JP4935272B2 - Positive photosensitive resin composition - Google Patents

Description

  The present invention relates to a positive photosensitive resin composition. More specifically, the present invention relates to a positive type photosensitive resin composition suitable for a surface protective film of a semiconductor element, an interlayer insulating film, an insulating layer of an organic electroluminescent element, etc., wherein a portion exposed to ultraviolet rays is dissolved in an alkali developer.

  A heat-resistant resin such as polyimide is used for a surface protective film, an interlayer insulating film, and the like of a semiconductor element such as an LSI because of its excellent heat resistance and electrical insulation. In such an application, it is important to show high adhesiveness with a silicon substrate as a substrate material. However, polyimide itself has low adhesiveness, and adhesion improvements using a silane coupling agent (for example, see Patent Document 1) are known.

  With the miniaturization of semiconductor elements, resolutions of several μm are required for surface protective films and interlayer insulating films. For such applications, positive photosensitive polyimide and polybenzoxazole that can be finely processed are used. It has been. These use naphthoquinone diazide compounds to develop a positive type, and the addition of aminosilane coupling agents, which were previously considered to have an effect of improving adhesiveness, decomposes the naphthoquinone diazide group, resulting in a significant decrease in photosensitive performance. There was a problem to do.

  In order to solve this problem, a method of applying a photosensitive resin precursor composition after applying a silane coupling agent and heat-treating as a method having good adhesiveness and not lowering the photosensitive performance (for example, Patent Document 2) Reference), a method of containing an anilinosilane compound in the photosensitive resin precursor composition (for example, see Patent Document 3), a method of containing a silane compound having an azomethine group in the photosensitive resin precursor composition (for example, Patent Document 4) And a method using an aminosilane compound having an aromatic amino group (see, for example, Patent Document 5) has been proposed.

In recent years, in order to reduce the mounting area of an LSI package, bumps are formed on the package, and the package is directly bonded to the substrate, from the method of connecting pins to the substrate, as in the conventional QFP. The method to do has come to be used. For this reason, it is necessary to form solder bumps or the like when forming a package, and heat resistance and chemical resistance are required for an insulating material such as polyimide used for protecting an LSI chip. In particular, since the solder bump formation is performed at a high temperature using an organic acid called a flux treatment, chemical resistance higher than the conventional one is required. In order to satisfy such requirements, a photosensitive resin precursor composition containing a thermally crosslinkable compound having a methylol group has been proposed (see, for example, Patent Document 6). These heat-crosslinkable compounds have a problem that the adhesiveness to the substrate is lowered when the content is large, and it has been very difficult to improve the adhesiveness even when the above-described conventional techniques are used.
JP 63-027834 A (Claim 3) JP 2002-050621 A (Claim 1) JP 2004-124054 A (Claim 2) JP 2004-045477 A (Claim 1) JP 2006-119271 A (Claim 1) JP 2002-328472 A (Claim 1)

  The above-described conventionally known photosensitive resin composition has problems such as peeling from the substrate and cracking during chemical processing when used in a semiconductor device that requires high heat resistance and chemical resistance. However, it has not been possible to obtain a material having both good adhesion and sufficient chemical resistance. The present invention provides a positive photosensitive resin composition that has both high adhesiveness and chemical resistance that can be used satisfactorily even in semiconductor devices that are excellent in sensitivity stability and require high heat resistance and high chemical resistance. Objective.

  The present invention is represented by (a) a polymer having a structure represented by general formula (1) as a main component, (b) a quinonediazide compound, (c) an alkoxymethyl group-containing compound, (d) represented by general formula (2). A positive photosensitive resin composition comprising an aminosilane compound and (e) a solvent.

In general formula (1), R ¹ and R ² are divalent to octavalent organic groups having 2 or more carbon atoms, R ³ and R ⁴ may be the same or different, and are each hydrogen or C 1-20 An organic group is shown. n is in the range of 10 to 100,000, l and m are integers of 0 to 2, and p and q are integers of 0 to 4. However, p + q> 0.

In General Formula (2), R ^{5 to} R ¹² each independently represent hydrogen or an organic group having 1 to 10 carbon atoms. R ^{13 to} R ¹⁵ each independently represents a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group, a phenyl group, a substituted phenyl group, and an alkoxyl group having 1 to 6 carbon atoms, and at least one of It is a C1-C6 alkoxyl group. i shows the integer of 1-10.

  According to the present invention, it is possible to obtain a positive photosensitive resin composition that is excellent in sensitivity stability and has both excellent chemical resistance and adhesion to a substrate.

  The positive photosensitive resin composition of the present invention contains (a) a polymer whose main component is a structure represented by the general formula (1). The polymer having the structure represented by the general formula (1) as a main component can be a polymer having an imide ring, an oxazole ring, or other cyclic structures by heating or an appropriate catalyst. Preferred examples include polyamic acid, polyamic acid ester of polyimide precursor, and polyhydroxyamide of polybenzoxazole precursor. Due to the annular structure, the heat resistance and solvent resistance are dramatically improved. Here, the main component means having n structural units of the structure represented by the general formula (1) in an amount of 50 mol% or more of the structural units of the polymer. Preferably it is 70 mol% or more, and more preferably 90 mol% or more.

In the general formula (1), R ¹ represents a divalent to octavalent organic group having 2 or more carbon atoms, and represents an acid structural component. Examples of acids in which R ¹ is divalent include aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, diphenyl ether dicarboxylic acid, naphthalenedicarboxylic acid, and bis (carboxyphenyl) propane, and aliphatic dicarboxylic acids such as cyclohexanedicarboxylic acid and adipic acid. And so on. The acid R ¹ is trivalent, trimellitic acid, tricarboxylic acids such as trimesic acid, pyromellitic acid as the acid R ¹ is tetravalent, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, diphenyl ether tetracarboxylic acid And tetracarboxylic acids such as Moreover, the acid which has hydroxyl groups, such as a hydroxyphthalic acid and a hydroxy trimellitic acid, can also be mentioned. These acid components may be used alone or in combination of two or more, but preferably contain 1 to 40 mol% of tetracarboxylic acid.

R ¹ preferably contains an aromatic ring from the viewpoint of heat resistance, and more preferably a trivalent or tetravalent organic group having 6 to 30 carbon atoms. Specifically, it is preferable that R ¹ (COOR ³ ) _m (OH) _p in the general formula (1) has a structure represented by the general formula (5).

In the above formula (5), R ³⁸ and R ⁴⁰ represent a divalent to tetravalent organic group having 2 to 20 carbon atoms, R ³⁹ represents a trivalent to hexavalent organic group having 3 to 20 carbon atoms, R ⁴¹ and R ⁴² may be the same or different and each represents hydrogen or an organic group having 1 to 20 carbon atoms. o and t are integers of 0 to 2, and r is an integer of 1 to 4. However, o + t ≦ 2.

R ³⁸ and R ⁴⁰ are more preferably those containing an aromatic ring from the viewpoint of the heat resistance of the resulting polymer, and among them, particularly preferred structures include residues such as trimellitic acid, trimesic acid and naphthalenetricarboxylic acid.

R ³⁹ represents a trivalent to hexavalent organic group having 3 to 20 carbon atoms. Furthermore, the r hydroxyl groups are preferably located adjacent to the amide bond. As such an example, bis (3-amino-4-hydroxyphenyl) hexafluoropropane, bis (3-hydroxy-4-aminophenyl) hexafluoropropane containing a fluorine atom, bis ( 3-amino-4-hydroxyphenyl) propane, bis (3-hydroxy-4-aminophenyl) propane, 3,3′-diamino-4,4′-dihydroxybiphenyl, 3,3′-dihydroxy-4,4 ′ Examples include diaminobiphenyl, 2,4-diamino-phenol, 2,5-diaminophenol, and 1,4-diamino-2,5-dihydroxybenzene having an amino group bonded thereto.

Further, R ⁴¹ and R ⁴² in the general formula (5) may be the same or different, and represent hydrogen or an organic group having 1 to 20 carbon atoms. By setting the number of carbon atoms to 20 or less, moderate solubility in an alkali developer can be obtained. o and t each represent an integer of 0 to 2, preferably 1 or 2. However, o + t ≦ 2. R represents an integer of 1 to 4. Within this range, good pattern processability can be obtained.

  Among the structures represented by the general formula (5), examples of preferred structures include the following structures, but are not limited thereto.

In the general formula (1), the structural component of the acid represented by R ¹ is a tetracarboxylic acid or dicarboxylic acid that does not have a hydroxyl group, as long as the solubility in alkali, the photosensitive performance, and the heat resistance are not impaired. Can also be copolymerized. Examples of this include aromatic tetracarboxylic acids such as pyromellitic acid, benzophenonetetracarboxylic acid, biphenyltetracarboxylic acid, diphenylethertetracarboxylic acid, diphenylsulfonetetracarboxylic acid, and diesters in which two carboxyl groups are methyl or ethyl groups. Compounds, aliphatic tetracarboxylic acids such as butanetetracarboxylic acid and cyclopentanetetracarboxylic acid, diester compounds in which two carboxyl groups are methyl or ethyl groups, terephthalic acid, isophthalic acid, diphenyl ether dicarboxylic acid, naphthalenedicarboxylic acid And aromatic dicarboxylic acids such as adipic acid and the like. In view of solubility in an alkali developer and photosensitivity, these are preferably a copolymer of 50 mol% or less of the acid component, and more preferably 30 mol% or less.

In the general formula (1), R ² represents a divalent to octavalent organic group having 2 or more carbon atoms and represents a structural component of diamine. Of these, those having an aromatic ring are preferred from the viewpoint of the heat resistance of the resulting polymer. Specific examples of the diamine include bis (amino-hydroxy-phenyl) hexafluoropropane having a fluorine atom, diaminodihydroxypyrimidine, diaminodihydroxypyridine, hydroxy-diamino-pyrimidine, diaminophenol having no fluorine atom, A structure in which a compound such as dihydroxybenzidine, diaminobenzoic acid, diaminoterephthalic acid, or R ² (COOR ⁴ ) _l (OH) _q in the general formula (1) is represented by any one of the general formulas (6) to (8) I can give you something.

In formula (6), R ⁴³ and R ⁴⁵ represent a trivalent to tetravalent organic group having 2 to 20 carbon atoms, and R ⁴⁴ represents a divalent organic group having 2 to 30 carbon atoms. u and v represent 1 or 2. In the general formula (7), R ⁴⁶ and R ⁴⁸ represent a divalent organic group having 2 to 20 carbon atoms, and R ⁴⁷ represents a trivalent to hexavalent organic group having 3 to 20 carbon atoms. w shows the integer of 1-4. R ^{49 in the} general formula (8) represents a divalent organic group having 2 to 20 carbon atoms, and R ⁵⁰ represents a trivalent to hexavalent organic group having 3 to 20 carbon atoms. x shows the integer of 1-4.

In the general formula (6), R ⁴³ and R ⁴⁵ denotes a trivalent to tetravalent organic group having 2 to 20 carbon atoms, those having an aromatic ring from the viewpoint of the heat resistance of the resulting polymer. Specific examples of —R ⁴³ (OH) _u — and —R ⁴⁵ (OH) _v — include hydroxyphenyl group, dihydroxyphenyl group, hydroxynaphthyl group, dihydroxynaphthyl group, hydroxybiphenyl group, dihydroxybiphenyl group, bis (Hydroxyphenyl) hexafluoropropane group, bis (hydroxyphenyl) propane group, bis (hydroxyphenyl) sulfone group, hydroxydiphenyl ether group, dihydroxydiphenyl ether group and the like can be mentioned. In addition, aliphatic groups such as a hydroxycyclohexyl group and a dihydroxycyclohexyl group can also be used. R ⁴⁴ represents a divalent organic group having 2 to 30 carbon atoms. A divalent group having an aromatic ring is preferable from the viewpoint of the heat resistance of the obtained polymer. Examples of such a group include a phenyl group, a biphenyl group, a diphenyl ether group, a diphenylhexafluoropropane group, a diphenylpropane group, and a diphenylsulfone group. In addition to this, an aliphatic cyclohexyl group and the like can also be used.

In the general formula (7), R ⁴⁶ and R ⁴⁸ represent a divalent organic group having 2 to 20 carbon atoms. A divalent group having an aromatic ring is preferred from the heat resistance of the resulting polymer. Examples of such a group include the groups shown as examples of R ⁴⁴ described above. R ⁴⁷ represents a trivalent to hexavalent organic group having 3 to 20 carbon atoms, and preferably has an aromatic ring from the heat resistance of the resulting polymer. Examples of —R ⁴⁷ (OH) _w — include the groups shown as examples of —R ⁴³ (OH) _u — and —R ⁴⁵ (OH) _v — described above.

In the general formula (8), R ⁴⁹ represents a divalent organic group having 2 to 20 carbon atoms. From the heat resistance of the polymer obtained, a divalent group having an aromatic ring is preferred. Examples of such a group include the groups shown as examples of R ⁴⁴ described above. R ⁵⁰ represents a trivalent to hexavalent organic group having 3 to 20 carbon atoms, and preferably has an aromatic ring from the heat resistance of the resulting polymer. Examples of —R ⁵⁰ (OH) _x — include the groups shown as examples of —R ⁴³ (OH) _u — and —R ⁴⁵ (OH) _v — described above.

  Of the structures represented by the general formula (6), examples of preferable structures include the following structures, but are not limited thereto.

  Further, among the structures represented by the general formula (7), examples of preferable structures include the following structures, but are not limited thereto.

  Of the structures represented by the general formula (8), examples of preferred structures include the structures shown below, but are not limited thereto.

  Other diamine components can be copolymerized with the diamine represented by the general formulas (6), (7), and (8). Examples include phenylenediamine, diaminodiphenyl ether, aminophenoxybenzene, diaminodiphenylmethane, diaminodiphenylsulfone, bis (trifluoromethyl) benzidine, bis (aminophenoxyphenyl) propane, bis (aminophenoxyphenyl) sulfone or their fragrances. Examples thereof include compounds in which the aromatic ring is substituted with an alkyl group or a halogen atom, aliphatic cyclohexyldiamine, methylenebiscyclohexylamine, hexamethylenediamine, and the like. These are preferably copolymerized in an amount of 1 to 40 mol% of the diamine component. By setting the copolymerization to 40 mol% or less, moderate solubility in an alkali developer can be obtained.

R ³ and R ^{4 in} the general formula (1) may be the same or different, and represent hydrogen or an organic group having 1 to 20 carbon atoms. From the viewpoint of solution stability of the resulting photosensitive resin solution, R ³ and R ⁴ are preferably organic groups, but hydrogen is preferable from the viewpoint of solubility in an aqueous alkali solution. In the present invention, hydrogen atoms and organic groups can be mixed. By adjusting the amounts of hydrogen and organic groups of R ³ and R ^4, the dissolution rate with respect to the aqueous alkali solution is changed, so that a photosensitive resin composition having an appropriate dissolution rate can be obtained by this adjustment. A preferable range is that 10 mol% to 90 mol% of each of R ³ and R ⁴ is a hydrogen atom. When the number of carbon atoms in R ³ and R ⁴ exceeds 20, it will not dissolve in the alkaline aqueous solution. From the above, R ³ and R ⁴ preferably contain at least one hydrocarbon group having 1 to 16 carbon atoms, and the others are hydrogen atoms.

  Moreover, l and m of General formula (1) have shown the number of carboxyl groups, and have shown the integer of 0-2. More preferably, it is 1 or 2. P and q of General formula (1) show the integer of 0-4, and are p + q> 0. In the general formula (1), n represents the number of repeating structural units of the polymer, and is in the range of 10 to 100,000. If n is less than 10, the solubility of the polymer in an alkaline developer becomes too high, and the contrast between the exposed area and the unexposed area cannot be obtained, and a desired pattern may not be formed. On the other hand, if n is larger than 100,000, the solubility of the polymer in an alkali developer becomes too small, the exposed portion is not dissolved, and a desired pattern cannot be formed. From the viewpoint of solubility of the polymer in an alkaline developer, n is preferably 1,000 or less, and more preferably 100 or less. Further, n is preferably 20 or more from the viewpoint of improving the elongation.

  N in the general formula (1) can be easily calculated by measuring the weight average molecular weight (Mw) by gel permeation chromatography (GPC), light scattering method, X-ray small angle scattering method or the like. When the molecular weight of the repeating unit is M and the weight average molecular weight of the polymer is Mw, n = Mw / M. The number of repetitions n in the present invention refers to a value calculated using the simplest GPC measurement in terms of polystyrene.

