JP4922495B2 - Transport device - Google Patents

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Publication number
JP4922495B2
JP4922495B2 JP2001069914A JP2001069914A JP4922495B2 JP 4922495 B2 JP4922495 B2 JP 4922495B2 JP 2001069914 A JP2001069914 A JP 2001069914A JP 2001069914 A JP2001069914 A JP 2001069914A JP 4922495 B2 JP4922495 B2 JP 4922495B2
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Prior art keywords
light shielding
switch
switch detects
shading
speed
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JP2001069914A
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Japanese (ja)
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JP2002265030A (en
Inventor
大輔 松本
秀樹 中村
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Koyo Thermo Systems Co Ltd
Senju Metal Industry Co Ltd
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Koyo Thermo Systems Co Ltd
Senju Metal Industry Co Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、炉などの連続熱処理装置に用いられる搬送装置に関する。特に、半導体基板、LCDパネルやプラズマディスプレーパネルなどのガラス基板やプリント配線基板などの板状被処理物の処理のためにクリーンルーム内などで用いられる炉などの処理装置用の搬送装置に関する。
【0002】
なお、本明細書において前後左右は被処理物の移動方向を基準にいうものとする。
【0003】
【従来の技術】
クリーンルーム内などで用いられる炉などの処理装置用の搬送装置は発塵が少ないことが要求される。このような要求を満たす搬送装置の1つとして、ウォーキングビーム式搬送装置がある。
【0004】
ウォーキングビーム式搬送装置は、左右に間隔をおいて設けられかつ前後方向に伸びた一対の移動ビームと、移動ビーム間に左右に間隔をおいて配された一対の固定ビームとを備え、以下のようにして被処理物を搬送する。
【0005】
まず、固定ビームより低い位置にある移動ビームが上方向に移動して固定ビーム上の載置位置にある被処理物を持ち上げる。ついで、持ち上げた被処理物が次の載置位置に達するまで移動ビームが前方に移動する。そして、移動ビームが下方に移動して被処理物が固定ビーム上の次の載置位置に載せられる。この後、移動ビームは後方へと移動する。
【0006】
上記の一連動作が繰り返されて被処理物が順次固定ビーム上を順次前方の載置位置へと載せ替えられて搬送される。
【0007】
【発明が解決しようとする課題】
上記従来の反応装置においては、クリーンルーム内で処理される被処理物は、半導体基板やガラス基板であり、搬送中に破損する恐れがあるため、載置部から被処理物を上方に移動させる速度および被処理物を下方に移動させて載置部に載せる速度には一定の制限が生じる。すなわち、被処理物が破損する恐れが生じるほどには被処理物を上下方に移動させる速度を速くすることができない。このため、全体として搬送速度を速くすることが困難であるという問題がある。ところで、搬送速度は、被処理物の温度分布にも影響を及ぼす場合があるため、搬送速度を速くできないと、被処理物の温度分布を好ましい状態にすることが困難な場合もある。
【0008】
本発明は上記問題を解決することを課題とし、被処理物の搬送速度を従来の装置に比して速くすることができ、被処理物の温度分布を好ましい状態にすることができる搬送装置を提供することを目的とする。
【0009】
【課題を解決するための手段および発明の効果】
上記課題を解決するために本発明の搬送装置は、
少なくとも上下に移動する一対のビームで被処理物を被処理物載置部から持ち上げおよび被処理物載置部に下げて置くウォーキングビーム式搬送装置において、前記ビームの上下位置を検出する位置検出手段を備え、位置検出手段により検出されたビームの上下位置に基づいてビームの上下移動速度を制御する制御手段とを備え、ビームが被処理物を載置部から持ち上げるさいおよび載置部に下げて置くさいのビームの上下移動速度が遅くなるようになされている
ものである。
【0010】
この装置によれば、被処理物を載置部から持ち上げるさいおよび被処理物を載置部に下げ置くさいの速度を遅くし、被処理物が載置部から離れているときの速度を速くして被処理物を上下方に移動させる速度が一定である場合に比し、被処理物を上下方に移動させる速度を速くすることができる。従って、被処理物の搬送速度の設定範囲が広くなり、被処理物の温度分布を好ましい状態にすることができる。
【0011】
【発明の実施の形態】
以下、図面を参照して本発明の搬送装置の1実施形態について説明する。
【0012】
図1には本発明の搬送装置を実施する搬送装置(2)を備えた連続炉(1)が示され、図2には後述する移動ビーム(4)の上下移動速度を制御するための位置検出手段および制御手段の概念が示されている。
【0013】
ここで、搬送装置(2)は、左右に間隔をおいて設けられた一対の移動ビーム(4)と、移動ビーム(4)間に左右に間隔をおいて設けられた一対の固定ビーム(5)とを備えている。移動ビーム(4)の間隔および固定ビーム(5)の間隔は被処理物(P)の幅より小さく、被処理物(P)を載せることができるようになっている。
【0014】
移動ビーム(4)の炉体から後方に突出した部分にはビーム(4)から下方に突出した前後スライド板(7)が取り付けられ、スライド板(7)に上下動板(6)が取り付けられている。
【0015】
前後スライド板(7)は図示しないモータによって前後に駆動され、上下動板(6)に対して前後に移動し、移動ビーム(4)を前進位置と後進位置との間を移動させる。一方、上下動板(6)は、モータ(M)によって上下に駆動され、前後スライド板(7)および移動ビーム(4)を一体に上下に動かして移動ビーム(4)を固定ビーム(5)より上の上昇位置および固定ビーム(5)より下の下降位置の間を移動させるものである。モータ(M)によって上下動板(6)を駆動する機構およびモータによって前後スライド板(7)を駆動する機構は公知のものであり詳細な説明は省略する。
【0016】
上下動板(6)には、これから後方に突出した遮光板(6a)が設けられている。また、4つの遮光スイッチ(S1)(S2)(S3)(S4)が、遮光板(6a)の上下動により光が遮られる位置に上下に間隔をおいて設けられている。
【0017】
遮光スイッチ(S1)は移動ビーム(4)が上昇位置に達したことを検出するためのものであり、遮光スイッチ(S4)は移動ビーム(4)が下降位置に達したことを検出するためのものである。そして、両スイッチ(S1)(S4)間に2つのスイッチ(S2)(S3)が配されている。両スイッチ(S2)(S3)は以下のような位置に設けられる。すなわち、遮光板(6a)が2つのスイッチ(S2)(S3)間を動いている間に移動ビーム(4)が固定ビーム(5)から被処理物(P)を持ち上げるおよび固定ビーム(5)に被処理物(P)を下げ置くような位置に設けられる。
【0018】
図2に示すようにスイッチ(S1)(S2)(S3)(S4)はプロクラムロジックコントローラ(PLC)に接続されている。そして、プロクラムロジックコントローラ(PLC)によって制御されるインバータ(INV)によりモータ(M)がインバータ駆動される。なお、プロクラムロジックコントローラ(PLC)によってインバータ(INV)を制御する構成及び遮光スイッチ(S1)(S2)(S3)(S4)の構成は公知のものであり、詳細な説明は省略する。
【0019】
以下、移動ビーム(4)の動作について説明する。
【0020】
移動ビーム(4)は、まず後退位置かつ上昇位置にある初期状態をとる。この状態の移動ビーム(4)に被処理物(P)が載せられる。
【0021】
被処理物(P)が載せられた移動ビーム(4)は前進位置まで前進して停止する。ついで、移動ビーム(4)が下降する。移動ビーム(4)が下降して遮光板(6a)がスイッチ(S2)の光を遮ると、インバータ(I)によりモータ(M)に供給される電力が低くなって移動ビーム(4)の下降速度がそれまでより遅くなる。さらに移動ビーム(4)が下降して被処理物(P)が固定ビーム(5)に載せ替えられた後、遮光板(6a)がスイッチ(S3)の光を遮るとインバータ(I)によりモータ(M)に供給される電力が高くなって移動ビーム(4)の下降速度がそれまでより速くなる。
【0022】
移動ビーム(4)が固定ビーム(5)より下方の下降位置まで下降すると移動ビーム(4)は後退位置まで後退する。
【0023】
後退位置まで後退した移動ビーム(4)は、上昇位置まで上昇し初期状態を取る。この際、固定ビーム(5)上の被処理物(P)は移動ビーム(4)に載せ替えられて持ち上げられるが、遮光板(6a)がスイッチ(S2)(S3)間を移動している間の移動ビーム(4)の上昇速度は、その他の時の上昇速度に比して遅くなる。これは上記と同様に遮光スイッチ(S1)(S2)(S3)(S4)によって移動ビーム(4)の位置を検出し、この位置に基づきインバータ(I)からモータ(M)に供給される電力が変化することにより行われる。
【0024】
上記搬送装置は、一方のビーム(4)が上下および前後に移動し、他方のビーム(5)が固定されたものであるが、本発明の搬送装置はこれに限られず、両方のビームが交互に移動して被処理物(P)が搬送されるものや、一方のビームが上下に移動し、他方のビームが前後に移動して被処理物(P)が搬送されるものも含まれる。
【図面の簡単な説明】
【図1】aは本発明の搬送装置を実施する搬送装置を備えた炉の縦断面図、bは同搬送装置の要部の横断面図である。
【図2】同搬送装置の速度制御手段の概念図である。
【符号の説明】
(1) 炉
(2) 搬送装置
(4) 移動ビーム
(5) 固定ビーム
(I) 制御手段(インバータ)
(P) 被処理物
(S1)(S2)(S3)(S4) 位置検出手段(遮光スイッチ)
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a transfer device used in a continuous heat treatment apparatus such as a furnace. In particular, the present invention relates to a transfer apparatus for a processing apparatus such as a furnace used in a clean room or the like for processing a plate-like workpiece such as a semiconductor substrate, a glass substrate such as an LCD panel or a plasma display panel, or a printed wiring board.
