JP4776514B2 - 窒化物半導体レーザ素子 - Google Patents

窒化物半導体レーザ素子 Download PDF

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Publication number
JP4776514B2
JP4776514B2 JP2006329465A JP2006329465A JP4776514B2 JP 4776514 B2 JP4776514 B2 JP 4776514B2 JP 2006329465 A JP2006329465 A JP 2006329465A JP 2006329465 A JP2006329465 A JP 2006329465A JP 4776514 B2 JP4776514 B2 JP 4776514B2
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Prior art keywords
film
nitride semiconductor
semiconductor laser
aluminum
oxide film
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JP2006329465A
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Japanese (ja)
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JP2007189207A (ja
JP2007189207A5 (https=
Inventor
佳伸 川口
剛 神川
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Sharp Corp
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Sharp Corp
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  • Formation Of Insulating Films (AREA)
  • Semiconductor Lasers (AREA)
JP2006329465A 2005-12-16 2006-12-06 窒化物半導体レーザ素子 Active JP4776514B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006329465A JP4776514B2 (ja) 2005-12-16 2006-12-06 窒化物半導体レーザ素子

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005363589 2005-12-16
JP2005363589 2005-12-16
JP2006329465A JP4776514B2 (ja) 2005-12-16 2006-12-06 窒化物半導体レーザ素子

Publications (3)

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JP2007189207A JP2007189207A (ja) 2007-07-26
JP2007189207A5 JP2007189207A5 (https=) 2008-04-03
JP4776514B2 true JP4776514B2 (ja) 2011-09-21

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JP2006329465A Active JP4776514B2 (ja) 2005-12-16 2006-12-06 窒化物半導体レーザ素子

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JP (1) JP4776514B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5004597B2 (ja) * 2006-03-06 2012-08-22 シャープ株式会社 窒化物半導体発光素子および窒化物半導体発光素子の製造方法
JP5430826B2 (ja) 2006-03-08 2014-03-05 シャープ株式会社 窒化物半導体レーザ素子
JP5127642B2 (ja) * 2007-09-28 2013-01-23 三洋電機株式会社 窒化物系半導体レーザ素子
JP5127644B2 (ja) * 2007-09-28 2013-01-23 三洋電機株式会社 窒化物系半導体レーザ素子
JP4621791B2 (ja) 2009-06-11 2011-01-26 シャープ株式会社 窒化物半導体レーザ素子
JP2024019797A (ja) * 2022-08-01 2024-02-14 株式会社日本製鋼所 半導体レーザおよびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000021860A (ja) * 1998-07-03 2000-01-21 Hitachi Ltd 半導体装置およびその製造方法
JP4977931B2 (ja) * 2001-03-06 2012-07-18 ソニー株式会社 GaN系半導体レーザの製造方法
JP2005340625A (ja) * 2004-05-28 2005-12-08 Nichia Chem Ind Ltd 窒化物半導体レーザ素子

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JP2007189207A (ja) 2007-07-26

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