JP2013004789A - Reflow device - Google Patents

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JP2013004789A
JP2013004789A JP2011135197A JP2011135197A JP2013004789A JP 2013004789 A JP2013004789 A JP 2013004789A JP 2011135197 A JP2011135197 A JP 2011135197A JP 2011135197 A JP2011135197 A JP 2011135197A JP 2013004789 A JP2013004789 A JP 2013004789A
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wiring board
local heating
substrate
temperature
heating unit
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Takashi Fujita
貴志 藤田
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a reflow device in which nonuniformity of temperature distribution can be reduced without increasing the tact time, by additionally providing a structure of reducing the nonuniformity of temperature distribution on the surface of a substrate by performing local heating and cooling.SOLUTION: The reflow device having a plurality of heating zones where a printed-wiring board is heated while being conveyed comprises a conveyor which conveys the printed-wiring board, a plurality of local heating units provided, respectively, for the heating zones in order to heat a part of the printed-wiring board locally, and a heated object passage detection sensor which detects passage of the printed-wiring board. The local heating units can be driven individually so that contact and noncontact with the printed-wiring board can be controlled, and the temperature of the local heating units can be controlled individually.

Description

本発明は、プリント配線板(以降、基板と略す)への電子部品実装に使用されるリフロー装置に関する。更には、基板をリフロー装置で加熱するにあたり、基板面内の温度分布の不均一性を低減する機構を持ったリフロー装置に関する。   The present invention relates to a reflow apparatus used for mounting electronic components on a printed wiring board (hereinafter abbreviated as a board). Furthermore, the present invention relates to a reflow apparatus having a mechanism for reducing non-uniformity of temperature distribution in the substrate surface when the substrate is heated by the reflow apparatus.

近年、コストの削減を目的としての多面付けや大型の製品の登場から、基板の製造プロセスで使用される基板サイズは大型化している。   In recent years, the size of a substrate used in a substrate manufacturing process has been increased due to multiple impositions for the purpose of cost reduction and the appearance of large products.

従来のリフロー装置は、複数のエリアに分かれた加熱ゾーンを持った構造をしており、各ゾーンはそれぞれ設定された温度で加熱されている。被加熱物である基板は、任意の温度プロファイル(基板が経験する温度と時間)で加熱される。複数のエリアに分かれた加熱ゾーンは異なった温度に設定される場合があるため、その場合は隣り合ったゾーンの境目を基板が通過する際に、各加熱ゾーン間の温度の差から、基板の加熱は、加熱ゾーン内の雰囲気による加熱に加え、基板の温度の高いゾーン側から温度の低い加熱ゾーン側への伝熱によって行なわれる。そのため、基板の搬送方向に対して先頭と末尾の基板の温まり方に差が生じ、同一基板面内でも温度プロファイルが異なる。各加熱ゾーンのサイズに対して小さいサイズの基板ではあまり問題とならないが、2つ以上の加熱ゾーンに亘るようなサイズの大型基板では、同一基板の部分によって温度プロファイルに差が生じる。この温度プロファイルの差によって、温度の低い部分では局所的なはんだの未溶融が起こり、逆に温度の高い部分では基板の熱的ダメージが大きくなると言った問題が発生する。   A conventional reflow apparatus has a structure having heating zones divided into a plurality of areas, and each zone is heated at a set temperature. The substrate to be heated is heated at an arbitrary temperature profile (temperature and time experienced by the substrate). Since the heating zones divided into multiple areas may be set to different temperatures, in that case, when the substrate passes through the boundary between adjacent zones, the temperature difference between the heating zones causes Heating is performed by heat transfer from the high temperature zone side of the substrate to the low temperature heating zone side in addition to heating by the atmosphere in the heating zone. For this reason, there is a difference in the warming of the first and last substrates with respect to the substrate transport direction, and the temperature profiles are different even within the same substrate surface. A substrate having a small size with respect to the size of each heating zone is not a problem, but a large substrate having a size extending over two or more heating zones causes a difference in temperature profile depending on the portion of the same substrate. Due to this difference in temperature profile, local unmelting of the solder occurs in the low temperature portion, and conversely, the thermal damage of the substrate increases in the high temperature portion.