[0002]
In the present specification, front, rear, left, and right refer to the moving direction of the workpiece.
[0003]
[Prior art]
A transfer device for a processing apparatus such as a furnace used in a clean room or the like is required to generate less dust. There is a walking beam type conveying apparatus as one of the conveying apparatuses that satisfy such requirements.
[0004]
The walking beam type conveying apparatus includes a pair of moving beams provided in the left-right direction and extending in the front-rear direction, and a pair of fixed beams arranged in the left-right distance between the moving beams. In this way, the workpiece is transported.
[0005]
First, the moving beam at a position lower than the fixed beam moves upward to lift the object to be processed at the placement position on the fixed beam. Next, the moving beam moves forward until the lifted workpiece reaches the next placement position. Then, the moving beam moves downward and the object to be processed is placed on the next placement position on the fixed beam. After this, the moving beam moves backward.
[0006]
The above-described series of operations are repeated, and the workpiece is sequentially transferred onto the fixed beam and transferred to the front mounting position.
[0007]
[Problems to be solved by the invention]
In the above-described conventional reaction apparatus, the object to be processed in the clean room is a semiconductor substrate or a glass substrate and may be damaged during transportation. Therefore, the speed at which the object to be processed is moved upward from the mounting portion. In addition, there is a certain limitation on the speed at which the workpiece is moved downward and placed on the placement unit. That is, the speed at which the workpiece is moved up and down cannot be increased to the extent that the workpiece may be damaged. For this reason, there is a problem that it is difficult to increase the conveyance speed as a whole. By the way, since the conveyance speed may affect the temperature distribution of the object to be processed, it may be difficult to make the temperature distribution of the object to be processed favorable if the conveyance speed cannot be increased.
[0008]
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problem, and to provide a transfer device that can increase the transfer speed of the object to be processed as compared with the conventional apparatus and can make the temperature distribution of the object to be processed preferable. The purpose is to provide.
[0009]
[Means for Solving the Problems and Effects of the Invention]
In order to solve the above problems, the transport device of the present invention is
Position detecting means for detecting the vertical position of the beam in a walking beam type conveying apparatus that places a workpiece to be lifted from the workpiece placing portion and lowered to the workpiece placing portion with a pair of beams that move up and down at least And a control means for controlling the vertical movement speed of the beam based on the vertical position of the beam detected by the position detection means, and when the beam lifts the workpiece from the placement portion and lowers it to the placement portion. The vertical movement speed of the placing beam is slowed down.
[0010]
According to this apparatus, the speed at which the workpiece is lifted from the placing section and the speed at which the workpiece is lowered on the placing section is slowed down, and the speed when the workpiece is away from the placing section is increased. Thus, compared with the case where the speed of moving the object to be processed is constant, the speed of moving the object to be processed can be increased. Therefore, the setting range of the conveyance speed of the workpiece is widened, and the temperature distribution of the workpiece can be in a preferable state.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of a transfer device of the present invention will be described with reference to the drawings.
[0012]
FIG. 1 shows a continuous furnace (1) equipped with a transfer device (2) for carrying out the transfer device of the present invention, and FIG. 2 shows a position for controlling the vertical movement speed of a moving beam (4) described later. The concept of detection means and control means is shown.
