JP4851706B2 - Photo reflector device with slit - Google Patents

Description

  The present invention relates to a photo reflector device with a slit that detects the presence or absence of a detection object or the position of the detection object.

  The photoreflector device is an optical sensor that detects the presence or absence of an object and the position of an object in a non-contact manner, and its main applications are video and audio tape start and end mark detection sensors and video and audio tape reels. Rotation detection sensor, CD player and FDD position detection sensor, copier, printer paper detection, timing detection sensor, camera film mark detection sensor, and other camera zoom position detection sensor It is suitable for various detection applications such as manufacturing equipment such as a camera autofocus position detection sensor. The general configuration and principle will be described. The light-emitting element and the light-receiving element are shielded from light. The light emitted from the light-emitting element strikes an object to be detected and is reflected, and the light-receiving element detects the reflected light. As a result, the output on the light receiving element side changes according to the presence or absence and position of an object in the vicinity of the photoreflector device, and this is used as a detection signal. The photo reflector has a wide detection part (internal P-Tr light-receiving area), and a slit mechanism is provided on the mechanism side when the position is to be limited.

As an example of a conventionally known photoreflector device, there is a structure in which a pair of light emitting elements and a light receiving element are mounted on an upper surface of an insulating substrate, and a light shielding frame is disposed so as to surround the light emitting element and the light receiving element. (For example, see Patent Document 1)
JP 2001-156325 A (second page, FIG. 6)

  As shown in FIGS. 8 and 9, the photoreflector device disclosed in Patent Document 1 is an SMD type photoreflector, and the structure thereof will be described. 21 is an insulating substrate, 22 is a light emitting element such as a light emitting diode (hereinafter referred to as LED), and is die-bonded on one of a pair of electrodes (not shown) provided on the insulating substrate 21; The other electrode is wire-bonded with a gold wire or the like. Reference numeral 23 denotes a light receiving element made of a phototransistor or the like, which is die-bonded to one electrode of another pair of electrodes (not shown) and wire-bonded to the other electrode with a gold wire or the like. Reference numeral 24 denotes a light-shielding frame made of light-shielding plastic or the like attached on the insulating substrate 21 so as to surround the light-emitting element 22 and the light-receiving element 23, and regulates the light emission and light-receiving directions of the light-emitting element 22 and the light-receiving element 23. To do. Reference numeral 25 denotes a sealing resin made of a translucent resin, which covers the light emitting element 22 and the light receiving element 23 and seals them.

  As described above, in the case of camera zoom position detection, camera autofocus position detection, etc., the photo reflector has a wide detection unit (light receiving area of the built-in P-Tr), and if the position is to be limited, the mechanism side Is provided with a slit mechanism. In FIG. 10, reference numeral 26 denotes a mounting board on which the SMD photo reflector 20 is mounted. Reference numeral 27 denotes an object to be measured, which is attached to the mechanism side 28. Reference numeral 29 denotes a slit mechanism in which a slit 30 is formed. The slit mechanism 29 is interposed between the photoreflector 20 and the measurement object 27, the mechanism side 28 moves in the direction of arrow F, and the measurement object 27 reaches a position above the photoreflector 20. Sometimes, light emitted from the light emitting element 22 passes through the slit 30 and is reflected by the measurement object 27, and the reflected light passes through the slit 30 and is detected by the light receiving element 23. Thus, by providing the slit mechanism on the mechanism side, position detection accuracy can be improved.

  The problem to be solved, as described above, can improve the position detection accuracy by providing a slit mechanism on the mechanism side, but in this case, as the slit mechanism, not only the number of parts increases, The distance from the measurement object on the mechanism side is also required, increasing the number of assembly steps as a set and increasing the cost. In addition, it is difficult to reduce the size. There was a big problem.

  The present invention solves the above-described drawbacks, and an object of the present invention is to provide a photoreflector device with a slit that is small and requires high positional accuracy.

In order to achieve the above object, a photoreflector device with a slit according to the present invention includes a light emitting element and a light receiving element mounted on a conductive pattern formed on an insulating substrate, and a light transmitting element so as to cover the light emitting element and the light receiving element. A photoreflector comprising a sealing resin that is sealed with a heat-curable thermosetting resin and a shielding frame that has a light interference prevention function between the two elements, and has a slit mechanism between the photoreflector and the object to be measured in the photo-reflector device, the slit mechanism be those provided integrally with the upper surface of both elements side of the photo-reflector, the slit mechanism, the thin plate, positioned above the light emitting element and a light receiving element, and A slit plate in which one slit is formed so as to cross the sealing resin covering the light emitting element and the light receiving element, and the slit plate is connected to the photo reflector. It is characterized in that it has attached to the top surface of the device side.

  In addition, the slit mechanism masks the slit portion on the upper surface on both element sides of the photo reflector, and after depositing a vapor deposition film on the other opening, the mask is peeled off to provide a slit vapor deposition layer. It is characterized by.

  In the photoreflector device with a slit according to the present invention, a slit mechanism having a position limiting function is integrally provided on the upper surface on both element sides of the photoreflector, so that it is necessary to provide a separate slit mechanism and incorporate it as a set as in the past. It is possible to provide a photoreflector device with a slit that is small, inexpensive, and has high positional accuracy.

  The photo reflector device with slits of the present invention will be described with reference to the drawings.

