JP4776514B2 - 窒化物半導体レーザ素子 - Google Patents
窒化物半導体レーザ素子 Download PDFInfo
- Publication number
- JP4776514B2 JP4776514B2 JP2006329465A JP2006329465A JP4776514B2 JP 4776514 B2 JP4776514 B2 JP 4776514B2 JP 2006329465 A JP2006329465 A JP 2006329465A JP 2006329465 A JP2006329465 A JP 2006329465A JP 4776514 B2 JP4776514 B2 JP 4776514B2
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- JP
- Japan
- Prior art keywords
- film
- nitride semiconductor
- semiconductor laser
- aluminum
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Formation Of Insulating Films (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006329465A JP4776514B2 (ja) | 2005-12-16 | 2006-12-06 | 窒化物半導体レーザ素子 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005363589 | 2005-12-16 | ||
| JP2005363589 | 2005-12-16 | ||
| JP2006329465A JP4776514B2 (ja) | 2005-12-16 | 2006-12-06 | 窒化物半導体レーザ素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007189207A JP2007189207A (ja) | 2007-07-26 |
| JP2007189207A5 JP2007189207A5 (https=) | 2008-04-03 |
| JP4776514B2 true JP4776514B2 (ja) | 2011-09-21 |
Family
ID=38344122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006329465A Active JP4776514B2 (ja) | 2005-12-16 | 2006-12-06 | 窒化物半導体レーザ素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4776514B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5004597B2 (ja) * | 2006-03-06 | 2012-08-22 | シャープ株式会社 | 窒化物半導体発光素子および窒化物半導体発光素子の製造方法 |
| JP5430826B2 (ja) | 2006-03-08 | 2014-03-05 | シャープ株式会社 | 窒化物半導体レーザ素子 |
| JP5127642B2 (ja) * | 2007-09-28 | 2013-01-23 | 三洋電機株式会社 | 窒化物系半導体レーザ素子 |
| JP5127644B2 (ja) * | 2007-09-28 | 2013-01-23 | 三洋電機株式会社 | 窒化物系半導体レーザ素子 |
| JP4621791B2 (ja) | 2009-06-11 | 2011-01-26 | シャープ株式会社 | 窒化物半導体レーザ素子 |
| JP2024019797A (ja) * | 2022-08-01 | 2024-02-14 | 株式会社日本製鋼所 | 半導体レーザおよびその製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000021860A (ja) * | 1998-07-03 | 2000-01-21 | Hitachi Ltd | 半導体装置およびその製造方法 |
| JP4977931B2 (ja) * | 2001-03-06 | 2012-07-18 | ソニー株式会社 | GaN系半導体レーザの製造方法 |
| JP2005340625A (ja) * | 2004-05-28 | 2005-12-08 | Nichia Chem Ind Ltd | 窒化物半導体レーザ素子 |
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2006
- 2006-12-06 JP JP2006329465A patent/JP4776514B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007189207A (ja) | 2007-07-26 |
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