[0013]
Here, the transfer device (2) includes a pair of moving beams (4) spaced apart from each other on the left and right sides, and a pair of fixed beams (5) spaced apart from each other between the moving beams (4). ). The interval between the moving beam (4) and the interval between the fixed beams (5) is smaller than the width of the workpiece (P), and the workpiece (P) can be placed thereon.
[0014]
A front and rear slide plate (7) projecting downward from the beam (4) is attached to a portion of the moving beam (4) projecting backward from the furnace body, and a vertical motion plate (6) is attached to the slide plate (7). ing.
[0015]
The front / rear slide plate (7) is driven back and forth by a motor (not shown) to move back and forth with respect to the vertical movement plate (6), thereby moving the moving beam (4) between the forward movement position and the reverse movement position. On the other hand, the up-and-down moving plate (6) is driven up and down by the motor (M) to move the front and rear slide plate (7) and the moving beam (4) up and down integrally to move the moving beam (4) to the fixed beam (5). It moves between a raised position above and a lowered position below the fixed beam (5). The mechanism for driving the vertical moving plate (6) by the motor (M) and the mechanism for driving the front / rear slide plate (7) by the motor are well known and will not be described in detail.
[0016]
The up-and-down moving plate (6) is provided with a light shielding plate (6a) projecting rearward therefrom. Four light shielding switches (S1), (S2), (S3), and (S4) are provided at intervals in the vertical direction at positions where light is blocked by the vertical movement of the light shielding plate (6a).
[0017]
The shading switch (S1) is for detecting that the moving beam (4) has reached the raised position, and the shading switch (S4) is for detecting that the moving beam (4) has reached the lowered position. Is. Two switches (S2) and (S3) are arranged between the switches (S1) and (S4). Both switches (S2) and (S3) are provided at the following positions. That is, the moving beam (4) lifts the workpiece (P) from the fixed beam (5) and the fixed beam (5) while the light shielding plate (6a) moves between the two switches (S2) and (S3). It is provided at a position where the workpiece (P) is put down.
[0018]
As shown in FIG. 2, the switches (S1), (S2), (S3), and (S4) are connected to a program logic controller (PLC). The motor (M) is driven by an inverter by an inverter (INV) controlled by a program logic controller (PLC). The configuration for controlling the inverter (INV) by the program logic controller (PLC) and the configuration of the light shielding switches (S1), (S2), (S3), and (S4) are well known, and detailed description thereof is omitted.
[0019]
Hereinafter, the operation of the moving beam (4) will be described.
[0020]
The moving beam (4) first takes an initial state in the retracted position and the raised position. The workpiece (P) is placed on the moving beam (4) in this state.
[0021]
The moving beam (4) on which the workpiece (P) is placed advances to the advance position and stops. Next, the moving beam (4) is lowered. When the moving beam (4) descends and the light blocking plate (6a) blocks the light from the switch (S2), the power supplied to the motor (M) by the inverter (I) decreases and the moving beam (4) descends. The speed is slower than before. Furthermore, after the moving beam (4) is lowered and the workpiece (P) is transferred to the fixed beam (5), the motor (5) is used by the inverter (I) when the light shielding plate (6a) blocks the light from the switch (S3). The power supplied to (M) becomes higher, and the moving beam (4) descends faster than before.
[0022]
When the moving beam (4) descends to a lower position below the fixed beam (5), the moving beam (4) retracts to the retracted position.
[0023]
The moving beam (4) retracted to the retracted position rises to the ascending position and takes an initial state. At this time, the workpiece (P) on the fixed beam (5) is transferred to the moving beam (4) and lifted, but the light shielding plate (6a) is moving between the switches (S2) and (S3). The rising speed of the moving beam (4) in the meantime is slower than the rising speed at other times. In the same manner as above, the position of the moving beam (4) is detected by the light shielding switches (S1), (S2), (S3), and (S4), and the electric power supplied from the inverter (I) to the motor (M) based on this position. This is done by changing.
[0024]
The above-mentioned transport device is one in which one beam (4) moves up and down and back and forth, and the other beam (5) is fixed.However, the transport device of the present invention is not limited to this, and both beams alternate. And the object to be processed (P) is conveyed, and one of the beams is moved up and down and the other beam is moved forward and backward to convey the object to be processed (P).