この問題に対し、特許文献1では、基板に局部的に、加熱ゾーン内の雰囲気とは異なる温度のガスを吹き付け、ガスを吹き付けた基板の部分とその周辺の温度を調整する機構を備えている。しかし、温度が異なるガスを基板に吹き付けると加熱ゾーン内の雰囲気の温度が変化してしまい、設定の温度に戻るまでは次の基板を流すことが出来ず、タクトタイムが大幅に増加する、と言う問題が残る。   In order to solve this problem, Patent Document 1 includes a mechanism for locally blowing a gas having a temperature different from the atmosphere in the heating zone to the substrate and adjusting the temperature of the portion of the substrate on which the gas is blown and the surrounding temperature. . However, if a gas with a different temperature is blown onto the substrate, the temperature of the atmosphere in the heating zone changes, and the next substrate cannot be flowed until it returns to the set temperature, greatly increasing the tact time. The problem remains.

特願2001−567023号公報Japanese Patent Application No. 2001-567023

本発明は上記問題に鑑みてなされたものであり、局部的に加熱および冷却を行い、基板表面の温度分布の不均一性を低減する構造を追加することで、タクトタイムを増加させることなく、温度分布の不均一性を低減できるリフロー装置を提供することを課題としている。   The present invention has been made in view of the above problems, and by locally heating and cooling, by adding a structure that reduces the non-uniformity of the temperature distribution on the substrate surface, without increasing the tact time, An object of the present invention is to provide a reflow apparatus capable of reducing non-uniformity of temperature distribution.

上記課題を解決するための手段として、本発明の請求項1は、プリント配線板を搬送しながら加熱する複数の加熱ゾーンを持ったリフロー装置であって、
少なくとも、前記プリント配線板を搬送するコンベアと、前記プリント配線板の一部分を局部的に加熱する局部加熱ユニットであって、前記加熱ゾーンごとに設けた複数の局部加熱ユニットと、前記プリント配線板が通過したことを検知する被加熱物通過検知センサと、を備えており、
前記局部加熱ユニットは、前記プリント配線板への接触および非接触が制御可能に個々に
駆動でき、且つ、個々に温度制御が可能であることを特徴とするリフロー装置である。
As means for solving the above-mentioned problems, claim 1 of the present invention is a reflow apparatus having a plurality of heating zones for heating while conveying a printed wiring board,
At least a conveyor that conveys the printed wiring board, a local heating unit that locally heats a portion of the printed wiring board, a plurality of local heating units provided for each heating zone, and the printed wiring board A heated object passage detection sensor for detecting that the vehicle has passed,
The local heating unit is a reflow apparatus characterized in that contact and non-contact with the printed wiring board can be controlled individually and can be controlled individually.

また、請求項2に記載の発明は、局部加熱ユニットのプリント配線板への接触および非接触の制御が、被加熱物通過検知センサからの信号に従って行われることを特徴とする請求項1に記載のリフロー装置である。   The invention according to claim 2 is characterized in that control of contact and non-contact of the local heating unit to the printed wiring board is performed according to a signal from the heated object passage detection sensor. This is a reflow apparatus.

また、請求項3に記載の発明は、局部加熱ユニットが棒状体であって、棒状体の断面で被加熱物に接触することを特徴とする請求項1または2に記載のリフロー装置である。   The invention according to claim 3 is the reflow apparatus according to claim 1 or 2, wherein the local heating unit is a rod-shaped body, and is in contact with an object to be heated in a cross section of the rod-shaped body.

本発明によるリフロー装置は、温度補償する構造を追加することで、タクトタイムを大幅に増加させることなく、平面基板面内の温度リフロープロファイルムラを低減することができる。   The reflow apparatus according to the present invention can reduce the temperature reflow profile unevenness in the plane substrate surface without significantly increasing the tact time by adding a temperature compensation structure.

