JP4703392B2 - 蒸着装置 - Google Patents
蒸着装置 Download PDFInfo
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- JP4703392B2 JP4703392B2 JP2005366997A JP2005366997A JP4703392B2 JP 4703392 B2 JP4703392 B2 JP 4703392B2 JP 2005366997 A JP2005366997 A JP 2005366997A JP 2005366997 A JP2005366997 A JP 2005366997A JP 4703392 B2 JP4703392 B2 JP 4703392B2
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- Prior art keywords
- substrate
- slit
- shutter
- vapor deposition
- evaporation source
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- 238000007740 vapor deposition Methods 0.000 title claims description 26
- 239000000758 substrate Substances 0.000 claims description 97
- 239000000463 material Substances 0.000 claims description 79
- 238000001704 evaporation Methods 0.000 claims description 65
- 230000008020 evaporation Effects 0.000 claims description 63
- 230000007246 mechanism Effects 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 230000007723 transport mechanism Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 57
- 239000010409 thin film Substances 0.000 description 23
- 238000000151 deposition Methods 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Description
2 成膜材料
3 基板
4 シャッタ部
5 スリット部
6・7 スリット片
8 シャッタ羽根
18 ガイドレール
19 スライド板
Claims (4)
- 複数の蒸発源に充填した成膜材料を夫々加熱して蒸発させ、各蒸発源からの前記成膜材料の蒸発物を基板上に付着させる際、前記蒸発源と前記基板との間に開閉可能に設けられるシャッタ部を開閉することで、前記蒸発源からの蒸発物による前記基板上への成膜領域を制御し得る蒸着装置であって、前記基板を所定位置に搬送可能とする搬送機構を有し、前記シャッタ部と前記基板との間に、開状態とした前記シャッタ部を通過する前記蒸発源からの蒸発物が付着する前記基板上の領域を任意に可変可能とする前記基板の搬送方向に対して水平方向に直交するスリット部を形成するスリット機構を設け、このスリット機構は、前記基板の搬送方向に沿って設けた一対のガイドレールに前記基板の搬送方向に対して水平方向に直交する向きで一対の板状のスリット片を夫々前記基板と平行方向に移動自在に架設状態に設け、この板状のスリット片間の隙間を前記スリット部に設定し、前記スリット片を、スリット片同士の間隔を広狭するように前記基板と平行方向に移動させるか若しくは一対のスリット片を共に基板と平行方向に移動させることで前記スリット部の開口幅及び前記開状態としたシャッタ部に対する位置を設定し得るように構成し、前記シャッタ部は、夫々独立して開閉制御可能な複数のシャッタ羽根から成り、これらのシャッタ羽根の一部若しくは全部を開状態とすることで、このシャッタ部の開放範囲及び開放位置を設定し得るように構成して、前記スリット部の開口幅及び前記開状態としたシャッタ部に対する位置の設定により、前記開状態としたシャッタ部を通過する前記各蒸発源からの蒸発物の前記基板への経路の一部を閉塞可能としたことを特徴とする蒸着装置。
- 前記基板の搬送方向に沿って設けた一対のガイドレールに夫々このガイドレール上をスライド移動自在にスライド板を設け、この一対のスライド板間に前記スリット片を架設状態に設けたことを特徴とする請求項1記載の蒸着装置。
- 前記スリット片は、前記スライド板上でスライドさせてスリット片同士の間隔を調整し得るように前記スライド板に設けられていることを特徴とする請求項2記載の蒸着装置。
- 前記シャッタ羽根は前記基板の搬送方向に複数並設状態に設けられ、このシャッタ羽根は前記基板と平行状態である閉状態から起回動若しくは伏回動させた開状態に起伏回動し得るように構成したことを特徴とする請求項1〜3のいずれか1項に記載の蒸着装置。
Priority Applications (1)
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JP2005366997A JP4703392B2 (ja) | 2005-12-20 | 2005-12-20 | 蒸着装置 |
Applications Claiming Priority (1)
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JP2005366997A JP4703392B2 (ja) | 2005-12-20 | 2005-12-20 | 蒸着装置 |
Publications (2)
Publication Number | Publication Date |
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JP2007169691A JP2007169691A (ja) | 2007-07-05 |
JP4703392B2 true JP4703392B2 (ja) | 2011-06-15 |
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JP2005366997A Active JP4703392B2 (ja) | 2005-12-20 | 2005-12-20 | 蒸着装置 |
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JP (1) | JP4703392B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6638936B2 (ja) | 2016-01-13 | 2020-02-05 | 住友電工ハードメタル株式会社 | 表面被覆切削工具およびその製造方法 |
CN113621935B (zh) * | 2021-08-16 | 2023-06-23 | 辽宁分子流科技有限公司 | 一种基于卷绕镀膜设备的卷绕镀膜方法 |
CN113621933B (zh) * | 2021-08-16 | 2023-06-23 | 辽宁分子流科技有限公司 | 一种用于卷绕镀膜设备的移动式挡板系统 |
CN113621934B (zh) * | 2021-08-16 | 2023-06-23 | 辽宁分子流科技有限公司 | 一种卷绕镀膜设备 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5239584A (en) * | 1975-09-25 | 1977-03-26 | Hitachi Ltd | Vacuum evaporation apparatus |
JPS53117559U (ja) * | 1977-02-24 | 1978-09-19 | ||
JPS58133374A (ja) * | 1982-02-04 | 1983-08-09 | Ulvac Corp | 真空蒸着多層膜形成装置 |
JPS61284565A (ja) * | 1985-06-12 | 1986-12-15 | Mitsubishi Heavy Ind Ltd | 複合膜形成装置 |
JPH04173968A (ja) * | 1990-11-06 | 1992-06-22 | Seiko Epson Corp | スパッタ装置構造 |
JPH05339725A (ja) * | 1992-06-11 | 1993-12-21 | Matsushita Electric Ind Co Ltd | スパッタリング装置 |
JP2004035983A (ja) * | 2002-07-05 | 2004-02-05 | Japan Science & Technology Corp | コンビナトリアル成膜装置用マスキング機構 |
-
2005
- 2005-12-20 JP JP2005366997A patent/JP4703392B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5239584A (en) * | 1975-09-25 | 1977-03-26 | Hitachi Ltd | Vacuum evaporation apparatus |
JPS53117559U (ja) * | 1977-02-24 | 1978-09-19 | ||
JPS58133374A (ja) * | 1982-02-04 | 1983-08-09 | Ulvac Corp | 真空蒸着多層膜形成装置 |
JPS61284565A (ja) * | 1985-06-12 | 1986-12-15 | Mitsubishi Heavy Ind Ltd | 複合膜形成装置 |
JPH04173968A (ja) * | 1990-11-06 | 1992-06-22 | Seiko Epson Corp | スパッタ装置構造 |
JPH05339725A (ja) * | 1992-06-11 | 1993-12-21 | Matsushita Electric Ind Co Ltd | スパッタリング装置 |
JP2004035983A (ja) * | 2002-07-05 | 2004-02-05 | Japan Science & Technology Corp | コンビナトリアル成膜装置用マスキング機構 |
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JP2007169691A (ja) | 2007-07-05 |
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