JP4879187B2 - 複数入射角分光散乱計システム - Google Patents

複数入射角分光散乱計システム Download PDF

Info

Publication number
JP4879187B2
JP4879187B2 JP2007545555A JP2007545555A JP4879187B2 JP 4879187 B2 JP4879187 B2 JP 4879187B2 JP 2007545555 A JP2007545555 A JP 2007545555A JP 2007545555 A JP2007545555 A JP 2007545555A JP 4879187 B2 JP4879187 B2 JP 4879187B2
Authority
JP
Japan
Prior art keywords
measurement
spectroscopic
sample
angles
diffracted light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007545555A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008523392A (ja
JP2008523392A5 (enExample
Inventor
バレケット・ノア
ワン・ハイミン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Corp filed Critical KLA Corp
Publication of JP2008523392A publication Critical patent/JP2008523392A/ja
Publication of JP2008523392A5 publication Critical patent/JP2008523392A5/ja
Application granted granted Critical
Publication of JP4879187B2 publication Critical patent/JP4879187B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2007545555A 2004-12-09 2005-12-06 複数入射角分光散乱計システム Expired - Fee Related JP4879187B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US63530504P 2004-12-09 2004-12-09
US60/635,305 2004-12-09
US11/078,572 US7483133B2 (en) 2004-12-09 2005-03-11 Multiple angle of incidence spectroscopic scatterometer system
US11/078,572 2005-03-11
PCT/US2005/044075 WO2006062952A2 (en) 2004-12-09 2005-12-06 Multiple angle of incidence spectroscopic scatterometer system

Publications (3)

Publication Number Publication Date
JP2008523392A JP2008523392A (ja) 2008-07-03
JP2008523392A5 JP2008523392A5 (enExample) 2011-10-27
JP4879187B2 true JP4879187B2 (ja) 2012-02-22

Family

ID=36578480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007545555A Expired - Fee Related JP4879187B2 (ja) 2004-12-09 2005-12-06 複数入射角分光散乱計システム

Country Status (3)

Country Link
US (1) US7483133B2 (enExample)
JP (1) JP4879187B2 (enExample)
WO (1) WO2006062952A2 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7738105B1 (en) * 2004-04-23 2010-06-15 Liphardt Martin M System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems
US8189193B1 (en) * 2004-04-23 2012-05-29 J.A. Woollam Co., Inc. System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems
US20080144036A1 (en) * 2006-12-19 2008-06-19 Asml Netherlands B.V. Method of measurement, an inspection apparatus and a lithographic apparatus
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US20070091325A1 (en) * 2005-01-07 2007-04-26 Mehrdad Nikoonahad Multi-channel optical metrology
JP4567487B2 (ja) * 2005-02-25 2010-10-20 エスアイアイ・ナノテクノロジー株式会社 試料観察方法、試料加工方法および荷電粒子ビーム装置
US7801713B1 (en) * 2006-11-17 2010-09-21 Kla-Tencor Corporation Generating a model using global node optimization
WO2008080127A2 (en) * 2006-12-22 2008-07-03 Zygo Corporation Apparatus and method for measuring characteristics of surface features
JP5572293B2 (ja) * 2008-07-07 2014-08-13 株式会社日立ハイテクノロジーズ 欠陥検査方法及び欠陥検査装置
JP5341440B2 (ja) * 2008-09-10 2013-11-13 株式会社日立ハイテクノロジーズ 検査装置
JP2012137510A (ja) * 2009-07-27 2012-07-19 Chihiro Suzuki 光学ユニット
US20110276319A1 (en) * 2010-05-06 2011-11-10 Jonathan Michael Madsen Determination of material optical properties for optical metrology of structures
US8502977B1 (en) * 2010-06-01 2013-08-06 Kla-Tencor Corporation Angular resolved spectroscopic scatterometer
JP2012198118A (ja) * 2011-03-22 2012-10-18 Olympus Corp 測光装置
WO2012147717A1 (ja) * 2011-04-26 2012-11-01 株式会社島津製作所 樹脂識別装置
CN103492845B (zh) * 2011-04-28 2015-09-16 柯尼卡美能达株式会社 多角度测色计
US8456639B2 (en) 2011-07-01 2013-06-04 Kla-Tencor Corporation Measurement of critical dimension
JP6033890B2 (ja) * 2012-02-21 2016-11-30 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置及び方法
US20150073714A1 (en) * 2012-04-02 2015-03-12 Landmark Graphics Corporation Vsp systems and methods representing survey data as parameterized compression, shear, and dispersive wave fields
KR102216201B1 (ko) * 2013-09-16 2021-02-15 케이엘에이 코포레이션 반도체 샘플의 계측을 수행하기 위한 타원편광 측정기 장치
US9115987B2 (en) 2013-12-04 2015-08-25 Nanometrics Incorporated Optical metrology with multiple angles of incidence and/or azimuth angles
JP6306724B2 (ja) * 2014-01-09 2018-04-04 ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ 非球面およびその他の非平坦面のトポグラフィの測定
US9588066B2 (en) 2014-01-23 2017-03-07 Revera, Incorporated Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
US11157072B1 (en) 2016-02-24 2021-10-26 Apple Inc. Direct retinal projector
WO2018213971A1 (zh) * 2017-05-22 2018-11-29 深圳配天智能技术研究院有限公司 一种视觉检测参数的确定方法、视觉检测设备以及视觉检测系统
KR102751649B1 (ko) * 2018-03-12 2025-01-07 오르보테크 엘티디. 자동화된 광학 검사를 위한 광학 시스템
JP7106673B2 (ja) * 2018-11-01 2022-07-26 富士フイルム株式会社 分光測定装置
WO2020090300A1 (ja) * 2018-11-01 2020-05-07 富士フイルム株式会社 分光測定装置
US12360062B1 (en) * 2021-12-29 2025-07-15 Kla Corporation Methods and systems for regularizing the optimization of application specific semiconductor measurement system parameter settings