Furthermore, in order to improve the adhesion to the substrate, an aliphatic group having a siloxane structure may be copolymerized in R ¹ and / or R ² of the general formula (1) within a range that does not reduce the heat resistance. Specific examples of the diamine component include those obtained by copolymerizing 1 to 10 mol% of bis (3-aminopropyl) tetramethyldisiloxane, bis (p-amino-phenyl) octamethylpentasiloxane, and the like.

  Moreover, terminal blocker can be made to react with the terminal of the polymer which has the structure represented by General formula (1) as a main component. By sealing the end of the polymer with a monoamine having a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a sulfonic acid group and a thiol group, the dissolution rate of the resin in an aqueous alkaline solution can be adjusted to a preferred range. . Moreover, the dissolution rate with respect to aqueous alkali solution can be adjusted to a preferable range by sealing the terminal of a polymer with an acid anhydride, an acid chloride, and monocarboxylic acid. The content of the end-capping agent such as monoamine, acid anhydride, acid chloride, monocarboxylic acid is preferably in the range of 0.1 to 60 mol%, particularly preferably 5 to 50 mol%, based on the total amine component. is there. By setting it as such a range, the viscosity of the solution at the time of apply | coating a resin composition can be obtained, and the resin composition which had the outstanding film | membrane physical property can be obtained.

The end-capping agent introduced into the resin can be easily detected by the following method. For example, by dissolving the resin into which the end-capping agent has been introduced in an acidic solution and decomposing it into an amine component and an acid anhydride component that are the structural units of the resin, this is measured by gas chromatography (GC) or NMR measurement, The end capping agent can be easily detected. Apart from this, it is possible to directly detect a resin into which a terminal blocking agent has been introduced by pyrolysis gas chromatography (PGC), infrared spectrum and ¹³ C NMR spectrum measurement.

  A polymer having a structure represented by the general formula (1) as a main component is synthesized by the following method. In the case of polyamic acid or polyamic acid ester, for example, a method of reacting a tetracarboxylic dianhydride and a diamine compound and a monoamino compound used for terminal blocking at a low temperature, a diester is obtained by tetracarboxylic dianhydride and an alcohol, Thereafter, a method of reacting a diamine compound, a monoamino compound and a condensing agent, a method of obtaining a diester by tetracarboxylic dianhydride and an alcohol, and then converting the remaining dicarboxylic acid to an acid chloride and reacting with the diamine compound or the monoamino compound. and so on. Polyhydroxyamide can also be used in place of polyamic acid as a heat-resistant polymer precursor similar to polyamic acid. In the case of polyhydroxyamide, it can be obtained by a production method in which a bisaminophenol compound, a dicarboxylic acid, and a monoamino compound are subjected to a condensation reaction. Specifically, a dehydration condensing agent such as dicyclohexylcarbodiimide (DCC) is reacted with an acid, and a bisaminophenol compound or monoamino compound is added thereto, or a bisaminophenol compound or monoamino is added with a tertiary amine such as pyridine. There is a method of dropping a dicarboxylic acid dichloride solution into a compound solution.

  The polymer having the structure represented by the general formula (1) as a main component is polymerized by the above method, and then poured into a large amount of water or a methanol / water mixture, precipitated, filtered and dried, It is desirable to isolate. By this precipitation operation, unreacted monomers and oligomer components such as dimers and trimers are removed, and film properties after thermosetting are improved.

  The positive photosensitive resin composition of the present invention contains (b) a quinonediazide compound. The quinonediazide compound is a compound in which a sulfonic acid of quinonediazide is bonded to a polyhydroxy compound with an ester, a compound in which a sulfonic acid of quinonediazide is bonded to a polyamino compound, and a sulfonamide of quinonediazide to a polyhydroxypolyamino compound. Examples include those that are combined. Although all the functional groups of these polyhydroxy compounds and polyamino compounds may not be substituted with quinonediazide, from the viewpoint of the contrast between the exposed part and the unexposed part, 50 mol% or more of the entire functional group is substituted with quinonediazide. Preferably it is. By using such a quinonediazide compound, it is possible to obtain a positive photosensitive resin composition that is sensitive to i-line (365 nm), h-line (405 nm), and g-line (436 nm) of a mercury lamp that is a general ultraviolet ray. it can.

  Polyhydroxy compounds include Bis-Z, BisP-EZ, TekP-4HBPA, TrisP-HAP, TrisP-PA, TrisP-SA, TrisOCR-PA, BisOCHP-Z, BisP-MZ, BisP-PZ, BisP-IPZ, BisOCP -IPZ, BisP-CP, BisRS-2P, BisRS-3P, BisP-OCHP, Methylenetris-FR-CR, BisRS-26X, DML-MBPC, DML-MBOC, DML-OCHP, DML-PCHP, DML-PC, DML-PTBP, DML-34X, DML-EP, DML-POP, dimethylol-BisOC-P, DML-PFP, DML-PSBP, DML-MTrisPC, TriML-P, TriML-35XL, TML-BP, TML-HQ TML-pp-BPF, TML-BPA, TMOM-BP, HML-TPPHBA, HML-TPPHAP (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), BIR-OC, BIP-PC, BIR-PC, BIR- PTBP, BIR-PCHP, BIP-BIOC-F, 4PC, BIR-BIPC-F, TEP-BIP-A, 46DMOC, 46DMOEP, TM-BIP-A (above, trade name, manufactured by Asahi Organic Materials Co., Ltd.) 2,6-dimethoxymethyl-4-t-butylphenol, 2,6-dimethoxymethyl-p-cresol, 2,6-diacetoxymethyl-p-cresol, naphthol, tetrahydroxybenzophenone, gallic acid methyl ester, bisphenol A , Bisphenol E, methylene bisphenol, BisP-AP (trade name, Honshu Manufactured by Manabu Kogyo Co.) and the like, but not limited to.

  Polyamino compounds are 1,4-phenylenediamine, 1,3-phenylenediamine, 4,4′-diaminodiphenyl ether, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylsulfone, 4,4′-diaminodiphenyl. Although sulfide etc. are mentioned, it is not limited to these.

  Examples of the polyhydroxypolyamino compound include 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane and 3,3'-dihydroxybenzidine, but are not limited thereto.

  In the present invention, quinonediazide is preferably a 5-naphthoquinonediazidesulfonyl group or a 4-naphthoquinonediazidesulfonyl group. The 4-naphthoquinonediazide sulfonyl ester compound has absorption in the i-line region of a mercury lamp and is suitable for i-line exposure. The 5-naphthoquinone diazide sulfonyl ester compound has an absorption extending to the g-line region of a mercury lamp and is suitable for g-line exposure. In the present invention, it is preferable to select a 4-naphthoquinone diazide sulfonyl ester compound or a 5-naphthoquinone diazide sulfonyl ester compound depending on the wavelength to be exposed. In addition, a naphthoquinone diazide sulfonyl ester compound in which 4-naphthoquinone diazide sulfonyl group and 5-naphthoquinone diazide sulfonyl group are used in the same molecule can be obtained, or 4-naphthoquinone diazide sulfonyl ester compound and 5-naphthoquinone diazide sulfonyl ester compound. Can also be used in combination.

  In addition, the molecular weight of the quinonediazide compound is preferably 1500 or less, and more preferably 1200 or less. When the molecular weight is 1500 or less, the quinonediazide compound is sufficiently thermally decomposed in the heat treatment after pattern formation, and a cured film having excellent heat resistance, mechanical properties, and adhesiveness can be obtained. On the other hand, 300 or more is preferable and 350 or more is more preferable.

  The content of the (b) quinonediazide compound is preferably 1 part by weight or more, more preferably 3 parts by weight or more, and preferably 50 parts by weight or less with respect to 100 parts by weight of the polymer of the component (a). More preferably, it is 40 parts by weight or less.

  The quinonediazide compound used in the present invention is synthesized from a specific phenol compound by the following method. For example, there is a method of reacting 5-naphthoquinonediazide sulfonyl chloride and a phenol compound in the presence of triethylamine. Examples of the method for synthesizing a phenol compound include a method in which an α- (hydroxyphenyl) styrene derivative is reacted with a polyhydric phenol compound under an acid catalyst.