従来のリフロー装置の基本構成の一例を示す概略図Schematic showing an example of the basic configuration of a conventional reflow device 本発明のリフロー装置の基本構成の一例を示す概略図Schematic showing an example of the basic configuration of the reflow apparatus of the present invention 本発明の棒状局部加熱ユニットが動作し、被加熱物と接触している一例を示す概略図Schematic showing an example in which the rod-shaped local heating unit of the present invention operates and is in contact with an object to be heated 本発明の棒状局部加熱ユニットの断面の一例を示す概略図Schematic which shows an example of the cross section of the rod-shaped local heating unit of this invention.

以下、図面を参照して本発明の実施の形態を説明する。図1〜4は本発明の一形態に係り、図1は従来のリフロー装置の基本構成の一例を示す概略図、図2は本発明のリフロー装置の基本構成の一例を示す概略図、図3は本発明のリフロー装置が動作している一例であり、本発明の棒状局部加熱ユニットが動作し、被加熱物と接触している一例を示す概略図である。図4は本発明の棒状局部加熱ユニットの断面の一例を示す概略図である。   Embodiments of the present invention will be described below with reference to the drawings. 1 to 4 relate to an embodiment of the present invention, FIG. 1 is a schematic diagram illustrating an example of the basic configuration of a conventional reflow apparatus, FIG. 2 is a schematic diagram illustrating an example of the basic configuration of the reflow apparatus of the present invention, and FIG. These are examples in which the reflow device of the present invention is operating, and are schematic views showing an example in which the bar-shaped local heating unit of the present invention operates and is in contact with an object to be heated. FIG. 4 is a schematic view showing an example of a cross section of the rod-shaped local heating unit of the present invention.

図1は、従来のリフロー装置の一例を示すものである。図1において、1はヒーター、2は冷却ファン、3は基板搬送用コンベア、4は小型基板である。図2は本発明におけるリフロー装置の一例を示すものであり、5は局部加熱ユニット、6は被加熱物通過検知センサである。図3は本発明の局部加熱ユニット5が大型基板7を加熱している一例を示したものである。   FIG. 1 shows an example of a conventional reflow apparatus. In FIG. 1, 1 is a heater, 2 is a cooling fan, 3 is a conveyor for conveying a substrate, and 4 is a small substrate. FIG. 2 shows an example of the reflow apparatus according to the present invention, in which 5 is a local heating unit and 6 is a heated object passage detection sensor. FIG. 3 shows an example in which the local heating unit 5 of the present invention is heating the large substrate 7.

図4は、本発明の棒状局部加熱ユニット5の一例であり、被加熱物と接触する面を見たものである。本発明の局部加熱ユニット5は、複数の棒状のものから構成され、この棒状ものが基板に接触することで基板温度を調整する。局部加熱ユニット5は、リフロー装置のヒーター1からの気流を妨げない構造となっていることが必要であり、局部加熱ユニットの形態は、これに限らず、例えばヒーター1からの気流が流れ込むための格子状開口を持った形状でも良い。   FIG. 4 is an example of the rod-shaped local heating unit 5 of the present invention, and is a view of a surface that comes into contact with an object to be heated. The local heating unit 5 of the present invention is composed of a plurality of rod-shaped members, and these rod-shaped members come into contact with the substrate to adjust the substrate temperature. The local heating unit 5 needs to have a structure that does not hinder the airflow from the heater 1 of the reflow device. The form of the local heating unit is not limited to this, and for example, the airflow from the heater 1 flows in. A shape having a grid-like opening may be used.

以上のように構成されたリフロー装置の動作について、以下にその動作について説明する。
半導体素子が実装された基板4は、図2の入口(図1に示した入口と同じ位置にある。)より基板搬送用コンベア3によって、リフロー装置内を搬送される。ヒーター1により小型基板4は上下から加熱され、任意の温度プロファイルによりフラックスの活性、金属表面の酸化膜除去、はんだ金属の溶融による半導体素子と基板のはんだ金属を介した接合、冷却の後に継手部の形成を行なう。
The operation of the reflow apparatus configured as described above will be described below.
The substrate 4 on which the semiconductor element is mounted is transported in the reflow apparatus by the substrate transporting conveyor 3 from the entrance of FIG. 2 (at the same position as the entrance shown in FIG. 1). The small substrate 4 is heated from above and below by the heater 1 and the joint portion after the flux activity, the removal of the oxide film on the metal surface, the joining of the semiconductor element and the substrate through the solder metal by melting the solder metal, and the cooling by an arbitrary temperature profile Is formed.

