JP4921645B2 - ウエハレベルcsp - Google Patents
ウエハレベルcsp Download PDFInfo
- Publication number
- JP4921645B2 JP4921645B2 JP2001057277A JP2001057277A JP4921645B2 JP 4921645 B2 JP4921645 B2 JP 4921645B2 JP 2001057277 A JP2001057277 A JP 2001057277A JP 2001057277 A JP2001057277 A JP 2001057277A JP 4921645 B2 JP4921645 B2 JP 4921645B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- electrode pad
- metal wiring
- disposed
- back surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Formation Of Insulating Films (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001057277A JP4921645B2 (ja) | 2001-03-01 | 2001-03-01 | ウエハレベルcsp |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001057277A JP4921645B2 (ja) | 2001-03-01 | 2001-03-01 | ウエハレベルcsp |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011062223A Division JP5200130B2 (ja) | 2011-03-22 | 2011-03-22 | ウエハレベルcspの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002261192A JP2002261192A (ja) | 2002-09-13 |
| JP2002261192A5 JP2002261192A5 (enExample) | 2008-01-24 |
| JP4921645B2 true JP4921645B2 (ja) | 2012-04-25 |
Family
ID=18917179
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001057277A Expired - Fee Related JP4921645B2 (ja) | 2001-03-01 | 2001-03-01 | ウエハレベルcsp |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4921645B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4072505B2 (ja) | 2003-02-28 | 2008-04-09 | エルピーダメモリ株式会社 | 積層型半導体パッケージ |
| US7863188B2 (en) | 2005-07-29 | 2011-01-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| JP5127178B2 (ja) * | 2005-07-29 | 2013-01-23 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP2008034704A (ja) * | 2006-07-31 | 2008-02-14 | New Japan Radio Co Ltd | 半導体装置の製造方法 |
| JP4946693B2 (ja) * | 2007-07-24 | 2012-06-06 | ソニー株式会社 | 半導体装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10135270A (ja) * | 1996-10-31 | 1998-05-22 | Casio Comput Co Ltd | 半導体装置及びその製造方法 |
-
2001
- 2001-03-01 JP JP2001057277A patent/JP4921645B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002261192A (ja) | 2002-09-13 |
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