JP4902505B2 - リソグラフィ装置およびデバイス製造方法 - Google Patents

リソグラフィ装置およびデバイス製造方法 Download PDF

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Publication number
JP4902505B2
JP4902505B2 JP2007309567A JP2007309567A JP4902505B2 JP 4902505 B2 JP4902505 B2 JP 4902505B2 JP 2007309567 A JP2007309567 A JP 2007309567A JP 2007309567 A JP2007309567 A JP 2007309567A JP 4902505 B2 JP4902505 B2 JP 4902505B2
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outlet
liquid
substrate
space
outlets
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Japanese (ja)
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JP2008147652A (ja
Inventor
リーペン，マイケル
ホーゲンダム，クリスティアーン，アレクサンダー
リーブレッツ，パウルス，マルティヌス，マリア
デル ハム，ロナルド ヴァン
サイモンズ，ウィルヘルムス，フランシスカス，ヨハネス
ディレックス，ダニエル，ヨゼフ，マリア
バークヴェンス，ポール，ペトラス，ヨアネス
モンド，エヴァ
ブランズ，ゲルト−ヤン，ゲラルドゥス，ヨハネス，トーマス
ステッフェンス，コエン
レンペンス，ハン，ヘンリクス，アルデゴンダ
リーロップ，マティウス，アンナ，カレル ヴァン
メッツェネーレ，クリストフェ デ
ミランダ，マルシオ，アレクサンドレ，カノ
スプルイテンブルグ，パトリック，ヨハネス，ウィルヘルムス
ヴァーストレーテ，ヨリス，ヨハン，アンネ−マリー
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エーエスエムエル ネザーランズ ビー．ブイ．
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007309567A 2006-12-07 2007-11-30 リソグラフィ装置およびデバイス製造方法 Active JP4902505B2 (ja)

Applications Claiming Priority (2)

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US63507906A 2006-12-07 2006-12-07
US11/635,079 2006-12-07

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JP2011026014A Division JP5346046B2 (ja) 2006-12-07 2011-02-09 リソグラフィ投影装置

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JP2008147652A JP2008147652A (ja) 2008-06-26
JP4902505B2 true JP4902505B2 (ja) 2012-03-21

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JP2011026014A Active JP5346046B2 (ja) 2006-12-07 2011-02-09 リソグラフィ投影装置

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Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036253A1 (nl) 2007-12-10 2009-06-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US8421993B2 (en) * 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
NL2003225A1 (nl) 2008-07-25 2010-01-26 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2003333A (en) * 2008-10-23 2010-04-26 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP2010205914A (ja) * 2009-03-03 2010-09-16 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
SG166747A1 (en) * 2009-05-26 2010-12-29 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method
JP5016705B2 (ja) 2009-06-09 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造
NL2005089A (nl) 2009-09-23 2011-03-28 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005655A (en) 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2006389A (en) 2010-04-15 2011-10-18 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and a device manufacturing method.
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
NL2007182A (en) * 2010-08-23 2012-02-27 Asml Netherlands Bv Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method.
US20120162619A1 (en) * 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
JP5241862B2 (ja) 2011-01-01 2013-07-17 キヤノン株式会社 露光装置及びデバイスの製造方法
NL2008979A (en) * 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009139A (en) * 2011-08-05 2013-02-06 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009271A (en) * 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
CN108463775B (zh) 2016-01-13 2021-05-25 Asml荷兰有限公司 流体处理结构及光刻设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3186100B2 (ja) * 1991-07-12 2001-07-11 ミノルタ株式会社 画像読取り装置
SG135052A1 (en) * 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2005041276A1 (ja) * 2003-10-28 2005-05-06 Nikon Corporation 露光装置、露光方法、デバイスの製造方法
JP4954444B2 (ja) * 2003-12-26 2012-06-13 株式会社ニコン 流路形成部材、露光装置及びデバイス製造方法
JP4797984B2 (ja) * 2004-02-19 2011-10-19 株式会社ニコン 露光装置及びデバイス製造方法
JP4479269B2 (ja) * 2004-02-20 2010-06-09 株式会社ニコン 露光装置及びデバイス製造方法
JP2006173295A (ja) * 2004-12-15 2006-06-29 Jsr Corp 液浸型露光装置及び液浸型露光方法
WO2006064851A1 (ja) * 2004-12-15 2006-06-22 Nikon Corporation 基板保持装置、露光装置、及びデバイス製造方法
EP1879217A4 (en) * 2005-03-18 2010-06-09 Nikon Corp EXPOSURE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS EVALUATION METHOD

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JP5346046B2 (ja) 2013-11-20
JP2011097107A (ja) 2011-05-12
JP2008147652A (ja) 2008-06-26

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