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0227305A (ja) * 1988-07-18 1990-01-30 Mitsubishi Rayon Co Ltd 耐熱性光学繊維
JP2002162367A (ja) * 2000-09-13 2002-06-07 Nikon Corp 表面検査装置および方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548506A (en) 1979-12-26 1985-10-22 The United States Of America As Represented By The Secretary Of The Navy Nondestructive analysis of multilayer roughness correlation
US5166752A (en) 1990-01-11 1992-11-24 Rudolph Research Corporation Simultaneous multiple angle/multiple wavelength ellipsometer and method
US5563702A (en) 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
US5412473A (en) 1993-07-16 1995-05-02 Therma-Wave, Inc. Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices
US5608526A (en) 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US5889593A (en) 1997-02-26 1999-03-30 Kla Instruments Corporation Optical system and method for angle-dependent reflection or transmission measurement
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
IL130874A (en) * 1999-07-09 2002-12-01 Nova Measuring Instr Ltd System and method for measuring pattern structures
US6891626B2 (en) * 2000-01-26 2005-05-10 Timbre Technologies, Inc. Caching of intra-layer calculations for rapid rigorous coupled-wave analyses
US6429943B1 (en) 2000-03-29 2002-08-06 Therma-Wave, Inc. Critical dimension analysis with simultaneous multiple angle of incidence measurements
US6900892B2 (en) 2000-12-19 2005-05-31 Kla-Tencor Technologies Corporation Parametric profiling using optical spectroscopic systems
JP2004529330A (ja) * 2001-03-02 2004-09-24 アクセント オプティカル テクノロジーズ，インク． スキャタロメトリを使用するライン・プロファイルの非対称測定
US6704661B1 (en) 2001-07-16 2004-03-09 Therma-Wave, Inc. Real time analysis of periodic structures on semiconductors
US6785638B2 (en) 2001-08-06 2004-08-31 Timbre Technologies, Inc. Method and system of dynamic learning through a regression-based library generation process
US7031894B2 (en) * 2002-01-16 2006-04-18 Timbre Technologies, Inc. Generating a library of simulated-diffraction signals and hypothetical profiles of periodic gratings
IL148484A (en) * 2002-03-04 2008-11-26 Nova Measuring Instr Ltd Optical measurements of patterned structures
US6721691B2 (en) * 2002-03-26 2004-04-13 Timbre Technologies, Inc. Metrology hardware specification using a hardware simulator
US6804005B2 (en) * 2002-05-02 2004-10-12 Timbre Technologies, Inc. Overlay measurements using zero-order cross polarization measurements
US6919964B2 (en) * 2002-07-09 2005-07-19 Therma-Wave, Inc. CD metrology analysis using a finite difference method
EP1527320A1 (en) * 2002-07-12 2005-05-04 Luka Optoscope ApS Method and apparatus for optically measuring the topography of nearly planar periodic structures
US7330279B2 (en) 2002-07-25 2008-02-12 Timbre Technologies, Inc. Model and parameter selection for optical metrology
US6784638B2 (en) * 2003-01-24 2004-08-31 Fu-I Yang Series charger with separate detection of batteries
US7274472B2 (en) * 2003-05-28 2007-09-25 Timbre Technologies, Inc. Resolution enhanced optical metrology
US7126700B2 (en) * 2003-12-12 2006-10-24 Timbre Technologies, Inc. Parametric optimization of optical metrology model

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0227305A (ja) * 1988-07-18 1990-01-30 Mitsubishi Rayon Co Ltd 耐熱性光学繊維
JP2002162367A (ja) * 2000-09-13 2002-06-07 Nikon Corp 表面検査装置および方法

Also Published As

Publication number Publication date
WO2006062952A2 (en) 2006-06-15
WO2006062952A3 (en) 2007-02-08
JP2008523392A (ja) 2008-07-03
US7483133B2 (en) 2009-01-27
US20060126079A1 (en) 2006-06-15

Similar Documents

Publication Publication Date Title
JP4879187B2 (ja) 複数入射角分光散乱計システム
US10495446B2 (en) Methods and apparatus for measuring height on a semiconductor wafer
US7046376B2 (en) Overlay targets with isolated, critical-dimension features and apparatus to measure overlay
KR102386664B1 (ko) 분광 빔 프로파일 계측
US11137350B2 (en) Mid-infrared spectroscopy for measurement of high aspect ratio structures
CN108463877B (zh) 用于扩展的红外线光谱椭偏测量的系统及方法
US9952140B2 (en) Small spot size spectroscopic ellipsometer
US6842259B2 (en) Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
JP6758309B2 (ja) フォーカスエラー感応性が減少した光学的計測
TWI461857B (zh) 用於角度解析分光鏡微影特性描述之方法及裝置
US7400403B2 (en) Beam profile ellipsometer with rotating compensator
US10041838B2 (en) Optical critical dimension metrology
US7292341B2 (en) Optical system operating with variable angle of incidence
US9291920B2 (en) Focus recipe determination for a lithographic scanner
US7292335B2 (en) Optical measurements of patterned structures
KR102492803B1 (ko) 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법
US12480893B2 (en) Optical and X-ray metrology methods for patterned semiconductor structures with randomness
US20250383299A1 (en) Physics augmented regression algorithm for critical dimensions in large pitch targets
US20250076185A1 (en) Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology
WO2005001577A1 (en) System and method for optical mertology of semiconductor wafers

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20081204

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110510

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110809

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110816

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20110907

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20111101

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20111129

R150 Certificate of patent or registration of utility model

Ref document number: 4879187

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20141209

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees