JP4763628B2 - Seismic isolation device - Google Patents

Description

  The present invention relates to a seismic isolation device including a lower support member and an upper support member that is movably attached to the lower support member and on which a seismic isolation object is placed.

  Seismic isolation devices are used to protect racks containing computers and works of art from earthquakes.

  One important point to consider when designing a seismic isolation device is the installation space for the seismic isolation device. Computer racks are usually designed and installed so that they can fit in the room ceiling without a seismic isolation device. In such a case, if the seismic isolation device is installed later, there is a concern that the rack may hit the ceiling or lighting fixtures, or block the ventilation, exhaust, and lighting space. Therefore, the height of the seismic isolation device itself needs to be designed as low as possible.

  In the case of a seismic isolation device for fine arts, the height of the art work itself is low, so it is easier to handle than the computer rack, but the height of the seismic isolation device is limited due to the position of the line of sight suitable for viewing. It is similar in that there is.

  From such a point of view, there is a seismic isolation device composed of a minimum support mechanism and a restoration mechanism (see, for example, Patent Document 1).

  In the seismic isolation device of Patent Literature 1, an intermediate frame is provided between an upper frame and a lower frame, and a curved rail body is disposed between the frames so as to face each other. A moving body having a roller body is provided between the opposed rail bodies, and the upper frame can move in the XY directions by moving the roller body on the rail body. In addition, since the rail body is curved, the roller body moves downward along the rail body due to gravity and is a restoring mechanism that returns to the original position.

  However, since the seismic isolation device of Patent Document 1 does not have a damping mechanism, the seismic isolation effect is insufficient.

  As a second example of the seismic isolation device, there is a seismic isolation device that performs seismic isolation using a hydraulic damper as a damping mechanism (see, for example, Patent Document 2).

  In the seismic isolation device of Patent Document 2, a mounting table on which a seismic isolation object is mounted and a sliding plate disposed below the mounting table are connected by a columnar vibration transmission member, and further, a hydraulic damper is attached to the sliding plate. Are connected. This hydraulic damper attenuates vibrations.

  However, the hydraulic damper has a small ratio of the effective stroke to the entire length of the damper (less than 1/2, about 1/3), and the stroke of the seismic isolation device is limited. For this reason, when a required stroke is ensured, a hydraulic damper having a long overall length is required, and the seismic isolation device is enlarged.

  As a third example of the seismic isolation device, there is a damper device that attenuates vibration using a viscous fluid (see, for example, Patent Document 3).

  The damper device of Patent Document 3 has a base-isolated table composed of upper and lower bases, and a viscous fluid rotary damper having a rotor on the lower base is fixed. Further, the rotary damper is connected to a bracket that can be turned horizontally, and is provided with a roller that rotates by turning the bracket. The roller is in contact with the back surface of the upper base, and even if the upper and lower bases move relative to each other, the rotor rotates due to the rotation of the roller and the horizontal rotation of the bracket, and the upper and lower bases move relative to each other by viscous fluid. Is given resistance.

However, in the damper device of Patent Document 3, the moving direction of the upper and lower bases is premised on the horizontal direction. For example, when the upper base moves up and down due to vibration, the roller cannot rotate, and the viscous fluid It is not possible to obtain the vibration attenuation effect due to.
JP2001-241501 JP 2000-170831 A JP 2000-314443 A

  An object of this invention is to obtain the seismic isolation apparatus which can suppress the vibration which acts on a seismic isolation object irrespective of the relative movement direction of an upper support member and a lower support member.

In the seismic isolation device according to claim 1 of the present invention, a seismic isolation unit including a lower support member and an upper support member that is movably attached to the lower support member and on which a seismic isolation object is placed is disposed. In the seismic isolation device, a container provided along the moving direction of the upper support member, a viscous body accommodated in the container, and a resistance plate that generates a damping force by moving in contact with the viscous body Connecting means for connecting the resistance plate to the upper support member; and provided on the inner wall of the container, supporting the resistance plate and allowing the resistance plate to move in contact with the liquid surface of the viscous body. And a groove portion .

  According to the above configuration, when the floor vibrates, the lower support member and the container are shaken, but the upper support member is movably attached to the lower support member, so that it tries to stay in place.

  In addition, since the resistance plate connected to the upper support member via the connecting means also tries to stay in place, the resistance plate will move in contact with the viscous material when viewed relatively, and the resistance plate is attenuated. Force is generated.

