JP4925349B2 - Reflow heating method and reflow heating apparatus - Google Patents

Reflow heating method and reflow heating apparatus Download PDF

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JP4925349B2
JP4925349B2 JP2008039513A JP2008039513A JP4925349B2 JP 4925349 B2 JP4925349 B2 JP 4925349B2 JP 2008039513 A JP2008039513 A JP 2008039513A JP 2008039513 A JP2008039513 A JP 2008039513A JP 4925349 B2 JP4925349 B2 JP 4925349B2
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reflow
lanes
heat absorption
transport
mounting
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JP2009200188A (en
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友彦 服部
浩之 粟生
宏 蔦
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Fuji Corp
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Fuji Machine Manufacturing Co Ltd
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本発明は、リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱するリフロー加熱方法及びリフロー加熱装置に関する発明である。   The present invention relates to a reflow heating method and a reflow heating apparatus in which a plurality of transfer lanes are provided in parallel in a reflow furnace, and a mounting substrate is simultaneously transferred in each transfer lane to perform reflow heating.

近年、リフローはんだ付け工程の生産能率を向上させるために、特許文献1(特開平10−163623号公報)に記載されているように、リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱するようにしたものがある。
特開平10−163623号公報
In recent years, in order to improve the production efficiency of the reflow soldering process, as described in Patent Document 1 (Japanese Patent Laid-Open No. 10-163623), a plurality of conveyance lanes are provided in parallel in the reflow furnace, and each conveyance is performed. In some lanes, the mounting substrate is transported simultaneously and reflow heated.
JP 10-163623 A

複数の搬送レーンを並列に設けたリフロー炉は、全ての搬送レーンに実装基板を載せてリフロー加熱したときに、リフロー炉内の温度プロファイルが最適となるように設計されている。しかし、常に、全ての搬送レーンに実装基板を載せてリフロー加熱するとは限らず、多品種少量生産等では、複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せてリフロー加熱する場合があるが、このような場合に、次のような問題が生じる。   The reflow furnace provided with a plurality of transfer lanes in parallel is designed so that the temperature profile in the reflow furnace is optimized when the mounting substrate is placed on all the transfer lanes and reflow heating is performed. However, the reflow heating is not always performed by mounting the mounting boards on all the transport lanes, and the reflow heating is performed by mounting the mounting boards only on a part of the transport lanes in a plurality of transport lanes, etc. In some cases, the following problems arise.

リフロー炉内では、搬送レーンに載せた実装基板が熱を吸収する吸熱源となるため、一部の搬送レーンのみに実装基板を載せた場合は、全ての搬送レーンに実装基板を載せた場合と比較して、リフロー炉内の各実装基板による合計吸熱量が少なくなるだけでなく、リフロー炉内での吸熱源の分布がアンバランスにもなる。このため、図2に示すように、リフロー炉内の温度プロファイルが最適な温度プロファイルからずれてしまい、この温度プロファイルのずれがリフローはんだ付けの品質を低下させる要因となる。   In the reflow furnace, the mounting board placed on the transfer lane serves as a heat absorption source that absorbs heat, so when mounting boards are placed only on some transfer lanes, the mounting boards are placed on all transfer lanes. In comparison, not only the total heat absorption amount by each mounting substrate in the reflow furnace is reduced, but also the distribution of the heat absorption sources in the reflow furnace becomes unbalanced. For this reason, as shown in FIG. 2, the temperature profile in the reflow furnace deviates from the optimum temperature profile, and this temperature profile deviation becomes a factor of degrading the quality of reflow soldering.

本発明はこのような事情を考慮してなされたものであり、従ってその目的は、リフロー炉内に並列に設けた複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せて搬送してリフロー加熱する場合でも、リフロー炉内の温度プロファイルのずれを少なくすることができて、リフローはんだ付けの品質低下を防止できるリフロー加熱方法及びリフロー加熱装置を提供することにある。   The present invention has been made in consideration of such circumstances. Accordingly, the object of the present invention is to carry a mounting board only on a part of the plurality of transportation lanes provided in parallel in the reflow furnace. Thus, even when reflow heating is performed, it is an object to provide a reflow heating method and a reflow heating apparatus that can reduce the deviation of the temperature profile in the reflow furnace and can prevent deterioration in quality of reflow soldering.