  The positive photosensitive resin composition of the present invention contains (c) an alkoxymethyl group-containing compound. Since an alkoxymethyl group causes a crosslinking reaction in a temperature range of 150 ° C. or higher, by containing the compound, a cured film having excellent chemical resistance can be obtained by crosslinking by post-development heat treatment described later. When the component (c) is not used, sufficient chemical resistance cannot be obtained, for example, cracks occur in the cured film due to the chemical treatment such as the solder flux treatment described above. The component (c) is preferably a compound having two or more alkoxymethyl groups in order to increase the crosslinking density, and more preferably a compound having four or more alkoxymethyl groups from the viewpoint of increasing the crosslinking density and further improving chemical resistance. . In the present invention, the alkoxymethyl group-containing compound is preferably a compound having a group represented by the general formula (3) or a compound represented by the general formula (4), and these may be used in combination.

In general formula (3), R ¹⁶ may be the same or different and represents an alkyl group having 1 to 20 carbon atoms. A C1-C10 alkyl group is preferable from a soluble point with a resin composition, and a C1-C3 alkyl group is more preferable.

In the general formula (4), R ¹⁷ and R ¹⁸ represent CH ₂ OR ³⁸ . R ³⁸ represents an organic group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms in view of solubility of the resin composition. R ¹⁹ represents a hydrogen atom, a methyl group or an ethyl group. R ^{20 to} R ³⁷ may be the same or different and each represents a hydrogen atom, an organic group having 1 to 20 carbon atoms, Cl, Br, I, or F. j represents an integer of 2 to 4.

  Specific examples of the compound containing the group represented by the general formula (3) include, but are not limited to, the following compounds.

  Specific examples of the compound represented by the general formula (4) include the following compounds, but are not limited thereto.

  The content of the (c) alkoxymethyl group-containing compound is preferably 0.5 parts by weight or more with respect to 100 parts by weight of the polymer of the component (a) from the viewpoint of increasing the crosslinking density and further improving the chemical resistance. Further, if it is 10 parts by weight or more, higher chemical resistance can be obtained. Therefore, 10 parts by weight or more is preferable for more severe processing conditions such as flux treatment for lead-free solder heated at around 260 ° C. Further, in terms of mechanical properties of the cured film, it is preferably 50 parts by weight or less, more preferably 40 parts by weight or less, and further preferably 30 parts by weight or less.

  The positive photosensitive resin composition of the present invention is characterized by containing (d) an aminosilane compound represented by the general formula (2). (C) The resin composition containing an alkoxymethyl group-containing compound has a tendency to decrease the adhesion to the substrate, but in the present invention, the adhesion to the substrate is dramatically improved by containing the component (d). And a resin composition having excellent heat resistance and adhesiveness is obtained. Moreover, the aminosilane compound represented by General formula (2) can reduce the basicity which an amino group has by substituting hydrogen of an amino group with a phenyl group. As a result, it is possible to obtain (b) a resin composition that prevents decomposition of the quinonediazide compound, has excellent exposure sensitivity storage stability, and exposure sensitivity after exposure stability.

In formula, R < ⁵ > -R < ¹² > shows hydrogen or a C1-C10 organic group each independently. From the viewpoint of solubility with the resin composition, hydrogen or an alkyl group having 1 to 3 carbon atoms is preferable, and hydrogen is most preferable. R ^{13 to} R ¹⁵ each independently represent a group selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group, a phenyl group, a substituted phenyl group, and an alkoxyl group having 1 to 6 carbon atoms, and at least one of It is a C1-C6 alkoxyl group. Preferably at least one is a methoxy group or an ethoxy group. i shows the integer of 1-10, and 2-4 are preferable.

  (D) Specific examples of the aminosilane compound represented by the general formula (2) include N-phenylaminomethyltrimethoxysilane, N-phenylaminomethyltriethoxysilane, N-phenylaminoethyltrimethoxysilane, and N-phenyl. Aminoethyltriethoxysilane, N-phenylaminopropyltrimethoxysilane, N-phenylaminopropyltriethoxysilane, N-phenylaminopropyltriisopropoxysilane, N-phenylaminopropylmethyldimethoxysilane, N-phenylaminopropyldimethylmethoxy Silane, N-phenylaminobutyltrimethoxysilane, N-phenylaminobutyltriethoxysilane, N-phenylaminopentyltrimethoxysilane, N-phenylaminopentyltriethoxysilane, N (2-methylphenyl) aminomethyltrimethoxysilane, N- (3-methylphenyl) aminomethyltrimethoxysilane, N- (4-methylphenyl) aminomethyltrimethoxysilane, N- (2-methylphenyl) aminoethyl Trimethoxysilane, N- (3-methylphenyl) aminoethyltrimethoxysilane, N- (4-methylphenyl) aminoethyltrimethoxysilane, N- (2-methylphenyl) aminopropyltrimethoxysilane, N- (3 -Methylphenyl) aminopropyltrimethoxysilane, N- (4-methylphenyl) aminopropyltrimethoxysilane, N- (4-methylphenyl) aminobutyltrimethoxysilane, N- (4-methylphenyl) aminopentyltrimethoxy Silane, N- (2,4-dimethyl Enyl) aminomethyltrimethoxysilane, N- (2,4-dimethylphenyl) aminoethyltrimethoxysilane, N- (2,4-dimethylphenyl) aminopropyltrimethoxysilane, N- (2,4-dimethylphenyl) Aminobutyltrimethoxysilane, N- (2,4-dimethylphenyl) aminopentyltrimethoxysilane, 3- (N-phenylamino) -2-methylpropyltrimethoxysilane, 3- (N-phenylamino) -3- Examples thereof include, but are not limited to, methylpropyltrimethoxysilane and N, N-phenylmethylaminopropyltrimethoxysilane. Among these, N-phenylaminoethyltrimethoxysilane, N-phenylaminoethyltriethoxysilane, N-phenylaminopropyltrimethoxysilane, N-phenylaminopropyltriethoxysilane, N-phenylaminobutyltrimethoxysilane, N-phenylaminobutyltriethoxysilane.

  (D) The content of the aminosilane compound represented by the general formula (2) is based on 100 parts by weight of the polymer mainly composed of the structure represented by the general formula (1) from the viewpoint of adhesiveness. 0.5 parts by weight or more, preferably 1 part by weight or more, more preferably 2 parts by weight or more. Moreover, from the heat resistant point of a cured film, 30 weight part or less is preferable, 20 weight part or less is more preferable, and 15 weight part or less is more preferable.

  The positive photosensitive resin composition of the present invention contains (e) a solvent. Solvents include polar aprotic solvents such as N-methyl-2-pyrrolidone, γ-butyrolactone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, tetrahydrofuran, dioxane, propylene glycol monomethyl ether, etc. Ethers, ketones such as acetone, methyl ethyl ketone, diisobutyl ketone and diacetone alcohol, esters such as ethyl acetate, propylene glycol monomethyl ether acetate and ethyl lactate, and aromatic hydrocarbons such as toluene and xylene. In the present invention, these solvents can be used alone or in combination of two or more. The content of the solvent is preferably 50 parts by weight or more, more preferably 100 parts by weight or more, and preferably 2000 parts by weight or less, more preferably 1500 parts by weight with respect to 100 parts by weight of the polymer of component (a). Or less.

  The positive photosensitive resin composition of the present invention may further contain (f) at least one silane compound selected from compounds represented by the following general formula (9) or (10) and vinyl silane compounds. When such a silane compound is used in combination with (d) the aminosilane compound represented by the general formula (2), it can serve as an adhesion aid for the substrate.

Ar ¹ and Ar ^{2 in the} general formulas (9) and (10) each represent an aromatic ring having 6 or more carbon atoms or an aromatic heterocyclic structure having 2 or more carbon atoms. Specific examples include, but are not limited to, a phenyl group, a naphthalene group, a biphenyl group, a triazine group, and a pyridine group.