By this damping force, the movement of the upper support member is suppressed regardless of the relative movement direction of the upper support member and the lower support member, and the vibration acting on the seismic isolation object can be suppressed. Furthermore, when viewed relatively, the resistance plate moves along the groove, so that the lower surface of the resistance plate moves in contact with the liquid surface of the viscous material. Thereby, the damping force acts evenly on the entire surface of the resistance plate.

In the seismic isolation device according to claim 2 of the present invention, the seismic isolation unit is disposed on the XY axis, and the lower support member disposed on the X axis is disposed on the upper support member disposed on the Y axis. And the seismic isolation object is placed on the upper support member arranged on the X- axis.

  According to the above configuration, when the floor oscillates, the lower support member and the container are shaken in the XY directions, but the upper support member is movably attached to the lower support member, so that it will remain in place. To do.

  In addition, since the resistance plate connected to the upper support member via the connecting means also tries to stay in place, the resistance plate will move in contact with the viscous material when viewed relatively, and the resistance plate is attenuated. Force is generated.

  By this damping force, the movement of the upper support member is suppressed regardless of the relative movement direction of the upper support member and the lower support member, and the vibration acting on the seismic isolation object can be suppressed.

  The seismic isolation device according to claim 3 of the present invention is characterized in that the container is disposed on the lower support member along the lower support member.

  According to the said structure, since a container exists in the upper part of a lower support member, the space which puts a container on a floor becomes unnecessary.

Seismic isolation device according to claim 4 of the present invention, the the groove portion a plurality of said resistance plate is supported, is characterized in that a resistive plate connecting member connecting the resistive plate.

  According to the said structure, the contact area of a resistance board and a viscous body can be changed by connecting a some resistance board with a resistance board connection member, or canceling | releasing connection. This eliminates the need to remove the resistance plate from the container and replace it when the damping force is adjusted by changing the contact area between the resistance plate and the viscous body according to the weight of the seismic isolation object. Becomes easy.

The seismic isolation device according to claim 5 of the present invention includes a restoration mechanism in which the upper support member moves up and down relative to the lower support member to restore the initial position, and the connecting means is substantially omitted from the upper support member. A connecting member projecting vertically downward, and projecting substantially vertically upward from the resistor plate, hits the connecting member when the upper support member moves, and moves the resistor plate integrally with the upper support member And an abutting member to be provided.

  According to the above configuration, even if the upper support member moves in the horizontal direction while moving up and down relatively, the connecting member hits the contact member, so that the resistance plate and the upper support member become the lower support member. Can be moved together.

  Since this invention set it as the said structure, it can suppress the vibration which acts on a seismic isolation object irrespective of the relative movement direction of the upper support member and lower support member of a seismic isolation apparatus.

  1st Embodiment of the seismic isolation apparatus of this invention is described based on drawing.

  As shown in FIG. 1, the seismic isolation device 10 includes four seismic isolation units 14A, 14B, 14C, and 14D and four damper units 16A, 16B, 16C, and 16D.

  The seismic isolation units 14A and 14B, 14C and 14D have the same configuration. The damper units 16A and 16B and 16C and 16D have the same configuration.

  As shown in FIG. 2a, the seismic isolation unit 14A includes a U-shaped upper channel member 18A and a U-shaped lower channel member 20A arranged inside the upper channel member 18A. The lower channel member 20A is fixed on the floor 12 by fixing means such as welding, adhesion, fastening with bolts and nuts (not shown).

  On both side surfaces of the upper channel member 18A, arc rails 22A each formed of a curved through hole having a high center portion and low end portions are formed at two locations. Similarly, on both side surfaces of the lower channel member 20A, arc rails 24A (see FIG. 3) each formed of a curved through hole having a low center portion and high end portions are formed at two locations.

  One circular columnar rotating body 26A is inserted through the two arc rails 22A and the arc rail 24A, and penetrates from one side surface of the upper channel member 18A to the other side surface. Accordingly, the upper channel material 18A is supported by the lower channel material 20A, and the upper channel material 18A and the lower channel material 20A can be moved relative to each other.

  In the initial position state in which the end portion of the upper channel member 18A and the end portion of the lower channel member 20A are aligned, the rotating body 26A is located at the center of the arc rails 22A and 24A.

