JP4906888B2 - マスクブランク及びフォトマスク - Google Patents

マスクブランク及びフォトマスク Download PDF

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Publication number
JP4906888B2
JP4906888B2 JP2009124973A JP2009124973A JP4906888B2 JP 4906888 B2 JP4906888 B2 JP 4906888B2 JP 2009124973 A JP2009124973 A JP 2009124973A JP 2009124973 A JP2009124973 A JP 2009124973A JP 4906888 B2 JP4906888 B2 JP 4906888B2
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JP
Japan
Prior art keywords
semi
film
line
transparent film
mask blank
Prior art date
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Active
Application number
JP2009124973A
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English (en)
Japanese (ja)
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JP2009187032A (ja
JP2009187032A5 (zh
Inventor
勝 三井
道明 佐野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2009124973A priority Critical patent/JP4906888B2/ja
Publication of JP2009187032A publication Critical patent/JP2009187032A/ja
Publication of JP2009187032A5 publication Critical patent/JP2009187032A5/ja
Application granted granted Critical
Publication of JP4906888B2 publication Critical patent/JP4906888B2/ja
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Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2009124973A 2005-12-26 2009-05-25 マスクブランク及びフォトマスク Active JP4906888B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009124973A JP4906888B2 (ja) 2005-12-26 2009-05-25 マスクブランク及びフォトマスク

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005371970 2005-12-26
JP2005371970 2005-12-26
JP2009124973A JP4906888B2 (ja) 2005-12-26 2009-05-25 マスクブランク及びフォトマスク

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006348984A Division JP4516560B2 (ja) 2005-12-26 2006-12-26 マスクブランク及びフォトマスク

Publications (3)

Publication Number Publication Date
JP2009187032A JP2009187032A (ja) 2009-08-20
JP2009187032A5 JP2009187032A5 (zh) 2011-07-28
JP4906888B2 true JP4906888B2 (ja) 2012-03-28

Family

ID=38218030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009124973A Active JP4906888B2 (ja) 2005-12-26 2009-05-25 マスクブランク及びフォトマスク

Country Status (4)

Country Link
JP (1) JP4906888B2 (zh)
KR (2) KR101082715B1 (zh)
CN (1) CN101346664B (zh)
WO (1) WO2007074810A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI446105B (zh) * 2007-07-23 2014-07-21 Hoya Corp 光罩之製造方法、圖案轉印方法、光罩以及資料庫
TWI437358B (zh) 2007-09-27 2014-05-11 Hoya Corp 空白光罩、空白光罩之製造方法及壓印用模型之製造方法
JP4934237B2 (ja) * 2007-09-29 2012-05-16 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
TWI422967B (zh) * 2007-10-12 2014-01-11 Ulvac Coating Corp 多灰階光罩之製造方法
CN103513508B (zh) * 2012-06-20 2016-08-10 欣兴电子股份有限公司 灰阶光掩膜与制作方法以及以灰阶光掩膜形成沟渠方法
CN107145035A (zh) * 2017-03-30 2017-09-08 惠科股份有限公司 光罩及其主动开关阵列基板的制造方法
JP7166975B2 (ja) * 2019-03-29 2022-11-08 Hoya株式会社 フォトマスクブランク、フォトマスクの製造方法、及び表示装置の製造方法
WO2024190208A1 (ja) * 2023-03-15 2024-09-19 株式会社ニコン フォトマスクブランクス、フォトマスク、フォトマスクブランクスの製造方法、フォトマスクの製造方法、及びデバイスの製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3262302B2 (ja) * 1993-04-09 2002-03-04 大日本印刷株式会社 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法
KR100295385B1 (ko) * 1993-04-09 2001-09-17 기타지마 요시토시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법
JP3289606B2 (ja) * 1996-07-11 2002-06-10 凸版印刷株式会社 ハーフトーン型位相シフトマスク用ブランク及びハーフトーン型位相シフトマスク
JP2004177683A (ja) * 2002-11-27 2004-06-24 Clariant (Japan) Kk 超高耐熱ポジ型感光性組成物を用いたパターン形成方法
JP4385690B2 (ja) * 2003-09-09 2009-12-16 凸版印刷株式会社 液晶表示素子製造用露光マスク及びその製造方法
JP4919220B2 (ja) * 2005-02-28 2012-04-18 Ｈｏｙａ株式会社 グレートーンマスク
JP5076473B2 (ja) * 2005-12-05 2012-11-21 大日本印刷株式会社 マスクブランクおよび階調マスク
JP4961990B2 (ja) * 2005-12-14 2012-06-27 大日本印刷株式会社 マスクブランクおよび階調マスク

Also Published As

Publication number Publication date
WO2007074810A1 (ja) 2007-07-05
KR20110025232A (ko) 2011-03-09
JP2009187032A (ja) 2009-08-20
CN101346664B (zh) 2011-12-14
KR20080088616A (ko) 2008-10-02
KR101082715B1 (ko) 2011-11-15
CN101346664A (zh) 2009-01-14
KR101210661B1 (ko) 2012-12-11

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