R ⁵¹ , R ⁵² , R ⁵⁹ , R ⁶⁰ , R ⁶⁷ , R ⁶⁸ in the general formulas (9) and (10) may be the same or different and each represents hydrogen or an organic group having 1 to 4 carbon atoms. Specific examples of the organic group having 1 to 4 carbon atoms include hydrocarbon such as methyl group, ethyl group and propyl group, and carbonyl group such as acetyl group. If the number of carbon atoms is 5 or more, the film shrinkage during curing becomes large, so care must be taken. R ⁵³ , R ⁶¹ and R ⁶⁶ may be the same or different and each represents an organic group having 1 to 6 carbon atoms. Specific examples of the organic group having 1 to 6 carbon atoms include hydrocarbons such as a methyl group, an ethyl group, and a propyl group, an alkoxy group, and an acetyl group. R ^{54 to} R ⁵⁸ and R ^{62 to} R ⁶⁵ may be the same or different and each represents a hydrocarbon group having 1 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms. Furthermore, at least one of R ^{54 to} R ⁵⁸ and R ^{62 to} R ⁶⁵ has an alkoxy group having 1 to 6 carbon atoms. a, d, f, and h are integers of 1 or more, and b, c, e, and g are integers of 0 or more. However, 1 ≦ a + b ≦ 4, 1 ≦ d + e ≦ 4, 1 ≦ g + h ≦ 4. Specific examples of the hydrocarbon group include, but are not limited to, a methyl group, an ethyl group, and a propyl group. Specific examples of the alkoxy group include, but are not limited to, a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, and an isobutoxy group. If the hydrocarbon group or alkoxy group has 7 or more carbon atoms, the film shrinkage at the time of curing will increase, so care must be taken. Preferable specific examples of this compound include the following structures, but are not limited thereto.

  Among them, the structure shown below is more preferable.

  Examples of the vinyl silane compound include vinyl trimethoxy silane, vinyl triethoxy silane, vinyl trichloro silane, vinyl tris (β-methoxy ethoxy) silane, etc. In addition to this, 3-methacryloxypropyl trimethoxy silane, 3- Carbon-carbon unsaturated bond-containing silane compounds such as acryloxypropyltrimethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, and 3-methacryloxypropylmethyldiethoxysilane can also be used. Vinyltrimethoxysilane and vinyltriethoxysilane are preferable.

  The compound represented by the general formula (9) or (10) and the vinylsilane compound may be used alone or in combination.

  The compound (f) represented by the general formula (9) or (10) and the vinylsilane compound are preferably contained in an amount of 0.001 part by weight or more with respect to 100 parts by weight of the polymer of the component (a). Preferably it is 0.005 weight part or more, More preferably, it is 0.01 weight part or more. Moreover, 30 weight part or less is preferable, More preferably, it is 20 weight part or less, More preferably, it is 15 weight part or less. If it is in this range, a sufficient effect as an adhesion aid can be obtained while maintaining the heat resistance of the composition.

  The positive photosensitive resin composition of the present invention may also contain (g) a photoacid generator selected from sulfonium salts, phosphonium salts, and diazonium salts. By containing the photoacid generator, it acts as a dissolution regulator for an alkaline developer. Since the resin composition obtained from the photosensitive resin composition of the present invention is used as a permanent film, it is environmentally undesirable for phosphorus or the like to remain, and it is necessary to consider the color tone of the film. In this case, a sulfonium salt is preferably used. Among the sulfonium salts, a triarylsulfonium salt represented by the general formula (11) is particularly preferable.

In the formula, R ⁶⁹ may be the same or different and each represents hydrogen or an organic group having 1 to 20 carbon atoms. R ⁷⁰ represents an organic group having 1 to 20 carbon atoms. α, β, and γ each represent an integer of 0 to 5.

  Specific examples of the triarylsulfonium salt represented by the general formula (11) are shown below, but are not limited thereto.

  In the positive photosensitive resin composition of the present invention, the content of the photoacid generator used as the component (g) is preferably 0.01 parts by weight or more with respect to 100 parts by weight of the polymer of the component (a). More preferably, it is 0.05 weight part or more, Preferably it is 50 weight part or less, More preferably, it is 10 weight part or less.

  Moreover, the compound which has a phenolic hydroxyl group can be contained for the purpose of improving the sensitivity of the said photosensitive resin composition as needed. Particularly preferred compounds having a phenolic hydroxyl group are, for example, Bis-Z, TekP-4HBPA, TrisP-HAP, TrisP-PA, BisRS-2P, BisRS-3P, BIR-PC, BIR-PTBP, BIR-BIPC-F. is there. By containing the compound having a phenolic hydroxyl group, the obtained resin composition is hardly dissolved in an alkali developer before exposure, and is easily dissolved in an alkali developer upon exposure. Development is easy in a short time.

  The content of the compound having a phenolic hydroxyl group is preferably 1 part by weight or more, more preferably 3 parts by weight or more, and preferably 50 parts by weight with respect to 100 parts by weight of the polymer of component (a). Part or less, more preferably 40 parts by weight or less.

  In addition, if necessary, for the purpose of improving the wettability between the photosensitive composition and the substrate, surfactants, esters such as ethyl lactate and propylene glycol monomethyl ether acetate, alcohols such as ethanol, cyclohexanone, methyl isobutyl Ketones such as ketones and ethers such as tetrahydrofuran and dioxane may be contained. Further, inorganic particles such as silicon dioxide and titanium dioxide, polyimide powder, and the like can also be contained.

  The manufacturing method of the positive photosensitive resin composition of this invention is illustrated. For example, (a) to (e), and if necessary, other components are placed in a glass flask or stainless steel container and stirred and dissolved with a mechanical stirrer, etc., ultrasonically dissolved, planetary stirring and defoaming The method of stirring and dissolving with an apparatus is mentioned. The viscosity of the composition is preferably 1 to 10,000 mPa · s. Moreover, you may filter with the filter of 0.1 micrometer-5 micrometers pore size in order to remove a foreign material.

  In the present invention, the component (d) is preferably added to the composition after completion of the polymerization of the polymer. When a compound corresponding to the component (d) is added at the time of polymer polymerization, it may be incorporated into the polymer main chain by a covalent bond in the polymer and the adhesion effect may be reduced. In addition, when the polymer was reprecipitated, it was reprecipitated in order to prevent problems such as removal of unreacted compounds of the above compound during the reprecipitation and lowering the adhesion effect, and gelation due to condensation of alkoxy groups. The component (d) is preferably added when the polymer is dissolved together with other components, or after the components (a) to (c) are dissolved in the solvent (e).

  Next, a method for forming a heat-resistant resin pattern using the positive photosensitive resin composition of the present invention will be described.

  A photosensitive resin composition is applied onto a substrate. As the substrate, a silicon wafer, ceramics, gallium arsenide, metal, glass, metal oxide insulating film, silicon nitride, ITO, or the like is used, but not limited thereto. Examples of the coating method include spin coating using a spinner, spray coating, roll coating, and slit die coating. Further, the coating film thickness varies depending on the coating method, the solid content concentration of the composition, the viscosity, and the like, but is usually applied so that the film thickness after drying is 0.1 to 150 μm.

  Next, the substrate coated with the photosensitive resin composition is dried to obtain a photosensitive resin film. Drying is preferably performed using an oven, a hot plate, infrared rays, or the like in the range of 50 ° C. to 150 ° C. for 1 minute to several hours.

  Next, the photosensitive resin film is exposed to actinic radiation through a mask having a desired pattern. As the actinic radiation used for exposure, there are ultraviolet rays, visible rays, electron beams, X-rays and the like. In the present invention, it is preferable to use i rays (365 nm), h rays (405 nm), and g rays (436 nm) of a mercury lamp. .

  In order to form a pattern of a heat resistant resin from the photosensitive resin film, the exposed portion may be removed using a developer after exposure. The developer is an aqueous solution of tetramethylammonium, diethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine, diethylamine, methylamine, dimethylamine, dimethylaminoethyl acetate, dimethylaminoethanol, dimethylamino An aqueous solution of a compound exhibiting alkalinity such as ethyl methacrylate, cyclohexylamine, ethylenediamine, hexamethylenediamine and the like is preferable. In some cases, these alkaline aqueous solutions may contain polar solvents such as N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, γ-butyrolactone, dimethylacrylamide, methanol, ethanol, Alcohols such as isopropanol, esters such as ethyl lactate and propylene glycol monomethyl ether acetate, ketones such as cyclopentanone, cyclohexanone, isobutyl ketone, and methyl isobutyl ketone may be added singly or in combination. Good. After development, rinse with water. Here, alcohols such as ethanol and isopropyl alcohol, and esters such as ethyl lactate and propylene glycol monomethyl ether acetate may be added to water for rinsing treatment.

  After development, a temperature of 200 ° C. to 500 ° C. is applied to convert it to a heat resistant resin film. This heat treatment is carried out for 5 minutes to 5 hours by selecting the temperature and increasing the temperature stepwise or by selecting a certain temperature range and continuously increasing the temperature. As an example, heat treatment is performed at 130 ° C., 200 ° C., and 350 ° C. for 30 minutes each. Alternatively, a method such as linearly raising the temperature from room temperature to 400 ° C. over 2 hours may be mentioned.

  The heat-resistant resin film formed by the positive photosensitive resin composition of the present invention includes a semiconductor passivation film, a protective film for a semiconductor element, an interlayer insulating film for a multilayer wiring for high-density mounting, an insulating layer for an organic electroluminescent element, etc. It is suitably used for applications.

  Hereinafter, the present invention will be described with reference to examples and the like, but the present invention is not limited to these examples. In addition, evaluation of the photosensitive resin composition in an Example was performed with the following method.

(1) Evaluation of sensitivity stability (a) Storage stability of exposure sensitivity Production of photosensitive resin film The film thickness after pre-baking a photosensitive resin composition (hereinafter referred to as varnish) on a 6-inch silicon wafer is 8 μm. Then, using a hot plate (a coating and developing apparatus Mark-7 manufactured by Tokyo Electron Co., Ltd.), pre-baking was performed at 120 ° C. for 3 minutes to obtain a photosensitive resin film.

Film thickness measurement method Using Lambda Ace STM-602 manufactured by Dainippon Screen Mfg. Co., Ltd., the film after pre-baking and development is measured at a refractive index of 1.629, and the cured film is measured at a refractive index of 1.773. did.

Exposure The reticle from which the pattern was cut was set in an exposure machine (i-line stepper DSW-8570i manufactured by GCA), and the photosensitive resin film was exposed to i-line by changing the exposure time at an intensity of 365 nm.

Development Using a developing device of Mark-7 manufactured by Tokyo Electron Ltd., a 2.38% aqueous solution of tetramethylammonium hydroxide was sprayed on the exposed film for 10 seconds at 50 revolutions. Then, it was allowed to stand for 70 seconds at 0 rotation, rinsed with water at 400 rotation, and shaken and dried for 10 seconds at 3000 rotation.

Calculation of Sensitivity After exposure and development, an exposure time (hereinafter referred to as an optimal exposure time) Eop1 at which a 50 μm line and space pattern (1L / 1S) is formed in a one-to-one width was determined. Next, the varnish was allowed to stand at 23 ° C. for 3 days, and the same evaluation as described above was performed to determine the optimum exposure time Eop2. Subsequently, the value of Eop2-Eop1 was calculated, and if the absolute value of this value was 50 mJ / cm ² or less, it was judged good, and if it exceeded 50 mJ / cm ² , it was regarded as bad.

(B) Exposure sensitivity after exposure exposure stability The photosensitive resin film was allowed to stand for 48 hours after exposure in a yellow room (23 ° C., 45% RH) and developed, and the optimum exposure time Eop3 was obtained as described above. . A value of Eop3-Eop1 was calculated, and if the absolute value of this value was 50 mJ / cm ² or less, it was judged good, and if it exceeded 50 mJ / cm ² , it was judged as bad.

(2) Evaluation of Adhesiveness with Substrate Production of Heat Resistant Resin Film A varnish is applied on a 6-inch silicon wafer so that the film thickness after pre-baking is 10 μm, and then a hot plate (application by Tokyo Electron Ltd.) A photosensitive resin film was obtained by pre-baking at 120 ° C. for 3 minutes using a developing device Mark-7). Using the inert oven INH-21CD manufactured by Koyo Thermo System Co., Ltd., the produced photosensitive resin film was heated at 170 ° C. for 30 minutes and then heated to 320 ° C. for 1 hour under a nitrogen stream (oxygen concentration 20 ppm or less). Then, heat treatment was performed at 320 ° C. for 1 hour to prepare a heat-resistant resin film (cured film).

  A 10-row, 10-column grid-like cut was made in the cured film at intervals of 2 mm, and a peel test was performed using cello tape (registered trademark). Thereafter, a pressure cooker test (PCT) treatment for 100 hours was performed, and a peel test using a cello tape was performed in the same manner as described above to evaluate the adhesiveness before and after the PCT. In the peeling test, the number of peeling was less than 10 as good and 10 or more as bad. The PCT treatment was performed under a saturation condition of 121 ° C. and 2 atm.

(3) After the chemical resistance evaluation pattern processed wafers (1) and as curing described above, were immersed in the stripping solution 106 (manufactured by Tokyo Ohka Kogyo Co., Ltd.) and treated for 10 minutes at 70 ° C., washed with water did. The pattern was observed for abnormalities such as cracks with an optical microscope.

Synthesis Example 1 Synthesis of hydroxyl group-containing acid anhydride (a) In a dry nitrogen stream, 18.3 g (0.05 mol) of 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (BAHF) 34.2 g (0.3 mol) of allyl glycidyl ether was dissolved in 100 g of gamma butyrolactone and cooled to −15 ° C. To this, 22.1 g (0.11 mol) of trimellitic anhydride chloride dissolved in 50 g of gamma butyrolactone was added dropwise so that the temperature of the reaction solution did not exceed 0 ° C. After completion of dropping, the reaction was carried out at 0 ° C. for 4 hours. This solution was concentrated with a rotary evaporator and charged into 1 L of toluene to obtain a hydroxyl group-containing acid anhydride (a).

Synthesis Example 2 Synthesis of hydroxyl group-containing diamine compound (b) 18.3 g (0.05 mol) of BAHF was dissolved in 100 mL of acetone and 17.4 g (0.3 mol) of propylene oxide, and cooled to -15 ° C. A solution prepared by dissolving 20.4 g (0.11 mol) of 3-nitrobenzoyl chloride in 100 mL of acetone was added dropwise thereto. After completion of dropping, the mixture was reacted at −15 ° C. for 4 hours and then returned to room temperature. The precipitated white solid was filtered off and vacuum dried at 50 ° C.

  30 g of the solid was placed in a 300 mL stainless steel autoclave, dispersed in 250 mL of methyl cellosolve, and 2 g of 5% palladium-carbon was added. Hydrogen was introduced here with a balloon and the reduction reaction was carried out at room temperature. After about 2 hours, the reaction was terminated by confirming that the balloons did not squeeze any more. After completion of the reaction, the catalyst was filtered to remove the palladium compound as a catalyst, and the mixture was concentrated with a rotary evaporator to obtain a hydroxyl group-containing diamine compound (b). The obtained solid was used for the reaction as it was.

Synthesis Example 3 Synthesis of hydroxyl group-containing diamine (c) 2-Amino-4-nitrophenol (15.4 g, 0.1 mol) was dissolved in acetone (50 mL) and propylene oxide (30 g, 0.34 mol). Cooled down. A solution prepared by dissolving 11.2 g (0.055 mol) of isophthalic acid chloride in 60 mL of acetone was gradually added dropwise thereto. After completion of dropping, the reaction was carried out at −15 ° C. for 4 hours. Thereafter, the precipitate formed by returning to room temperature was collected by filtration.

  This precipitate was dissolved in 200 mL of GBL, 3 g of 5% palladium-carbon was added, and the mixture was vigorously stirred. A balloon filled with hydrogen gas was attached thereto, and stirring was continued until the balloon of hydrogen gas did not contract any further at room temperature, and further stirred for 2 hours with the balloon of hydrogen gas attached. After completion of the stirring, the palladium compound was removed by filtration, and the solution was concentrated to half by a rotary evaporator. Ethanol was added thereto for recrystallization to obtain a hydroxyl group-containing diamine (c) crystal.

Synthesis Example 4 Synthesis of Hydroxyl Group-Containing Diamine (d) 2-Amino-4-nitrophenol 15.4 g (0.1 mol) was dissolved in acetone 100 mL and propylene oxide 17.4 g (0.3 mol), and −15 Cooled to ° C. A solution prepared by dissolving 20.4 g (0.11 mol) of 4-nitrobenzoyl chloride in 100 mL of acetone was gradually added dropwise thereto. After completion of dropping, the reaction was carried out at −15 ° C. for 4 hours. Thereafter, the precipitate formed by returning to room temperature was collected by filtration. Thereafter, a hydroxyl group-containing diamine (d) crystal was obtained in the same manner as in Synthesis Example 2.

Synthesis Example 5 Synthesis of quinonediazide compound (e) Under a dry nitrogen stream, BisP-RS (trade name, manufactured by Honshu Chemical Industry Co., Ltd.) 16.10 g (0.05 mol) and 5-naphthoquinonediazidesulfonyl acid chloride 26.86 g (0.1 mol) was dissolved in 450 g of 1,4-dioxane and brought to room temperature. Here, 10.12 g of triethylamine mixed with 50 g of 1,4-dioxane was added dropwise so that the temperature in the system would not be 35 ° C. or higher. It stirred at 30 degreeC after dripping for 2 hours. The triethylamine salt was filtered and the filtrate was poured into water. Thereafter, the deposited precipitate was collected by filtration. This precipitate was dried with a vacuum dryer to obtain a quinonediazide compound (e).

Synthesis Example 6 Synthesis of quinonediazide compound (f) TrisP-HAP (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), 15.31 g (0.05 mol) and 5-naphthoquinonediazidesulfonyl acid chloride 40. 28 g (0.15 mol) was dissolved in 450 g of 1,4-dioxane and brought to room temperature. A quinonediazide compound (f) was obtained in the same manner as in Synthesis Example 5 using 15.18 g of triethylamine mixed with 50 g of 1,4-dioxane.

Synthesis Example 7 Synthesis of quinonediazide compound (g) TrisP-PA (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), 21.22 g (0.05 mol) and 5-naphthoquinonediazidesulfonyl chloride 26. 86 g (0.10 mol) and 13.43 g (0.05 mol) of 4-naphthoquinone diazide sulfonyl chloride were dissolved in 450 g of 1,4-dioxane and brought to room temperature. A quinonediazide compound (g) was obtained in the same manner as in Synthesis Example 5 using 12.65 g of triethylamine mixed with 50 g of 1,4-dioxane.

Synthesis Example 8 Synthesis of quinonediazide compound (h) In a dry nitrogen stream, 11.41 g (0.05 mol) of bisphenol A and 26.86 g (0.1 mol) of 4-naphthoquinonediazidesulfonyl acid chloride were added to 1,4-dioxane. Dissolved in 450 g and brought to room temperature. A quinonediazide compound (h) was obtained in the same manner as in Synthesis Example 5 using 10.12 g of triethylamine mixed with 50 g of 1,4-dioxane.

Synthesis Example 9 Synthesis of Polymer A 4.4 g (0.022 mol) of 4,4′-diaminophenyl ether (DAE), 1,3-bis (3-aminopropyl) tetramethyldisiloxane (SiDA) under a dry nitrogen stream ) 1.24 g (0.005 mol) was dissolved in 50 g of N-methyl-2-pyrrolidone (NMP). Here in addition hydroxylation group-containing acid anhydride obtained in Synthesis Example 1 (a) 21.4 g (0.030 mol) with NMP14g, reacted at 20 ° C., then allowed to react for 2 hours at 40 ° C. It was. Thereafter, 0.65 g (0.006 mol) of 4-aminophenol was added as a terminal blocking agent, and the mixture was further reacted at 40 ° C. for 1 hour. Thereafter, a solution obtained by diluting 7.14 g (0.06 mol) of N, N-dimethylformamide dimethylacetal with 5 g of NMP was added dropwise over 10 minutes. After dropping, the mixture was stirred at 40 ° C. for 3 hours. After completion of the reaction, the solution was poured into 2 L of water, and a polymer solid precipitate was collected by filtration. The polymer solid was dried in a vacuum dryer at 50 ° C. for 72 hours to obtain a polyimide precursor polymer A.

Synthesis Example 10 Synthesis of Polymer B In a dry nitrogen stream, 13.6 g (0.0225 mol) of hydroxyl group-containing diamine (b) obtained in Synthesis Example 2 was dissolved in 50 g of NMP. Here in addition hydroxylation group-containing acid anhydride obtained in Synthesis Example 1 (a) 17.5 g (0.025 mol) with pyridine 30g, it was allowed to react for 2 hours at 40 ° C.. Thereafter, 0.58 g (0.005 mol) of 4-aminophenylacetylene was added as a terminal blocking agent, and the mixture was further reacted at 40 ° C. for 1 hour. After completion of the reaction, the solution was poured into 2 L of water, and a polymer solid precipitate was collected by filtration. The polymer solid was dried in a vacuum dryer at 80 ° C. for 72 hours to obtain a polyimide precursor polymer B.

Synthesis Example 11 Synthesis of Polymer C Under dry nitrogen stream, 15.13 g (0.040 mol) of hydroxyl group-containing diamine compound (c) obtained in Synthesis Example 3 and 1.24 g (0.005 mol) of SiDA were dissolved in 50 g of NMP. I let you. To this, 15.51 g (0.05 mol) of 3,3 ′, 4,4′-diphenyl ether tetracarboxylic anhydride (ODPA) was added together with 21 g of NMP, reacted at 20 ° C. for 1 hour, and then at 50 ° C. for 2 hours. Reacted. Thereafter, a solution obtained by diluting 14.7 g (0.1 mol) of N, N-dimethylformamide diethyl acetal with 15 g of NMP was added dropwise over 10 minutes. After dropping, the mixture was stirred at 40 ° C. for 3 hours. After completion of the reaction, the solution was poured into 2 L of water, and a polymer solid precipitate was collected by filtration. The polymer solid was dried in a vacuum dryer at 80 ° C. for 72 hours to obtain a polyimide precursor polymer C.

Synthesis Example 12 Synthesis of Polymer D Under a dry nitrogen stream, the hydroxyl group-containing diamine compound (d) obtained in Synthesis Example 4 (6.08 g, 0.025 mol), DAE 4.51 g (0.0225 mol), and SiDA 0.62 g (0.0025 mol) was dissolved in 70 g of NMP. 28.57 g (0.040 mol) of hydroxyl group-containing acid anhydride (a) obtained in Synthesis Example 1 and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA). 41 g (0.010 mol) was added at room temperature together with 25 g of NMP, and the mixture was stirred at room temperature for 1 hour and then at 50 ° C. for 2 hours. After completion of the reaction, the solution was poured into 2 L of water, and a polymer solid precipitate was collected by filtration. The polymer solid was dried with a vacuum dryer at 80 ° C. for 72 hours to obtain a polyimide precursor polymer D.

Synthesis Example 13 Synthesis of Polymer E 19.70 g of a dicarboxylic acid derivative obtained by reacting 1 mol of diphenyl ether-4,4′-dicarboxylic acid dichloride (DEDC) with 2 mol of 1-hydroxybenzotriazole in a dry nitrogen stream ( 0.040 mol) and 18.31 g (0.050 mol) of BAHF were dissolved in 200 g of NMP and stirred at 75 ° C. for 12 hours. Next, 2.96 g (0.020 mol) of maleic anhydride dissolved in 30 g of NMP was added as a terminal blocking agent, and the mixture was further stirred at 75 ° C. for 12 hours to complete the reaction. After the completion of the reaction, the solution was put into 3 L of a solution of water / methanol = 3/1, and a polymer solid precipitate was collected by filtration. The polymer solid was dried in a vacuum dryer at 80 ° C. for 20 hours to obtain a polybenzoxazole precursor polymer E.