  As shown in FIGS. 1 and 2a, one end of a plate-like connecting member 28A is attached to one side upper part of the upper channel member 18A by fixing means such as welding, bonding, fastening with bolts and nuts (not shown). It is fixed in a direction orthogonal to the side surface of the channel material 18A. Further, a resistance plate 30A is fixed to the other end of the connecting member 28A in a direction orthogonal to the connecting member 28A by fixing means such as welding, adhesion, fastening with bolts and nuts (not shown).

  Thereby, the resistance plate 30A can be moved integrally with the upper channel member 18A via the connecting member 28A.

  On the other hand, a flat plate-like fixing portion 32A is fixed on the floor 12 by fixing means such as welding, bonding, fastening with bolts and nuts (not shown).

  On the fixed portion 32A, a rectangular parallelepiped container 34A having an opening on the upper surface and disposed along the longitudinal direction of the upper channel member 18A is formed integrally with the fixed portion 32A.

  As shown in FIG. 2 a, a viscous body L such as silicone oil is accommodated in advance in the container 34 </ b> A, and a resistance plate 30 </ b> A is inserted vertically into the viscous body L. The resistance plate 30A is arranged such that the distance between the resistance plate 30A and the container 34A is d1 = d2.

  Here, the above-described damper unit 16A is configured by the connecting member 28A, the resistance plate 30A, the fixing portion 32A, the container 34A, and the viscous body L.

  In addition, since the structure of the seismic isolation unit 14B and the damper unit 16B is the same as that of the seismic isolation unit 14A and the damper unit 16A, description is abbreviate | omitted.

  As shown in FIG. 1, two sets of seismic isolation units 14A and damper units 16A, and seismic isolation units 14B and damper units 16B are arranged on the floor 12 at predetermined intervals along the arrow Y direction. The seismic isolation units 14C and 14D are arranged on the seismic isolation units 14A and 14B so as to be orthogonal to the seismic isolation units 14A and 14B, and are fixed by fixing means such as bolts and nuts (not shown).

  As shown in FIG. 2b, the seismic isolation unit 14C includes a U-shaped upper channel member 18C and a U-shaped lower channel member 20C arranged inside the upper channel member 18C.

  On both side surfaces of the upper channel member 18C, arc rails 22C each formed of a curved through hole having a central portion and low end portions are formed at two locations. Similarly, on both side surfaces of the lower channel member 20C, arc rails 24C each formed of a curved through hole having a low center portion and high end portions are formed at two locations.

  One circular columnar rotating body 26C is inserted through the two arc rails 22C and 24C, and penetrates from one side surface of the upper channel member 18C to the other side surface. Thereby, the upper channel material 18C is supported by the lower channel material 20C, and the upper channel material 18C and the lower channel material 20C are relatively movable.

  In the initial position state in which the end portion of the upper channel member 18C and the end portion of the lower channel member 20C are aligned, the rotating body 26C is located at the center of the arc rails 22C and 24C.

  As shown in FIGS. 1 and 2a, one end of a plate-like connecting member 28C is fixed on one side surface of the upper channel member 18C by fixing means such as welding, bonding, fastening with bolts and nuts (not shown). It is fixed in a direction perpendicular to the side surface of the channel material 18C. Further, a resistance plate 30C is fixed to the other end of the connecting member 28C in a direction orthogonal to the connecting member 28C by fixing means such as welding, adhesion, fastening with bolts and nuts (not shown).

  Thereby, the resistance plate 30C can move integrally with the upper channel member 18C via the connecting member 28C.

  On the other hand, a flat plate-like fixing portion 32C is fixed to the side surface of the lower channel member 20C by fixing means such as welding, adhesion, fastening with bolts and nuts (not shown).

  On the fixed portion 32C, a rectangular parallelepiped container 34C having an opening on the upper surface and disposed along the longitudinal direction of the upper channel member 18C is formed integrally with the fixed portion 32C.

  As shown in FIG. 2b, a viscous body L such as silicon oil is accommodated in advance in the container 34C, and a resistance plate 30C is inserted vertically into the viscous body L. The resistance plate 30C is arranged such that the distance between the resistance plate 30C and the container 34C is d1 = d2.

  Here, the above-described damper unit 16C is configured by the connecting member 28C, the resistance plate 30C, the fixing portion 32C, the container 34C, and the viscous body L.

