JP4725170B2 - Color filter manufacturing method and liquid crystal display device - Google Patents

Description

  The present invention relates to a color filter and a liquid crystal display device, and more particularly to a method of manufacturing a color filter used in a liquid crystal display device of a multi-orientation division type vertical alignment mode and a liquid crystal display device using such a color filter.

As a flat display, a liquid crystal display (LCD) has rapidly expanded from a personal computer (PC), a mobile phone, a video camera, etc. to a large-screen TV due to its thinness, light weight, and low power consumption.
In addition, in order to achieve high-quality image quality that does not depend on the viewing angle, there are an increasing number of cases where the multi-domain vertical alignment mode (MVA mode), which is one of the viewing angle improvement modes, is selected. ing. This MVA mode has advantages such as (1) wide viewing angle, (2) high contrast, and (3) high-speed response.
In order to realize the above-mentioned multiple alignment division (the alignment direction of liquid crystal molecules is a plurality of directions), so-called multi-domaining, a method of repeating mask rubbing a plurality of times at first was considered. There were many problems such as generation of static electricity due to the rubbing process, a decrease in yield due to dust generation, and a decrease in productivity due to complicated processes.

  In view of this, a technique has been developed in which protrusions are provided in the liquid crystal panel to control the tilt direction of liquid crystal molecules without using a rubbing technique (Patent Document 1). The protrusions for controlling the alignment of the liquid crystal molecules can be formed in, for example, a 45 ° zigzag stripe shape having a bent portion so that the alignment direction in one pixel is divided into four and the divided areas are equal. Designed to. Further, the protrusions can be provided on both the color filter side and the TFT (Thin Film Transistor) substrate side. In this case, when the two substrates are made to face each other, both protrusions are alternately arranged. Configured as follows. Such protrusions have a role of imparting a pretilt angle to the liquid crystal molecules and distorting the lines of electric force. Due to these two effects, the liquid crystal molecules are aligned in a plurality of different directions when a voltage is applied. . Furthermore, recently, instead of providing the above-mentioned protrusion on the TFT substrate side, a structure in which a slit is provided in a transparent electrode has been developed as a virtual alignment control protrusion (Patent Document 2).

In addition, there is a method for manufacturing an MVA mode liquid crystal display device in which a spacer for maintaining a constant cell gap and a lower alignment control protrusion are simultaneously formed by exposing the photoresist twice. It has been proposed (Patent Document 3).
Japanese Patent Laid-Open No. 11-242225 Japanese Patent Laid-Open No. 10-104645 JP 2001-201750 A

However, the conventional MVA mode liquid crystal display device has a problem that the brightness of the screen is lowered because protrusions for controlling the tilt direction of the liquid crystal molecules exist in the pixels. For example, in the manufacturing method described in Patent Document 3, since the alignment control protrusion is provided on the common electrode formed on the colored layer of the color filter, the light transmission amount at this portion is reduced and the brightness of the screen is reduced. There was a problem that was inevitable.
Further, the manufacturing method described in Patent Document 3 has a problem that the exposure is required twice in order to form both the spacers having different heights and the alignment control protrusions at the same time, and the process is complicated.
The present invention has been made in view of the above circumstances, and a method for easily manufacturing a color filter for a multi-orientation division type vertical alignment mode, and a multi-orientation division type vertical alignment excellent in display quality. An object is to provide a mode liquid crystal display device.

In order to achieve the above object, the present invention provides a black matrix forming step of forming a black matrix on the surface of a transparent substrate in a method of manufacturing a color filter used in a liquid crystal display device of a multi-orientation division type vertical alignment mode. The first step of repeating the operation of forming a colored layer having a protrusion non-forming portion in a region having no black matrix with a predetermined pixel pattern for a plurality of colors , or forming a spacer non-forming portion on the black matrix A colored layer forming step consisting of any one of the second steps of repeating the operation of forming a colored layer having a non-projecting portion for formation in a predetermined pixel pattern in a region having no black matrix and having a predetermined pixel pattern ; an electrode forming step of forming a common transparent electrode to cover the colored layer, the colored layer forming step is the first When made of extent, it said on a common transparent electrode to form a photosensitive resin composition film, through the spacer protrusion forming mask exposing the photosensitive resin composition film, and developed on the black matrix A spacer is formed on the colored layer and the common transparent electrode, and a protrusion for controlling the alignment direction of liquid crystal molecules in a plurality of directions is formed on the protrusion non-forming portion of the colored layer, and the colored layer When the forming step includes the second step, a photosensitive resin composition film is formed on the common transparent electrode, and the photosensitive resin composition film is exposed and developed through a spacer / projection forming mask. , to form a spacer in the non-forming site spacer of the colored layer, to form a protrusion for controlling an alignment direction of liquid crystal molecules in the non-forming site for the projection of the colored layer in a plurality of directions Has a spacer protrusion forming step, a, the said spacer protrusion forming step, after the viscosity of a photosensitive resin composition in the range of 3 to 8 MPa · s, was coated with a photosensitive resin composition, 45 seconds Pre-baking to form the photosensitive resin composition film, forming the protrusions having a light transmittance in the range of 80 to 100%, and controlling the difference in height between the spacer top and the protrusion top, The difference in height between the top of the spacer and the top of the protrusion is regarded as the sum of the thickness of the black matrix and the thickness of the colored layer, and the colored layer forming step consists of the first step. The method of controlling the thickness of the colored layer, the difference in height between the top of the spacer and the top of the protrusion is regarded as the thickness of the black matrix, and the colored layer forming step consists of the second step. One of the methods performed by controlling the thickness of the rack matrix is used .

  As another aspect of the present invention, in the spacer / projection forming step, a heat treatment is performed after development.

Further, the present invention provides a multi-orientation-divided vertical alignment mode liquid crystal display device including a TFT substrate and a color filter that are opposed to form cells at a predetermined interval, and a liquid crystal layer filled in the cells, The color filter is manufactured by any one of the color filter manufacturing methods described above, and the TFT substrate is configured to include a transparent pixel electrode for each pixel.
As another aspect of the present invention, the transparent pixel electrode of the TFT substrate is configured to include a slit for controlling the alignment direction of liquid crystal molecules in a plurality of directions.
As another aspect of the present invention, the TFT substrate is configured to have protrusions on the transparent pixel electrode for controlling the alignment direction of liquid crystal molecules in a plurality of directions.

In the method for producing a color filter of the present invention, the protrusions for controlling the alignment direction of the liquid crystal molecules in a plurality of directions are formed at the protrusion non-formation portions of the colored layer. Spacers and protrusions can be formed simultaneously by a single exposure, and manufacturing is simplified and there is no overlap between the protrusions and the colored layer. It is possible to manufacture a color filter that suppresses the decrease.
In addition, since the liquid crystal display device of the present invention does not have a colored layer at the position where the protrusions for controlling the alignment direction of the liquid crystal molecules in a plurality of directions are present, a display screen with a high screen brightness and a wide viewing angle can be obtained. Is possible.

DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, exemplary embodiments of the invention will be described with reference to the drawings.
First, the color filter manufactured by the color filter manufacturing method of the present invention will be described.
FIG. 1 is a plan view showing an example of a color filter manufactured by the color filter manufacturing method of the present invention, and FIG. 2 is an enlarged longitudinal sectional view taken along the line II of FIG. 1 and 2, the color filter 11 includes a transparent substrate 12 and a lattice-shaped black matrix 13 and a colored layer 14 formed on the transparent substrate 12.
The colored layer 14 is an array of stripe-shaped red patterns 14R, green patterns 14G, and blue patterns 14B. For each pixel P (portion surrounded by a thick line in FIG. 1), a protrusion non-forming portion 15 is formed. Two are provided. Further, the black matrix 13 is perpendicular to the narrow black matrix 13a (extending in the direction of arrow a in FIG. 1) located between the colored patterns 14R, 14G, and 14B of the colored layer 14. It consists of a wide black matrix 13b arranged (extending in the direction of arrow b in FIG. 1).

A common transparent electrode 17 is disposed so as to cover the black matrix 13 and the colored layer 14. Further, the protrusion non-forming portion 15 is provided with a protrusion 18 for controlling the alignment direction of the liquid crystal molecules of the liquid crystal layer in a plurality of directions, and the colored layer 14 positioned on the black matrix 13 (13b) A spacer 19 is disposed on the common transparent electrode 17 and has an alignment film (not shown) so as to cover these protrusions 18 and the spacer 19.
The protrusion 18 has a function of giving a pretilt angle to nearby liquid crystal molecules and a function of distorting the lines of electric force in a desired direction. For example, in the liquid crystal display device described later, the protrusion 18 can be used alone or on the TFT substrate. The alignment direction of the liquid crystal molecules in the liquid crystal layer can be controlled in a plurality of directions in cooperation with the slits or protrusions of the transparent pixel electrode.

In the illustrated example, such a protrusion 18 has a spot shape (a frustoconical shape or a cylindrical shape), and the light transmittance is in the range of 70 to 100%, preferably 80 to 100%. If the light transmittance of the protrusion 18 is less than 70%, the brightness of the screen is reduced due to the presence of the protrusion 18. In the present invention, the effect of disposing the protrusion 18 in the non-projection portion 15 is effective. It is not preferable because it is not played. In the present invention, the light transmittance is a light transmittance in a wavelength range of 380 to 780 nm, and the transmittance is measured by a microspectrophotometer (light source: C light source, illumination magnification: 20 times, pin Hole diameter: 50 μm).
The spacer 19 sets the thickness of the liquid crystal layer formed in the gap between the color filter 11 and the TFT substrate to a desired thickness. The spacer 19 has a spot shape (a frustoconical shape or a cylindrical shape), and the light transmittance is the same as that of the protrusion 18.

  In such a color filter 11, as shown in FIG. 2, the height of the protrusion 18 and the height of the spacer 19 are both A, and the thickness of the common transparent electrode 17 is as thin as about 200 to 5000 mm as will be described later. Therefore, the protrusion amount B of the protrusion 18 from the colored layer 14 is the difference between the height A of the protrusion 18 and the thickness C of the colored layer 14 (B = A−C) when the thickness of the colored layer 14 is C. It can be considered. Further, the difference in height X between the tops of the protrusions 18 and the spacers 19 is the sum of the thickness D of the black matrix 13 and the thickness C of the colored layer, where D is the thickness of the black matrix 13 (X = C + D). Can be considered. Such a protrusion amount B is, for example, in the range of 0.5 to 2.0 μm, and the height difference X between the top of the protrusion 18 and the top of the spacer 19 is set in the range of, for example, 2.0 to 5.0 μm. can do.

FIG. 3 is a cross-sectional view corresponding to FIG. 2 showing another example of the color filter manufactured by the color filter manufacturing method of the present invention. In FIG. 3, the color filter 21 is different from the color filter 11 described above in that the spacer 29 is provided on the black matrix 23 without the colored layer 24 interposed.
That is, the color filter 21 includes a transparent substrate 22, and a lattice-shaped black matrix 23 and a colored layer 24 formed on the transparent substrate 22.
The colored layer 24 includes a stripe-shaped red pattern 24R (not shown), a green pattern 24G, and a blue pattern 24B (not shown). A projection non-formation portion 25 is formed for each pixel P. In addition to the two, a non-spacer portion 26 for spacers is provided on the black matrix 23. The black matrix 23 includes a narrow black matrix (not shown) positioned between the colored patterns 24R, 24G, and 24B of the colored layer 24, and a wide black matrix 23b disposed so as to be orthogonal thereto. Consists of.

A common transparent electrode 27 is disposed so as to cover the black matrix 23 and the colored layer 24. Further, the protrusion non-forming portion 25 is provided with a protrusion 28 for controlling the alignment direction of the liquid crystal molecules of the liquid crystal layer in a plurality of directions, and the spacer non-forming portion 26 on the black matrix 23 (23b). A spacer 29 is disposed on the surface. An alignment film (not shown) is provided so as to cover these protrusions 28 and spacers 29.
The shape and light transmittance of the protrusion 28 and the spacer 29 can be the same as those of the protrusion 18 and the spacer 19 described above. In such a color filter 21, the height of the protrusion 28 and the height of the spacer 29 are both A, and the thickness of the common transparent electrode 27 is as thin as about 200 to 5000 mm, as will be described later. The protrusion amount B of the protrusion 28 from the above can be regarded as a difference between the height A of the protrusion 28 and the thickness C of the colored layer 24 (B = A−C), where C is the thickness of the colored layer 24. Further, the difference in height X between the top of the protrusion 28 and the top of the spacer 29 can be regarded as the thickness D (X = D) of the black matrix 23 when the thickness of the black matrix 23 is D. Such a protrusion amount B is set, for example, in the range of 0.5 to 2.0 μm, and the height difference X between the top of the projection 28 and the top of the spacer 29 is set, for example, in the range of 2.0 to 5.0 μm. can do.

[Color filter manufacturing method]
An embodiment of the method for producing a color filter of the present invention will be described using the above-described color filter 11 as an example.
FIG. 4 is a process diagram for explaining an embodiment of a method for producing a color filter of the present invention.
In the method for producing a color filter of the present invention, the black matrix 13 is formed on the surface 12a of the transparent substrate 12 so as to have a desired thickness D (FIG. 4A). Next, a red pattern 14R (not shown) having a non-projecting portion 15 for each pixel P is formed with a predetermined pixel pattern so as to get over the black matrix 13b. By repeating the same operation, a green pattern 14G and a blue pattern 14B (not shown) each having a non-projecting portion 15 for each pixel are formed in a predetermined pixel pattern, and coloring having a desired thickness C is performed. The layer 14 is formed (FIG. 4B).