Example 1
10 g of the polymer A solid obtained in Synthesis Example 9 was weighed, 2 g of the quinonediazide compound (e) obtained in Synthesis Example 5 and Nicalac MX-270 (trade name, manufactured by Sanwa Chemical Co., Ltd.) 1.5 g, N -0.3 g of phenylaminopropyltrimethoxysilane and 1.0 g of TrisP-HAP (trade name, manufactured by Honshu Chemical Industry Co., Ltd.) were dissolved in 30 g of GBL to obtain a varnish of a photosensitive polyimide precursor composition. Using the obtained varnish, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Example 2
10 g of the polymer B solid obtained in Synthesis Example 10 was weighed, 2 g of the quinonediazide compound (f) obtained in Synthesis Example 6 and Nicalac MX-290 (trade name, manufactured by Sanwa Chemical Co., Ltd.) 2.5 g, N -A varnish of a photosensitive polyimide precursor composition was obtained by dissolving 0.3 g of phenylaminopropyltriethoxysilane and 0.2 g of m-acetylaminophenyltrimethoxysilane in 30 g of GBL. Using the obtained varnish, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Example 3
10 g of the polymer C solid obtained in Synthesis Example 11 was weighed, 1.5 g of the quinonediazide compound (g) obtained in Synthesis Example 7 and 2.0 g of HMOM-TPHAP (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), A varnish of a photosensitive polyimide precursor composition was obtained by dissolving 0.3 g of N-phenylaminobutyltrimethoxysilane in 20 g of GBL and 10 g of EL. Using the obtained varnish, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Example 4
10 g of the polymer D solid obtained in Synthesis Example 12 was weighed, 2 g of the quinonediazide compound (h) obtained in Synthesis Example 8 and HMOM-TPPA (trade name, manufactured by Honshu Chemical Industry Co., Ltd.) 1.0 g, N- 0.2 g of phenylaminopropyltrimethoxysilane and 0.1 g of WPAG-567 (trade name, manufactured by Wako Pure Chemical Industries, Ltd.) were dissolved in 30 g of GBL to obtain a varnish of a photosensitive polyimide precursor composition. Using the obtained varnish, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Example 5
10 g of the polymer E solid obtained in Synthesis Example 13 was weighed, 2 g of the quinonediazide compound (e) obtained in Synthesis Example 5 and 1.0 g of Nicalak MX-270 (trade name, manufactured by Sanwa Chemical Co., Ltd.), TrisP -1.5 g of PA (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), 0.2 g of N-phenylaminobutyltrimethoxysilane, 0.1 g of WPAG-350 (trade name, manufactured by Wako Pure Chemical Industries, Ltd.) It was made to melt | dissolve in NMP30g and the varnish of the photosensitive polyimide precursor composition was obtained. Using the obtained varnish, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Example 6
10 g of the polymer A solid obtained in Synthesis Example 9 was weighed, 2.5 g of the quinonediazide compound (h) obtained in Synthesis Example 8 and 3.0 g of TMOM-BP (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), A varnish of a photosensitive polyimide precursor composition was obtained by dissolving 0.3 g of N-phenylaminopropyltriethoxysilane and 1.0 g of TrisP-HAP (trade name, manufactured by Honshu Chemical Industry Co., Ltd.) in 30 g of GBL. Using the obtained varnish, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Example 7
A varnish was obtained in the same manner as in Example 1 except that 0.8 g of Nicalak MX-270 was used, and as described above, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed.

Example 8
A varnish was obtained in the same manner as in Example 3 except that 0.08 g of N-phenylaminobutyltrimethoxysilane was used and 0.3 g of vinyltrimethoxysilane was used. Evaluation of adhesiveness and chemical resistance were performed.

Example 9
A varnish was obtained in the same manner as in Example 5 except that 0.05 g of N-phenylaminobutyltrimethoxysilane was used, and as described above, the evaluation was made on the stability of the impression, the evaluation of the adhesion to the substrate, and the evaluation of chemical resistance. It was.

Comparative Example 1
A varnish was obtained in the same manner as in Example 2 except that Nicarax MX-280 and N-phenylaminopropyltriethoxysilane were not used. As described above, evaluation of sensitivity stability, evaluation of adhesion to the substrate, evaluation of chemical resistance Went.

Comparative Example 2
A varnish was obtained in the same manner as in Example 4 except that 0.2 g of 3,3′-diacetylaminophenyltetramethoxydisiloxane was used instead of 0.2 g of N-phenylaminopropyltrimethoxysilane. Sensitivity stability evaluation, adhesion evaluation with a substrate, and chemical resistance evaluation were performed.

Comparative Example 3
A varnish was obtained in the same manner as in Example 6 except that 0.2 g of 3-aminopropyltriethoxysilane was used instead of 0.2 g of N-phenylaminopropyltriethoxysilane, and the sensitivity stability evaluation was performed as described above. Evaluation of adhesion to the substrate and chemical resistance were performed.

Comparative Example 4
The varnish was prepared in the same manner as in Example 1 except that 0.2 g of 3-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine was used instead of 0.2 g of N-phenylaminopropyltrimethoxysilane. As described above, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed as described above.

Comparative Example 5
A varnish was obtained in the same manner as in Example 1 except that 0.2 g of N-β (aminoethyl) γ-aminopropyltrimethoxysilane was used instead of 0.2 g of N-phenylaminopropyltrimethoxysilane. In addition, the sensitivity stability evaluation, the adhesion evaluation with the substrate, and the chemical resistance evaluation were performed.

Comparative Example 6
100 g of EL was added to 36.6 g (0.1 mol) of 6FAP. Subsequently, 55.6 g (0.2 mol, KBE-403, manufactured by Shin-Etsu Chemical Co., Ltd.) of 3-glycidoxypropyltriethoxysilane was added to this solution, and the mixture was stirred at 50 ° C. for 6 hours to obtain an adhesion improver G. It was. A varnish was obtained in the same manner as in Example 1 except that 0.2 g of adhesion improver G was used instead of 0.2 g of N-phenylaminopropyltrimethoxysilane, and as described above, sensitivity stability evaluation and adhesion to the substrate were performed. Property evaluation and chemical resistance evaluation were performed.

Comparative Example 7
A varnish was obtained in the same manner as in Example 1 except that 0.2 g of m-acetylaminophenyltrimethoxysilane was used instead of 0.2 g of N-phenylaminopropyltrimethoxysilane, and sensitivity stability was evaluated as described above. Evaluation of adhesion to the substrate and evaluation of chemical resistance were performed.

  The compounds having phenolic hydroxyl groups, photoacid generators, and alkoxymethyl group-containing compounds used in the Examples and Comparative Examples are shown below.

The compositions and evaluation results of Examples 1 to 9 and Comparative Examples 1 to 7 are shown in Tables 1 and 2.

Claims (3)

(A) a polymer having a structure represented by general formula (1) as a main component, (b) a quinonediazide compound, (c) an alkoxymethyl group-containing compound, (d) an aminosilane compound represented by general formula (2), and (E) A positive photosensitive resin composition comprising a solvent.

(In the general formula (1), R ¹ and R ² are divalent to octavalent organic groups having 2 or more carbon atoms, R ³ and R ⁴ may be the same or different, and may be hydrogen or 1 to 20 carbon atoms. N is in the range of 10 to 100,000, l and m are integers of 0 to 2, p and q are integers of 0 to 4, provided that p + q> 0.)

(In General Formula (2), R ^{5 to} R ¹² each independently represent hydrogen or an organic group having 1 to 10 carbon atoms. R ^{13 to} R ¹⁵ each independently represent an alkyl group or alkenyl group having 1 to 6 carbon atoms. , A phenyl group, a substituted phenyl group and a group selected from the group consisting of an alkoxyl group having 1 to 6 carbon atoms, wherein at least one is an alkoxyl group having 1 to 6 carbon atoms, i represents an integer of 1 to 10; .) (A) 10 to 50 parts by weight of (c) alkoxymethyl group-containing compound with respect to 100 parts by weight of the polymer having the structure represented by general formula (1) as a main component, and (d) represented by general formula (2) The positive photosensitive resin composition according to claim 1, wherein the aminosilane compound is contained in an amount of 1 to 30 parts by weight. (C) The alkoxymethyl group-containing compound comprises a compound having a group represented by the general formula (3) and / or a compound represented by the general formula (4). Positive photosensitive resin composition.

(In General Formula (3), R ¹⁶ may be the same or different and represents an alkyl group having 1 to 20 carbon atoms.)

(In General Formula (4), R ¹⁷ and R ¹⁸ represent CH ₂ OR ³⁸ (R ³⁸ is an organic group having 1 to 6 carbon atoms) R ¹⁹ represents a hydrogen atom, a methyl group or an ethyl group. ^{20 to} R ³⁷ may be the same or different and each represents a hydrogen atom, an organic group having 1 to 20 carbon atoms, Cl, Br, I or F. j represents an integer of 2 to 4.