  The configuration of the seismic isolation unit 14D and the damper unit 16D is the same as that of the seismic isolation unit 14C and the damper unit 16C as shown in FIG.

  Two sets of seismic isolation unit 14C and damper unit 16C, and seismic isolation unit 14D and damper unit 16D are arranged along the arrow X direction.

  Here, on the upper channel members 18C and 18D of the seismic isolation units 14C and 14D, a server rack 16 loaded with a computer server is placed, and is fixed to the upper channel members 18C and 18D by fixing means such as bolts and nuts (not shown). It is fixed.

  The seismic isolation unit 14A and the seismic isolation units 14B to 14D, and the damper unit 16A and the damper units 16B to 16D are similarly moved by each channel material, the resistance plate in the viscous body L, and the like. Since the seismic effect can be obtained, the following explanation will explain the construction of the seismic isolation unit 14A and the damper unit 16A. If necessary to describe the overall construction, the symbols B, C and D will be given. I will explain.

  Next, the relative movement and restoration mechanism of the upper channel material 18A and the lower channel material 20A will be described.

  As shown in FIG. 3a, in the initial position, the ends of the upper channel member 18A and the lower channel member 20A are aligned, and the rotating body 26A is located at the center of the arc rails 22A, 24A.

  Subsequently, as shown in FIG. 3b, when the lower channel member 20A moves in the arrow + Y direction due to periodic vibration, the rotating body 26A rises to the right end of the arc rail 24A and moves to the left end of the arc rail 22A. To do.

  As a result, the upper channel material 18A moves relative to the lower channel material 20A. Further, since the center position of the rotating body 26A is higher than the center position at the initial position, the upper channel material 18A rises in the arrow Z direction.

  Subsequently, when the lower channel member 20A moves in the arrow -Y direction due to vibration, the rotating body 26A moves downward on the arc rail 24A and moves upward on the arc rail 22A to return to the initial position. Thereby, the upper channel material 18A also becomes the height of the initial position.

  Subsequently, as shown in FIG. 3c, when the lower channel member 20A further moves in the arrow -Y direction, the rotating body 26A rises to the left end of the arc rail 24A and moves to the right end of the arc rail 22A.

  As a result, the upper channel material 18A moves relative to the lower channel material 20A. Further, since the center position of the rotating body 26A is higher than the center position at the initial position, the upper channel material 18A rises in the arrow Z direction.

  Subsequently, when the lower channel member 20A moves in the arrow + Y direction due to vibration, the rotating body 26A moves downward on the arc rail 24A, moves upward on the arc rail 22A, and returns to the initial position. The upper channel material 18A is also at the height of the initial position.

  Thus, when a vibration having periodicity is given, the lower channel material 20A moves in the directions of the arrows + Y and -Y, so that the upper channel material 18A and the lower channel material 20A move relative to each other. ing. Further, by having a restoration mechanism in which the rotating body 26A moves downward along the arc rail 24A, restoration to the initial position is performed.

  Next, the operation of the first embodiment of the present invention will be described.

  As shown in FIG. 1, when the floor 12 vibrates in the XY direction, the lower channel members 20A and 20B and the containers 34A and 34B swing in the + Y or −Y direction. Since the upper channel members 18A and 18B are movably attached to the lower channel members 20A and 20B, the upper channel members 18A and 18B are lifted in the Z direction in order to stay in place (see FIG. 3).

  Further, the resistance plates 30A and 30B connected to the upper channel members 18A and 18B via the connecting members 28A and 28B are also raised in the Z direction so as to stay on the spot. Since the resistance plates 30A and 30B are inserted into the viscous bodies L of the containers 34A and 34B, the resistance plates 30A and 30B can freely move in the Z direction, and the movement of the upper channel members 18A and 18B in the Z direction is not hindered.

  As shown in FIG. 4, when viewed relatively, the resistance plates 30 </ b> A and 30 </ b> B move in contact with the viscous body L with the area S, and a vibration damping force is generated in the resistance plates 30 </ b> A and 30 </ b> B.

  Due to this damping force, movement of the upper channel members 18A and 18B in the + Y and −Y directions is suppressed.

  On the other hand, the lower channel members 20C and 20D fixed to the upper channel members 18A and 18B are not shaken in the + Y and −Y directions because the upper channel members 18A and 18B remain in the initial positions. However, since the swing in the X direction of the floor 12 is transmitted through the upper channel members 18A and 18B, the lower channel members 20C and 20D swing in the + X and −X directions.