上記目的を達成するために、請求項1に係る発明は、リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱する方法において、前記複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せて搬送してリフロー加熱する際に、実装基板を載せない搬送レーンに、前記一部の搬送レーンに載せた実装基板と熱吸収特性(熱容量、熱伝導率等)が類似するダミー被加熱体を載せて搬送するようにしたものである。   In order to achieve the above object, the invention according to claim 1 is the method of providing a plurality of transfer lanes in a reflow furnace in parallel and simultaneously transporting the mounting substrate in each transfer lane and performing reflow heating. Among the lanes, when the mounting board is mounted on only a part of the transport lanes and transported and reflow-heated, the transport lane on which the mounting board is not placed and the mounting board mounted on the part of the transport lanes and heat absorption characteristics A dummy heated body having similar heat capacity, thermal conductivity, etc.) is placed and transported.

この方法では、実装基板を載せない搬送レーンに、実装基板と熱吸収特性(熱容量、熱伝導率等)が類似するダミー被加熱体を載せることで、全ての搬送レーン上に熱吸収特性が類似する吸熱源(実装基板又はダミー被加熱体)を載せることができる。これにより、一部の搬送レーンのみに実装基板を載せてリフロー加熱する場合でも、リフロー炉内の温度プロファイルを全ての搬送レーンに実装基板を載せた場合とほほ同様の温度プロファイルとすることができて、リフロー炉内の温度プロファイルのずれを少なくすることができ、リフローはんだ付けの品質低下を防止することができる。   In this method, by placing a dummy heated body with similar heat absorption characteristics (heat capacity, thermal conductivity, etc.) to the mounting board on the transfer lane where no mounting board is placed, the heat absorption characteristics are similar on all transfer lanes. An endothermic heat source (mounting substrate or dummy heated body) can be placed. As a result, even when the mounting board is mounted on only a part of the transfer lanes and reflow heating is performed, the temperature profile in the reflow furnace can be made to be almost the same as when the mounting board is mounted on all the transfer lanes. The temperature profile deviation in the reflow furnace can be reduced, and the quality of reflow soldering can be prevented from deteriorating.

また、本発明は、請求項2,3のように、リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱するものにおいて、前記各搬送レーンにそれぞれ吸熱量を制御可能な吸熱手段を設置し、前記複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せて搬送してリフロー加熱する際に、実装基板を載せていない搬送レーンの吸熱手段を吸熱動作させると共に、その吸熱量を前記一部の搬送レーンに載せた実装基板の熱吸収特性(熱容量、熱伝導率等)に応じて制御するようにしても良い。   Further, according to the present invention, as in claims 2 and 3, a plurality of transfer lanes are provided in parallel in the reflow furnace, and the mounting substrate is simultaneously transferred in each transfer lane and reflow heated. A heat-absorbing means that can control the amount of heat absorbed respectively, and when carrying the reflow heating by mounting the mounting board only on a part of the plurality of transport lanes and carrying the reflow heating, the transport lane that does not carry the mounting board The heat absorption means may be operated to absorb heat, and the amount of heat absorbed may be controlled in accordance with the heat absorption characteristics (heat capacity, thermal conductivity, etc.) of the mounting board mounted on the part of the transfer lanes.

このように、実装基板を載せていない搬送レーンの吸熱手段を吸熱動作させると共に、その吸熱量を実装基板の熱吸収特性(熱容量、熱伝導率等)に応じて制御するようにすれば、実装基板を載せていない搬送レーンでも、実装基板を載せた搬送レーンと同様の吸熱量を吸熱手段によって確保することができる。これにより、一部の搬送レーンのみに実装基板を載せてリフロー加熱する場合でも、吸熱手段によってリフロー炉内の温度プロファイルを全ての搬送レーンに実装基板を載せた場合とほほ同様の温度プロファイルとすることができて、リフロー炉内の温度プロファイルのずれを少なくすることができ、リフローはんだ付けの品質低下を防止することができる。しかも、ダミー被加熱体を準備したり、ダミー被加熱体を搬送レーンに載せる作業を行う必要がないため、生産性を低下させずに済む利点がある。   In this way, if the heat absorption means of the transfer lane on which the mounting board is not mounted is operated to absorb heat, and the amount of heat absorption is controlled according to the heat absorption characteristics (heat capacity, thermal conductivity, etc.) of the mounting board, Even in the transfer lane on which the substrate is not placed, the same heat absorption amount as that of the transfer lane on which the mounting substrate is placed can be secured by the heat absorption means. As a result, even if the mounting board is mounted on only some transfer lanes and reflow heating is performed, the temperature profile in the reflow furnace should be almost the same as that when the mounting board is mounted on all transfer lanes by the heat absorption means. Therefore, the deviation of the temperature profile in the reflow furnace can be reduced, and the deterioration of the quality of reflow soldering can be prevented. In addition, there is no need to prepare a dummy heated body or to perform an operation of placing the dummy heated body on the transfer lane, so that there is an advantage that productivity is not lowered.

