JP4794998B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP4794998B2
JP4794998B2 JP2005337468A JP2005337468A JP4794998B2 JP 4794998 B2 JP4794998 B2 JP 4794998B2 JP 2005337468 A JP2005337468 A JP 2005337468A JP 2005337468 A JP2005337468 A JP 2005337468A JP 4794998 B2 JP4794998 B2 JP 4794998B2
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Japan
Prior art keywords
gas
plasma
plasma processing
processing apparatus
workpiece
Prior art date
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Expired - Fee Related
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JP2005337468A
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English (en)
Japanese (ja)
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JP2006179876A (ja
JP2006179876A5 (enExample
Inventor
光央 齋藤
智洋 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2005337468A priority Critical patent/JP4794998B2/ja
Publication of JP2006179876A publication Critical patent/JP2006179876A/ja
Publication of JP2006179876A5 publication Critical patent/JP2006179876A5/ja
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Publication of JP4794998B2 publication Critical patent/JP4794998B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2005337468A 2004-11-24 2005-11-22 プラズマ処理装置 Expired - Fee Related JP4794998B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005337468A JP4794998B2 (ja) 2004-11-24 2005-11-22 プラズマ処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004338418 2004-11-24
JP2004338418 2004-11-24
JP2005337468A JP4794998B2 (ja) 2004-11-24 2005-11-22 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2006179876A JP2006179876A (ja) 2006-07-06
JP2006179876A5 JP2006179876A5 (enExample) 2008-09-25
JP4794998B2 true JP4794998B2 (ja) 2011-10-19

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ID=36733642

Family Applications (1)

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JP2005337468A Expired - Fee Related JP4794998B2 (ja) 2004-11-24 2005-11-22 プラズマ処理装置

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JP (1) JP4794998B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5026005B2 (ja) 2005-09-19 2012-09-12 三洋電機株式会社 無線装置
JP6155455B2 (ja) * 2012-06-29 2017-07-05 京セラ株式会社 大気圧プラズマ発生用電極および大気圧プラズマ発生装置、ならびにそれを用いた大気圧プラズマ加工物の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0557525A (ja) * 1991-08-30 1993-03-09 Nippondenso Co Ltd 微細トレンチ加工機および微細トレンチ加工方法
JPH0685059A (ja) * 1992-09-01 1994-03-25 Yuuha Mikakutou Seimitsu Kogaku Kenkyusho:Kk 加工用電極
JP4754115B2 (ja) * 2001-08-03 2011-08-24 東京エレクトロン株式会社 プラズマ処理装置
JP4110062B2 (ja) * 2002-08-28 2008-07-02 松下電器産業株式会社 プラズマ処理方法及び装置
JP4233348B2 (ja) * 2003-02-24 2009-03-04 シャープ株式会社 プラズマプロセス装置

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JP2006179876A (ja) 2006-07-06

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