  At this time, since the upper channel members 18C and 18D are movably attached to the lower channel members 20C and 20D, the upper channel members 18C and 18D are lifted in the Z direction in order to stay in place (see FIG. 3).

  Further, the resistance plates 30C and 30D connected to the upper channel members 18C and 18D via the connecting members 28C and 28D also rise in the Z direction so as to stay in place. Since the resistance plates 30C and 30D are inserted into the viscous bodies L of the containers 34C and 34D, the resistance plates 30C and 30D can freely move in the Z direction, and the movement of the upper channel members 18C and 18D in the Z direction is not hindered.

  Here, like the above-described resistance plates 30A and 30B, when viewed relatively, the resistance plates 30C and 30D move in contact with the viscous body L, and vibration damping force is generated in the resistance plates 30C and 30D. To do.

  Due to this damping force, movement of the upper channel members 18C and 18D in the + X and −X directions via the resistance plates 30C and 30D is suppressed.

  Thus, even if the floor 12 vibrates in the X and Y directions, the movement of the upper channel members 18C and 18D in the X and Y directions is suppressed by the damping force generated by each resistance plate. Can be suppressed.

  In addition, the same seismic isolation effect can be obtained in each seismic isolation unit and each damper unit regardless of the relative movement direction (X direction, Y direction) of each upper channel material and each lower channel material.

  Furthermore, since the ratio of the effective stroke with respect to the total length of the upper channel material 20A and the lower channel material 20B is larger than that of the hydraulic damper, a channel material with a long total length is not required when securing a necessary stroke for vibration, The seismic isolation device can be downsized.

  Next, 2nd Embodiment of the seismic isolation structure of this invention is described based on drawing.

  Note that the same reference numerals as those in the first embodiment are given to the same elements as those in the first embodiment described above, and the description thereof is omitted.

  As shown in FIG. 5, a seismic isolation device 50 is provided on the floor 12. The seismic isolation device 50 includes two seismic isolation units 14A and 14B arranged in the Y direction and two seismic isolation units 14C and 14D arranged in the X direction. The server rack 16 is placed on the seismic isolation units 14C and 14D.

  Further, inside the lower channel members 20A, 20B, 20C, and 20D, rectangular parallelepiped containers 52A, 52B, 52C, and 52D that have openings on the upper surface and are disposed along the longitudinal direction of the lower channel member 20A are illustrated. It is fixed by fixing means such as welding.

  In addition, since each member which attached | subjected code | symbol A-D is the same structure, in the following description, the structure of code | symbol A is demonstrated and the code | symbol of B, C, D is required when description of the whole structure is required. A description will be given.

  As shown in FIG. 6, the container 52A is fixed inside the lower channel member 20A. A pair of rectangular grooves 54A are formed on the inner wall of the container 52A along the longitudinal direction of the lower channel member 20A.

  An end portion of a flat resistor plate 56A is extrapolated in the groove portion 54A, and the resistor plate 56A is movable along the groove portion 54A. Further, the aforementioned viscous body L is accommodated between the resistance plate 56A and the inner bottom wall of the container 52A, and the resistance plate 56A and the viscous body L are in contact with each other.

  Abutting plates 57A and 58A made of a flat plate are erected at a predetermined interval at the center of the resistance plate 56A in the longitudinal direction on the upper surface of the resistance plate 56A. The contact plates 57A and 58A are welded to the resistance plate 56A and are integrated with the resistance plate 56A.

  On the other hand, one end of a cylindrical pin 60A is welded and fixed to the center in the longitudinal direction on the upper surface of the inner wall of the upper channel member 18A. The other end of the pin 60A is inserted between the contact plates 57A and 58A.

  Here, the pin 60A can move in the Z direction between the contact plates 57A and 58A, and contacts the contact plates 57A and 58A even if the pin 60A moves in the Z direction. Further, when the resistance plate 56A moves, the upper channel material 18A can be moved in the same direction as the resistor plate 56A by bringing the pins 60A into contact with the contact plates 57A and 58A.

  Next, the operation of the second embodiment of the present invention will be described.

