WO2008123196A1 - 光源 - Google Patents

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Publication number
WO2008123196A1
WO2008123196A1 PCT/JP2008/055439 JP2008055439W WO2008123196A1 WO 2008123196 A1 WO2008123196 A1 WO 2008123196A1 JP 2008055439 W JP2008055439 W JP 2008055439W WO 2008123196 A1 WO2008123196 A1 WO 2008123196A1
Authority
WO
WIPO (PCT)
Prior art keywords
casing
light source
lens
electrode
disposed
Prior art date
Application number
PCT/JP2008/055439
Other languages
English (en)
French (fr)
Inventor
Masaru Hori
Hiroyuki Kano
Shoji Den
Original Assignee
Nu Eco Engineering Co., Ltd.
Katagiri Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nu Eco Engineering Co., Ltd., Katagiri Engineering Co., Ltd. filed Critical Nu Eco Engineering Co., Ltd.
Priority to US12/450,402 priority Critical patent/US8310673B2/en
Publication of WO2008123196A1 publication Critical patent/WO2008123196A1/ja

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/0006Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0025Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by using photoelectric means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15Preventing contamination of the components of the optical system or obstruction of the light path
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/3103Atomic absorption analysis
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15Preventing contamination of the components of the optical system or obstruction of the light path
    • G01N2021/158Eliminating condensation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/02Mechanical
    • G01N2201/023Controlling conditions in casing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/02Mechanical
    • G01N2201/023Controlling conditions in casing
    • G01N2201/0233Gas purge
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/061Sources

Abstract

【課題】プラズマの状態を乱すことなく、粒子密度を正確に測定できる光源を実現すること。 【解決手段】本光源は、管状の筐体12と、筐体の内壁に沿って設けられた、冷却媒体を流通させる冷却媒体流通路30と、筐体の先端に配設されたレンズ50と、レンズの手前であって、筐体内部において、その筐体の軸に垂直に、相互に平行に、配設された第1電極44及び第2電極46と、その間に配設された絶縁スペーサ46とを有する。第1電極、絶縁スペーサ及び第2電極の中央部を軸の方向に貫通する孔47を有する。冷却媒体流通路の内壁に沿って、放電ガスを、レンズの裏面に向かって導入し、レンズで反射させて、孔を通して、流通させる放電ガス流通路を設けた。
PCT/JP2008/055439 2007-03-26 2008-03-24 光源 WO2008123196A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/450,402 US8310673B2 (en) 2007-03-26 2008-03-24 Light source

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007080340A JP4881775B2 (ja) 2007-03-26 2007-03-26 光源
JP2007-080340 2007-03-26

Publications (1)

Publication Number Publication Date
WO2008123196A1 true WO2008123196A1 (ja) 2008-10-16

Family

ID=39830693

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/055439 WO2008123196A1 (ja) 2007-03-26 2008-03-24 光源

Country Status (3)

Country Link
US (1) US8310673B2 (ja)
JP (1) JP4881775B2 (ja)
WO (1) WO2008123196A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102345853B1 (ko) * 2019-02-15 2022-01-03 주식회사 히타치하이테크 가스 성분의 모니터 방법 및 그 장치 그리고 그것을 이용한 처리 장치

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128445A (en) * 1981-12-23 1982-08-10 Hitachi Ltd Hollow electrode lamp
JPH06251897A (ja) * 1993-02-24 1994-09-09 Sumitomo Heavy Ind Ltd プラズマ発生方法及びその装置
JPH07326324A (ja) * 1994-05-31 1995-12-12 Hamamatsu Photonics Kk ガス放電管
JPH1167732A (ja) * 1997-08-22 1999-03-09 Matsushita Electron Corp プラズマプロセスのモニタリング方法およびモニタリング装置
JP2004354505A (ja) * 2003-05-27 2004-12-16 Seiko Epson Corp 電気光学装置用基板、電気光学装置用基板の製造方法、および電気光学装置、電気光学装置の製造方法、並びに電子機器
JP2006302653A (ja) * 2005-04-20 2006-11-02 Univ Nagoya 表面改質装置
JP2006528415A (ja) * 2003-05-21 2006-12-14 オーテーベー、グループ、ベスローテン、フェンノートシャップ カスケード源およびこのカスケード源の制御方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833322A (en) * 1986-05-02 1989-05-23 Shell Oil Company Method and apparatus for analysis of material
US5021646A (en) * 1990-01-25 1991-06-04 Spectra-Physics, Inc. Remote optical path for capillary electrophoresis instrument

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128445A (en) * 1981-12-23 1982-08-10 Hitachi Ltd Hollow electrode lamp
JPH06251897A (ja) * 1993-02-24 1994-09-09 Sumitomo Heavy Ind Ltd プラズマ発生方法及びその装置
JPH07326324A (ja) * 1994-05-31 1995-12-12 Hamamatsu Photonics Kk ガス放電管
JPH1167732A (ja) * 1997-08-22 1999-03-09 Matsushita Electron Corp プラズマプロセスのモニタリング方法およびモニタリング装置
JP2006528415A (ja) * 2003-05-21 2006-12-14 オーテーベー、グループ、ベスローテン、フェンノートシャップ カスケード源およびこのカスケード源の制御方法
JP2004354505A (ja) * 2003-05-27 2004-12-16 Seiko Epson Corp 電気光学装置用基板、電気光学装置用基板の製造方法、および電気光学装置、電気光学装置の製造方法、並びに電子機器
JP2006302653A (ja) * 2005-04-20 2006-11-02 Univ Nagoya 表面改質装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
TAKASHIMA S. ET AL.: "Vacuum ultraviolet absorption spectroscopy employing a microdischarge hollow-cathode lamp for absolute density measurements of hydrogen atoms in reactive plasmas", APPLIED PHYSICS LETTERS, vol. 75, no. 25, 20 December 1999 (1999-12-20), pages 3929 - 3931, XP000902556 *

Also Published As

Publication number Publication date
JP4881775B2 (ja) 2012-02-22
US20100201978A1 (en) 2010-08-12
US8310673B2 (en) 2012-11-13
JP2008243492A (ja) 2008-10-09

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