JP4881775B2 - 光源 - Google Patents
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- JP4881775B2 JP4881775B2 JP2007080340A JP2007080340A JP4881775B2 JP 4881775 B2 JP4881775 B2 JP 4881775B2 JP 2007080340 A JP2007080340 A JP 2007080340A JP 2007080340 A JP2007080340 A JP 2007080340A JP 4881775 B2 JP4881775 B2 JP 4881775B2
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- JP
- Japan
- Prior art keywords
- electrode
- housing
- discharge gas
- lens
- casing
- Prior art date
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- 239000002826 coolant Substances 0.000 claims description 29
- 125000006850 spacer group Chemical group 0.000 claims description 22
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 238000004847 absorption spectroscopy Methods 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 37
- 239000002245 particle Substances 0.000 description 18
- 238000004891 communication Methods 0.000 description 7
- 239000000498 cooling water Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- -1 hydrogen radicals Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002831 nitrogen free-radicals Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
- H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
- H05H1/0025—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by using photoelectric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/3103—Atomic absorption analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
- G01N2021/158—Eliminating condensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
- G01N2201/023—Controlling conditions in casing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
- G01N2201/023—Controlling conditions in casing
- G01N2201/0233—Gas purge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/061—Sources
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Immunology (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Description
また、レンズ50には、段付きレンズを用いていることか、組立精度を向上させることができる。本実施例の光源10の構成部品を組み付け前に、真空でベーキングすることで、これらの部品から不純物ガスが放出されることが防止でき、発光スペクトルを純粋なものとすることができる。
12…筐体
14…フランジ
15…間隙
30…冷却媒体流通路
40…電極ホルダー
41…フランジ
43…排気口
44…第1電極
45…第2電極
46…絶縁スペーサ
47…連通孔
50…レンズ
60…コイルスプリング
63…金属シャフト
42…吸気口
Claims (3)
- プラズマ雰囲気を生成する反応室に挿入して、原子又は分子密度を吸光分光により測定するための光源において、
管状の筐体と、
該筐体の内壁に沿って該筐体の軸方向に設けられ、前記筐体の根元部から前記筐体の先端に向けて冷却媒体を供給する往路と前記先端から前記根元部に向けて冷却媒体を帰還させる復路とを有した、冷却媒体を流通させる冷却媒体流通路と、
前記筐体の先端に配設されたレンズと、
前記レンズの手前であって、前記筐体内部において、その筐体の軸に垂直に、相互に平行に、配設された第1電極及び第2電極と、
前記第1電極と前記第2電極との間に配設された絶縁スペーサと、
前記第1電極、前記絶縁スペーサ及び前記第2電極の中央部を前記軸の方向に貫通する孔と、
前記冷却媒体流通路の壁面に沿って前記筐体の軸方向に形成され、前記筐体の前記根元部から前記筐体の前記先端に向けて、放電ガスを、前記レンズの裏面に向かって導入する往路と、前記放電ガスを前記レンズで反射させて、前記孔を通して、放電ガスを前記根元部に流通させる復路とを有する放電ガス流通路と
を有することを特徴とする光源。 - 前記第2電極を前記絶縁スペーサに押圧する導電性バネを有して、該バネを介して前記第2電極に電圧を印加することを特徴とする請求項1に記載の光源。
- 前記第1電極、前記絶縁スペーサ及び前記第2電極を支持し、前記筐体内部に前記軸に平行に挿入された電極ホルダーであって、該電極ホルダーの外壁と前記冷却媒体流通路の壁面との間に間隙を設けて、軸方向に移動可能に配設された管状の電極ホルダーを有し、前記間隙及び該電極ホルダーの内部空間を前記放電ガス流通路としたことを特徴とする請求項1又は請求項2に記載の光源。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007080340A JP4881775B2 (ja) | 2007-03-26 | 2007-03-26 | 光源 |
PCT/JP2008/055439 WO2008123196A1 (ja) | 2007-03-26 | 2008-03-24 | 光源 |
US12/450,402 US8310673B2 (en) | 2007-03-26 | 2008-03-24 | Light source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007080340A JP4881775B2 (ja) | 2007-03-26 | 2007-03-26 | 光源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008243492A JP2008243492A (ja) | 2008-10-09 |
JP4881775B2 true JP4881775B2 (ja) | 2012-02-22 |
Family
ID=39830693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007080340A Active JP4881775B2 (ja) | 2007-03-26 | 2007-03-26 | 光源 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8310673B2 (ja) |
JP (1) | JP4881775B2 (ja) |
WO (1) | WO2008123196A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6807488B1 (ja) * | 2019-02-15 | 2021-01-06 | 株式会社日立ハイテク | ガス成分のモニタ方法及びその装置並びにそれを用いた処理装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57128445A (en) * | 1981-12-23 | 1982-08-10 | Hitachi Ltd | Hollow electrode lamp |
US4833322A (en) * | 1986-05-02 | 1989-05-23 | Shell Oil Company | Method and apparatus for analysis of material |
US5021646A (en) * | 1990-01-25 | 1991-06-04 | Spectra-Physics, Inc. | Remote optical path for capillary electrophoresis instrument |
JP2916972B2 (ja) * | 1993-02-24 | 1999-07-05 | 住友重機械工業株式会社 | プラズマ発生方法及びその装置 |
JP2740738B2 (ja) * | 1994-05-31 | 1998-04-15 | 浜松ホトニクス株式会社 | ガス放電管 |
JPH1167732A (ja) * | 1997-08-22 | 1999-03-09 | Matsushita Electron Corp | プラズマプロセスのモニタリング方法およびモニタリング装置 |
NL1023491C2 (nl) * | 2003-05-21 | 2004-11-24 | Otb Groep B V | Cascadebron. |
JP2004354505A (ja) * | 2003-05-27 | 2004-12-16 | Seiko Epson Corp | 電気光学装置用基板、電気光学装置用基板の製造方法、および電気光学装置、電気光学装置の製造方法、並びに電子機器 |
JP4684725B2 (ja) * | 2005-04-20 | 2011-05-18 | 国立大学法人名古屋大学 | 親水性処理装置 |
-
2007
- 2007-03-26 JP JP2007080340A patent/JP4881775B2/ja active Active
-
2008
- 2008-03-24 US US12/450,402 patent/US8310673B2/en active Active
- 2008-03-24 WO PCT/JP2008/055439 patent/WO2008123196A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2008243492A (ja) | 2008-10-09 |
US8310673B2 (en) | 2012-11-13 |
US20100201978A1 (en) | 2010-08-12 |
WO2008123196A1 (ja) | 2008-10-16 |
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