本発明の実施形態の1つとして、図3の入口から基板搬送用コンベア3によってリフロ
ー装置内を搬送された大型基板7が、被加熱物通過検知センサ6の下を通過すると、搬送速度に応じて局部加熱ユニット5が上昇し大型基板7と接触、局部加熱もしくは冷却を行なうことができる。この局部加熱ユニット5は、1つ1つの温度設定をすることができるようになっている。リフロー装置で処理する基板4のサイズやその他の仕様の違いによって処理される基板4の温度プロファイルの不均一性を小さくするように、局部加熱ユニット5の個々の温度設定を行う。
As one embodiment of the present invention, when a large substrate 7 conveyed through the reflow apparatus by the substrate conveying conveyor 3 from the entrance of FIG. 3 passes under the heated object passage detection sensor 6, it corresponds to the conveying speed. As a result, the local heating unit 5 rises and can be brought into contact with the large-sized substrate 7, and local heating or cooling can be performed. The local heating unit 5 can set the temperature one by one. The individual temperature setting of the local heating unit 5 is performed so as to reduce the non-uniformity of the temperature profile of the substrate 4 to be processed depending on the size of the substrate 4 processed by the reflow apparatus and other specifications.

具体的な温度条件としては、フラックスの活性化を行うプリヒートを行う加熱ゾーンは150℃〜170℃、30秒間〜120秒間の加熱処理を行う。その次のはんだ付けを行う加熱ゾーンは、250℃〜255℃、10秒間〜20秒間の加熱処理を行う。   As a specific temperature condition, the heating zone for preheating for activating the flux performs heat treatment at 150 to 170 ° C. for 30 to 120 seconds. The heating zone in which the next soldering is performed performs heat treatment at 250 ° C. to 255 ° C. for 10 seconds to 20 seconds.

この時に、処理する基板サイズがはんだ付けを行う加熱ゾーンより長いために、前段のプリヒートを行う加熱ゾーンにはみ出してしまう場合は、そのはみ出した基板4の部分は温度が低くなってしまうため、局部加熱ユニット5を基板4に接触させて加熱する。また、はみ出していない場合にも、1つの加熱ゾーンの中で基板4の温度に不均一性がある場合は、設定温度に近づけるために、同様に、局部加熱ユニット5を基板4に接触させて、加熱または冷却を行う。
この様にすることで、1つの基板の各部の温度プロファイルの不均一性が従来より低減された。その結果、フラックスの活性化が不十分なために発生するはんだ付け不良や局所的なはんだの未溶融の発生の低減を、タクトタイムを変えずに達成することが可能となった。
At this time, since the size of the substrate to be processed is longer than the heating zone in which soldering is performed, the portion of the protruding substrate 4 becomes low in temperature when it protrudes into the heating zone in which preheating is performed in the previous stage. The heating unit 5 is brought into contact with the substrate 4 and heated. Further, even when the substrate 4 does not protrude, if the temperature of the substrate 4 is not uniform in one heating zone, the local heating unit 5 is similarly brought into contact with the substrate 4 in order to approach the set temperature. Heat or cool.
By doing in this way, the nonuniformity of the temperature profile of each part of one board | substrate was reduced conventionally. As a result, it has become possible to reduce soldering defects caused by insufficient flux activation and local unmelted solder generation without changing the tact time.