以下、本発明を実施するための最良の形態を具体化した2つの実施例1,2を説明する。   Hereinafter, two Examples 1 and 2, which embody the best mode for carrying out the present invention, will be described.

本発明の実施例1を図1及び図2に基づいて説明する。
まず、図1に基づいてリフロー加熱装置の構成を説明する。
リフロー炉11内には、実装基板12を搬送する2台の搬送レーン13が並列に設けらている(3台以上の搬送レーン13を並列に設けても良い)。リフロー炉11内には、各搬送レーン13の上方部等に、実装基板12を加熱する遠赤外線ヒータ等の加熱手段16が設けられている。
A first embodiment of the present invention will be described with reference to FIGS.
First, the configuration of the reflow heating device will be described with reference to FIG.
In the reflow furnace 11, two transfer lanes 13 for transferring the mounting substrate 12 are provided in parallel (three or more transfer lanes 13 may be provided in parallel). In the reflow furnace 11, heating means 16 such as a far-infrared heater for heating the mounting substrate 12 is provided in an upper portion of each transfer lane 13.

リフロー炉11内の2台の搬送レーン13のうち、片方の搬送レーン13(L)のみに実装基板12を載せて搬送してリフロー加熱する場合は、実装基板12を載せない搬送レーン13(R)に、上記片方の搬送レーン13(L)に載せた実装基板12と熱吸収特性(熱容量、熱伝導率等)が類似するダミー被加熱体14を載せて搬送する。このダミー被加熱体14は、実装基板12と同等の材料で形成されたものを用いても良いし、実装基板12とは異なる材料で形成されたものを用いても良く、また、ダミー被加熱体14の形状も、実装基板12とほぼ同じ形状であっても良いし、異なる形状であっても良い。要は、リフロー炉11内でダミー被加熱体14が吸収する熱量が実装基板12が吸収する熱量とほぼ同じになるように形成すれば良い。   Of the two transfer lanes 13 in the reflow furnace 11, when the mounting substrate 12 is mounted and transferred only on one transfer lane 13 (L) and reflow heating is performed, the transfer lane 13 (R ) And a dummy heated body 14 having similar heat absorption characteristics (heat capacity, thermal conductivity, etc.) to the mounting substrate 12 mounted on the one transfer lane 13 (L). The dummy heated body 14 may be formed of a material equivalent to that of the mounting substrate 12, may be formed of a material different from that of the mounting substrate 12, and the dummy heated body may be used. The shape of the body 14 may be substantially the same shape as the mounting substrate 12 or may be a different shape. In short, what is necessary is just to form so that the heat amount which the dummy to-be-heated body 14 absorbs in the reflow furnace 11 becomes substantially the same as the heat amount which the mounting substrate 12 absorbs.

また、一方の搬送レーン13(L)のみに実装基板12を載せ、他方の搬送レーン13(R)にダミー被加熱体14を載せる場合は、実装基板12の数と同じ数のダミー被加熱体14を他方の搬送レーン13(R)に載せても良いし、実装基板12の数とダミー被加熱体14の数が異なっても良い。   Further, when the mounting substrate 12 is placed only on one transport lane 13 (L) and the dummy heated bodies 14 are placed on the other transport lane 13 (R), the same number of dummy heated bodies as the number of the mounting substrates 12 is provided. 14 may be placed on the other transport lane 13 (R), or the number of mounting boards 12 and the number of dummy heated bodies 14 may be different.