  As shown in FIGS. 5 and 6, when the floor 12 vibrates in the XY direction, the lower channel members 20A and 20B and the containers 52A and 52B swing in the + Y or −Y direction. Since the upper channel members 18A and 18B are movably attached to the lower channel members 20A and 20B, the upper channel members 18A and 18B are lifted in the Z direction in order to stay in place (see FIG. 3).

  Further, as the upper channel members 20A and 20B rise in the Z direction, the pins 60A and 60B also rise in the Z direction.

  The pins 60A and 60B are free to move in the Z direction, and the movement of the upper channel members 18A and 18B in the Z direction is not hindered. Further, since the resistance plates 56A and 56B are not affected by the movement of the pins 60A and 60B in the Z direction, they can move along the groove portions 54A and 54B and move in the Y direction.

  Here, when the pins 60A, 60B come into contact with the contact plates 57A, 58A, 57B, 58B, the resistance plates 56A, 56B also try to stay in place. Therefore, when viewed relatively, as shown in FIG. 7, the resistance plates 56A and 56B move in contact with the viscous body L in the area S, and a vibration damping force is generated in the resistance plates 56A and 56B. .

  Due to this damping force, movement of the upper channel members 18A and 18B in the + Y and −Y directions is suppressed.

On the other hand, the lower channel members 20C and 20D fixed to the upper channel members 18A and 18B.
Since the upper channel members 18A and 18B remain in the initial positions, they do not swing in the + Y and −Y directions. However, since the swing in the X direction of the floor 12 is transmitted through the upper channel members 18A and 18B, the lower channel members 20C and 20D swing in the + X and −X directions.

  Further, the containers 52C and 52D fixed to the lower channel members 20C and 20D are also shaken in the + X or −X direction by the vibration of the floor 12.

  At this time, since the upper channel members 18C and 18D are movably attached to the lower channel members 20C and 20D, the upper channel members 18C and 18D are lifted in the Z direction so as to stay in place. Further, the pins 60C and 60D also rise in the Z direction.

  On the other hand, since the resistance plates 56C and 56D are not affected by the movement of the pins 60C and 60D in the Z direction, they can move along the grooves 54C and 54D and move in the X direction.

  Here, when the pins 60C, 60D come into contact with the contact plates 57C, 58C, 57D, 58D, the resistance plates 56C, 56D also try to stay in place. Therefore, when viewed relatively, the resistance plates 56C and 56D move in contact with the viscous body L, and a vibration damping force is generated in the resistance plates 56C and 56D.

  Due to this damping force, the movement of the upper channel members 18C and 18D in the + X and −X directions is suppressed.

  Thus, even if the floor 12 vibrates in the XY direction, the movement of the upper channel members 18C and 18D in the XY direction is suppressed by the damping force generated by the viscous body L. Therefore, the XY direction acting on the server rack 16 is suppressed. Vibration can be suppressed. The effect of suppressing vibration does not depend on the relative movement direction of the upper channel members 18A, 18B, 18C, 18D and the lower channel members 20A, 20B, 20C, 20D in the seismic isolation device 10.

  Further, since the containers 52A, 52B, 52C, 52D are arranged on the upper side (inside) of the lower channel members 20A, 20B, 20C, 20D, a space for placing the containers 52A, 52B, 52C, 52D on the floor 12 is unnecessary. It becomes.

  Further, when viewed relatively, the resistance plates 56A, 56B, 56C, and 56D move along the groove portions 54A, 54B, 54C, and 54D, so that the lower surfaces of the resistance plates 56A, 56B, 56C, and 56D Since it moves in contact with the liquid surface, the damping force of the viscous body L acts evenly on the entire surface of the resistance plates 56A, 56B, 56C, 56D.

  In addition, relatively, even if the upper channel members 18A, 18B, 18C, 18D move in the XY direction while moving up and down in the Z direction, the pins 60A, 60B, 60C, 60D and the contact plates 57A, 58A, When the 57D and 58D are in contact, the resistance plates 56A, 56B, 56C and 56D and the upper channel members 18A, 18B, 18C and 18D are moved together along the lower channel members 20A, 20B, 20C and 20D. Can do.

  Furthermore, by moving the resistance plates 56A, 56B, 56C, 56D in one direction along the groove portions 54A, 54B, 54C, 54D, the resistance plates 56A, 56B, 56D from the inner bottom surface of the containers 52A, 52B, 52C, 52D, The gaps up to 56C and 56D can be made constant, and the damping force by the resistance plates 56A, 56B, 56C and 56D is stabilized.