  As the transparent substrate 12, a transparent flexible material such as quartz glass, pyrex glass or synthetic quartz plate or a flexible flexible material such as a transparent resin film or an optical resin plate is used. Can do. Among them, 1737 glass manufactured by Corning, in particular, is a material having a small coefficient of thermal expansion, excellent in dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the glass. Suitable for color filters for color liquid crystal display devices.

  The black matrix 13 can be formed, for example, by forming a metal thin film of chromium or the like having a thickness D of about 1000 to 2000 mm by sputtering or vacuum deposition and patterning the thin film. Further, a resin layer made of polyimide resin, acrylic resin, epoxy resin or the like containing light-shielding particles such as carbon fine particles is formed, and this resin layer is patterned to obtain a black having a thickness D of about 0.5 to 2.0 μm. The matrix 13 may be formed. Furthermore, a photosensitive resin layer containing light-shielding particles such as carbon fine particles and metal oxide is formed, and this photosensitive resin layer is patterned to obtain a black matrix 13 having a thickness D of about 0.5 to 2.0 μm. Can also be formed.

The red pattern 14R, the green pattern 14G, and the blue pattern 14B having the non-projection portion 15 for each pixel can be formed by, for example, a pigment dispersion method using a photosensitive resin containing a desired colorant, Furthermore, it can be formed by a known method such as a printing method, an electrodeposition method, or a transfer method. The thickness C of the colored layer 14 composed of the red pattern 14R, the green pattern 14G, and the blue pattern 14B can be set, for example, in the range of 1.0 to 4.0 μm. Further, the opening area of the non-projecting portion 15 can be, for example, about 20 to 700 μm ^{2. In} the illustrated example, two non-projecting portions 15 are formed in each pixel P. Or three or more.
The order of forming the colored patterns 14R, 14G, and 14B is not limited to the above example.

In the present invention, by controlling the thickness D of the black matrix 13 and the thickness C of the colored layer 14, the height difference X between the tops of the protrusions 18 and the tops of the spacers 19 formed in the subsequent process is controlled. be able to. Further, the protrusion 18 from the colored layer 14 is controlled by controlling the thickness C of the colored layer 14 and the thickness of the negative photosensitive resin composition film 20 described later (the height 18 of the protrusion 18 after development and the spacer 19). The amount of protrusion B can be controlled.
Next, the common transparent electrode 17 is formed so as to cover the black matrix 13 and the colored layer 14 composed of a plurality of colored patterns 14R, 14G, and 14B (FIG. 4C). The common transparent electrode 17 is generally formed using indium tin oxide (ITO), zinc oxide (ZnO), tin oxide (SnO), etc., and alloys thereof, such as sputtering, vacuum deposition, and CVD. It can be performed by a simple film formation method. The thickness of the common transparent electrode 17 can be, for example, about 200 to 5000 mm, and the protrusion amount B of the protrusion 18 from the colored layer 14 and the difference X between the top of the protrusion 18 and the top of the spacer 19 are X. In this setting, the thickness of the common transparent electrode 17 can be ignored.

Next, a negative photosensitive resin composition is applied onto the common transparent electrode 17 and pre-baked to form a negative photosensitive resin composition film 20, and the negative photosensitive resin is formed through the spacer / projection formation mask M 1. The resin composition film 20 is subjected to proximity exposure (FIG. 4D).
As a negative photosensitive resin composition to be used, a publicly known negative photosensitive resin composition can be used. For example, as an acrylic negative photosensitive resin composition, at least a photopolymerization initiator that generates a radical component when irradiated with ultraviolet rays, and a cleavage polymerization reaction by the generated radical having an acrylic group of C═C in the molecule. A component composed of a component that wakes up and hardens, and a functional group (for example, a component having an acidic group in the case of development with an alkaline solution) that can dissolve the unexposed portion by subsequent development can be used. Among the above-mentioned components having an acrylic group, examples of relatively low molecular weight polyfunctional acrylic molecules include dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), and tetramethylpentatriacrylate (TMPTA). Can be mentioned. Moreover, as a high molecular weight polyfunctional acrylic molecule, the polymer etc. which introduce | transduced the acrylic group through the spacer to the one part carboxylic acid group part of the styrene-acrylic acid-benzyl methacrylate copolymer are mentioned. If necessary, additives such as carbon black, copper-iron-manganese composite oxide, indium tin oxide (ITO), aluminum, silver, iron oxide and other conductive powders can be added to the negative photosensitive resin composition. You may make it contain.

  As a method for applying the negative photosensitive resin composition, for example, a spin coating method, a slit & spin coating method, a slit die coating method, or the like can be used. In the present invention, it is preferable to use a negative photosensitive resin composition having a viscosity in the range of 2 to 10 mPa · s, preferably 3 to 8 mPa · s. In addition, the time from the application of the negative photosensitive resin composition to the pre-baking is within 60 seconds, preferably within 45 seconds. As a result, the surface shape of the applied negative photosensitive resin composition reflects the surface shape of the colored layer 14 having the protrusion non-forming portion 15 and covering the black matrix 13b, and the uneven shape. In this state, the negative photosensitive resin composition film 20 can be formed. The viscosity is measured using a vibration viscometer CJV-5000 (temperature: 25 ° C.) manufactured by A & D.

In the present invention, the negative photosensitive resin composition film 20 may be formed by transferring a film made of the negative photosensitive resin composition onto the common transparent electrode 17.
The spacer / projection formation mask M1 has transmission holes through which the plurality of projection non-formation portions 15 formed in the colored patterns 14R, 14G, and 14B and the spacer formation portions of the black matrix 13 (13b) can be exposed. It is a mask provided.
Next, by developing the negative photosensitive resin composition film 20, the protrusions 18 for controlling the alignment direction of the liquid crystal molecules in a plurality of directions are not provided for the protrusions of the colored patterns 14 R, 14 G, and 14 B of the plurality of colors. A spacer 19 is formed on the black matrix 13 (13b) through the colored layer 14 (colored patterns 14R, 14G, and 14B) and the common transparent electrode 17 (FIG. 4E). .

In addition, after the exposure and development for forming the protrusion 18 and the spacer 19 are completed, the protrusion 18 and the spacer 19 may be subjected to a heat treatment. This heat treatment can be appropriately set, for example, at a temperature of 180 to 250 ° C. and a treatment time of about 10 to 90 minutes.
Further, when forming an alignment film so as to cover the common transparent electrode 17, the protrusion 18, and the spacer 19, for example, organic compounds such as soluble polyimide, polyamic acid type polyimide, and modified polyimide may be used in various printing methods and known coating methods. It can apply by apply | coating and heating after that. The thickness of the alignment film can be about 500 to 1000 mm. This alignment film does not require alignment treatment (rubbing).
In the method for manufacturing a color filter of the present invention as described above, the protrusion 18 for controlling the alignment direction of the liquid crystal molecules in a plurality of directions is formed in the non-projection portion 15 for the protrusion of the colored layer 14, so that the height of the top portion is increased. The spacers 19 and the protrusions 18 having a difference X (with different top positions) can be simultaneously formed by one exposure.