実装基板12の数と同じ数のダミー被加熱体14を他方の搬送レーン13(R)に載せる場合は、リフロー炉11内での各ダミー被加熱体14の吸熱量が各実装基板12の吸熱量とほぼ同一となるように形成すると共に、各ダミー被加熱体14の搬送間隔を各実装基板12の搬送間隔と同じにすれば良い。   When the same number of dummy heated bodies 14 as the number of mounting boards 12 are placed on the other transport lane 13 (R), the amount of heat absorbed by each dummy heated body 14 in the reflow furnace 11 is absorbed by each mounting board 12. What is necessary is just to make it the same as the conveyance space | interval of each mounting substrate 12, while forming so that it may become substantially the same as calorie | heat amount, and the conveyance space | interval of each dummy to-be-heated body 14.

実装基板12の数とダミー被加熱体14の数が異なっている場合は、リフロー炉11内での全ダミー被加熱体14の合計吸熱量がリフロー炉11内での全実装基板12の合計吸熱量とほぼ同一となるように(又は両者の合計吸熱量の差が小さくなるように)、ダミー被加熱体14の数を設定すると共に、リフロー炉11内でのダミー被加熱体14の数が少ないほどダミー被加熱体14の搬送間隔を長くするように設定すれば良い。   When the number of mounting substrates 12 and the number of dummy heated bodies 14 are different, the total heat absorption amount of all dummy heated bodies 14 in the reflow furnace 11 is the total absorption amount of all mounted substrates 12 in the reflow furnace 11. The number of dummy heated bodies 14 is set so as to be substantially the same as the amount of heat (or the difference between the total endothermic amounts of the two is reduced), and the number of dummy heated bodies 14 in the reflow furnace 11 is What is necessary is just to set so that the conveyance space | interval of the dummy to-be-heated body 14 may become long, so that there are few.

リフロー炉11を設置する基台17内には、各搬送レーン13で搬送したダミー被加熱体14をリフロー炉11の出口側から入口側に返送するための返送コンベア15が設けられている。この基台17内の返送コンベア15がリフロー炉11内の加熱手段16で加熱されないように基台17とリフロー炉11との間が断熱壁で仕切られ、返送コンベア15でダミー被加熱体14を返送する際に該ダミー被加熱体14を放熱させて温度低下させるようになっている。尚、基台17内にダミー被加熱体14を強制冷却するための冷却ファン等の強制冷却手段を設けても良い。   In the base 17 on which the reflow furnace 11 is installed, a return conveyor 15 for returning the dummy heated body 14 transported in each transport lane 13 from the outlet side to the inlet side of the reflow furnace 11 is provided. The base 17 and the reflow furnace 11 are partitioned by a heat insulating wall so that the return conveyor 15 in the base 17 is not heated by the heating means 16 in the reflow furnace 11, and the dummy heated body 14 is separated by the return conveyor 15. When returning, the dummy heated body 14 is radiated to reduce the temperature. A forced cooling means such as a cooling fan for forcibly cooling the dummy heated body 14 may be provided in the base 17.

このリフロー炉11は、全ての搬送レーン13に実装基板12を載せてリフロー加熱したときに、リフロー炉11内の温度プロファイル(図2参照)が最適となるように加熱手段16の発熱量や配置場所が設定されている。従って、全ての搬送レーン13に実装基板12を載せてリフロー加熱する場合は、ダミー被加熱体14を使用せずに、実装基板12をリフロー加熱すれば良い。   In this reflow furnace 11, when the mounting substrate 12 is placed on all the transfer lanes 13 and reflow heated, the amount of heat generated and the arrangement of the heating means 16 are optimized so that the temperature profile in the reflow furnace 11 (see FIG. 2) is optimal. The location is set. Therefore, when the mounting substrate 12 is placed on all the transfer lanes 13 and reflow-heated, the mounting substrate 12 may be reflow-heated without using the dummy heated body 14.

リフロー炉11内では、搬送レーン13に載せた実装基板12が熱を吸収する吸熱源となるため、片方の搬送レーン13(L)のみに実装基板12を載せた場合は、両方の搬送レーン13(L,R)に実装基板12を載せた場合と比較して、リフロー炉11内の各実装基板12による合計吸熱量が少なくなるだけでなく、リフロー炉11内での吸熱源の分布がアンバランスにもなる。このため、ダミー被加熱体14を使用しない場合は、図2に示すように、リフロー炉11内の温度プロファイルが最適な温度プロファイルからずれてしまい、この温度プロファイルのずれがリフローはんだ付けの品質を低下させる要因となる。   In the reflow furnace 11, the mounting substrate 12 placed on the transport lane 13 serves as an endothermic source that absorbs heat. Therefore, when the mounting substrate 12 is placed only on one transport lane 13 (L), both transport lanes 13 Compared with the case where the mounting substrate 12 is placed on (L, R), not only the total heat absorption amount by each mounting substrate 12 in the reflow furnace 11 is reduced, but also the distribution of the heat absorption source in the reflow furnace 11 is unbalanced. It also becomes a balance. For this reason, when the dummy heated body 14 is not used, as shown in FIG. 2, the temperature profile in the reflow furnace 11 deviates from the optimum temperature profile, and this temperature profile deviation improves the quality of reflow soldering. It becomes a factor to reduce.