[Brief description of the drawings]
FIG. 1A is a longitudinal sectional view of a furnace equipped with a transfer apparatus for carrying out the transfer apparatus of the present invention, and FIG. 1B is a transverse cross-sectional view of a main part of the transfer apparatus.
FIG. 2 is a conceptual diagram of speed control means of the transport apparatus.
[Explanation of symbols]
(1) Furnace
(2) Transfer device
(4) Moving beam
(5) Fixed beam
(I) Control means (inverter)
(P) Workpiece
(S1) (S2) (S3) (S4) Position detection means (shading switch)

Claims (2)

少なくとも上下に移動する一対のビームで被処理物を被処理物載置部から持ち上げおよび被処理物載置部に下げて置くウォーキングビーム式搬送装置において、
前記ビームを上下移動させるモータと、前記ビームの上下位置を検出する位置検出手段と、位置検出手段により検出されたビームの上下位置に基づいてモータによるビームの上下移動速度を制御する制御手段とを備え、
位置検出手段は、第1〜第4遮光スイッチよりなり、ビームが上昇位置に達したことを第1遮光スイッチが検出し、前記ビームが下降位置に達したことを第2遮光スイッチが検出し、前記ビームが上昇位置および下降位置間における第1速度切換位置に達したことを第3遮光スイッチが検出し、前記ビームが上昇位置および下降位置間における第1速度切換位置下方の第2速度切換位置に達したことを第4遮光スイッチが検出し、
制御手段は、ビームの上昇ストロークにおいて、ビームを第2遮光スイッチが検出してから第4遮光スイッチが検出するまでの間は、ビームを高速で上昇させ、ビームを第4遮光スイッチが検出してから第3遮光スイッチが検出するまでの間は、ビームを低速で上昇させ、ビームの下降ストロークにおいて、ビームを第1遮光スイッチが検出してから第3遮光スイッチが検出するまでの間は、ビームを高速で下降させ、ビームを第3遮光スイッチが検出してから第4遮光スイッチが検出するまでの間は、ビームを低速で下降させるようにモータを制御し、
ビームの低速上昇のさいに、ビームが被処理物を載置部から持ち上げ、ビームの低速下降のさいに、ビームが被処理物を載置部に下げて置くようになされているウォーキングビーム式搬送装置。
In the walking beam type transfer device that places the workpiece to be lifted from the workpiece placing portion and lowered to the workpiece placing portion with a pair of beams that move at least up and down,
A motor for moving the beam up and down , a position detection means for detecting the vertical position of the beam, and a control means for controlling the vertical movement speed of the beam by the motor based on the vertical position of the beam detected by the position detection means. Prepared,
The position detecting means includes first to fourth light shielding switches, the first light shielding switch detects that the beam has reached the ascending position, and the second light shielding switch detects that the beam has reached the descending position, A third shading switch detects that the beam has reached the first speed switching position between the ascending position and the descending position, and the second speed switching position below the first speed switching position between the ascending position and the descending position. The fourth shading switch detects that
The control means raises the beam at a high speed and detects the beam by the fourth shading switch until the fourth shading switch detects the beam after the second shading switch detects the beam in the ascending stroke of the beam. Until the third shading switch detects the beam, the beam is raised at a low speed, and during the beam descending stroke, the beam is raised between the detection of the beam by the first shading switch and the detection of the third shading switch. The motor is controlled so that the beam is lowered at a low speed between the time when the beam is detected by the third light shielding switch and the time when the fourth light shielding switch detects the beam.
Walking beam type transport, where the beam lifts the object to be processed from the mounting part when the beam rises at a low speed, and the beam lowers the object to be processed on the mounting part when the beam descends at a low speed apparatus.
制御手段は、ビームの上昇ストロークにおいて、ビームを第3遮光スイッチが検出してから第1遮光スイッチが検出するまでの間は、ビームを高速で上昇させ、ビームの下降ストロークにおいて、ビームを第4遮光スイッチが検出してから第2遮光スイッチが検出するまでの間は、ビームを高速で下降させるようにモータを制御する請求項1に記載のウォーキングビーム式搬送装置。  The control means raises the beam at a high speed during the beam rising stroke until the first light blocking switch detects the beam after the third light blocking switch detects the beam, and the beam moves the fourth beam at the beam falling stroke. 2. The walking beam type conveying apparatus according to claim 1, wherein the motor is controlled so that the beam is lowered at a high speed between the detection of the light shielding switch and the detection of the second light shielding switch.
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