Next, another embodiment of the method for producing a color filter of the present invention will be described using the above-described color filter 21 as an example.
FIG. 5 is a process diagram for explaining another embodiment of the method for producing a color filter of the present invention. First, in the color filter manufacturing method of the present invention, the black matrix 23 is formed on the surface 22a of the transparent substrate 22 so as to have a desired thickness D (FIG. 5A). Next, for each pixel P, a red pattern 24R (not shown) having a non-projecting portion 25 and a spacer non-forming portion 26 is formed with a predetermined pixel pattern so as to get over the black matrix 23b. By repeating the same operation, a green pattern 24G and a blue pattern 24B (not shown) each having a non-projection portion 25 for projection and a non-formation portion 26 for spacer are formed in a predetermined pixel pattern for each pixel. A colored layer 24 having a desired thickness C is formed (FIG. 5B).

The transparent substrate 22 can be the same as the transparent substrate 12 described above. The black matrix 23 can be formed in the same manner as the black matrix 13 described above, and the thickness D of the black matrix 23 can be arbitrarily set to about 0.5 to 2.0 μm.
The red pattern 24R, the green pattern 24G, and the blue pattern 24B each having a non-projection portion 25 and a spacer non-formation portion 26 for each pixel are, for example, pigment dispersion using a photosensitive resin containing a desired colorant. It can be formed by a known method such as a printing method, an electrodeposition method, or a transfer method. The thickness C of such a colored layer 24 can be set in the range of 1.0 to 4.0 μm, for example. The order of forming the colored patterns 24R, 24G, and 24B is not limited to the above example.

The opening area of the protrusion non-forming part 25 can be, for example, about 20 to 700 μm ^{2. In} the illustrated example, two protrusion non-forming parts 25 are formed in each pixel P. Or three or more.
In the present invention, by controlling the thickness D of the black matrix 23 described above, the height difference X between the tops of the protrusions 28 and the tops of the spacers 29 formed in a later step can be controlled. Further, by controlling the thickness C of the colored layer 24 and the thickness of the negative photosensitive resin composition film 30 described later (the height A of the protrusion 28 after development and the spacer 29), the protrusion 28 from the colored layer 24 is controlled. The amount of protrusion B can be controlled.

Next, a common transparent electrode 27 is formed so as to cover the black matrix 23 and the colored layer 24 (FIG. 5C). The formation of the common transparent electrode 27 can be performed in the same manner as the formation of the common transparent electrode 17 described above. The thickness of the common transparent electrode 27 can be set to, for example, about 200 to 5000 mm, and the projection amount B of the projection 28 from the colored layer 24 and the difference X between the height of the top of the projection 28 and the top of the spacer 29 are set. In, the thickness of the common transparent electrode 27 can be ignored.
Next, a negative photosensitive resin composition is applied on the common transparent electrode 27, pre-baked to form a negative photosensitive resin composition film 30, and the negative photosensitive resin is formed through the spacer / projection forming mask M2. The resin composition film 30 is subjected to proximity exposure (FIG. 5D).
Examples of the negative photosensitive resin composition to be used include the above-described negative photosensitive resin compositions. Moreover, the method quoted by the above-mentioned manufacturing method can be used for the coating method of a negative photosensitive resin composition.

Also in this embodiment, it is preferable to use a negative photosensitive resin composition having a viscosity of 2 to 10 mPa · s, preferably 3 to 8 mPa · s. In addition, the time from the application of the negative photosensitive resin composition to the pre-baking is within 60 seconds, preferably within 45 seconds.
The spacer / projection formation mask M2 includes a plurality of projection non-formation portions 25 formed in the colored patterns 24R, 24G, and 24B and transmission holes that can expose portions corresponding to the spacer non-formation portions 26. Mask.
Next, by developing the negative photosensitive resin composition film 30, protrusions 28 for controlling the alignment direction of the liquid crystal molecules in a plurality of directions are formed in the non-projection portions 25 for the protrusions of the colored layer. A spacer 29 is formed in the spacer non-formation portion 26 on the matrix 23 (23b) (FIG. 5E).

Note that after the exposure and development for forming the protrusions 28 and the spacers 29 are completed, the protrusions 28 and the spacers 29 may be subjected to heat treatment. This heat treatment can be appropriately set, for example, at a temperature of 180 to 250 ° C. and a treatment time of about 10 to 90 minutes.
Further, when the alignment film is formed so as to cover the common transparent electrode 27, the protrusion 28, and the spacer 29, it can be performed in the same manner as in the above embodiment.
In the manufacturing method of the color filter of the present invention as described above, the protrusions 28 for controlling the alignment direction of the liquid crystal molecules in a plurality of directions are formed in the protrusion non-forming portion 25 of the colored layer 24. The spacers 29 and the projections 28 having a difference X (with different top positions) can be formed simultaneously by one exposure.

  In the example of the manufacturing method described above, the negative photosensitive resin composition is used. However, in the present invention, even if the positive photosensitive resin composition is used, the projections 18 and 28 and the spacer 19 are obtained by one exposure. , 29 can be formed simultaneously. As the positive photosensitive resin composition, for example, a composition in which a photosensitive component composed of a quinonediazide group-containing compound is combined with an alkali-soluble novolak resin can be used. Even when a positive photosensitive resin composition is used, it is preferable to use one having a viscosity of 2 to 10 mPa · s, preferably 3 to 8 mPa · s. Further, the time from the application of the positive photosensitive resin composition to the pre-baking is within 60 seconds, preferably within 45 seconds. When a positive photosensitive resin composition is used, as the spacer / projection formation mask M1, a plurality of projection non-formation sites 15 formed in the colored patterns 14R, 14G, and 14B and the black matrix 13 (13b) A mask capable of shielding light from the spacer forming portion is used. Further, as the spacer / projection formation mask M2, a mask capable of shielding the plurality of projection non-formation sites 25 and spacer non-formation sites 26 formed in the colored layer 24 is used.

The above manufacturing method is an example of the present invention, and the present invention is not limited to this. For example, in the above-described example, the cross-sectional shape of the protrusions 18 and 28 is a circular spot shape (cylindrical shape or frustoconical shape), but the cross-sectional shape is a polygonal spot shape (prism shape, truncated pyramid shape). There may be. Further, as shown in FIG. 6, the protrusions 18 and 28 may have a plurality of stripe shapes so that the alignment direction in one pixel P can be divided into a plurality of portions. The number of the stripe-shaped protrusions 18 and 28 may be one or three or more, and the stripe-shaped protrusions 18 and 28 may have a bent portion.
Moreover, in the manufacturing method of this invention, each coloring pattern of the colored layers 14 and 24 is not limited to stripe shape.
In the manufacturing method of the present invention, one spacer may be formed for each of a plurality of pixels without forming the spacer for each pixel.

[Liquid Crystal Display]
Next, the liquid crystal display device of the present invention will be described.
FIG. 7 is a schematic partial sectional view showing an embodiment of the liquid crystal display device of the present invention.
In FIG. 7, the liquid crystal display device 1 includes the color filter 11 and the TFT substrate 41 facing each other at a predetermined interval, the periphery is sealed with a seal member (not shown), and the liquid crystal layer 2 is provided in the gap portion. It is a liquid crystal display device of a multi-alignment division type vertical alignment mode. A polarizing plate (not shown) is provided outside the color filter 11 and the TFT substrate 41, respectively.

The color filter 11 constituting the liquid crystal display device 1 of the present invention is manufactured by the above-described color filter manufacturing method of the present invention, and is the same as that shown in FIGS. The description about is omitted.
The TFT substrate 41 constituting the liquid crystal display device 1 of the present invention has a plurality of liquid crystal driving thin film transistors (TFTs) 43, transparent pixel electrodes 44, and liquid crystal molecule orientation directions on a transparent substrate 42 so as to correspond to each pixel. A projection 45 for controlling the direction is provided, and an alignment film (not shown) is provided so as to cover the transparent pixel electrode 44 and the projection 45.

On the TFT substrate 41, a gate line group (not shown) for opening and closing the thin film transistor (TFT) 43, a signal line group (not shown) for supplying a video signal, and a voltage to the common transparent electrode 17 of the color filter 11 A supply line (not shown) is provided. These lead wires are usually made of a metal such as aluminum formed in a lump in the manufacturing process of the thin film transistor (TFT) 43.
As the transparent substrate 42 constituting the TFT substrate 41, the same substrate as the transparent substrate 12 of the color filter 11 described above can be used.
In addition, the transparent pixel electrode 44 is made of indium tin oxide (ITO), zinc oxide (ZnO), tin oxide (SnO), or an alloy thereof using a sputtering method or vacuum deposition through an electrode forming mask. The film can be formed by a general film forming method such as a CVD method or a CVD method. Alternatively, it can be formed by combining a known photolithography technique and an etching technique.

Further, the protrusions 45 for controlling the alignment direction of the liquid crystal molecules in a plurality of directions are formed on the transparent pixel electrode 44 at a pitch shifted by a half pitch with respect to the arrangement pitch of the protrusions 18 of the color filter 11 in one pixel P. Is provided. The protrusion 45 can be formed of a resin material in the same manner as the protrusion 18.
In the liquid crystal display device 1 of the present invention as described above, since the colored layer 14 does not exist in the portion where the protrusion 18 for controlling the alignment direction of the liquid crystal molecules in a plurality of directions is present, the reduction in the brightness of the screen is suppressed as much as possible. A display screen with a wide viewing angle and high brightness is possible.

  The liquid crystal display device described above is an example, and the present invention is not limited to this. For example, instead of the color filter 11, the color filter 21 produced by the color filter manufacturing method of the present invention can be used. Further, as shown in FIG. 8, the shape of the protrusion 18 may be a plurality of stripe shapes, and the slit 46 may be formed in the transparent pixel electrode 44 of the TFT substrate 41 correspondingly. In this case, the slits 46 are formed at a pitch shifted by a half pitch with respect to the arrangement pitch of the protrusions 18 of the color filter 11. The number of the stripe-shaped protrusions 18 may be one or three or more, and the slit 46 can be formed corresponding to this. Further, the stripe-shaped protrusion 18 may have a bent portion, and the slit 46 can be formed correspondingly. Furthermore, the shape of the protrusion 18 and the slit 46 may be a discontinuous stripe shape having a bent portion.

Next, an Example is shown and this invention is demonstrated further in detail.
[Example 1]
As a transparent substrate for a color filter, a glass substrate (1737 glass manufactured by Corning) having a size of 100 mm × 100 mm and a thickness of 0.7 mm was prepared. After washing this substrate in accordance with a regular method, a photosensitive resin composition (CFRR DN-83 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is applied to the entire surface of one side of the substrate, exposed and developed through a predetermined mask, and black. A matrix (thickness D = 1.5 μm) was formed. This black matrix had a lattice shape in which narrow (20 μm) parallel stripes (stripe pitch 130 μm) and wide (40 μm) parallel stripes (stripe pitch 370 μm) intersected.

Next, a negative photosensitive resin composition for a red pattern, a negative photosensitive resin composition for a green pattern, and a negative photosensitive resin composition for a blue pattern having the following compositions were prepared.
(Negative photosensitive resin composition for red pattern)
・ Red pigment: 4.8 parts by weight (Chromophthalic Red A2B, manufactured by Ciba Specialty Chemicals)
・ Yellow pigment: 1.2 parts by weight (PASFOL Yellow D1819, manufactured by BASF)
-Dispersant (Arubia Corp. Solpers 24000-3.0 parts by weight-Monomer (Sartomer SR399)-4.0 parts by weight-Polymer I-5.0 parts by weight-Initiator-1.4 parts by weight (Ciba Specialty Chemicals Irgacure 907)
Initiator: 0.6 parts by weight (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-
Tetraphenyl-1,2'-bisimidazole)
-Surfactant: 1.0 part by weight (Nonion HS-210, manufactured by NOF Corporation)
・ Solvent: 79.0 parts by weight (propylene glycol monomethyl ether acetate)

(Negative photosensitive resin composition for green pattern)
Green pigment: 4.2 parts by weight (Avisia Monastral Green 9Y-C)
・ Yellow pigment: 1.8 parts by weight (manufactured by BASF Paliotor Yellow D1819)
-Dispersant (Arubia Corp. Solpers 24000-3.0 parts by weight-Monomer (Sartomer SR399)-4.0 parts by weight-Polymer I-5.0 parts by weight-Initiator-1.4 parts by weight (Ciba Specialty Chemicals Irgacure 907)
Initiator: 0.6 parts by weight (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-
Tetraphenyl-1,2'-bisimidazole)
・ Solvent: 80.0 parts by weight (propylene glycol monomethyl ether acetate)

(Negative photosensitive resin composition for blue pattern)
・ Blue pigment: 6.0 parts by weight (Heliogen Blue L6700F manufactured by BASF)
Pigment derivative (Solsperse 12000 manufactured by Avicia) ... 0.6 parts by weight Dispersant (Solpers 24000 manufactured by Abyssia) 2.4 parts by weight Monomer (SR399 manufactured by Sartomer) 4.0 parts by weight Polymer I 5 0.0 parts by weight ・ Initiator: 1.4 parts by weight (Irgacure 907, manufactured by Ciba Specialty Chemicals)
Initiator: 0.6 parts by weight (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-
Tetraphenyl-1,2'-bisimidazole)
・ Solvent: 80.0 parts by weight (propylene glycol monomethyl ether acetate)

The polymer I is based on 100 mol% of a copolymer of benzyl methacrylate: styrene: acrylic acid: 2-hydroxyethyl methacrylate = 15.6: 37.0: 30.5: 16.9 (molar ratio). 2-methacryloyloxyethyl isocyanate was added at 16.9 mol%, and the weight average molecular weight was 42500.
Next, a negative photosensitive resin composition for red pattern is applied by spin coating so as to cover the black matrix on the glass substrate, exposed and developed through a photomask for red pattern, and the red pattern is formed. Formed. As shown in FIG. 1, this red pattern has a stripe shape (width 140 μm) located between adjacent narrow black matrices, and a circular non-projection portion having a diameter of 15 μm is elongated within one pixel. Two were provided at a pitch of 60 μm in the direction. As a result, a pixel having a size of 130 μm × 185 μm was set, and two non-projection portions for protrusions existed in each pixel.

Then, the green pattern and the blue pattern were formed by the same operation using the negative photosensitive resin composition for the green pattern and the negative photosensitive resin composition for the blue pattern. Thus, a colored layer (thickness C = 2.5 μm) in which the red pattern, the green pattern, and the blue pattern are arranged in a pixel pattern as shown in FIGS. 1 and 2 was formed.
Next, a common transparent electrode (thickness 1500 mm) made of indium tin oxide (ITO) was formed by sputtering so as to cover the black matrix and the colored layer.

Next, the negative photosensitive resin composition A having the following composition was applied onto the common transparent electrode by a spin coating method, and pre-baked (90 ° C., 3 minutes) after 30 seconds. Next, the film was exposed through a mask for forming spacers / projections (exposure amount: 100 mJ / cm ² , exposure gap: 100 μm) and developed.
(Negative photosensitive resin composition A)
・ Methyl methacrylate-styrene-acrylic acid copolymer: 32 parts by weight ・ Epicoat 180S70: 18 parts by weight (manufactured by Japan Epoxy Resin Co., Ltd.)
Dipentaerythritol pentaacrylate: 42 parts by weight Initiator: 8 parts by weight (Irgacure 907 manufactured by Ciba Specialty Chemicals)
・ Solvent: 300 parts by weight (propylene glycol monomethyl ether acetate)

In addition, the viscosity of the negative photosensitive resin composition A measured on the following measurement conditions was 4.5 mPa * s.
(Viscosity measurement conditions)
It measures at 25 degreeC with the vibration type viscosity meter CJV-5000 by A & D company, and makes the value 60 second after a measurement start into a viscosity.

  Thereafter, heat treatment was performed at 230 ° C. for 30 minutes to form spacers and alignment control protrusions. The spacer was formed on a wide black matrix through a colored layer and a common transparent electrode, and the height A of the spacer was 3.5 μm and the thickness was about 20 μm. Further, the protrusions were formed in the protrusion non-forming portions of the colored patterns of the red pattern, the green pattern, and the blue pattern, and the height A of the protrusion was 3.5 μm and the thickness was about 15 μm. Thereby, the protrusion amount B (B = A−C) of the protrusion from the colored layer was 1 μm, and the height difference X (X = C + D) between the top of the protrusion and the top of the spacer was 4 μm.

The light transmittance of the protrusions and spacers measured under the following measurement conditions was 90%.
(Measurement conditions of light transmittance)
Using a microspectrophotometer (OSP-SP200 manufactured by Olympus Corporation), in the range of visible light (380 to 780 nm), illumination magnification: 20 times, pinhole diameter: 50 μm
m, reference glass: Measured using Corning 1737 glass.

Next, a coating for alignment film (SE-5300 manufactured by Nissan Chemical Co., Ltd.) is applied by a spin coat method so as to cover the common transparent electrode, the protrusion, and the spacer, and subjected to a heat treatment at 220 ° C. for 60 minutes. An alignment film having a thickness (thickness on the common transparent electrode) of 200 mm was formed to obtain a color filter.
On the other hand, a glass substrate (1737 glass manufactured by Corning) having a size of 100 mm × 100 mm and a thickness of 0.7 mm was prepared as a transparent substrate for the TFT substrate. After this substrate was washed according to a conventional method, indium tin oxide (ITO) was formed to a thickness of 1500 mm by sputtering on the entire surface of one side of the substrate to form a transparent electrode.

Next, a positive photosensitive resist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is applied onto the transparent electrode, exposed and developed through a predetermined mask, and each pixel having a size of 130 μm × 185 μm is obtained. A resist pattern with a diameter of 15 μm was formed.
Thereafter, an alignment film having a thickness of 200 mm was formed on the transparent pixel electrode in the same manner as in the production of the color filter, thereby obtaining a TFT substrate.

The actual TFT substrate is provided with a transparent electrode and a reflective electrode patterned in a pixel shape on a substrate provided with a thin film transistor (TFT) for driving liquid crystal. The TFT substrate was omitted.
Next, the color filter and the TFT substrate are made to face each other on the alignment film forming surface side, and then a liquid crystal (MLC-6608 manufactured by MERCK Co., Ltd.) is injected into the cell using a vacuum injection method, and the injection port is made of an ultraviolet curable resin Was used, and an annealing treatment was performed at 105 ° C. for 1 hour to cancel the flow orientation effect. Thereby, a liquid crystal display device for evaluation was produced. The thickness of the liquid crystal layer of this liquid crystal display device was 5 μm at a portion where no black matrix was present.

[Example 2]
In the same manner as in Example 1, a black matrix was formed on one surface of a transparent substrate for color filter (Corning 1737 glass). This black matrix had a lattice shape in which narrow (20 μm) parallel stripes (stripe pitch 130 μm) and wide (210 μm) parallel stripes (stripe pitch 370 μm) intersected, and the thickness D was 1.5 μm.

Next, a red photosensitive resin composition for a red pattern, a negative photosensitive resin composition for a green pattern, and a negative photosensitive resin composition for a blue pattern, which are the same as those in Example 1, are used. A colored layer (thickness C = 2.5 μm) composed of a pattern, a green pattern, and a blue pattern was formed. However, as shown in FIG. 3, each coloring pattern is provided with two circular non-projection portions having a diameter of 15 μm for each pixel at a pitch of 60 μm in the longitudinal direction, and on a wide black matrix. Had one circular spacer non-formation part with a diameter of 20 μm.
Next, in the same manner as in Example 1, a common transparent electrode made of indium tin oxide (ITO) was formed so as to cover the black matrix and the colored layer.

Next, a negative photosensitive resin composition B having the following composition was applied onto the common transparent electrode by a spin coating method, and pre-baked (90 ° C., 3 minutes) after 30 seconds. Next, the film was exposed through a mask for forming spacers / projections (exposure amount: 100 mJ / cm ² , exposure gap: 100 μm) and developed. The viscosity of the negative photosensitive resin composition B measured under the same conditions as in Example 1 was 5 mPa · s.
(Negative photosensitive resin composition B)
・ Methyl methacrylate-styrene-acrylic acid copolymer: 42 parts by weight ・ Epicoat 180S70: 18 parts by weight (manufactured by Japan Epoxy Resin Co., Ltd.)
Dipentaerythritol pentaacrylate: 32 parts by weight Initiator: 8 parts by weight (Irgacure 907 manufactured by Ciba Specialty Chemicals)
・ Solvent: 300 parts by weight (propylene glycol monomethyl ether acetate)

Thereafter, heat treatment was performed at 230 ° C. for 30 minutes to form spacers and alignment control protrusions. The spacer was formed in a spacer non-formation site on a wide black matrix, and the spacer height A was 4 μm and the thickness was about 20 μm. The protrusions were formed in the protrusion non-forming portions of the colored patterns of the red pattern, the green pattern, and the blue pattern, and the height A of the protrusion was 4 μm and the thickness was about 15 μm. Thereby, the protrusion amount B (B = A−C) of the protrusion from the colored layer is 1.5 μm, and the height difference X (X = D) between the top of the protrusion and the top of the spacer is 1.5 μm. It was.
The light transmittance of the protrusion and spacer measured under the same measurement conditions as in Example 1 was 90%.

Next, a coating for alignment film (SE-5300 manufactured by Nissan Chemical Co., Ltd.) is applied by a spin coat method so as to cover the common transparent electrode, the protrusion, and the spacer, and subjected to a heat treatment at 220 ° C. for 60 minutes. An alignment film having a thickness (thickness on the common transparent electrode) of 200 mm was formed to obtain a color filter.
On the other hand, a TFT substrate was prepared in the same manner as in Example 1, the color filter and the TFT substrate were opposed to the alignment film forming surface side, and then liquid crystal (MLC-6608 manufactured by MERCK Corporation) was used by vacuum injection. ) Was injected into the cell, the inlet was sealed with an ultraviolet curable resin, and an annealing treatment was performed at 105 ° C. for 1 hour to cancel the flow alignment effect. Thereby, a liquid crystal display device for evaluation was produced. The thickness of the liquid crystal layer of this liquid crystal display device was 1.5 μm at a portion where no black matrix was present.

[Example 3]
In the same manner as in Example 1, the common transparent electrode was formed.
Next, a positive photosensitive resin composition C having the following composition was applied onto the common transparent electrode by a spin coating method, and pre-baked (90 ° C., 3 minutes) after 30 seconds. Next, exposure (exposure amount: 80 mJ / cm ² , exposure gap: 150 μm) was performed through a mask for spacer / projection formation, and development was performed. The viscosity of the positive photosensitive resin composition C measured under the same conditions as in Example 1 was 3.5 mPa · s.
(Positive photosensitive resin composition C)
・ Alkali-soluble novolac resin: 90 parts by weight (MP402FPY manufactured by Japan Epoxy Resin Co., Ltd.)
・ Quinonediazide group-containing benzophenone compound: 9 parts by weight (NTester manufactured by Toyo Gosei Co., Ltd.)
Additive (KBM-403, Shin-Etsu Chemical Co., Ltd.) ... 1 part by weight Solvent ... 250 parts by weight (propylene glycol monomethyl ether acetate)
・ Solvent (cyclohexanone): 50 parts by weight

Thereafter, heat treatment was performed at 230 ° C. for 30 minutes to form spacers and alignment control protrusions. The spacer was formed on a wide black matrix through a colored layer and a common transparent electrode, and the height A of the spacer was 3.5 μm and the thickness was about 20 μm. Further, the protrusions were formed in the protrusion non-forming portions of the colored patterns of the red pattern, the green pattern, and the blue pattern, and the height A of the protrusion was 3.5 μm and the thickness was about 15 μm. Thereby, the protrusion amount B (B = A−C) of the protrusion from the colored layer was 1 μm, and the height difference X (X = C + D) between the top of the protrusion and the top of the spacer was 4 μm.
The light transmittance of the protrusion and the spacer measured under the same measurement conditions as in Example 1 was 80%.

Next, a coating for alignment film (SE-5300 manufactured by Nissan Chemical Co., Ltd.) is applied by a spin coat method so as to cover the common transparent electrode, the protrusion, and the spacer, and subjected to a heat treatment at 220 ° C. for 60 minutes. An alignment film having a thickness (thickness on the common transparent electrode) of 200 mm was formed to obtain a color filter.
On the other hand, a TFT substrate was prepared in the same manner as in Example 1, the color filter and the TFT substrate were opposed to the alignment film forming surface side, and then liquid crystal (MLC-6608 manufactured by MERCK Corporation) was used by vacuum injection. ) Was injected into the cell, the inlet was sealed with an ultraviolet curable resin, and an annealing treatment was performed at 105 ° C. for 1 hour to cancel the flow alignment effect. Thereby, a liquid crystal display device for evaluation was produced. The thickness of the liquid crystal layer of this liquid crystal display device was 5 μm at a portion where no black matrix was present.

[Example 4]
In the same manner as in Example 2, the processes up to the formation of the common transparent electrode were performed.
Next, the positive photosensitive resin composition C having the above composition was applied onto the common transparent electrode by a spin coating method, and pre-baked (90 ° C., 3 minutes) after 30 seconds. Next, exposure (exposure amount: 80 mJ / cm ² , exposure gap: 150 μm) was performed through a mask for spacer / projection formation, and development was performed.

Thereafter, heat treatment was performed at 230 ° C. for 30 minutes to form spacers and alignment control protrusions. The spacer was formed in a non-spacer-forming region on the wide black matrix, and the spacer height A was 4 μm and the thickness was about 20 μm. Further, the protrusions were formed in the protrusion non-forming portions of the colored patterns of the red pattern, the green pattern, and the blue pattern, and the height A of the protrusion was 4 μm and the thickness was about 15 μm. Thereby, the protrusion amount B (B = A−C) of the protrusion from the colored layer is 1.5 μm, and the height difference X (X = D) between the top of the protrusion and the top of the spacer is 1.5 μm. It was.
The light transmittance of the protrusion and the spacer measured under the same measurement conditions as in Example 1 was 80%.

Next, a coating for alignment film (SE-5300 manufactured by Nissan Chemical Co., Ltd.) is applied by a spin coat method so as to cover the common transparent electrode, the protrusion, and the spacer, and subjected to a heat treatment at 220 ° C. for 60 minutes. An alignment film having a thickness (thickness on the common transparent electrode) of 200 mm was formed to obtain a color filter.
On the other hand, a TFT substrate was prepared in the same manner as in Example 1, the color filter and the TFT substrate were opposed to the alignment film forming surface side, and then liquid crystal (MLC-6608 manufactured by MERCK Corporation) was used by vacuum injection. ) Was injected into the cell, the inlet was sealed with an ultraviolet curable resin, and an annealing treatment was performed at 105 ° C. for 1 hour to cancel the flow alignment effect. Thereby, a liquid crystal display device for evaluation was produced. The thickness of the liquid crystal layer of this liquid crystal display device was 1.5 μm at a portion where no black matrix was present.