  1 and 2 relate to Embodiment 1 of the present invention, FIG. 1 is a plan view of a photoreflector device with a slit, and FIG. 2 is a cross-sectional view taken along line AA of FIG. 1 and 2, reference numeral 1 denotes a photoreflector device with a slit to which a slit plate is attached. Reference numeral 2 denotes an insulating substrate having a substantially rectangular plane made of glass epoxy resin or the like. On the lower surface, an external connection electrode and a through-hole electrode for connecting the upper and lower surface electrodes are formed. A light emitting element 3 made of an infrared LED and a light receiving element 4 made of a phototransistor or a photodiode are mounted at a predetermined position on the upper surface side of the insulating substrate 2 and are die-bonded to a conductive pattern (not shown). It is wire-bonded with a thin metal wire and electrically connected.

  A light shielding frame 5 made of light shielding plastic or the like attached on the insulating substrate 2 is disposed so as to surround the light emitting element 3 and the light receiving element 4, and the light emitting element 3 and the light receiving element 4 are epoxy containing a visible light cut agent. It is sealed with a sealing resin 6 made of a translucent resin, and is similar to a conventional photo reflector.

  A feature of the first embodiment is that a thin plate having a light shielding property, for example, a slit 7 such as a slit width = 0.1 to 0.2 mm is provided at a predetermined position of a plate thickness = 0.1 to 0.2 mm. The formed slit plate 8 is integrally attached to the upper surfaces on both element sides of the photo reflector.

  By attaching the slit plate 8 to the upper surface of the conventional photoreflector, the number of parts is reduced, and at the same time, the number of steps for incorporating the slit mechanism as a set becomes unnecessary and the cost is reduced. Further, since a distance from the object to be detected is not required, a photoreflector device with a slit having a small size and high positional accuracy can be obtained.

  3 and 4 relate to Embodiment 2 of the present invention, FIG. 3 is a plan view of a photoreflector device with a slit, and FIG. 4 is a cross-sectional view taken along line BB in FIG. 3 and 4, the difference from the first embodiment described above is that, instead of the slit plate 8, a mask portion 10 corresponding to the slit 9 is provided on the upper surface of the photoreflector device, and a vapor deposition film is formed at the other opening. 11, the mask portion 10 is peeled off, and the slit vapor deposition layer 12 is provided to obtain a photoreflector device 1A with a slit.

  Similar to the effect of the first embodiment described above, it is possible to obtain a photoreflector device with a slit that is small and inexpensive and has high positional accuracy.

5 to 7 relate to a third embodiment of the present invention, FIG. 5 is a plan view of a photoreflector device with a slit, FIG. 6 is a cross-sectional view taken along the line CC of FIG. It is DD sectional view taken on the line.
5 to 7, the difference from the first and second embodiments is that the upper surface resin portion is molded in two colors. That is, a shielding frame 14 with a slit made of the non-translucent resin and having a slit 13 formed at a predetermined position is provided so as to cover the sealing resin 6 made of an epoxy-based translucent resin containing a visible light cut agent. Thereby, the photo reflector device 1B with a slit can be obtained.

  Similar to the effects of the first and second embodiments described above, it is possible to obtain a photoreflector device with a slit that is small and inexpensive and has high positional accuracy.

  As described above, the slits are formed on both the light-emitting side and the light-receiving side, but a sufficient effect can be obtained only by providing the slit mechanism only on the light-receiving side.

  Moreover, although the SMD type photo reflector device has been described, the photo reflector device with a slit according to the present invention is not limited to the SMD type.

It is a top view of the photo reflector device with a slit concerning Example 1 of the present invention. It is the sectional view on the AA line of FIG. It is a top view of the photo reflector device with a slit concerning Example 2 of the present invention. FIG. 4 is a sectional view taken along line BB in FIG. 3. It is a top view of the photo reflector device with a slit concerning Example 3 of the present invention. It is CC sectional view taken on the line of FIG. FIG. 6 is a sectional view taken along the line DD in FIG. 5. It is a top view of the conventional photoreflector apparatus. It is the EE sectional view taken on the line of FIG. It is explanatory drawing of the state which interposed the slit mechanism between the photo reflector apparatus of FIG. 8, and a measuring object.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 1A, 1B Photo reflector device with a slit 2 Insulating substrate 3 Light emitting element 4 Light receiving element 5 Shielding frame 6 Sealing resin 7, 9, 13 Slit 8 Slit plate 11 Vapor deposition layer 12 Slit vapor deposition layer 14 Slit light shielding frame

Claims (2)

  A light-emitting element and a light-receiving element mounted on a conductive pattern formed on an insulating substrate; a sealing resin that is sealed with a light-transmitting thermosetting resin so as to cover the light-emitting element and the light-receiving element; A photo reflector having a shielding frame having an optical interference prevention function between the photo reflector and a measured object, wherein the slit mechanism is provided on the upper surfaces of both elements of the photo reflector. The slit mechanism is disposed on a thin plate above the light emitting element and the light receiving element, and crosses the sealing resin that covers the light emitting element and the light receiving element. A photo reflector device with a slit, wherein a slit plate is formed with a single slit, and the slit plate is affixed to the upper surfaces of both elements of the photo reflector. The slit mechanism is characterized in that the slit portion is masked on the upper surface on both elements side of the photo reflector, and after depositing a deposition film on the other opening, the mask is peeled off to provide a slit deposition layer. The photo reflector device with a slit according to claim 1.

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