaging device with an insulating member, a hole may be made in a part of the insulating member, or the whole shape may be rectangular without sealing. The insulating member may not be formed on only a part of the periphery of the solid-state imaging device, for example, only one side. The film having elasticity is preferably a film having an adhesive layer formed on one side so that it can be easily formed and attached.
本発明の他の固体撮像装置は、所要の端子が設けられたガラス基板と、該ガラス基板に対して撮像面のマイクロレンズが所定の間隔をあけて対向するよう配置されかつ前記ガラス基板の端子に接続された固体撮像素子とを備え、前記マイクロレンズを除く前記固体撮像装置と前記ガラス基板との間に絶縁性部材を充填して前記マイクロレンズを密封空間内に封止した固体撮像装置であって、少なくとも一部分が弾性を有する膜により囲まれたエア保持層が形成され、前記絶縁性部材には前記密封空間内のエアの膨張、収縮にともない該エアが出入りする開口が設けられ、前記密封空間は前記開口を介して前記エア保持層に連通していることを特徴とする。 In another solid-state imaging device of the present invention, a glass substrate provided with a required terminal, and a microlens on the imaging surface facing the glass substrate with a predetermined distance therebetween, and a terminal of the glass substrate A solid-state imaging device connected to the solid-state imaging device, wherein an insulating member is filled between the solid-state imaging device excluding the microlens and the glass substrate, and the microlens is sealed in a sealed space. An air holding layer surrounded by an elastic film is formed at least partially, and the insulating member is provided with an opening through which the air enters and exits as the air expands and contracts in the sealed space. The sealed space communicates with the air holding layer through the opening.
このようにすれば、エア保持層は少なくとも弾性を有する膜で囲まれて構成されているので、この弾性膜の伸縮によりエア保持層の容積は増減可能となる。そしてこのエア保持層に密封空間が連通しているので、密封空間内のエアの膨張、収縮に応じてエア保持層の容積が増減可能となり、密封空間内のエアの膨張、収縮を許容できるようになる。また、エア保持層の体積を大きくとったり、弾性膜の伸縮率を大きくとったりすることにより、エア増減の許容量が大きくなり、ガラス基板や固体撮像素子の変形や破損の心配をより一層減らすことができる。 In this way, since the air holding layer is configured to be surrounded by at least an elastic film, the volume of the air holding layer can be increased or decreased by expansion and contraction of the elastic film. Since the sealed space communicates with the air retaining layer, the volume of the air retaining layer can be increased or decreased according to the expansion and contraction of air in the sealed space, and the expansion and contraction of air in the sealed space can be allowed. become. Also, by increasing the volume of the air retention layer or increasing the elastic film's expansion / contraction rate, the allowable amount of air increase / decrease is increased, and the risk of deformation or breakage of the glass substrate or solid-state imaging device can be further reduced. it can.
なお、エア保持層の具体的形成手段としては、たとえば片面の周縁に粘着層が形成されたフィルムを用い、このフィルムを所定量の空気を取り込みつつガラス基板に貼り付けることにより、少なくともガラス基板とこのフィルムとにより囲まれたエア保持層を形成する。 As a specific means for forming the air retaining layer, for example, a film having an adhesive layer formed on the periphery of one surface is used, and this film is attached to a glass substrate while taking in a predetermined amount of air, so that at least a glass substrate and An air retaining layer surrounded by the film is formed.
以上のように、本発明の固体撮像装置によれば、絶縁性部材の開口が密封空間内のエアの膨張、収縮を許容可能に閉塞されているので、固体撮像装置の使用時における温度変化によっても、撮像面周りの部材が変形したり破損したりしにくくなり、しかも撮像面にゴミが侵入する心配もなく、優れた性能の固体撮像装置を提供することができる。 As described above, according to the solid-state imaging device of the present invention, the opening of the insulating member is closed to allow the expansion and contraction of the air in the sealed space. In addition, it is possible to provide a solid-state imaging device with excellent performance without causing the members around the imaging surface to be deformed or damaged, and without having to worry about dust entering the imaging surface.
本発明の実施の形態について、図1から図5を用いて説明する。 Embodiments of the present invention will be described with reference to FIGS.
本実施形態に係る固体撮像装置は、図1に示すような構成であり、1は所要の端子2が一主面に設けられたガラス基板、3はガラス基板1の一主面に搭載,配置されたCCDもしくはCMOSなどからなる固体撮像素子、4は固体撮像素子3の端子12とガラス基板1の端子2との間を電気的に接続するたとえばAu製バンプ、6は固体撮像素子3のマイクロレンズ5およびガラス基板1面間に密封空間7を形成する絶縁性部材としての封止樹脂層である。
The solid-state imaging device according to the present embodiment has a configuration as shown in FIG. 1, where 1 is a glass substrate on which a required terminal 2 is provided on one main surface, and 3 is mounted and arranged on one main surface of the glass substrate 1. The solid-state imaging device composed of a CCD or CMOS or the like, 4 is an Au bump for electrically connecting the
ガラス基板1の端子2は、外部接続用電極2aと、固体撮像素子3の端子12にバンプ4を介して接続される電極2cと、これら両電極2a、2cとを接続する配線2bとからなる。
The terminal 2 of the glass substrate 1 includes an external connection electrode 2a, an electrode 2c connected to the
固体撮像素子3は、受光面にマイクロレンズ5を備えており、かつこのマイクロレンズ5の形成面を、ガラス基板1に対向させて搭載,配置してある。
The solid-state imaging device 3 includes a
封止樹脂層6の形成は、例えば光硬化性のエポキシ樹脂を供給し、ガラス基板側から紫外線などの光を照射することにより行う。封止樹脂層6と固体撮像素子3とガラス基板1とで密封空間7を形成し、マイクロレンズ5を封止している。また、封止樹脂層6は、固体撮像素子3を機械的に強固に固定するとともに、外部からのゴミの浸入を防止している。密封空間7内には、ゴミ等を極力排除した空気が、外気圧とほぼ等しい圧力にて封止されている。
The sealing
本実施の形態では、固体撮像素子3全体を覆い所定の空気を取り込んだ状態でガラス基板1に貼り付けられたフィルム10を設けることによりエア保持層8を形成しており、また、封止樹脂層6に貫通穴9を設けている。
In the present embodiment, the air holding layer 8 is formed by providing the
フィルム10は、固体撮像素子3の大きさよりも大きく形成された略矩形状のPET等の材料からなり、固体撮像素子3を上面から覆う形で、かつ所定量の空気を取り込んでガラス基板1に外周部を貼り付け、エア保持層8を形成している。なお、フィルム10の貼り付けは予め粘着面が形成された既製品を用いることにより容易にかつ強固に貼り付けできるが、エア保持層8に外部からゴミが浸入しないように、フィルム10を貼り付けた後、フィルム10の周縁に接着剤などのシール剤11を形成して確実に密閉するのが好ましい。
The
貫通穴9は、図5に示すように、固体撮像素子3の周縁部に形成した封止樹脂層6の一カ所を貫通する形で設けられており、密封空間7とエア保持層8とを連通している。なお、貫通穴9は、封止樹脂層6のいずれか一部分が開口していればよく、例えば矩形状の固体撮像素子3の一辺のみ封止樹脂層を形成しないようにしてもよいし、固体撮像素子3の周縁の所定数カ所のみ封止樹脂層6を形成するようにしてもよい。
As shown in FIG. 5, the through-hole 9 is provided so as to penetrate one place of the
以上の構成の固体撮像装置では、フィルム10の柔軟性によりエア保持層8は密封空間7内の気体の膨張、収縮を許容できるようになっている。そのため、固体撮像装置の使用時に温度変化が生じ、密封空間7内の空気が膨張または収縮しても、撮像面周りの部材(ガラス基板1および固体撮像素子3)が変形したり破損したりしにくくできる。また、エア保持層8は密封空間7と連通しており、外部空間とは遮断されているので、マイクロレンズ5を封止する密封空間7にゴミなどが侵入するおそれがない。
In the solid-state imaging device having the above configuration, the air holding layer 8 can permit the expansion and contraction of the gas in the sealed space 7 due to the flexibility of the
なお、本発明はもちろん、上述した実施の形態に限定されるものではなく、その他、あらゆる用途に適用可能である。 Of course, the present invention is not limited to the above-described embodiment, and can be applied to all other uses.
エア保持層8は、開口9に連通していれば他にもあらゆる形態をとることができ、またあらゆる位置に設置可能である。 The air retaining layer 8 can take any other form as long as it communicates with the opening 9 and can be installed at any position.
また、フィルム10の面積を大きくすれば、エア保持層8の容積の変化量をより大きく確保することができ、密封空間7内の空気の膨張、収縮に対してより確実に対応できるようになる。逆に、エア保持層8を設けずに貫通穴9の開口をフィルム10で閉塞するだけでも、フィルム10の伸縮効果は発揮され、密封空間7内の空気の膨張、収縮に対応することができる。
In addition, if the area of the
また、貫通穴9は封止樹脂層6に穴を設ける構成に限らず、例えば封止樹脂層6を貫通するダクトを別途設けても良い。
Further, the through hole 9 is not limited to the configuration in which the hole is formed in the sealing
本発明は、極めて小型で使用環境による温度変化が大きい各種携帯用撮像機器に内蔵される固体撮像装置として好適である。 The present invention is suitable as a solid-state imaging device built in various portable imaging devices that are extremely small and have a large temperature change depending on the usage environment.
1 ガラス基板
2 端子
3 固体撮像素子
4 バンプ
5 マイクロレンズ
6 封止樹脂層
7 密封空間
8 エア保持層
9 貫通穴
10 フィルム
11 シール剤
12 端子
DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Terminal 3 Solid-state image sensor 4
Claims (2)
前記絶縁性部材には前記密封空間内のエアの膨張、収縮にともない該エアが出入りする開口が設けられ、前記ガラス基板から前記固体撮像素子には前記開口を跨いで架設された弾性を有する膜が設けられ、該膜により前記密封空間内のエアを密封していることを特徴とする固体撮像装置。 A glass substrate provided with a required terminal; and a solid-state imaging device arranged so that a microlens on the imaging surface faces the glass substrate with a predetermined interval and connected to the terminal of the glass substrate. A solid-state imaging device in which an insulating member is filled between the solid-state imaging element excluding the microlens and the glass substrate, and the microlens is sealed in a sealed space,
The insulating member is provided with an opening through which the air enters and exits as the air in the sealed space expands and contracts, and an elastic film that spans the opening from the glass substrate to the solid-state imaging device. The solid-state imaging device is characterized in that air in the sealed space is sealed by the film .
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