JP4731951B2 - 干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法 - Google Patents

干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4731951B2
JP4731951B2 JP2005053445A JP2005053445A JP4731951B2 JP 4731951 B2 JP4731951 B2 JP 4731951B2 JP 2005053445 A JP2005053445 A JP 2005053445A JP 2005053445 A JP2005053445 A JP 2005053445A JP 4731951 B2 JP4731951 B2 JP 4731951B2
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Japan
Prior art keywords
interference
information
interference fringes
phase
light
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Expired - Fee Related
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JP2005053445A
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Japanese (ja)
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JP2006237494A (ja
JP2006237494A5 (enExample
Inventor
正磨 加藤
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Canon Inc
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Canon Inc
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Priority to JP2005053445A priority Critical patent/JP4731951B2/ja
Priority to US11/364,600 priority patent/US7474413B2/en
Publication of JP2006237494A publication Critical patent/JP2006237494A/ja
Publication of JP2006237494A5 publication Critical patent/JP2006237494A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005053445A 2005-02-28 2005-02-28 干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法 Expired - Fee Related JP4731951B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005053445A JP4731951B2 (ja) 2005-02-28 2005-02-28 干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法
US11/364,600 US7474413B2 (en) 2005-02-28 2006-02-27 Method and apparatus for analyzing interference fringe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005053445A JP4731951B2 (ja) 2005-02-28 2005-02-28 干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006237494A JP2006237494A (ja) 2006-09-07
JP2006237494A5 JP2006237494A5 (enExample) 2008-04-10
JP4731951B2 true JP4731951B2 (ja) 2011-07-27

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JP2005053445A Expired - Fee Related JP4731951B2 (ja) 2005-02-28 2005-02-28 干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法

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US (1) US7474413B2 (enExample)
JP (1) JP4731951B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006124707A2 (en) * 2005-05-18 2006-11-23 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
US8072611B2 (en) * 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
JP5534647B2 (ja) * 2008-02-28 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
US7889356B2 (en) * 2008-12-09 2011-02-15 Zygo Corporation Two grating lateral shearing wavefront sensor
JP5328437B2 (ja) * 2009-03-25 2013-10-30 キヤノン株式会社 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置
EP3696605A1 (en) * 2019-02-13 2020-08-19 ASML Netherlands B.V. Method and lithograph apparatus for measuring a radiation beam

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764139A (en) 1980-10-08 1982-04-19 Nippon Kogaku Kk <Nikon> Interferometer
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
US5835217A (en) 1997-02-28 1998-11-10 The Regents Of The University Of California Phase-shifting point diffraction interferometer
JP2000097616A (ja) * 1998-09-22 2000-04-07 Nikon Corp 干渉計
US6312373B1 (en) 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
JP2000097666A (ja) 1998-09-22 2000-04-07 Nikon Corp 面形状計測用干渉計、波面収差測定機、前記干渉計及び前記波面収差測定機を用いた投影光学系の製造方法、及び前記干渉計の校正方法
JP4144828B2 (ja) * 1999-09-28 2008-09-03 フジノン株式会社 干渉縞測定解析方法
JP4607311B2 (ja) * 2000-11-22 2011-01-05 富士フイルム株式会社 開口合成による大型被観察体の波面形状測定方法および測定波面形状補正方法
JP3871309B2 (ja) * 2001-01-31 2007-01-24 フジノン株式会社 位相シフト縞解析方法およびこれを用いた装置
JP2003124109A (ja) * 2001-10-19 2003-04-25 Canon Inc アライメント装置、露光装置および観察装置
JP2003302205A (ja) * 2002-02-07 2003-10-24 Nikon Corp シアリング干渉測定方法及びシアリング干渉計、投影光学系の製造方法、投影光学系、及び投影露光装置
DE10316123A1 (de) * 2003-04-04 2004-10-14 Carl Zeiss Smt Ag Vorrichtung und Verfahren zur Wellenfrontvermessung eines optischen Abbildungssystems durch phasenschiebende Interferometrie
JP4666982B2 (ja) * 2004-09-02 2011-04-06 キヤノン株式会社 光学特性測定装置、露光装置及びデバイス製造方法

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US20060203253A1 (en) 2006-09-14
JP2006237494A (ja) 2006-09-07
US7474413B2 (en) 2009-01-06

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