この局部加熱ユニット5の配置は、大型基板7の下側に限られず、上側もしくは上下の両方に設置しても良いし、上下方向とは垂直方向の、側方の片側または両側に設置しても良い。   The arrangement of the local heating unit 5 is not limited to the lower side of the large substrate 7 and may be installed on the upper side or the upper and lower sides. Alternatively, the local heating unit 5 may be installed on one side or both sides in the vertical direction. Also good.

また、本発明の局部加熱ユニット5の実施形態として、局部加熱ユニット5の内部に温度調整用の機構が内蔵されているのであるが、その温度調整用の機構の一例として電熱線を使用することができる。また温度調整用の機構の一例として、局部加熱ユニット5の内部に液体循環用導管を有しており、この中を液体が循環することで、局部加熱ユニット5の温度を調整することができる。また、この導管を循環する物質は、液体に限らず気体であっても良い。また温度調整用の機構の一例として、ヒートパイプを使用することができる。また温度調整用の機構の一例として、ペルチェ素子を使用することができる。   Further, as an embodiment of the local heating unit 5 of the present invention, a temperature adjustment mechanism is built in the local heating unit 5, and a heating wire is used as an example of the temperature adjustment mechanism. Can do. As an example of the temperature adjustment mechanism, the local heating unit 5 includes a liquid circulation conduit, and the temperature of the local heating unit 5 can be adjusted by circulating the liquid therethrough. Further, the substance circulating in this conduit is not limited to a liquid but may be a gas. Moreover, a heat pipe can be used as an example of the mechanism for temperature adjustment. Further, a Peltier element can be used as an example of a temperature adjustment mechanism.

1 ヒーター
2 冷却ファン
3 基板搬送用コンベア
4 小型基板
5 局部加熱ユニット
6 被加熱物通過検知センサ
7 大型基板
DESCRIPTION OF SYMBOLS 1 Heater 2 Cooling fan 3 Substrate conveyance conveyor 4 Small substrate 5 Local heating unit 6 Heated object passage detection sensor 7 Large substrate

Claims (3)

プリント配線板を搬送しながら加熱する複数の加熱ゾーンを持ったリフロー装置であって、
少なくとも、前記プリント配線板を搬送するコンベアと、前記プリント配線板の一部分を局部的に加熱する局部加熱ユニットであって、前記加熱ゾーンごとに設けた複数の局部加熱ユニットと、前記プリント配線板が通過したことを検知する被加熱物通過検知センサと、を備えており、
前記局部加熱ユニットは、前記プリント配線板への接触および非接触が制御可能に個々に駆動でき、且つ、個々に温度制御が可能であることを特徴とするリフロー装置。
A reflow apparatus having a plurality of heating zones for heating while conveying a printed wiring board,
At least a conveyor that conveys the printed wiring board, a local heating unit that locally heats a portion of the printed wiring board, a plurality of local heating units provided for each heating zone, and the printed wiring board A heated object passage detection sensor for detecting that the vehicle has passed,
The reflow apparatus characterized in that the local heating unit can be individually driven so as to be able to control contact and non-contact with the printed wiring board and can be individually controlled in temperature.
局部加熱ユニットのプリント配線板への接触および非接触の制御が、被加熱物通過検知センサからの信号に従って行われることを特徴とする請求項1に記載のリフロー装置。   2. The reflow apparatus according to claim 1, wherein the control of the contact and non-contact of the local heating unit with the printed wiring board is performed according to a signal from the heated object passage detection sensor. 局部加熱ユニットが棒状体であって、棒状体の断面で被加熱物に接触することを特徴とする請求項1または2に記載のリフロー装置。   The reflow apparatus according to claim 1 or 2, wherein the local heating unit is a rod-shaped body, and is in contact with an object to be heated in a cross section of the rod-shaped body.
JP2011135197A 2011-06-17 2011-06-17 Reflow device Withdrawn JP2013004789A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014160716A (en) * 2013-02-19 2014-09-04 Mitsubishi Electric Corp Semiconductor device manufacturing method and semiconductor device manufacturing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014160716A (en) * 2013-02-19 2014-09-04 Mitsubishi Electric Corp Semiconductor device manufacturing method and semiconductor device manufacturing apparatus

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