JP4886285B2 - 表示デバイス - Google Patents

表示デバイス Download PDF

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Publication number
JP4886285B2
JP4886285B2 JP2005350595A JP2005350595A JP4886285B2 JP 4886285 B2 JP4886285 B2 JP 4886285B2 JP 2005350595 A JP2005350595 A JP 2005350595A JP 2005350595 A JP2005350595 A JP 2005350595A JP 4886285 B2 JP4886285 B2 JP 4886285B2
Authority
JP
Japan
Prior art keywords
aluminum alloy
film
pixel electrode
alloy film
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005350595A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006100856A5 (ko
JP2006100856A (ja
Inventor
裕史 後藤
勝文 富久
敏洋 釘宮
淳一 中井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP2005350595A priority Critical patent/JP4886285B2/ja
Publication of JP2006100856A publication Critical patent/JP2006100856A/ja
Publication of JP2006100856A5 publication Critical patent/JP2006100856A5/ja
Application granted granted Critical
Publication of JP4886285B2 publication Critical patent/JP4886285B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2005350595A 2002-12-19 2005-12-05 表示デバイス Expired - Fee Related JP4886285B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005350595A JP4886285B2 (ja) 2002-12-19 2005-12-05 表示デバイス

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002368786 2002-12-19
JP2002368786 2002-12-19
JP2005350595A JP4886285B2 (ja) 2002-12-19 2005-12-05 表示デバイス

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003274288A Division JP3940385B2 (ja) 2002-12-19 2003-07-14 表示デバイスおよびその製法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2006194468A Division JP2006339666A (ja) 2002-12-19 2006-07-14 アルミニウム合金膜形成用スパッタリングターゲット
JP2011149596A Division JP2011209756A (ja) 2002-12-19 2011-07-05 表示デバイスおよびその製法、ならびにスパッタリングターゲット

Publications (3)

Publication Number Publication Date
JP2006100856A JP2006100856A (ja) 2006-04-13
JP2006100856A5 JP2006100856A5 (ko) 2006-08-31
JP4886285B2 true JP4886285B2 (ja) 2012-02-29

Family

ID=36240303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005350595A Expired - Fee Related JP4886285B2 (ja) 2002-12-19 2005-12-05 表示デバイス

Country Status (1)

Country Link
JP (1) JP4886285B2 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4728170B2 (ja) 2006-05-26 2011-07-20 三菱電機株式会社 半導体デバイスおよびアクティブマトリクス型表示装置
US20090001373A1 (en) * 2007-06-26 2009-01-01 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) Electrode of aluminum-alloy film with low contact resistance, method for production thereof, and display unit
JP5215620B2 (ja) * 2007-09-12 2013-06-19 三菱電機株式会社 半導体デバイス、表示装置及び半導体デバイスの製造方法
JP5159558B2 (ja) * 2008-10-28 2013-03-06 株式会社神戸製鋼所 表示装置の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2733006B2 (ja) * 1993-07-27 1998-03-30 株式会社神戸製鋼所 半導体用電極及びその製造方法並びに半導体用電極膜形成用スパッタリングターゲット
JP3365954B2 (ja) * 1997-04-14 2003-01-14 株式会社神戸製鋼所 半導体電極用Al−Ni−Y 合金薄膜および半導体電極用Al−Ni−Y 合金薄膜形成用スパッタリングターゲット
JP4458563B2 (ja) * 1998-03-31 2010-04-28 三菱電機株式会社 薄膜トランジスタの製造方法およびこれを用いた液晶表示装置の製造方法
JP2000294556A (ja) * 1999-04-05 2000-10-20 Hitachi Metals Ltd ドライエッチング性に優れたAl合金配線膜およびAl合金配線膜形成用ターゲット
JP2001350159A (ja) * 2000-06-06 2001-12-21 Hitachi Ltd 液晶表示装置及びその製造方法
JP2003089864A (ja) * 2001-09-18 2003-03-28 Mitsui Mining & Smelting Co Ltd アルミニウム合金薄膜及びその薄膜を有する配線回路並びにその薄膜を形成するターゲット材

Also Published As

Publication number Publication date
JP2006100856A (ja) 2006-04-13

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