JP4813072B2 - 液晶滴下量測定システム及びこれを利用した液晶滴下量の測定方法 - Google Patents
液晶滴下量測定システム及びこれを利用した液晶滴下量の測定方法 Download PDFInfo
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- JP4813072B2 JP4813072B2 JP2005082966A JP2005082966A JP4813072B2 JP 4813072 B2 JP4813072 B2 JP 4813072B2 JP 2005082966 A JP2005082966 A JP 2005082966A JP 2005082966 A JP2005082966 A JP 2005082966A JP 4813072 B2 JP4813072 B2 JP 4813072B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal dropping
- amount
- dropping amount
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J49/00—Regeneration or reactivation of ion-exchangers; Apparatus therefor
- B01J49/60—Cleaning or rinsing ion-exchange beds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/14—Maintenance of water treatment installations
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
- G01N2021/8557—Special shaping of flow, e.g. using a by-pass line, jet flow, curtain flow
- G01N2021/8564—Sample as drops
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
- G02F1/13415—Drop filling process
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Environmental & Geological Engineering (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Water Supply & Treatment (AREA)
- Coating Apparatus (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
<液晶滴下量測定システム1>
図1は、本発明の一つの実施例による液晶滴下量測定システムの図である。図2は、本発明の一つの実施例による液晶滴下量測定システムの複数設置図である。
<液晶滴下量測定方法>
次に、本発明の液晶滴下量測定システムを用いて液晶滴下量を測定する方法について説明する。
次に、図3に、ほこり又は異物防止のための本発明の他の実施例による液晶滴下量測定システムを示す。
<液晶滴下量測定システム3>
また、ほこり又は異物をさらに防止する場合の液晶滴下量測定システム構造を図4a及び図4bに示されている。図4Aに示したように、液晶滴下量測定システムは、テスト基板上に液晶5を滴下するテスト液晶滴下器11、及びテスト液晶滴下量を測定する液晶滴下量測定器300を含む。
15 位置調節器
20 光源
30 拡散板
40 カメラ
51、52 導光管
100 基板
200、300 液晶滴下量測定器
Claims (5)
- 基板上に液晶を滴下する液晶滴下器と、前記基板上に滴下された前記液晶の滴下量を測定する少なくとも1つの液晶滴下量測定器と、を含む液晶滴下量測定システムであって、
前記液晶滴下量測定器は、
前記基板上に滴下された前記液晶に光を照射する光源と、
前記光源から照射されて前記液晶を通過した光を認識するカメラと、
前記液晶の体積を測定して適切な滴下量を計算し、前記適切な滴下量をフィードバックする制御部と、
フィードバックした前記適切な滴下量に基づいて、前記液晶の滴下量を調節する調節部と、
を含み、
前記液晶滴下量測定器は、前記液晶滴下器の上部に位置していることを特徴とする液晶滴下量測定システム。 - 前記光源と前記基板との間には、前記光源からの光を伝搬する第1導光管が設置されており、
前記基板と前記カメラとの間には、前記カメラに光を伝搬する第2導光管が設置されていることを特徴とする、請求項1に記載の液晶滴下量測定システム。 - 前記第1導光管の光射出側には拡散板が設置されていることを特徴とする、請求項1または2に記載の液晶滴下量測定システム。
- 基板上に液晶滴下器によって液晶を滴下する段階と、
前記基板上に滴下された前記液晶の体積を、前記液晶滴下器の上部に配置されている液晶滴下量測定器で測定する段階と、
測定された前記液晶の体積に基づいて前記基板上に滴下された滴下量を計算し、液晶滴下器にフィードバックして液晶滴下量を調節する段階と、
を含むことを特徴とする液晶滴下量の測定方法。 - 前記液晶滴下量測定器は複数台あって、
前記複数の液晶滴下量測定器で液晶の体積を測定する段階をさらに含む、請求項4に記載の液晶滴下量の測定方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2005-003222 | 2005-01-13 | ||
KR1020050003222A KR20060082641A (ko) | 2005-01-13 | 2005-01-13 | 액정 적하량 측정 시스템 및 이를 이용한 액정 적하량측정 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006195402A JP2006195402A (ja) | 2006-07-27 |
JP4813072B2 true JP4813072B2 (ja) | 2011-11-09 |
Family
ID=36652377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005082966A Expired - Fee Related JP4813072B2 (ja) | 2005-01-13 | 2005-03-23 | 液晶滴下量測定システム及びこれを利用した液晶滴下量の測定方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7307739B2 (ja) |
JP (1) | JP4813072B2 (ja) |
KR (1) | KR20060082641A (ja) |
CN (1) | CN1804542B (ja) |
TW (1) | TW200624909A (ja) |
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WO2009076249A2 (en) * | 2007-12-06 | 2009-06-18 | Applied Materials, Inc. | Methods and apparatus for measuring deposited ink in pixel wells on a substrate using a line scan camera |
KR100919407B1 (ko) * | 2008-01-28 | 2009-09-29 | 주식회사 탑 엔지니어링 | 액정 적하 장치 |
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JP5366293B2 (ja) * | 2008-10-10 | 2013-12-11 | 芝浦メカトロニクス株式会社 | 液晶滴下装置及び液晶滴下方法 |
WO2010137370A1 (ja) * | 2009-05-25 | 2010-12-02 | シャープ株式会社 | 液晶滴下装置および液晶滴下のモニタ方法 |
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KR101201403B1 (ko) * | 2010-12-30 | 2012-11-14 | 에이피시스템 주식회사 | 감지 모듈 |
KR101288988B1 (ko) * | 2010-12-30 | 2013-07-23 | 에이피시스템 주식회사 | 적하 장치 |
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2005
- 2005-01-13 KR KR1020050003222A patent/KR20060082641A/ko not_active Application Discontinuation
- 2005-03-23 JP JP2005082966A patent/JP4813072B2/ja not_active Expired - Fee Related
- 2005-09-16 US US11/228,952 patent/US7307739B2/en not_active Expired - Fee Related
- 2005-09-20 TW TW094132429A patent/TW200624909A/zh unknown
- 2005-12-29 CN CN2005101381228A patent/CN1804542B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1804542A (zh) | 2006-07-19 |
KR20060082641A (ko) | 2006-07-19 |
TW200624909A (en) | 2006-07-16 |
CN1804542B (zh) | 2010-05-05 |
US20060151727A1 (en) | 2006-07-13 |
JP2006195402A (ja) | 2006-07-27 |
US7307739B2 (en) | 2007-12-11 |
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