そこで、本実施例1では、片方の搬送レーン13(L)のみに実装基板12を載せてリフロー加熱する場合は、実装基板12を載せない搬送レーン13(R)にダミー被加熱体14を載せて搬送する。この際、リフロー炉11内での全ダミー被加熱体14の合計吸熱量がリフロー炉11内での全実装基板12の合計吸熱量とほぼ同一となるように(又は両者の合計吸熱量の差が小さくなるように)、ダミー被加熱体14の使用数を算出して、その使用数に応じた搬送間隔でダミー被加熱体14を搬送する。   Therefore, in the first embodiment, when the mounting substrate 12 is mounted on only one transfer lane 13 (L) and reflow heating is performed, the dummy heated body 14 is mounted on the transfer lane 13 (R) where the mounting substrate 12 is not mounted. Transport. At this time, the total heat absorption amount of all the dummy heated bodies 14 in the reflow furnace 11 is substantially the same as the total heat absorption amount of all the mounting boards 12 in the reflow furnace 11 (or a difference between the total heat absorption amounts of both). The number of used dummy heated bodies 14 is calculated so that the dummy heated body 14 is conveyed at a conveyance interval corresponding to the number of used.

このようにすれば、片方の搬送レーン13(L)のみに実装基板12を載せてリフロー加熱する場合でも、リフロー炉11内の温度プロファイルを両方の搬送レーン13(L,R)に実装基板12を載せた場合とほほ同様の温度プロファイルとすることができて、リフロー炉11内の温度プロファイルのずれを少なくすることができ、リフローはんだ付けの品質低下を防止することができる。   In this way, even when the mounting substrate 12 is mounted only on one transfer lane 13 (L) and reflow heating is performed, the temperature profile in the reflow furnace 11 is transferred to both transfer lanes 13 (L, R). Therefore, the temperature profile in the reflow furnace 11 can be reduced, and the quality of reflow soldering can be prevented from deteriorating.

次に、図3を用いて本発明の実施例2を説明する。但し、上記実施例1と実質的に同じ部分は同じ符号を付して説明を簡略化し、主として異なる部分を説明する。
本実施例2においても、リフロー炉11内には、2台(又は3台以上)の搬送レーン13が並列に設けらている。本実施例2では、ダミー被加熱体14を使用しないため、基台17内には、返送コンベア15が設けられていない。
Next, Embodiment 2 of the present invention will be described with reference to FIG. However, substantially the same parts as those in the first embodiment are given the same reference numerals to simplify the description, and mainly different parts will be described.
Also in the second embodiment, two (or three or more) transport lanes 13 are provided in parallel in the reflow furnace 11. In the second embodiment, since the dummy heated body 14 is not used, the return conveyor 15 is not provided in the base 17.

本実施例2では、各搬送レーン13に、それぞれ吸熱量を電気的に制御可能な吸熱手段18が設置されている。この吸熱手段18は、例えばペルチェ素子を用い、その吸熱面側を上向きとして加熱手段16側に露出させ、発熱面側を下向きにした状態で設置されている。各搬送レーン13の吸熱手段18は、実装基板12の搬送・加熱を妨げない位置に各搬送レーン13の入口側から出口側までの搬送区間をほぼ均等に吸熱できるように配置されている。各吸熱手段18の発熱面側(下面側)にヒートパイプ等の熱輸送手段(図示せず)を設けて、各吸熱手段18からの放熱をリフロー炉11内の上部に輸送してリフロー加熱の熱源の一部として再利用するようにしても良い。或は、各吸熱手段18の発熱面側(下面側)にヒートシンク等の放熱手段(図示せず)を設けて、当該放熱手段からリフロー炉11の外部に放熱させるようにしても良い。   In the second embodiment, the heat absorption means 18 capable of electrically controlling the amount of heat absorption is installed in each conveyance lane 13. The heat absorbing means 18 is installed, for example, using a Peltier element, with the heat absorbing surface side facing upward, exposed to the heating means 16 side, and the heat generating surface side facing downward. The heat absorption means 18 of each conveyance lane 13 is disposed at a position that does not hinder the conveyance / heating of the mounting substrate 12 so that the conveyance section from the inlet side to the outlet side of each conveyance lane 13 can absorb heat almost uniformly. A heat transporting means (not shown) such as a heat pipe is provided on the heat generating surface side (lower surface side) of each heat absorbing means 18, and the heat radiation from each heat absorbing means 18 is transported to the upper part in the reflow furnace 11 for reflow heating. It may be reused as part of the heat source. Alternatively, a heat radiating means (not shown) such as a heat sink may be provided on the heat generating surface side (lower surface side) of each heat absorbing means 18 so that the heat is radiated from the heat radiating means to the outside of the reflow furnace 11.

各搬送レーン13毎に吸熱手段18の印加電圧又は電流をコントローラ(制御手段)で制御することで、各搬送レーン13毎に吸熱手段18の吸熱量を独立して制御できるようになっている。   By controlling the applied voltage or current of the heat absorption means 18 for each transport lane 13 with a controller (control means), the heat absorption amount of the heat absorption means 18 can be controlled independently for each transport lane 13.

全ての搬送レーン13に実装基板12を載せてリフロー加熱する場合は、全ての搬送レーン13の吸熱手段18への通電を全て停止(OFF)して、全ての搬送レーン13の吸熱手段18が吸熱動作しないようにする。   When mounting the mounting substrate 12 on all the conveyance lanes 13 and performing reflow heating, the energization to the heat absorption means 18 of all the conveyance lanes 13 is stopped (OFF), and the heat absorption means 18 of all the conveyance lanes 13 absorb the heat. Do not work.

これに対して、一部の搬送レーン13(L)のみに実装基板12を載せてリフロー加熱する場合は、実装基板12を載せない搬送レーン13(R)のみ、吸熱手段18に通電して吸熱動作させると共に、該吸熱手段18の吸熱量(印加電圧又は電流)をコントローラ(制御手段)で実装基板12の熱吸収特性に応じて制御する。具体的には、実装基板12を載せない搬送レーン13(R)の吸熱手段18の合計吸熱量がリフロー炉11内での全実装基板12の合計吸熱量とほぼ同一となるように(又は両者の合計吸熱量の差が小さくなるように)、該吸熱手段18の吸熱量(印加電圧又は電流)を制御する。   On the other hand, when the mounting substrate 12 is mounted only on a part of the transfer lanes 13 (L) and reflow heating is performed, only the transfer lane 13 (R) on which the mounting substrate 12 is not mounted is energized to the heat absorption means 18 to absorb heat. While operating, the heat absorption amount (applied voltage or current) of the heat absorption means 18 is controlled by the controller (control means) according to the heat absorption characteristics of the mounting board 12. Specifically, the total heat absorption amount of the heat absorption means 18 in the transfer lane 13 (R) on which the mounting substrate 12 is not placed is substantially the same as the total heat absorption amount of all the mounting substrates 12 in the reflow furnace 11 (or both). The endothermic amount (applied voltage or current) of the endothermic means 18 is controlled so that the difference between the total endothermic amounts becomes smaller.

このようにすれば、一方の搬送レーン13(L)のみに実装基板12を載せてリフロー加熱する場合でも、他方の搬送レーン13(R)の吸熱手段18の吸熱動作によってリフロー炉11内の温度プロファイルを両方の搬送レーン13(L,R)に実装基板12を載せた場合とほほ同様の温度プロファイルとすることができて、リフロー炉11内の温度プロファイルのずれを少なくすることができ、リフローはんだ付けの品質低下を防止することができる。   In this way, even when the mounting substrate 12 is mounted only on one transfer lane 13 (L) and reflow heating is performed, the temperature in the reflow furnace 11 is increased by the heat absorption operation of the heat absorption means 18 in the other transfer lane 13 (R). The profile can be a temperature profile almost the same as when the mounting substrate 12 is placed on both the transfer lanes 13 (L, R), the temperature profile shift in the reflow furnace 11 can be reduced, and the reflow soldering can be performed. It is possible to prevent deterioration of the attachment quality.