  Next, an example of server room earthquake response analysis using the seismic isolation device 50 will be described.

  The analysis conditions were the building model S, 7 floors above ground, 5 floors with seismic isolation equipment installed, 5 seconds with seismic isolation cycles, and the input seismic waves as Ministry of Land, Infrastructure, Transport and Tourism notification waves (very rarely generated ground motion).

  FIG. 8a shows a graph of the displacement response spectrum, and FIG. 8b shows a graph of the acceleration response spectrum.

  As shown in FIG. 8a, when a seismic isolation device without a damper is used (h = 0.07: graph A), the displacement is 78.2 cm. The stroke of a commercially available seismic isolation device for server racks is as large as 36 cm. In this case, even if the server rack flies at the stroke end or is fixed to the device, a very large impact force (acceleration) is generated. I will join.

  On the other hand, when the seismic isolation device 50 is used (h = 0.40: graph B), the displacement is suppressed to 35.7 cm, which is a large seismic isolation compared to the case where the seismic isolation device without a damper is used. The effect is obtained.

  Further, as shown in FIG. 8b, the acceleration response at a period of 6 seconds hardly changes between the case where the seismic isolation device 50 is used (graph D) and the case where the seismic isolation device without a damper is used (graph C). However, it becomes 100 gal or less.

  Next, a setting example of the resistance plate area of the seismic isolation device 50 will be described.

As a condition, the weight (m) of the seismic isolation device 50 is set to 600 kgf (standard weight of a server rack full of servers), the natural period (T) of the seismic isolation device 50 is set to 6 seconds, and the seismic isolation device 50 as a whole. The damping constant h1 = 0.40, the damping constant h0 = 0.07 due to the friction between the arc rail and the rotating body, and the kinematic viscosity coefficient ν = 250,000 cst (centistokes: mm ² / s) of the viscous body L.

  A container, a resistor plate, and a viscous body are used as one damper, and a damping constant h required for the damper is set to h = h1−h0 = 0.33.

Also, the damping force required for the damper is F, the speed is V, the damping coefficient is C (= F / V), the resistance plate area is S, and the thickness of the viscous material in contact with the resistance plate (the distance between the resistance plate and the container bottom) is set. d, the viscous body density is ρ (= 1000 kg / m ³ ), and the viscosity coefficient is μ (= ρ × ν).

  Here, since C = 2 × h × m × (2π / T), C = 2 × 0.33 × 600 × (2π / 6) = 415 N · s / m. Further, since F = μ × (V / d) × S, this is modified to be S / d = (F / V) / μ = C / (ρ × ν).

From these, it is calculated | required with S / d = 415 * (1000 * 0.25) = 166 (cm < ² > / cm).

If d = 0.5 cm, the resistance plate area S = 83 cm ² .

  Next, 3rd Embodiment of the seismic isolation structure of this invention is described based on drawing.

  Note that the same reference numerals as those in the first and second embodiments are given to the same components as those in the first and second embodiments described above, and the description thereof is omitted.

  FIG. 9 shows a state in which the resistor plate 56A is divided into three.

  As shown in FIG. 9a, the three resistance plates 64A, 66A, 68A are in contact with the viscous body L of the container 52A. The resistance plates 64A, 66A, 68A are formed with a plurality of through holes 70A penetrating from the front surface to the back surface of the resistance plates 64A, 66A, 68A.

  As shown in FIG. 9c, each of the resistance plates 64A, 66A, 68A is connected by inserting a U-shaped gravel 72A through two adjacent through holes 70A.

  Next, the operation of the third embodiment of the present invention will be described.

  As described above, it is necessary to change the area (S) of the resistance plate in accordance with the change in the load weight (m) of the seismic isolation device. Now, assume that there is a server rack A having a loading weight that requires the resistance plates 64A, 66A, and 68A and a server rack B having a loading weight that requires only the resistance plate 64A.

  As shown in FIG. 9a, when performing seismic isolation of the server rack A (not shown), it is possible to obtain the seismic isolation effect by connecting the resistance plates 64A, 66A, 68A with a grazing 72A.

  On the other hand, as shown in FIG. 9b, when performing seismic isolation of the server rack B (not shown), the wash 72A is removed, and the resistance plate 64A is disposed at the center of the container 52A. Further, the resistance plates 66A and 68A are brought to the left and right ends, respectively, and fixed by a stopper (not shown).