[Comparative example]
The same transparent substrate as in Example 1 was prepared, and this substrate was washed according to a conventional method. Then, a chromium thin film (thickness 2000 mm) was formed on the entire surface of one side of the substrate by sputtering. Next, a positive photosensitive resist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied on the chromium thin film, and exposed and developed through a predetermined mask to form a resist pattern. Next, using this resist pattern as a mask, the chromium thin film was etched using an aqueous solution of ceric ammonium nitrate and perchloric acid to form a black matrix. This black matrix had a lattice shape in which narrow (20 μm) parallel stripes (stripe pitch 130 μm) and wide (40 μm) parallel stripes (stripe pitch 370 μm) intersected, and the thickness was 2000 mm.

Next, a colored layer was formed on the black matrix in the same manner as in Example 1 except that no non-projection portion was formed, and a common transparent electrode was formed.
Next, a positive photosensitive resin composition for protrusion formation (LC-100VL manufactured by Rohm & Haas Co., Ltd.) is applied on the common transparent electrode by a spin coat method, and exposed through a spacer / protrusion formation mask. (Exposure amount: 80 mJ / cm ² , exposure gap: 150 μm), and further, exposure through a mask for forming a spacer (exposure amount: 80 mJ / cm ² , exposure gap: 150 μm) was developed.

Thereafter, a heat treatment was performed at 230 ° C. for 30 minutes to form alignment control protrusions and spacers. Two protrusions formed on the colored layer were present for each pixel of each of the red, green, and blue colored patterns, and had a height of 1 μm and a thickness of about 15 μm. The spacer was formed on a wide black matrix through a colored layer and a common transparent electrode, and had a height of 5 μm and a thickness of about 20 μm.
Next, an alignment film was formed in the same manner as in Example 1 to obtain a color filter.
Next, a TFT substrate was produced in the same manner as in Example 1, and a liquid crystal display device for evaluation was produced. The thickness of the liquid crystal layer of this liquid crystal display device was 5 μm at a portion where no black matrix was present.

[Evaluation]
When the luminance Y value at the time of white display when the liquid crystal display device manufactured as described above was placed on the backlight and a voltage was applied was measured, the luminance Y value in the liquid crystal display devices of Examples 1 to 4 was It was confirmed that the luminance Y value of the liquid crystal display device of the comparative example was 5 to 15% higher.

  It can be used for a liquid crystal display device of a multi-alignment division type vertical alignment mode.

It is a top view which shows an example of the color filter manufactured by the color filter manufacturing method of this invention. FIG. 2 is an enlarged longitudinal sectional view taken along the line II in FIG. 1. It is sectional drawing equivalent to FIG. 2 which shows the other example of the color filter manufactured by the color filter manufacturing method of this invention. It is process drawing for demonstrating one Embodiment of the manufacturing method of the color filter of this invention. It is process drawing for demonstrating other embodiment of the manufacturing method of the color filter of this invention. It is a top view which shows the other example of the color filter manufactured by the color filter manufacturing method of this invention. 1 is a schematic partial cross-sectional view showing an embodiment of a liquid crystal display device of the present invention. It is a top view which shows other embodiment of the liquid crystal display device of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Liquid crystal display device 11, 21 ... Color filter 12, 22 ... Transparent substrate 13, 23 ... Black matrix 14, 24 ... Colored layer 14R, 14G, 14B, 24G ... Colored pattern 15, 25 ... Non-projection part 26 ... Spacer non-formation site 17, 27 ... Common transparent electrode 18, 28 ... Projection 19, 29 ... Spacer 20, 30 ... Photosensitive resin composition film 41 ... TFT substrate 42 ... Transparent substrate 43 ... TFT
44 ... Transparent pixel electrode 45 ... Projection 46 ... Slit

Claims (5)

In the manufacturing method of the color filter used for the liquid crystal display device of the multiple alignment division type vertical alignment mode,
A black matrix forming step of forming a black matrix on the surface of the transparent substrate;
The first step of repeating the process of forming a colored layer having a non-projection part for forming a predetermined pixel pattern in a region where the black matrix does not exist for a plurality of colors , or having a non-spacer part on the black matrix. In addition, a colored layer forming step consisting of any one of the second steps in which an operation for forming a colored layer having a non-projecting portion for formation in a predetermined pixel pattern in a region where no black matrix is present is repeated for a plurality of colors ,
An electrode forming step of forming a common transparent electrode so as to cover the colored layer;
When the colored layer forming step comprises the first step , a photosensitive resin composition film is formed on the common transparent electrode, and the photosensitive resin composition film is exposed through a spacer / projection forming mask, Development is performed to form spacers on the colored layer and the common transparent electrode on the black matrix, and to control the alignment direction of the liquid crystal molecules in a plurality of directions at the non-projection forming portion of the colored layer And when the colored layer forming step comprises the second step, a photosensitive resin composition film is formed on the common transparent electrode, and the photosensitive resin composition is formed via a spacer / projection forming mask. The object film is exposed and developed to form a spacer in the non-spacer-forming portion of the colored layer, and a plurality of orientation directions of liquid crystal molecules in the non-projecting portion of the colored layer Has a spacer protrusion forming step of forming a projection for controlling a,
In the spacer / projection forming step, a photosensitive resin composition having a viscosity in the range of 3 to 8 mPa · s is used, and after the photosensitive resin composition is applied, pre-baking is performed within 45 seconds to form the photosensitive resin composition. Forming a film, forming the protrusions having a light transmittance in the range of 80 to 100%,
The difference in height between the top of the spacer and the top of the protrusion is controlled by regarding the difference in height between the top of the spacer and the top of the protrusion as the sum of the thickness of the black matrix and the thickness of the colored layer. As one-step process, the method of controlling the thickness of the black matrix and the thickness of the colored layer, the difference in height between the spacer top and the projection top is regarded as the thickness of the black matrix, and the colored layer forming step A method for producing a color filter comprising using the second step as a method for controlling the thickness of the black matrix . The method for producing a color filter according to claim 1, wherein in the spacer / projection formation step, heat treatment is performed after development. In the liquid crystal display device of the multi-alignment division type vertical alignment mode,
3. The method for producing a color filter according to claim 1, further comprising: a TFT substrate and a color filter that are opposed to each other so as to form cells at a predetermined interval; and a liquid crystal layer filled in the cell. A liquid crystal display device, wherein the TFT substrate is provided with a transparent pixel electrode for each pixel. The liquid crystal display device according to claim 3 , wherein the transparent pixel electrode of the TFT substrate includes a slit for controlling the alignment direction of the liquid crystal molecules in a plurality of directions. The liquid crystal display device according to claim 3 , wherein the TFT substrate includes protrusions on the transparent pixel electrode for controlling the alignment direction of liquid crystal molecules in a plurality of directions.

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