本発明の実施例1のリフロー炉の構成を概略的に示す縦断面図である。It is a longitudinal cross-sectional view which shows schematically the structure of the reflow furnace of Example 1 of this invention. リフロー炉内の温度プロファイルの一例を説明する図である。It is a figure explaining an example of the temperature profile in a reflow furnace. 本発明の実施例2のリフロー炉の構成を概略的に示す縦断面図である。It is a longitudinal cross-sectional view which shows schematically the structure of the reflow furnace of Example 2 of this invention.

符号の説明Explanation of symbols

11…リフロー炉、12…実装基板、13…搬送レーン、14…ダミー被加熱体、15…返送コンベア、16…加熱手段、17…基台、18…吸熱手段   DESCRIPTION OF SYMBOLS 11 ... Reflow furnace, 12 ... Mounting board, 13 ... Conveyance lane, 14 ... Dummy heated body, 15 ... Return conveyor, 16 ... Heating means, 17 ... Base, 18 ... Endothermic means

Claims (3)

リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱する方法において、
前記複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せて搬送してリフロー加熱する際に、実装基板を載せない搬送レーンに、前記一部の搬送レーンに載せた実装基板と熱吸収特性が類似するダミー被加熱体を載せて搬送することを特徴とするリフロー加熱方法。
In the method of providing a plurality of transport lanes in parallel in the reflow furnace and reflow heating by transporting the mounting substrate simultaneously in each transport lane,
Among the plurality of transfer lanes, when mounting and mounting the mounting substrate only on a part of the transport lanes and performing reflow heating, the mounting substrate mounted on the part of the transport lanes on the transport lane not mounting the mounting substrate and A reflow heating method comprising carrying a dummy object to be heated having similar heat absorption characteristics.
リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱する方法において、
前記各搬送レーンにそれぞれ吸熱量を制御可能な吸熱手段を設置し、
前記複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せて搬送してリフロー加熱する際に、実装基板を載せていない搬送レーンの吸熱手段を吸熱動作させると共に、その吸熱量を前記一部の搬送レーンに載せた実装基板の熱吸収特性に応じて制御することを特徴とするリフロー加熱方法。
In the method of providing a plurality of transport lanes in parallel in the reflow furnace and reflow heating by transporting the mounting substrate simultaneously in each transport lane,
Install heat absorption means capable of controlling the amount of heat absorption in each of the transport lanes,
Among the plurality of transport lanes, when the mounting board is mounted on only a part of the transport lanes and transported and reflow-heated, the heat absorbing means of the transport lane on which the mounting board is not mounted is endothermic, and the heat absorption amount is A reflow heating method, wherein control is performed according to a heat absorption characteristic of a mounting substrate placed on the partial transfer lane.
リフロー炉内に複数の搬送レーンを並列に設け、各搬送レーンで実装基板を同時に搬送してリフロー加熱するリフロー加熱装置において、
前記各搬送レーンにそれぞれ設置され、吸熱量を制御可能な吸熱手段と、
前記各搬送レーンの吸熱手段の吸熱量を制御する制御手段とを備え、
前記制御手段は、前記複数の搬送レーンのうち、一部の搬送レーンのみに実装基板を載せて搬送してリフロー加熱する際に、実装基板を載せていない搬送レーンの吸熱手段を吸熱動作させると共に、その吸熱量を前記一部の搬送レーンに載せた実装基板の熱吸収特性に応じて制御することを特徴とするリフロー加熱装置。
In a reflow heating apparatus for providing a plurality of transfer lanes in parallel in a reflow furnace and simultaneously transferring a mounting substrate in each transfer lane and reflow heating,
Endothermic means installed in each of the transport lanes and capable of controlling the amount of heat absorption;
Control means for controlling the heat absorption amount of the heat absorption means of each of the transport lanes,
The control means, when the mounting board is mounted on only a part of the plurality of transport lanes and transported for reflow heating, the heat absorbing means of the transport lane on which the mounting board is not mounted is operated to absorb heat. The reflow heating apparatus is characterized in that the heat absorption amount is controlled in accordance with the heat absorption characteristics of the mounting board mounted on the part of the transfer lanes.
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