  In this manner, the contact area S between the resistance plates 64A, 66A, 68A and the viscous body L can be changed by connecting the resistance plates 64A, 66A, 68A with the faint 72A or releasing the connection.

  Further, when it is desired to adjust the damping force by changing the contact area S between the resistance plates 64A, 66A, 68A and the viscous body L according to the size or weight of the seismic isolation object, the resistance plates 64A, 66A, 68A are used as containers. There is no need to remove and replace 52A, and the seismic isolation device can be easily adjusted.

  In addition, this invention is not limited to said embodiment.

  The number of resistance plates is not limited to 1 to 3, but may be 4 or more.

  As a restoring mechanism, in addition to the one using an arc rail, one that takes a restoring force using a straight rail and a spring, one that the rotating body simply rolls on the rail, one that the rail is above and below the rotating body, etc. Can be used.

It is a perspective view of the seismic isolation apparatus which concerns on 1st Embodiment of this invention. It is sectional drawing of the seismic isolation apparatus which concerns on 1st Embodiment of this invention. It is a schematic diagram which shows the movement state of the seismic isolation unit which concerns on 1st Embodiment of this invention. It is a schematic diagram which shows the state which a resistance board moves in the viscous body inside the container which concerns on 1st Embodiment of this invention. It is a perspective view of the seismic isolation apparatus which concerns on 2nd Embodiment of this invention. It is sectional drawing of the seismic isolation apparatus which concerns on 2nd Embodiment of this invention. It is a schematic diagram which shows the state which a resistance board contacts and moves to the viscous body inside the container which concerns on 2nd Embodiment of this invention. (A) It is a displacement response spectrum of the installation floor at the time of using the seismic isolation apparatus which concerns on 2nd Embodiment of this invention. (B) It is an acceleration response spectrum of the installation floor at the time of using the seismic isolation apparatus which concerns on 2nd Embodiment of this invention. It is a top view which shows the some resistance board of the seismic isolation apparatus which concerns on 3rd Embodiment of this invention.

Explanation of symbols

10 Seismic isolation device (Seismic isolation device)
14A Seismic Isolation Unit (Seismic Isolation Unit)
16 Server rack (Seismic isolation object)
18A Upper channel material (upper support member)
20A Lower channel material (lower support member)
22A Circular rail (restoration mechanism)
24A circular rail (restoration mechanism)
26A Rotating body (restoration mechanism)
28A connecting member (connecting means)
30A resistance plate (resistance plate)
34A Container (container)
50 Seismic isolation device (Seismic isolation device)
54A Groove (groove)
56A resistance plate (resistance plate)
57A Contact plate (contact member)
58A Contact plate (contact member)
60A pin (connection member)
72A grazing (resistance plate connecting member)
L Viscous body (viscous body)

Claims (5)

In the seismic isolation device in which the seismic isolation unit including the lower support member and the upper support member that is movably attached to the lower support member and on which the seismic isolation object is placed is disposed,
A container provided along the moving direction of the upper support member;
A viscous material housed in the container;
A resistance plate that generates a damping force by moving in contact with the viscous body;
Connecting means for connecting the resistance plate to the upper support member;
A groove that is provided on the inner wall of the container, supports the resistance plate, and allows the resistance plate to move in contact with the liquid surface of the viscous body;
A seismic isolation device characterized by comprising: The seismic isolation unit is disposed on the XY axis, and the lower support member disposed on the X axis is placed on the upper support member disposed on the Y axis, and the upper part disposed on the X axis. The seismic isolation device according to claim 1, wherein the seismic isolation object is placed on the support member.   The seismic isolation device according to claim 1 or 2, wherein the container is disposed on the lower support member along the lower support member. The seismic isolation device according to any one of claims 1 to 3 , wherein a plurality of the resistance plates are supported in the groove portion, and a resistance plate connecting member that connects the resistance plates is provided . The upper support member includes a restoration mechanism that moves up and down relative to the lower support member to restore the initial position,
The connecting means is
A connecting member protruding substantially vertically downward from the upper support member;
An abutting member that protrudes substantially vertically upward from the resistance plate, hits the connecting member when the upper support member moves, and moves the resistance plate integrally with the upper support member;
Seismic isolation device according to claim 1, wherein any one of claims 4, further comprising a.

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